Information
-
Patent Grant
-
6815881
-
Patent Number
6,815,881
-
Date Filed
Monday, February 11, 200223 years ago
-
Date Issued
Tuesday, November 9, 200420 years ago
-
Inventors
-
Original Assignees
-
Examiners
- Patel; Nimeshkumar D.
- Guharay; Karabi
Agents
-
CPC
-
US Classifications
Field of Search
US
- 313 409
- 313 412
- 313 413
- 313 414
- 313 441
- 313 446
- 313 447
- 313 448
- 313 449
- 315 15
- 315 382
- 315 36811
- 315 36815
-
International Classifications
-
Abstract
An electron gun includes plural aligned charged grids each having an aperture (in a monochrome CRT) or plural apertures (in a color CRT) through which an electron beam (or beams) is directed. The beams emitted by a cathode sequentially transit a beam forming region (BFR), a dynamic focus lens and a main focus lens prior to being incident on the CRT's display screen. The electron beam tends to expand in diameter in the direction of the CRT's display screen. This results in an increase in the focusing effect on the electron beam of the electron gun's grids in proceeding from the BFR toward the display screen where the beam passing apertures in the various grids are of the same size. To increase electron beam focusing sensitivity while reducing the beam's dynamic focus voltage, the beam passing apertures in the gun's dynamic focus lens are provided with progressively reduced size in proceeding toward the electron gun's cathode.
Description
FIELD OF THE INVENTION
This invention relates generally to self-emitting video display devices such as of the cathode ray tube (CRT) type and is particularly directed to a multi-grid electron gun such as used in a CRT having progressively reduced beam passing apertures in its charged grids in proceeding toward the electron gun's cathode(s).
BACKGROUND OF THE INVENTION
In a conventional electron gun such as used in either a monochrome or color CRT, energetic electrons are emitted from a cathode (or cathodes) and are directed to the gun's beam forming region (BFR). The BFR includes the G1 control grid, the G2 screen grid and a portion of a G3 grid in facing relation with the G2 screen grid. The energetic electrons are directed through aligned apertures in these three grids and are thereby formed into a well-defined beam, or beams, having a very small, circular cross section. After transiting the electron gun's BFR, the beams are directed through a focus lens, typically divided into a pre-focus lens and a main focus lens, for focusing the electron beams on a phosphor-bearing display screen of the CRT. The focus lens focuses each of the beams to a small spot on the CRT's display screen, with the beams simultaneously deflected in a raster-like manner at very high speeds to form a video image on the display screen. In the case of a typical color CRT, three electron beams are simultaneously formed, focused, and converged to a single spot on the display screen. The three electron beams are then displaced in unison in a raster-like manner over the display screen in forming a color video image.
The beam passing apertures in the BFR are typically small in size, with the apertures in the electron gun's G1 control grid and G2 screen grid typically on the order of 0.3 mm to 0.8 mm in diameter. The bottom portion of the G3 grid in facing relation with the G2 screen grid includes apertures which are somewhat larger in that they are typically on the order of 1 mm to 2 mm. The top portion of the G3 grid as well as the G4 and subsequent grids, including auxiliary dynamic modulation grids, have larger beam passing apertures which are typically on the order of 4.5 mm to 7.5 mm in diameter for color electron guns. Aperture size increases in proceeding toward the CRT's display screen in the main focusing lens region in color electron guns due to the “common lens” design utilized in this portion of the electron gun. Even larger electron beam passing apertures are typically used in monochrome electron guns.
Up The electrons exiting the BFR are formed into a beam bundle for subsequent focusing by the pre-focus lens and main focus lens to a small spot on the CRT's display screen. After exiting the electron gun's BFR, the diameter of the beam increases continuously as the electrons travel in the direction of the display screen along the gun's Z-axis. The electron beam expands in the R-direction which is transverse to the Z-axis. This electron beam expansion is due to the velocity of electrons along the R-direction, as well as to the space-charge effect in the beam caused by the mutual repulsion between the electrons in the beam.
The beam passing apertures in the various grids in an electron gun are generally of the same diameter. The primary reason for equal sized apertures in each of the gun's charged grids relates to the use of a mandrel in electron gun assembly. A mandrel is inserted through each aligned array of beam passing apertures in the various grids to maintain the grids in common alignment during the beading process in electron gun assembly. The common sized beam passing apertures and the use of a generally cylindrical mandrel for grid alignment greatly simplifies and facilitates electron gun assembly.
As the electron beam expands in diameter after it exits the electron gun's BFR, the focusing effect of each grid in the lens portion of the electron gun, where all of the grids have beam passing apertures of essentially the same size, becomes progressively stronger due to the progressively increasing diameter of the electron beam. Thus, the closer the charged grid is to the CRT's display screen, the stronger is its focusing effect on the electron beam. Conversely, in the area of the BFR as well as in the lower portion of the gun's pre-focus lens region, the charged grids have a reduced focusing effect on the electron beam due to the beam's small diameter in this region. Because of the reduced focusing effect of the grids in this region, a larger dynamic focus voltage is required to correct for astigmatism of the deflected beam's spot size caused by the CRT's inline deflection yoke as well as to correct for out-of-focus effects which arise from the electron beam's increased landing or throw distance. Reducing the dynamic focus voltage required to correct for astigmatism of the deflected beam places increased demands on electron gun design requirements.
