1. Field of the Invention
Embodiments of the present invention generally relate to a production line for the fabrication of thin film photovoltaic modules. In particular, embodiments of the present invention relate to an automated production line using a common module of laser scribe tools for providing consistent scribe lines in multiple layers in the formation of thin film photovoltaic modules.
2. Description of the Related Art
Photovoltaic (PV) cells or solar cells are devices that convert sunlight into direct current (DC) electrical power. Typical thin film solar cells have a PV layer comprising one or more p-i-n junctions. Each p-i-n junction comprises a p-type layer, an intrinsic type layer, and an n-type layer. When the p-i-n junction of the solar cell is exposed to sunlight (consisting of energy from photons), the sunlight is converted to electricity through the PV effect.
Thin film solar cells are typically formed in series on a large area substrate to form a solar module. The solar modules are formed by scribing trenches in the various thin film layers deposited on the large area substrate during the fabrication process to both isolate and electrically connect the solar cells in series. In order to maintain consistency and throughput, state of the art solar module production lines use different laser modules at various locations in the production line. This is in part due to the use of particular wavelength lasers used for scribing trenches through different film layers in the formation of the solar cell modules. As a result, state of the art solar cell production lines have lengthy, inflexible process routes that consume a considerable amount of costly fabrication facility space and have a higher production line cost-of-ownership due to the requirement to house multiple different spare parts.
Therefore, there is a need for a process and system for fabricating solar modules incorporating a common module of laser scribe tools to decrease cost and facility space requirements, while improving the various scribing processes, system flexibility, and overall system throughput.
In one embodiment of the present invention, a laser scribe module for scribing a series of trenches in multiple material layers, including at least a front contact layer, a photovoltaic layer, and a back contact layer, deposited on a substrate, comprises an automation device configured to receive and transport the substrate within the module, one or more reading devices configured to scan a unique reference designator assigned to the substrate, a plurality of laser scribing tools, each configured to emit radiation at substantially the same wavelength, and a system controller configured to receive information from the one or more reading devices, identify the material layer needing to be scribed, send commands to the automation device to transport the substrate to one of the plurality of laser scribing tools, and configure parameters of the laser scribing tool for scribing the identified material layer.
In another embodiment, a process for scribing lines in multiple layers of a solar cell device comprises receiving a substrate having one or more material layers disposed thereon into a laser scribe module, wherein the laser scribe has a plurality of laser scribe tools disposed therein, each laser scribe tool configured to emit radiation at substantially the same wavelength, transferring the substrate to an available laser scribe tool via an automation device and a system controller, setting parameters of the available laser scribe tool based on a top material layer disposed on the substrate via the system controller, wherein the top material layer is selected from the list consisting of a front contact layer, a photovoltaic layer, and a back contact layer, and scribing a series of lines into the top material layer via the available laser scribe tool and the system controller.
In another embodiment, a system for fabricating solar cell modules comprises a loading module configured to receive a substrate having a front contact layer disposed thereon, a first processing module configured to receive the substrate having the front contact layer disposed thereon with a series of trenches scribed through the front contact layer and deposit a photovoltaic layer over the scribed front contact layer, a second processing module configured to receive the substrate having the photovoltaic layer disposed thereon with a series of trenches scribed through the photovoltaic layer and deposit a back contact layer over the scribed photovoltaic layer, a common laser module having a plurality of laser tools for scribing the series of lines in each layer deposited on the substrate, wherein each laser tool is configured to emit radiation at substantially the same wavelength, and a system controller configured to set and control parameters of each of the laser tools based on the top layer deposited on the substrate needing to be scribed.
In yet another embodiment of the present invention, a process for fabricating solar cell modules comprises receiving a substrate having a transparent conducting oxide layer deposited thereon into a common laser module having a plurality of laser scribing tools, wherein each laser scribing tool is configured to emit radiation at substantially the same wavelength, transferring the substrate to a first available laser scribing tool via an automation device and a system controller, setting at least a laser pulse frequency of the first available laser scribing tool via the system controller, scribing a series of trenches through the transparent conducting oxide layer, transferring the substrate into a first processing module having at least one cluster tool with at least one chamber via the automation device, depositing one or more photovoltaic layers over the scribed transparent conducting oxide layer, transferring the substrate having the one or more photovoltaic layers disposed thereon to a second available laser scribing tool within the common laser module via the automation device, setting at least a laser pulse frequency of the second available laser scribing tool via the system controller, scribing a series of trenches through the one or more photovoltaic layers, transferring the substrate into a second processing module having at least one deposition chamber, depositing a back contact layer over the scribed photovoltaic layers, transferring the substrate having the back contact layer deposited thereon to a third available laser scribing tool within the common laser module via the automation device, setting at least a laser pulse frequency of the third available laser scribing tool via the system controller, and scribing a series of trenches through the back contact layer.
