Patent Application
20230123033
The present invention relates to the field of liquid crystal display technologies, and in particular, to a color filter substrate, a manufacturing method thereof, and a liquid crystal display panel.
Current liquid crystal display (LCD) panels usually comprise a thin film transistor (TFT) substrate and a color filter (CF) substrate.
In a manufacturing process of a liquid crystal panel, when implementing one drop filling (ODF, a liquid crystal dropping process), a vacuum assembly process is used to vacuum. At this time, a vacuum chamber will appear in a dummy region between two substrates. Current CF film structure in the dummy region is not sufficiently supported. Under an action of an atmospheric pressure outside the substrate, the substrate in the dummy region is prone to dent, which causes neighboring panels to be tilted up, a “seesaw” effect occurs, flatness of the panel is not good, and an edge of an LCD display appears yellow.
The present invention provides a color filter substrate, a manufacturing method thereof, and a liquid crystal display panel. The color filter substrate improves a film structure in a peripheral region, improves supportability of a film, prevents denting in the peripheral region, and improves yellowing of a periphery of the liquid crystal display panel.
The present invention first provides the color filter substrate comprising a display region and a peripheral region, wherein the peripheral region is provided with a light shielding layer and a photoresist layer, the photoresist layer in the peripheral region comprises a plurality of color photoresists, the plurality of color photoresists are stacked, and projections of the plurality of color photoresists in a direction perpendicular to the color filter substrate overlap with each other.
In some embodiments, the photoresist layer in the peripheral region comprises at least two types of photoresists selected from a group of a blue photoresist, a green photoresist, and a red photoresist.
In some embodiments, the peripheral region is further provided with an over coat layer and a spacer layer. The light shielding layer, the photoresist layer, the over coat layer (OC layer), and a spacer layer are stacked in the peripheral region, and projections of the light shielding layer, the photoresist layer, the over coat layer, and the spacer layer in a direction perpendicular to the color filter substrate overlap with each other.
In some embodiments, the display region of the color filter substrate is provided with a light shielding layer and a photoresist layer, the light shielding layer in the display region is a black matrix structure, the black matrix structure divides the color filter substrate into a plurality of pixel regions, and the photoresist layer of the display region is distributed in the pixel regions.
In some embodiments, the display region of the color filter substrate is further provided with the over coat layer, a common electrode layer, and a first alignment film layer.
In some embodiments, the light shielding layer of the peripheral region is continuously distributed, and a thickness of the light shielding layer of the peripheral region is equal to a thickness of a black matrix in the display region.
The present invention further provides a liquid crystal display panel comprising a thin film transistor substrate and the above-mentioned color filter substrate disposed in parallel, and a liquid crystal layer disposed between the two substrates, wherein the liquid crystal layer is distributed at a position corresponding to the display region of the color filter substrate.
In some embodiments, the spacer layer is provided with a plurality of spacers, and in the peripheral region, gap distances between the plurality of spacers and the thin film transistor substrate are same as each other.
The present invention further provides a display device comprising the above-mentioned liquid crystal panel.
The present invention further provides a manufacturing method of a color filter substrate, comprising following steps:
forming a light shielding layer on a display region and a peripheral region of a base substrate, wherein the light shielding layer in the display region is etched into a matrix distribution pattern, and a substrate of the display region is divided into a plurality of pixel regions;
forming a photoresist layer on the display region, wherein different color photoresists of the photoresist layer of the display region are distributed in the pixel regions, and the different color photoresists of the peripheral region are stacked;
forming an over coat layer on the photoresist layer; and
forming a spacer layer on the over coat layer of the peripheral region,
wherein the light shielding layer, the photoresist layer, the over coat layer, and the spacer layer of the peripheral region are stacked.
In some embodiments, the spacer layer in the peripheral region is provided with a plurality of spacers, and patterns of the plurality of spacers are formed by a semi-permeable mask process.