The present invention addresses the aforementioned limitations of the prior art by providing progressively reduced electron beam passing aperture size in an electron gun for use in a CRT which increases electron beam focusing sensitivity without increasing beam spot aberration on the CRT's display screen or the out-of-focus effects on the video image. By providing the BFR and pre-focus lens of the electron gun with progressively reduced electron beam passing aperture size in proceeding toward the gun's cathode, increased electron beam focusing sensitivity is provided without increasing dynamic focus voltage or electron beam spot aberration on the display screen.
OBJECTS AND SUMMARY OF THE INVENTION
Accordingly, it is an object of the present invention to provide in an electron gun of a CRT increased electron beam focusing sensitivity for improved video image quality.
It is another object of the present invention to reduce the dynamic voltage is required in the electron gun of a CRT to correct for electron beam astigmatism and out-of-focus effects.
Yet another object of the present invention is to provide for the assembly of a multi-grid color CRT electron gun with charged grids having reduced diameter electron beam passing apertures using a mandrel.
The present invention contemplates an electron gun for use in a cathode ray tube (CRT) for producing a video image on a display screen, the electron gun comprising a cathode for providing energetic electrons; a beam forming region (BFR) aligned with the cathode and disposed intermediate the cathode and the display screen for receiving and forming the energetic electrons into an elongated, narrow beam, the BFR including plural spaced first charged grids each having one or more first aligned apertures, wherein the electrons are directed through the first aligned apertures and the electron beam increases in cross section in proceeding from the BFR toward the display screen; and an electrostatic lens disposed intermediate the BFR and the display screen and including plural spaced second charged grids each having one or more second aligned apertures through which the electron beam is directed for focusing the electron beam on the display screen, wherein the second aligned apertures decrease in size in proceeding in a direction from the display screen toward the BFR for increasing focusing sensitivity of the electrostatic lens on the electron beam.
BRIEF DESCRIPTION OF THE DRAWINGS
The appended claims set forth those novel features which characterize the invention. However, the invention itself, as well as further objects and advantages thereof, will best be understood by reference to the following detailed description of a preferred embodiment taken in conjunction with the accompanying drawings, where like reference characters identify like elements throughout the various figures, in which:
FIG. 1
is a simplified longitudinal sectional view of a quadrupole-type electron gun for use in a CRT having progressively reduced electron beam passing aperture size in accordance with the principles of the present invention;
FIG. 2
is a simplified longitudinal sectional view of one embodiment of a bi-potential electron gun with progressively reduced electron beam passing aperture size in accordance with the present invention;
FIGS. 2
a-
2
d
are sectional views of the bi-potential electron gun of
FIG. 2
taken respectively along sight lines
2
a
—
2
a
,
2
b
—
2
b
,
2
c
—
2
c
and
2
d
—
2
d
therein;
FIG. 3
is a simplified longitudinal sectional view of another embodiment of a bi-potential electron gun with progressively reduced electron beam passing aperture size in accordance with the present invention;
FIGS. 3
a
-
3
f
are sectional views of the bi-potential electron gun shown in
FIG. 3
taken respectively along sight lines
3
a
—
3
a
,
3
b
—
3
b
,
3
c
—
3
c
,
3
d
—
3
d
,
3
e
—
3
e
and
3
f
—
3
f
therein;
FIG. 4
is a simplified longitudinal sectional view of yet another embodiment of a bi-potential electron gun with progressively reduced electron beam passing aperture size in accordance with the present invention; and
FIGS. 4
a
-
4
e
are sectional views of the bi-potential electron gun shown in
FIG. 4
taken respectively along sight lines
4
a
—
4
a
,
4
b
—
4
b
,
4
c
—
4
c
,
4
d
—
4
d
and
4
e
—
4
e
therein;
FIG. 5
is a simplified longitudinal sectional view of still another embodiment of a bi-potential electron gun with progressively reduced electron beam passing aperture size in accordance with the present invention;
FIGS. 5
a
-
5
f
are sectional views of the bi-potential electron gun shown in
FIG. 5
taken respectively along sight lines
5
a
—
5
a
,
5
b
—
5
b
,
5
c
—
5
c
,
5
d
—
5
d
,
5
e
—
5
e
and
5
f
—
5
f
therein; and
FIG. 6
is a perspective view of a portion of the bi-potential electron gun shown in
FIG. 4
illustrating details of the G31 grid, the G32 grid, and the G33 grid.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
Referring to
FIG. 1
, there is shown a simplified longitudinal sectional view of a quadrupole-type (QPF) electron gun
10
, but without a dynamic quadrupole, having progressively reduced electron beam passing aperture size in accordance with one embodiment of the present invention. The present invention is applicable to electron guns used in both monochrome and color CRTs. The electron gun
10
shown in
FIG. 1
is thus applicable to both monochrome and color CRTs, it being understood that the electron beam
34
shown in dotted line form in the figure is only one of three beams in a color CRT. In this latter case, the electron gun
10
generates and directs two additional inline electron beams (which are not shown in the figure for simplicity), with one electron beam in spaced relation from the center electron beam
34
into the plane of the sheet and the other electron beam disposed above the plane shown in
FIG. 1
, or toward the reader. Thus, for simplicity, only the center electron beam
34
as well as the aligned beam passing apertures in the various grids through which the electron beam is directed are shown in
FIG. 1
, where the electron gun
10
is a multi-beam electron gun such as used in a color CRT.
Electron gun
10
includes a cathode K for generating energetic electrons and directing these electrons through aligned apertures in a G1 control grid
12
and a G2 screen grid
14
. In the case of a multi-beam electron gun, electron gun
10
further includes two additional cathodes which are not shown in the figure for simplicity, with one of these cathodes disposed below the plane of FIG.