So that the manner in which the above recited features of the present invention can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
For clarity, identical reference numerals have been used, where applicable, to designate identical elements that are common between figures. It is contemplated that features of one embodiment may be incorporated in other embodiments without further clarification.
Embodiments of the present invention generally relate to an automated production line using a common laser scribe module for providing consistent scribe lines in multiple layers during the formation of thin film photovoltaic modules. The common laser scribe module includes a plurality of identical, programmable laser tools configured to emit radiation at a common wavelength. Substrates flowing through the production line are tracked by a system controller, which identifies available laser tools within the common laser scribe module and routes substrates to available tools for scribing features in one or more layers disposed on the substrates. The system controller also sets and controls laser parameters, such as power, pulse frequency, pulse width, and laser pattern, in order to accurately and consistently produce scribed lines in the appropriate material layer of the substrate.
In general, a system controller 290 may be used to control one or more components found in the production line 200. The system controller 290 generally facilitates the control and automation of the overall production line 200 and typically includes a central processing unit (CPU) (not shown), memory (not shown), and support circuits (or I/O) (not shown). The CPU may be one of any form of computer processors that are used in industrial settings for controlling various system functions, substrate movement, chamber processes, and support hardware (e.g., sensors, robots, motors, lamps, etc.), and monitor the processes (e.g., substrate support temperature, power supply variables, chamber process time, I/O signals, etc.). The memory is connected to the CPU, and may be one or more of a readily available memory, such as random access memory (RAM), read only memory (ROM), floppy disk, hard disk, or any other form of digital storage, local or remote. Software instructions and data can be coded and stored within the memory for instructing the CPU. The support circuits are also connected to the CPU for supporting the processor in a conventional manner. The support circuits may include cache, power supplies, clock circuits, input/output circuitry, subsystems, and the like. A program (or computer instructions) readable by the system controller 290 determines which tasks are performable on a substrate. Preferably, the program is software readable by the system controller 290 that includes code to perform tasks relating to monitoring, execution and control of the movement, support, and/or positioning of a substrate along with the various process recipe tasks and various chamber process recipe steps being performed in the production line 200. In one embodiment, the system controller 290 also contains a plurality of programmable logic controllers (PLC's) that are used to locally control one or more modules in the solar cell production, and a material handling system controller (e.g., PLC or standard computer) that deals with the higher level strategic movement, scheduling and running of the complete production line 200.
In order to form a desired number and pattern of solar cells 312 on the substrate 302, a plurality of scribing processes may be performed on material layers formed on the substrate 302 to achieve cell-to-cell and cell-to edge isolation.
The PV layer 320 may include a plurality of silicon film layers that includes one or more p-i-n junctions for converting energy from incident photons into electricity through the PV effect. In one configuration, the PV layer 320 comprises a first p-i-n junction having a p-type amorphous silicon layer, and intrinsic type amorphous silicon layer formed over the p-type amorphous silicon layer, and an n-type amorphous silicon layer formed over the intrinsic type amorphous silicon layer. In one example, the p-type amorphous silicon layer is formed to a thickness between about 60 Å and about 300 Å, the intrinsic type amorphous silicon layer is formed to a thickness between about 1500 Å and about 3500 Å, and the n-type amorphous semiconductor layer is formed to a thickness between about 100 Å and about 500 Å. In one embodiment, instead of the n-type amorphous silicon layer, an n-type microcrystalline semiconductor layer is formed to a thickness between about 100 Å and about 400 Å.