In the present invention, by adding a photoresist layer to a color filter substrate in a peripheral region, a plurality of the photoresist layers are stacked to optimize a film structure of the color filter substrate, enhance a film support, reduce a degree of depression in the peripheral region in an ODF process, and improve mura (unevenness) in a peripheral of a LCD panel. The color filter substrate with optimized film structure is simple to process and does not change original design of a display region of the film layer, and has a wide range of applications.
The technical solution and other beneficial effects of the present invention will be made apparent by following detailed description of embodiments of the present invention in conjunction with accompanying drawings.
The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by those skilled in the art without creative work are within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms “length,” “width,” “thickness,” “upper,” “lower,” and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present invention and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be construed as limiting the present invention. Furthermore, the terms “first” and “second” are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as “first”, “second”, may explicitly or implicitly include one or more of the described features. In the description of the present application, “plurality” means two or more unless specifically limited otherwise.
The following disclosure provides different implementations or examples to implement the present invention. In order to simplify the disclosure of the present invention, specific examples are described below. Of course, they are only examples and are not intended to limit the present invention. In addition, the present invention may repeat reference numerals and/or reference letters in different examples. Such repetition is for the purpose of simplification and clarity, and does not indicate the relationship between the various embodiments and/or settings discussed. In addition, the present invention provides examples of various specific processes and materials, but those of ordinary skill in the art may be aware of the application of other processes and/or the use of other materials.
Referring to
The photoresist layer in the peripheral region 20 comprises at least two types of photoresists selected from a group of a blue photoresist, a green photoresist, and a red photoresist. Specifically, the first photoresist 23 and the second photoresist 24 are photoresists with different colors. In some embodiments, the first photoresist 23 is a green photoresist, and the second photoresist 24 is a blue photoresist, or, the first photoresist 23 and the second photoresist 24 are a combination of two other color photoresists.
Photoresist types of the photoresist layer can be determined according to a manufacturing process of the photoresist layer of the color filter substrate, especially according to a manufacturing process of a photoresist layer 13 in the display region 10. For example, according to the manufacturing process of the photoresist layer 13 in the display region 10, a green photoresist is first formed, and then a blue photoresist is formed, then the first photoresist 23 in the corresponding peripheral region 20 is a green photoresist, the second photoresist 24 is a blue photoresist, and the two are stacked.
In some embodiments, the peripheral region 20 is further provided with an over coat layer 25 and a spacer layer 26. The over coat layer 25 is a planarization layer, and the spacer layer 26 serves as a secondary spacer. Referring to
In some embodiments, a difference between a sum of a thickness of all the film layers of the color filter substrate in the peripheral region and a sum of a thickness of all the film layers of the color filter substrate in the display region is less than a preset threshold, so that the thicknesses of the two is roughly equal. The preset threshold can be determined according to a design of a cell gap and a display effect of the liquid crystal display panel.
In the color filter substrate, a thickness of the first photoresist 23 and a thickness of the second photoresist layer 24 can be adjusted to adjust an overall film thickness of the peripheral region 20 and the display region 10, and reduce a gap between the peripheral region 20 and the display region 10.
In some embodiments, thicknesses of individual film layers of the first photoresist 23 and the second photoresist 24 are 2.0-3.0 μm (micrometers), respectively, and a thickness of the first photoresist 23 and the second photoresist 24 after being stacked is about 3.5-5.0 μm.
In some embodiments, the spacer layer 26 is stacked on a surface of the over coat layer 25.
Referring to
The display region 10 of the color filter substrate is further provided with an over coat layer 14, a common electrode layer 15, and a first alignment film layer 16.
The light shielding layer of the peripheral region 20 is continuously distributed, and a thickness of the light shielding layer 22 of the peripheral region 20 is equal to a thickness of the black matrix (light shielding layer 12) in the display region 10.
In some embodiments, the light shielding layer and the over coat layer of the display region 10 and the peripheral region 20 are formed in a same manufacturing process. For example, in a CF substrate manufacturing process, the light shielding layer is formed on the base substrate 11 to cover the display region 10 and the peripheral region 20, and then the light shielding layer of the display region 10 is formed into a black matrix pattern to form the light shielding layer 12, and the light shielding layer in the peripheral region 20 is continuously distributed to form the light shielding layer 22. For example, in the CF substrate manufacturing process, after a color photoresist film layer is formed, the over coat layer is formed to cover the display region 10 and the peripheral region 20 to form the over coat layer 14 and the over coat layer 25. The light shielding layer and the over coat layer in the embodiment can be implemented according to processes known in the art.