1
and the other cathode disposed above the plane of the figure. While the following discussion is limited to the center electron beam
34
and the grid apertures through which this beam is directed, this discussion is equally applicable to the two outer electron beams in electron gun
10
which as indicated above are not shown in the figure for simplicity.
The electron gun's beam forming region (BFR)
36
is comprised of the G1 control grid
12
, the G2 screen grid
14
, and a lower side of a G3 grid
16
. QPF electron gun
10
further includes a dynamic focus lens
37
comprised of the upper side of the G3 grid
16
, a G4 grid
18
, and the lower side of a G5 grid
20
. The three electron beams, including the center electron beam
34
(shown in the figure in dotted line form), are focused on the display screen
30
by means of a main focus lens
38
comprised of the upper side of the G5 grid
20
and a G6 grid
22
. The G1 grid
12
is typically maintained at zero voltage, while the G2 screen grid
14
and the G4 grid are typically coupled to a common voltage V
G2
source
26
and the G3 and G5 grids
16
,
20
are coupled to a common focus voltage V
F
source
28
. The V
G2
source
26
maintains the G2 screen and G4 grids
14
,
18
at a voltage in the range of 400-750 V. The G6 grid
22
is typically coupled to an accelerating, or anode, voltage source which is not shown in the figure for simplicity. Each of the three electron beams is directed through plural aligned apertures in the various grids of electron gun
10
as the electrons proceed from each respective cathode K toward the CRT's display screen
30
.
As shown in
FIG. 1
, electron beam
34
is directed through the BFR
36
of electron gun
10
in the form of a narrow bundle along the longitudinal axis Z-Z′ of the electron gun. After passing through the electron gun's BFR
36
, the beam, or beams, expand radially because of the beam's space-charge effect and the radial thermal velocity component of the electrons which is perpendicular to the gun's longitudinal axis Z-Z′. The effect of these phenomena is to increase the cross section of the electron beam
34
as it proceeds from the BFR
36
and sequentially through the gun's dynamic focus lens
37
and its main focus lens
38
prior to being incident upon display screen
30
.
In accordance with the present invention, in order to increase the focus sensitivity of the electron gun
10
on the electron beam
34
, the beam passing apertures in the gun's dynamic focus lens
37
are provided with reduced diameter in proceeding toward cathode K. Thus, the aperture
16
a
in the high end of the G3 grid
16
is provided with a diameter d1, while the beam passing aperture
18
a
in the G4 grid is provided with a diameter d2. Finally, the beam passing aperture
20
a
in the low end of the G5 grid
20
is provided with a diameter d3, where d3≧d2≧d1. Thus, in the dynamic focus lens
37
of electron gun
10
the respective beam passing apertures in the low end of the G5 grid
20
, in the G4 grid
18
, and in the high end of the G3 grid
16
are of decreasing diameter to accommodate the reduced diameter of the electron beam
34
in proceeding in the direction of cathode K. This increases the focus sensitivity of the electron gun's dynamic focus lens
37
on electron beam
34
and corrects for beam astigmatism with minimum spherical aberration of the beam.
Also shown in
FIG. 1
in dotted line form is a mandrel
32
inserted through aligned apertures in the electron gun's G1, G2, G3, G4, G5 and G6 grids. In proceeding toward the electron gun's cathode K, mandrel
32
is tapered in a step-wise manner so as to accommodate the reduced diameters of apertures
20
a
,
18
a
and
16
a
,
16
b
respectively disposed in the G5, G4 and G3 grids
20
,
18
and
16
as well as the apertures in the G1 and G2 grids. The distal end of mandrel
32
is tapered in a step-wise manner in proceeding toward the electron gun's cathode K for insertion in a tight-fitting manner in apertures in the G5, G4, G3, G2 and G1 grids for precisely aligning these grids during assembly of electron gun
10
. Once the electron gun
10
is assembled, mandrel
32
is removed from the aligned grid assembly for completion of assembly of the electron gun. In the case of a multi-beam color CRT incorporating three inline electron beams, a mandrel
32
as shown in
FIG. 1
would be inserted through each of the three groups of aligned beam passing apertures for precisely aligning the electron gun's grids during assembly. Each of three such mandrels preferably would be incorporated in an alignment jig used in the assembly of the multi-beam electron gun.
Referring to
FIG. 2
, there is shown a simplified longitudinal sectional view of a bi-potential electron gun
40
incorporating a progressively reduced electron beam passing aperture size in accordance with the principles of the present invention. Bi-potential electron gun
40
includes a cathode K which generates and directs energetic electrons through aligned apertures in a G1 control grid
42
and a G2 screen grid
44
. The electron beam
65
(shown in dotted line form) is then sequentially directed through aligned apertures in a G31 grid
46
, a G32 grid
48
, a G33 grid
50
, and a G4 grid
52
. The electron beam
65
is incident upon the CRT's display screen which is not shown in
FIG. 2
for simplicity. In addition, while
FIG. 2
shows only a single set of aligned apertures in the various charged grids such as in a monochrome CRT, the arrangement shown in
FIG. 2
is also applicable to a color CRT including three inline apertures in each grid, with each aperture adapted for passing a respective electron beam.
The G1 control grid
42
, G2 screen grid
44
and the bottom portion of the G31 grid
46
, i.e., in facing relation to the G2 screen grid, form the electron gun's beam forming region (BFR)
64
. The upper portion of the G31 grid
46
, the G32 grid
48
and the lower portion of the G33 grid
50
form the electron gun's dynamic focus lens
66
. The upper portion of the G33 grid
50
in combination with the G4 grid
52
form the electron gun's main focus lens
68
. A focus voltage E
b
source
62
is coupled to the G4 grid
52
for focusing the electron beams.