In another configuration, the PV layer 320 further comprises a second p-i-n junction over the first p-i-n junction. In one example, the second p-i-n junction comprises a p-type microcrystalline silicon layer formed to a thickness from about 100 Å and about 400 Å, an intrinsic type microcrystalline silicon layer formed to a thickness between about 10,000 Å and about 30,000 Å over the p-type microcrystalline silicon layer, and an n-type amorphous silicon layer formed over the intrinsic type microcrystalline silicon layer at a thickness between about 100 Å and about 500 Å.
The back contact layer 350, which is formed over the PV layer 320, may include one or more conductive layers adapted to serve as a back electrode for the solar cells 312. In one embodiment, the back contact layer 350 may comprise a series of conductive layers that may include metals and/or conductive transparent oxide layers. Examples of materials that may comprise the back contact layer 350 include, but are not limited to aluminum (Al), silver (Ag), titanium (Ti), chromium (Cr), gold (Au), copper (Cu), platinum (Pt), alloys thereof, or combinations thereof. In one embodiment, the back contact layer 350 comprises a transparent conducting oxide (TCO) layer that is disposed over the PV layer 320 and one or more metal layers formed over the TCO layer. In one example, the TCO layer includes an aluminum zinc oxide (AZO) layer, and the one or more metal layers comprises an aluminum layer and a nickel vanadium alloy layer that has a thickness between about 1000 Å and about 3000 Å. In another example, the back contact layer 350 comprises an aluminum and nickel vanadium multilayer film that has a thickness between about 1000 Å and about 3000 Å.
Three scribing steps may be performed to produce trenches P1, P2, and P3, which are required to form a high efficiency solar cell device, such as the solar module 300. Although formed together on the substrate 302, the individual cells 312 are isolated from each other by the insulating trench P3 formed in the back contact layer 350 and the PV layer 320. In addition, the trench P2 is formed in the PV layer 320 so that the back contact layer 350 is in electrical contact with the front contact layer 310. In one embodiment, the insulating trench P1 is formed by laser removal of a portion of the front contact layer 310 prior to the deposition of the PV layer 320 and the back contact layer 350. Similarly, in on embodiment, the trench P2 is formed in the PV layer 320 by the laser scribe removal of a portion of the PV layer 320 prior to the deposition of the back contact layer 350. Finally, in one embodiment, the trench P3 is formed by the laser removal of portions of the back contact layer 350 and the PV layer 320.
The lines of trenches P1, P2, and P3 are typically formed by a pulsed laser source capable of a frequency below about 80 kHz. The laser source is typically pulsed at a desired frequency as the substrate 302 is linearly translated, resulting in a series of overlapping regions or “spots” of ablated material in the desired layer on the substrate 302. In conventional laser scribing of the P1 trench, a 1064 nm laser source is pulsed at a frequency of about 60 kHz as the substrate 302 is linearly translated at a rate of about 1 m/s. In contrast, the formation of the P2 and P3 trenches are typically provided by pulsing a 532 nm laser at a frequency of about 20 kHz as the substrate 302 is linearly translated at a rate of about 1 m/s. Using conventional laser tools and laser pulsing techniques demands the use of a different wavelength laser for ablating the front contact layer material than the PV layer material or the back contact layer material to achieve reasonable throughput in the solar cell formation process. For instance, the use of a conventional 532 nm wavelength laser and conventional pulsing techniques on the front contact layer 310 does not result in fully ablated lines of trenches P1 because the material (e.g., TCO) of which the front contact layer 310 is comprised, absorbs very little energy at wavelengths around 532 nm. In contrast, the use of a 1064 wavelength laser during the formation of the P2 and P3 trenches would result in unacceptable removal of the front contact layer 310.
To avoid confusion relating to the actions specifically performed on the substrates 302 in the following description, a substrate 302 having one or more of the deposited layers (e.g., the front contact layer 310, the PV layer 320, or the back contact layer 350) and/or one or more internal electrical connections (e.g., side buss 314, cross-buss 316) disposed thereon is referred to as a device substrate 303. Similarly, a device substrate 303 that has been bonded to a back glass substrate using a bonding material is referred to as a composite solar cell structure 304.