Embodiment 3 provides the liquid crystal display panel. Referring to
In some embodiments, the spacer 26 in the color filter substrate is provided with an opening region on a mask plate in a photoresist exposure and development process, so a spacer pattern can be formed after the photoresist exposure and development process. Therefore, a plurality of the spacers 26 have more than one contact point with the thin film transistor substrate. An arrangement of the contact points and the spacer pattern are determined according to a topography of the thin film transistor substrate and the design of the cell gap, so that the color filter substrate and the thin film transistor substrate are aligned accurately, and a film thickness of the display region 10 and a film thickness of the peripheral region 20 are consistent. In the peripheral region 20, gap distances between the plurality of spacers 26 and the thin film transistor substrate are same as each other. Patterns of the plurality of spacers 26 can be formed by a semi-permeable film mask process.
Referring to
The embodiment of the present invention further provides a manufacturing method of the color filter substrate, which comprises following steps:
forming the light shielding layer on the display region 10 and the peripheral region 20 of the base substrate 11, wherein the light shielding layer 12 in the display region 10 is etched into a matrix distribution pattern, and a substrate of the display region 10 is divided into the plurality of pixel regions; and wherein the light shielding layer 22 of the peripheral region 20 maintains a continuous distribution or an etching pattern.
forming the photoresist layer on the light shielding layer in all the regions of the base substrate 11, wherein different color photoresists (RGB) of the photoresist layer of the display region are distributed in the pixel regions, and the different color photoresists of the peripheral region 20 are stacked;
forming the over coat layer on the photoresist layer in all the regions of the base substrate 11, covering the display region 10 and the peripheral region 20 to form the over coat layer 14 and the over coat layer 25, respectively; and
forming the spacer layer 26 on the over coat layer 14 of the peripheral region 20,
wherein the light shielding layer 22, the photoresist layer 23, 24, the over coat layer 25, and the spacer layer 26 of the peripheral region 20 are stacked, and the projections of the layers in a direction perpendicular to the panel overlap with each other.
In some embodiments, a photoresist stacking order in the peripheral region 20 is consistent with a coating order of the photoresist layer in the display region 10. The photoresist of the peripheral region 20 and the photoresist of the display region 10 are preferably formed in a single manufacturing process. For example, the display region 10 is first made of a G photoresist, and then made of a B photoresist. Correspondingly, when the G photoresist is formed in the display region 10, a G photoresist layer is also formed in the peripheral region 20, and then when the B photoresist is formed in the display region 10, a B photoresist layer is also formed in the peripheral region 20. The B photoresist layer is stacked on a surface of the G photoresist layer.
In some embodiments, the manufacturing method of the color filter substrate further comprises sequentially disposing the common electrode layer 15 and the first alignment film layer 16 on the surface of the over coat layer 16 of the display region 10. For example, the common electrode layer 15 is an ITO metal layer.
The embodiment of the present invention further comprises manufacturing the liquid crystal display panel, respectively forming the color filter substrate and the thin film transistor substrate, and then aligning the two substrates to implement the ODF process.
Materials and forming processes of the film layers of the color filter substrate and the thin film transistor substrate in the embodiments of the present invention are not particularly limited, and it can be made by using materials and processes known in the art to form the film structure of the embodiment of the present invention to achieve a purpose of the present invention.
The color filter substrate and the liquid crystal display panel provided by the embodiments of the present invention are described in detail above. In the article, specific examples are used to illustrate the principle and implementation of the present invention. The description of the above embodiments is only used to help understand the technical solution of the present invention and its core idea. Those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments, or equivalently replace some of the technical features. However, these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the various embodiments of the present invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 202010842146.6 | Aug 2020 | CN | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/CN2020/115636 | 9/16/2020 | WO |