A dynamic voltage V
d
source
58
is coupled to the G31 grid
46
and the G33 grid
50
. A fixed voltage V
s
source
60
is connected to the G32 grid
48
. The V
d
source
58
provides a time variable voltage to the G31 and G33 grids
46
,
50
. A fixed voltage is provided to the G32 grid
48
by the V
s
source
60
. The combination of the fixed voltage provided to the G32 grid
48
and time variable voltage provided to the G31 and G33 grids
46
,
50
produces first and second dynamic quadrupoles
54
and
56
(shown in dotted line form in
FIG. 2.
) The first and second dynamic quadrupoles
54
,
56
form a time variable quadrupole lens to compensate for the deflection yoke's astigmatism effect. The first dynamic quadrupole
54
is formed between the top portion of the G32 grid
48
and the bottom portion of the G33 grid
50
. The second dynamic quadrupole
56
is formed between the top portion of the G31 grid
46
and the bottom portion of the G32 grid
48
.
In accordance with the present invention, the first and second dynamic quadrupoles
54
and
56
are disposed in the electron gun's dynamic focus lens
66
. In proceeding toward the electron gun's cathode K, it can be seen that the beam passing aperture
50
a
in the bottom portion of the G33 grid
50
is greater in diameter then the adjacent beam passing aperture
48
b
in the top portion of the G32 grid
48
. Similarly, in the second dynamic quadrupole
56
beam passing aperture
48
a
in the bottom portion of the G32 grid
48
is larger in diameter then the beam passing aperture
46
a
in the top portion of the G31 grid
46
. Thus, in the electron gun's prefocus lens
66
, d4>d3>d2>d1. The decreasing diameters of the beam passing apertures in proceeding in the electron gun's dynamic focus lens
66
toward it's cathode K provides increased focusing sensitivity for electron beam
65
as it expands in diameter in proceeding from the electron gun's cathode K towards the display screen.
Referring to
FIGS. 2
a
-
2
d
, there are shown sectional views of the bi-potential electron gun
40
shown in
FIG. 2
taken respectively along sight lines
2
a
—
2
a
,
2
b
—
2
b
,
2
c
—
2
c
and
2
d
—
2
d
. As shown in
FIG. 2
a
, the low side of the G33 grid
50
includes an elongated common aperture
50
a
through which the three electron beams are directed in a spaced manner. Disposed along the length of the common aperture
50
a
are three enlarged portions formed by paired circular arcs in the upper and lower edges of the common aperture. Each of the spaced enlarged portions in the common aperture
50
a
is provided with a diameter of d4. Similarly, as shown in
FIG. 2
d
for the high side of the G31 grid
46
, this grid includes an elongated common aperture
46
a
having three spaced enlarged portions through each of which a respective one of the electron beams is directed. Each of the enlarged portions of the common elongated aperture
46
a
has a diameter d1. As shown in
FIG. 2
b
, the high side of the G32 grid
48
is provided with three spaced beam passing apertures each having an enlarged and generally circular inner portion with a diameter d3. Similarly,
FIG. 2
c
shows the low side of the G32 grid
48
as also including three spaced beam passing apertures, each of which has an inner circular portion with a diameter d2. In accordance with the progressively reduced electron beam passing aperture size in proceeding toward the cathode(s) of the inventive electron gun
40
, d4>d3>d2>d1.
Referring to
FIG. 3
, there is shown a longitudinal sectional view of another embodiment of a bi-potential electron gun
70
in accordance with the present invention. Bi-potential electron gun
70
includes a G1 control grid
72
, a G2 screen grid
74
, and a G31 grid
76
. The G1 control grid
72
, G2 screen grid
74
, and the bottom portion of the G31 grid
76
form the electron gun's BFR
75
. Electron gun
70
further includes a G32 grid
78
, a G33 grid
80
, a G34 grid
82
, and a G4 grid
84
. The upper portion of the G31 grid
76
, the G32 grid
78
, the G33 grid
80
, and the lower portion of the G34 grid
82
form the electron gun's dynamic focus lens
77
. The top portion of the G34 grid
82
and the G4 grid
84
form the electron gun's main focus lens
79
. The electron gun's cathode K directs energetic electrons through aligned apertures in the aforementioned grids, with the electron gun's BFR
75
forming the electrons into an electron beam
65
(shown in the figure in dotted line form). As shown in
FIG. 3
, the diameter of the electron beam
65
expands as previously described as it transits aligned apertures in the various grids in traveling from the electron gun's cathode K to its display screen (which is not shown in the figure for simplicity).
A variable voltage V
d
source
90
is connected to and charges the electron gun's G32 grid
78
and G34 grid
82
. A voltage applied to the G32 grid
78
and G34 grid
82
by the variable voltage V
d
source
90
varies as the electron beams are swept across the CRT's display screen. A fixed voltage V
s
source
92
is coupled to and charges the G31 grid
76
and G33 grid
80
. An anode voltage E
b
source
94
is connected to and charges the G4 grid
84
for focusing and accelerating the electron beams toward the CRT's display screen. The time variable voltage applied to the G34 grid
82
and the G32 grid
78
in combination with the fixed voltage applied to the G33 grid
80
and the G31 grid
76
and the relative positions of these grids results in the formation of three dynamic quadrupoles in the electron gun's dynamic focus lens
77
. Thus, a first dynamic quadrupole
86
(shown in dotted line form) is formed between the bottom portion of the G34 grid
82
and the top portion of the G33 grid
80
. A second dynamic quadrupole
87
(also shown in the figure in dotted line form) is formed between the bottom portion of the G33 grid
80
and the top portion of the G32 grid
78
. Finally, a third dynamic quadrupole
88
(also shown in dotted line form) is formed between the bottom portion of the G32 grid
78
and the top portion of the G31 grid
76
. The combination of the first, second and third dynamic quadrupoles
86
,
87
and
88
form the dynamic quadrupole lens region to compensate for the astigmatism effect of the CRT's deflection yoke.