Referring to
In one embodiment, each substrate 302 is received with a unique, reference designator formed thereon. In one embodiment, the reference designator comprises a unique, individual marking, such as a barcode or other identification marking, which is assigned to each substrate 302. In one embodiment, the reference designator may be printed on or scribed into the substrate 302. In one embodiment, the reference designator may be scribed into the front contact layer 310 already deposited on a surface of the substrate 302 before it is received into the production line 200. In one embodiment, the reference designator may be located in an edge region of the substrate 302/303. In one embodiment, the reference designator is read via a reading device (not shown), such as a barcode or other optical reading device, during or after loading the substrate 302/303 into the loading module 202. The reference designator is then subsequently read at various locations throughout the production line 200, and the identification information communicated to the system controller 290, where it is correlated with other processing information and stored. The system controller 290 then uses the identification information provided on the reference designator to track the movement of each substrate 302/303, control the movement and positioning of each substrate 302/303 in the production line 200, and control the processes performed on each individual substrate 302/303.
Referring to
Next, the device substrate 303 is transported via the automation device 281 to a common scribe module 500, which comprises a plurality of laser scribing tools 600. In one embodiment, as the device substrate 303 enters the common scribe module 500, its reference designator is read and communicated to the system controller 290. The system controller 290 then controls the transport of the device substrate, on the automation device 281, to one of the scribe tools 600 within the scribe module 500. Since each of the scribe tools 600 is physically identical, the system controller 290 determines which of the scribe tools 600 is available and sends commands to the automation device 281 to transport the device substrate 303 to the available laser scribe tool 600. The system controller 290 then sends commands to the specific scribe tool 600 to perform a front contact isolation step 108 on the device substrate 303 to electrically isolate different regions of the device substrate 303 surface from each other.
In the front contact isolation step 108, the system controller 290 selects and controls process parameters of the scribe tool 600 to perform laser scribing of a series of lines of trenches P1 into the front contact layer 310 of the device substrate 303. In one embodiment, the system controller 290 determines the process parameters based on the location from which the device substrate 303 is received. In one embodiment, the laser scribe tool 600 comprises a fiber based pulsed amplifier laser configured to emit light at a wavelength from about 510 nm to about 560 nm, such as 532 nm. In one embodiment, the system controller 290 controls the laser pulse frequency of the fiber laser within the scribe tool 600 to at least about 300 kHz or greater. In one embodiment, the system controller 290 controls the laser power output between about 5 W and about 10 W. In one embodiment, the system controller 290 controls the laser pulse width between about 2 ns and about 30 ns. In one embodiment, the system controller 290 controls the laser pulse width to 4.2 ns. In one embodiment, the system controller 290 controls the scan speed between about 1 m/s and about 5 m/s, such as about 2.5 m/s. In one embodiment, the system controller 290 controls the laser spot size to about 50 μm or less. In one embodiment, the system controller sets and controls the spacing of the lines of trenches P1. The common scribe module 500 and the scribe tools 600 contained therein are described in more detail below with respect to FIGS. 5 and 6A-6D.
Next, the device substrate 303 is transported out of the common scribe module 500 and into a processing module 212 in which step 112, which comprises one or more photovoltaic deposition steps, is performed on the device substrate 303. In step 112, the one or more photovoltaic deposition steps may include one or more preparation, etching, and/or material deposition steps that are used to form the various regions of the solar cell device. Step 112 generally comprises a series of sub-processing steps that are used to form the PV layer 320 of the solar module 300. In one embodiment, the PV layer 320 comprises one or more p-i-n junctions including amorphous silicon and/or microcrystalline silicon materials. In general, the one or more processing steps are performed in one or more cluster tools (e.g., cluster tools 212A-212D) found in the processing module 212 to form one or more layers in the solar cell device formed on the device substrate 303.
In one embodiment, each cluster tool 212A-212D comprises a load lock chamber “A” and a plurality of processing chambers “B”-“H”. In one embodiment, one of the process chambers “B”-“H” is configured to deposit a p-type silicon layer(s) of a PV layer 320 of a solar cell device and the remaining processing chambers “B”-“H” are each configured to deposit both the intrinsic type silicon layer(s) and the n-type silicon layer(s) of the PV layer. In one embodiment, the intrinsic type silicon layer(s) and the n-type silicon layer(s) of the PV layer 320 may be deposited in the same chamber without performing a passivation process, which is used to minimize cross-contamination between the deposited layers, in between the deposition steps.
In one embodiment, in cases where the solar cell device is formed to include multiple p-i-n junctions, such as a tandem junction type of the solar cell, the cluster tool 212A in the processing module 212 may be adapted to form the first p-i-n junction and at least one of the cluster tools 212B-212D are configured to form the second p-i-n junction.