As shown in
FIG. 3
, the beam passing aperture
76
a
in the top portion of the G31 grid
76
has a diameter d1. The apertures
78
a
and
78
b
respectively in the bottom and top portions of the G32 grid
78
are provided with respective diameters of d2 and d3. The apertures
80
a
and
80
b
respectively in the bottom and top portions of the G33 grid
80
are provided with respective diameters of d4 and d5. Finally, the aperture
82
a
in the bottom portion of the G34 grid
82
is provided with a diameter of d6. In accordance with the embodiment of the invention shown in
FIG. 3
, d6>d5>d4>d3>d2>d1. By progressively reducing the diameters of the electron beam passing apertures in the charged grids in the electron gun's dynamic focus lens
77
, as the diameter of the electron beam
65
is reduced in proceeding toward cathode K, the focusing sensitivity of the electron gun's dynamic focus lens on the electron beams is substantially increased. By increasing electron beam focusing sensitivity, the dynamic focusing voltage in the electron gun's dynamic focus lens
77
may be reduced resulting in a corresponding reduction in dynamic spherical aberration in the election beam spot on the CRT's display screen.
Referring to
FIGS. 3
a
-
3
f
, there are shown sectional views of the bi-potential electron gun
70
shown in
FIG. 3
taken respectively along sight lines
3
a
—
3
a
,
3
b
—
3
b
,
3
c
—
3
c
,
3
d
—
3
d
,
3
e
—
3
e
and
3
f
—
3
f
. As shown in
FIG. 3
a
, the low side of the G34 grid
82
is provided with an elongated common beam passing aperture
82
a
having three spaced enlarged portions disposed along its length. Each of the enlarged portions in the common beam passing aperture
82
is generally circular and has a diameter d6. As shown in
FIG. 3
d
, the high side of the G32 grid
78
is also provided with an elongated common beam passing aperture through which all three electron beams are directed. The common beam passing aperture
78
b
is also provided with three spaced enlarged portions along its length, each having a generally circular shape. The spaced enlarged portions of the common beam passing aperture
78
b
are each provided with a diameter d3. Similarly, the low side of the G32 grid
78
is provided with an elongated common beam passing aperture
78
a
having three spaced enlarged portions disposed along the length thereof. Each of the enlarged portions of the common beam passing aperture
78
a
has a diameter d2.
FIG. 3
b
is an elevation view of the high side of the G33 grid
80
which includes three spaced beam passing apertures through each of which is directed a respective one of the electron beams. The three spaced apertures in the high side of the G33 grid
80
are each provided with an enlarged, generally circular inner portion having a diameter d5. As shown in
FIG. 3
c
, the low side of the G33 grid
80
is also provided with three spaced beam passing apertures each having an inner enlarged portion with a diameter d4. Similarly, as shown in
FIG. 3
f
, the high side of the G31 grid
76
is provided with three spaced beam passing apertures each having an enlarged, generally circular inner portion having a diameter d1. As shown in
FIGS. 3
a
-
3
f
, the enlarged, generally circular portions of the beam passing apertures of the G34 grid
82
, the G33 grid
80
, the G32 grid
78
, and the G31 grid
76
are defined by the relationship d6>d5>d4>d3>d2>d1.
Referring to
FIG. 4
, there is shown a longitudinal sectional view of another embodiment of a bi-potential electron gun
100
in accordance with the present invention. Electron gun
100
includes one or more cathodes K which direct one or more electron beams
121
through aligned apertures in a G1 control grid
102
, a G2 screen grid
104
, and a G31 grid
106
. The combination of the G1 control grid
102
, G2 screen grid
104
, and the bottom portion of the G31 grid
106
forms the electron gun's BFR
115
. Electron gun
100
further includes a G32 grid
108
, a G33 grid
110
, a G34 grid
112
, and a G4 grid
114
. The top portion of the G31 grid
106
, the G32 grid
108
, the G33 grid
110
, and the bottom portion of the G34 grid
112
form the electron gun's dynamic focus lens
117
. The top portion of the G34 grid
112
and the G4 grid
114
form the electron gun's main focus lens
119
. Each of the aforementioned grids includes at least one aperture, where all of the apertures are arranged in linear alignment for passing electron beam
121
which is incident upon the display screen (not shown for simplicity) of a CRT for displaying a video image. In the case of a monochrome CRT, all of the beam passing apertures are arranged along a single linear axis, while in the case of a color CRT three such arrays of linearly aligned apertures are provided for, with each aligned array of apertures passing a respective electron beam for providing one of the primary colors of red, green and blue.
A dynamic voltage V
d
source
116
is coupled to and charges the G34 grid
112
and the G32 grid
108
. A fixed voltage V
s
source
118
is coupled to and charges the G33 grid
110
and the G31 grid
106
. An anode voltage E
b
source
120
is coupled to and charges the G4 grid
114
for focusing and accelerating the electron beam(s).
A first dynamic quadrupole
122
(shown in dotted line form) is formed by the bottom portion of the G34 grid
112
and the top portion of the G33 grid
110
. A second dynamic quadrupole
124
(also shown in dotted line form) is formed by the bottom portion of the G33 grid
110
, the G32 grid
108
, and the top portion of the G31 grid
106
. The combination of the first and second dynamic quadrupoles
122
and
124
forms a quadrupole lens which compensates for the astigmatism effect on the electron beam
121
caused by the CRT's deflection yoke. The first dynamic quadrupole
122
is comprised of two elements, while the second dynamic quadrupole
124
is comprised of three elements.
In the first dynamic quadrupole
122
, an electron beam passing aperture
112
a
in the bottom portion of the G34 grid
112
is provided with a diameter of d5. Also in the first quadrupole
122
, an electron beam passing aperture
110
b
in the top portion of the G33 grid
110
is provided with a diameter of d4. In the second dynamic quadrupole
124
, a beam passing aperture
110
a
in the bottom portion of the G33 grid
110
is provided with a diameter d3 and a beam passing aperture
108
a
in the G32 grid
108
is provided with a diameter of a d2. Also in the second dynamic quadrupole
124
, a beam passing aperture
106
a
in the top portion of the G31 grid
106
is provided with a diameter d1. In accordance with the embodiment of the invention shown in
FIG. 4
, d5>d4>d3>d2>d1. Thus, the aligned beam passing apertures in the electron gun's dynamic focus lens
117
are of reduced diameter in proceeding from the CRT's display screen to its cathode K, corresponding to the reduced diameter of the electron beam
121
in proceeding toward cathode K. This arrangement provides increased beam focusing sensitivity in the dynamic focus lens portion of electron gun
100
, while permitting a reduction in magnitude of the beam dynamic focus voltages applied to the various charged grids in the electron gun's dynamic focus lens
117
without increasing electron beam spot aberration on the CRT's display screen.
Referring to
FIGS. 4
a
-
4
e
, there are respectively shown sectional views of the bi-potential electron gun
100
shown in
FIG. 4
taken respectively along sight lines
4
a
—
4
a
,
4
b
—
4
b
,
4
c
—
4
c
,
4
d
—
4
d
and
4
e
—
4
e
. As shown in
FIG. 4
a
, the low side of the G34 grid
112
is provided with an elongated, common beam passing aperture through which the three electron beams are directed. The elongated, common beam passing aperture
112
a
includes three spaced, generally circular enlarged portions each having a diameter d5. As shown in
FIG. 4
d
, the G32 grid
108
also includes an elongated, common beam passing aperture
108
a
having three spaced, generally circular enlarged portions through each of which is directed a respective electron beam. The enlarged portions disposed in a spaced manner along the common beam passing aperture
108
a
each have a diameter d2. As shown in
FIG. 4
b
, the high side of the G33 grid
110
includes three spaced beam passing apertures each having a generally circular inner portion with a diameter d4. As shown in
FIG. 4
c
, the low side of the G33 grid
110
similarly includes three spaced beam passing apertures each having an inner enlarged, generally circular portion through which a respective electron beam is directed. Each of the enlarged portions of the beam passing apertures in the G33 grid has a diameter d3. Similarly, as shown in
FIG. 4
e
, the high side of the G31 grid
106
includes three spaced beam passing apertures, each having an enlarged, generally circular inner portion through which a respective electron beam is directed. The enlarged, generally circular inner portion of each of the beam passing apertures in the G31 grid
106
has a diameter d1. In accordance with the progressively reduced electron beam passing aperture size in proceeding toward the electron gun's cathode arrangement of the present invention, d5>d4>d3>d2>d1.
Referring to
FIG. 5
, there is shown a longitudinal sectional of another embodiment of a bi-potential electron gun
130
incorporating progressively reduced electron beam passing aperture size in accordance with the present invention. The bi-potential electron gun
130
includes a cathode K (or cathodes in case of a color CRT) which directs energetic electrons through aligned apertures in a G1 control grid
132
, a G2 screen grid
134
, and a G31 grid
136
. The G1 control grid
132
, G2 screen grid
134
and the bottom portion of the G31 grid
136
form the BFR
137
of electron gun
130
. The electron gun
130
further includes a G32 grid
138
, a G33 grid
140
, a G34 grid
142
, a G35 grid
144
, and a G4 grid
146
. Each of the aforementioned grids has one or more apertures in common alignment for passing an electron beam
143
(shown in the figure in dotted line form) which is incident upon the display screen (not shown in the figure for simplicity) of the CRT.
A time variable voltage V
d
source
152
is coupled to and charges the electron gun's G31 grid
136
, G33 grid
140
, and G35 grid
144
. A fixed voltage V
s
source
154
is coupled to and charges the electron gun's G32 grid
138
and G34 grid
142
. An anode voltage E
b
source
156
is coupled to and charges the B34 grid
146
for focusing and accelerating the electron beam
143
toward the CRT's display screen.
The top portion of the G31 grid
136
in combination with the G32 grid
138
, the G33 grid
140
, the G34 grid
142
, and the bottom portion of the G35 grid
144
form the electron gun's dynamic focus lens
139
. The top portion of the G35 grid
144
and the G4 grid
146
form the electron gun's main focus lens
141
.
The bottom portion of the G35 grid
144
in combination with the G34 grid
142
and the top portion of the G33 grid
140
form a first dynamic quadrupole
148
(shown in the figure in dotted line form). Similarly, the bottom portion of the G33 grid
140
in combination with the G32 grid
138
and the top portion of the G31 grid
136
form a second dynamic quadrupole
150
(also shown in dotted line form). The time variable voltage provided by the V
d
source
152
to the G31 grid
136
, the G33 grid
140
, and the G35 grid
144
permits the first and second dynamic quadrupoles
148
and
150
to focus the electron beam
143
(or beams) on the CRT's display screen as the beams are swept across the display screen in forming a video image thereon. The first and second dynamic quadrupoles
148
,
150
correct for astigmatism in the electron beam's spot on the display screen as the electron beam (or beams) are deflected over the display screen caused by the CRT's inline magnetic deflection yoke. The first and second dynamic quadrupoles
148
,
150
also correct for out-of-focus effects on the electron beam arising from changes in the electron beam's landing distance as it is incident upon the display screen.
As shown in
FIG. 5
, the beam passing apertures in the electron gun's dynamic focus lens
139
are of decreasing diameter in proceeding toward cathode K. Thus, the beam passing aperture
144
a
in the bottom portion of the G35 grid
144
has a diameter d6, while the beam passing aperture
142
a
in the G34 grid
142
has a diameter of d5. Similarly, the top portion of the G33 grid
144
is provided with a first beam passing aperture
140
b
having a diameter d4, while the bottom portion of this grid is provided with a second beam passing aperture
140
a
having a diameter d3. Finally, the G32 grid
138
includes a beam passing aperture
138
a
having a diameter d2, while the top portion of the G31 grid
136
is provided with a beam-passing aperture
136
a
having a diameter d1. In accordance with this embodiment of the present invention, d6>d5>d4>d3>d2>d1. By reducing the diameter of the beam passing aperture in the electron gun's dynamic focus lens
139
in proceeding towards it's cathode K, the focusing sensitivity of the dynamic focus lens on the electron beam
143
is substantially increased and compensates for the reduced diameter of the electron beam in proceeding toward cathode K. By increasing the focusing sensitivity of the electron gun's dynamic focus lens
139
on the electron beam
143
, the peak dynamic voltage applied by the V
d
source
152
to the G31 grid
136
, the G33 grid
140
, and the G35 grid
144
may be substantially reduced, resulting in a corresponding reduction in the dynamic spherical aberration of the electron beam's spot on the CRT's display screen.
Referring to
FIGS. 5
a
-
5
f
, there are respectively shown sectional views of the bi-potential electron gun
130
shown in
FIG. 5
taken along sight lines
5
a
—
5
a
,
5
b
—
5
b
,
5
c
—
5
c
,
5
d
—
5
d
,
5
e
—
5
e
and
5
f
—
5
f
therein. As shown in
FIG. 5
a
, the low side of the G35 grid
144
includes an elongated, common electron beam passing aperture
144
a
having three spaced enlarged portions arranged along its length. Each of the enlarged portions in the common beam passing aperture
144
a
is generally circular and has a diameter d6. As shown respectively in
FIGS. 5
c
and
5
d
, the high and low sides of the G33 grid
140
each include a respective elongated, common electron beam passing aperture
140
b
and
140
a
. Each of the elongated common beam passing apertures
144
b
,
144
a
includes three spaced, enlarged portions each having a diameter of d4 and d3, respectively. Similarly, as shown in
FIG. 5
f
, the high side of the G31 grid
136
includes an elongated, common beam passing aperture having three spaced enlarged portions disposed along its length. Each of the spaced enlarged portions in the common beam passing aperture
136
a
is generally circular and has a diameter d1. As shown in
FIG. 5
b
, the G34 grid
142
includes three spaced electron beam passing apertures through each of which a respective electron beam is directed. Each of the beam passing apertures in the G34 grid
142
has an inner, enlarged, generally circular portion having a diameter d5. Similarly, as shown in
FIG. 5
e
, the G32 grid
138
includes three spaced electron beam passing apertures through each of which a respective electron beam is directed. Each of the three electron beam passing apertures in the G32 grid
138
has an inner, enlarged, generally circular portion having a diameter d2. In accordance with the progressively reduced electron beam passing aperture size arrangement of the present invention, the aligned beam passing apertures in the grids shown in
FIGS. 5
a
-
5
f
have the relationship d6>d5>d4>d3>d2>d1.
Referring to
FIG. 6
, there is shown a simplified partial respective view of the bi-potential electron gun
100
shown in FIG.
4
. As described above, the bi-potential electron gun
110
includes the G31 grid
106
, the generally flat G32 grid
108
, and the G33 grid
110
. As described above, the high side of the G31 grid
106
includes three spaced, keyhole-shaped beam passing apertures each having an enlarged, generally circular inner portion. The low side of the G33 grid
110
similarly includes three spaced beam passing apertures also having inner, generally circular portions through which a respective electron beam is directed. Each of the three electron beams in the G33 grid
110
is larger, particularly in its inner, generally circular portion, than the corresponding beam passing aperture in the high side of the G31 grid
106
with which it is aligned. Also as described above, the G32 grid
108
includes an elongated, common electron beam passing aperture
108
through which all three electron beams are directed. Arranged in a spaced manner along the length of the common beam passing aperture
108
are three, generally circular enlarged portions through which a respective one of the electron beams is directed. The generally circular inner portion of each of the beam passing apertures in the low side of the G33 grid
110
is larger than the spaced, corresponding, aligned generally circular portions in the common beam passing aperture
108
a
of the G32 grid
108
. A first fixed voltage V
s
is provided to the G31 grid
106
by a fixed voltage source
118
. A second fixed voltage V
s
′ is provided to the G33 grid
110
by means of the fixed voltage source
118
. A dynamic voltage V
d
is provided to the G32 grid
108
by a variable voltage source
116
.
While particular embodiments of the present invention have been shown and described, it will be obvious to those skilled in the relevant art that changes and modifications may be made without departing from the invention in its broader aspects. Therefore, the aim in the appended claims is to cover all such changes and modifications as fall within the true spirit and scope of the invention. The matter set forth in the foregoing description and accompanying drawings is offered by way of illustration only and not as a limitation. The actual scope of the invention is intended to be defined in the following claims when viewed in their proper perspective based on the prior art.
Claims
- 1. An electron gun for use in a cathode ray tube (CRT) having plural electron beams for producing a color video image on a display screen, said electron gun comprising:a cathode for providing energetic electrons; a beam forming region (BFR) aligned with said cathode and disposed intermediate said cathode and the display screen for receiving and forming said energetic electrons into a narrow beam, said BFR including plural spaced first charged grids each having one or more first aligned apertures, wherein said electrons are directed through said first aligned apertures and said electron beam increases in cross section in proceeding from said BFR toward the display screen; and an electrostatic lens disposed intermediate said BFR and the display screen and including plural spaced second grids charged by a respective focus voltage, each of said second grids having one or more second aligned apertures through which said electron beam is directed for focusing said electron beam on the display screen, wherein said second aligned apertures decrease in size in proceeding in a direction from the display screen toward said BFR for increasing focusing sensitivity of said electrostatic lens on the electron beam while decreasing said focus voltages, said electrostatic lens including a dynamic quadrupole and said second grids including a third grid having a fixed focus voltage and fourth grid having a dynamic focus voltage, said third grid including plural spaced apertures for passing a respective electron beam and said fourth grid including a single common aperture for passing said plural electron beams, said single common aperture having plural spaced enlarged portions each aligned with a respective aperture in said third grid and adapted for passing a respective electron beam, and wherein each enlarged portion is larger than an aligned beam passing aperture in said third grid, and wherein said fourth grid is disposed intermediate said third grid and the display screen.
- 2. An electron gun for use in a cathode ray tube (CRT) including plural electron beams for producing a color video image on a display screen, said electron gun comprising:a cathode for providing energetic electrons; a beam forming region (BFR) aligned with said cathode and disposed intermediate said cathode and the display screen for receiving and forming said energetic electrons into a narrow beam, said BFR including plural spaced first charged grids each having one or more first aligned apertures, wherein said electrons are directed through said first aligned apertures and said electron beam increases in cross section in proceeding from said BFR toward the display screen; and an electrostatic lens disposed intermediate said BFR and the display screen and including plural spaced second grids charged by a respective focus voltage, each of said second grids having one or more second aligned apertures through which said electron beam is directed for focusing said electron beam on the display screen, wherein said second aligned apertures decrease in size in proceeding in a direction from the display screen toward said BFR for increasing focusing sensitivity of said electrostatic lens on the electron beam while decreasing said focus voltages, said electrostatic lens including a dynamic quadrupole and said second grids including a third and having a fixed focus voltage and fourth grid having a dynamic focus voltage, said third grid including plural spaced apertures for passing a respective electron beam and said fourth grid including a single common aperture for passing said plural electron beams, said single common aperture having plural spaced enlarged portions each aligned with a respective aperture in said third grid and adapted for passing a respective electron beam, and wherein each enlarged portion is smaller than an aligned beam passing aperture in said third grid, and wherein said third grid is disposed intermediate said fourth grid and the display screen.
- 3. An electron gun for use in a cathode ray tube (CRT) for producing a video image on a display screen, said electron gun comprising:a cathode for providing energetic electrons; a beam forming region (BFR) aligned with said cathode and disposed intermediate said cathode and the display screen for receiving and forming said energetic electrons into a narrow beam, said BFR including plural spaced first charged grids each having one or more first aligned apertures, wherein said electrons are directed through said first aligned apertures and said electron beam increases in cross section in proceeding from said BFR toward the display screen; and an electrostatic lens disposed intermediate said BFR and the display screen and including plural spaced second grids charged by a respective focus voltage, each of said second grids having one or more second aligned apertures through which said electron beam is directed for focusing said electron beam on the display screen, said electrostatic lens including first and second dynamic quadrupoles each having a respective third grid and a respective fourth grid, wherein each of said third grids includes plural spaced apertures for passing a respective electron beam and each of said fourth grids includes a single common aperture having plural spaced aligned portions each adapted for passing a respective electron beam, and wherein each spaced aperture in each of said third grids is larger than an aligned enlarged portion of the single common aperture in an associated fourth grid when said fourth grid is disposed intermediate said cathode and its associated third grid, and is smaller than an aligned enlarged portion of the single common aperture in an associated fourth grid when said third grid is disposed intermediate said cathode and its associated fourth grid.
- 4. The electron gun of claim 3 wherein the CRT is a color CRT having three cathodes for providing three groups of energetic electrons, and wherein each of said first charged grids includes three apertures each adapted to receive and form a respective group of energetic electrons into an elongated, narrow beam.
- 5. The electron gun of claim 4 wherein the three apertures in each of said first charged grids are arranged in an inline array.
- 6. The electron gun of claim 3 wherein said BFR includes a G1 control grid, a G2 screen grid, and a bottom portion of a G3 grid.
- 7. The electron gun of claim 6 wherein said electrostatic lens includes a top portion of said G3 grid and plural spaced aligned focus grids disposed intermediate said G3 grid and the display screen.
US Referenced Citations (36)