In one embodiment, the reference designator on the device substrate 303 is read prior to entering and/or within the processing module 212, and identification information is communicated to the system controller 290. In one embodiment, the identification information is used by the system controller 290 to track the device substrate 303 and control the processes performed thereon within the processing module 212.
Next, the device substrate 303 is transported back to the common scribe module 500 via the automation device 281. In one embodiment, as the device substrate 303 enters the common scribe module 500, its reference designator is again read and communicated to the system controller 290. The system controller 290 then controls the transport of the device substrate 303, on the automation device 281, to one of the scribe tools 600 within the scribe module 500. Again, since each of the scribe tools 600 is physically identical, the system controller 290 determines which of the scribe tools 600 is available and sends commands to the automation device 281 to transport the device substrate 303 to the available laser scribe tool 600. The system controller 290 then sends commands to the specific scribe tool 600 to perform an interconnect formation step 116 on the device substrate 303 to isolate different regions of the device substrate 303 surface from each other. In one embodiment, the device substrate 303 is transported via a crossover conveyor 281A to allow the device substrate 303 to be transferred one of the scribe tools 600 for processing in the same direction as the previous and subsequent scribing processes.
In the interconnect formation step 116, the system controller 290 selects and controls process parameters of the scribe tool 600 to perform laser scribing of a series of lines of trenches P2 into the PV layer 320 of the device substrate 303. In one embodiment, the system controller 290 determines the process parameters based on the location from which the device substrate 303 is received. In one embodiment, the laser scribe tool 600 comprises a fiber based pulsed amplifier laser configured to emit light at a wavelength from about 510 nm to about 560 nm, such as 532 nm. In one embodiment, the system controller 290 controls the laser pulse frequency of the fiber laser within the scribe tool 600 to between about 15 kHz and about 30 kHz, such as about 20 kHz. In one embodiment, the system controller 290 controls the laser power output from about 0.2 W to about 1 W. In one embodiment, the system controller 290 controls the laser pulse width between about 1 ns and about 30 ns. In one embodiment, the system controller 290 controls the laser pulse width to 4.2 ns. In one embodiment, the system controller 290 controls the scan speed between about 0.5 m/s and about 1.5 m/s, such as about 0.83 m/s. In one embodiment, the system controller 290 controls the laser spot size to about 50 μm or less. In one embodiment, the system controller sets and controls the spacing of the lines of trenches P2, such that they are appropriately spaced from the lines of trenches P1. The common scribe module 500 and the scribe tools 600 contained therein are described in more detail below with respect to FIGS. 5 and 6A-6D.
Next, the device substrate 303 is transported to the processing module 218 in which a back contact formation step 118 is performed on the device substrate 303. In step 118, one or more substrate back contact formation steps are performed, which may include one or more preparation, etching, and/or material deposition steps that are used to form the back contact regions of the solar cell device. In one embodiment, step 118 generally comprises one or more PVD steps that are used to form the back contact layer 350 on the surface of the device substrate 303. In one embodiment, the one or more PVD steps are used to form a back contact region that contains a metal layer selected from a group consisting of zinc (Zn), tin (Sn), aluminum (Al), copper (Cu), silver (Ag), nickel (Ni), and vanadium (V). In one example, a zinc oxide (ZnO) or nickel vanadium alloy (NiV) is used to form at least a portion of the back contact layer 350. In one embodiment, the one or more processing steps are performed using an ATON™ PVD 5.7 tool available from Applied Materials in Santa Clara, Calif. In another embodiment, one or more CVD steps are used to form the back contact layer 350 on the surface of the device substrate 303. In one embodiment, the reference designator on the device substrate 303 is read prior to entering and/or within the processing module 218, and identification information is communicated to the system controller 290. In one embodiment, the identification information is used by the system controller 290 to track the device substrate 303 and control the processes performed thereon within the processing module 218.
Next, the device substrate 303 is transported back to the common scribe module 500 via the automation device 281. In one embodiment, as the device substrate 303 enters the common scribe module 500, its reference designator is again read and communicated to the system controller 290. The system controller 290 then controls the transport of the device substrate 303, on the automation device 281, to one of the scribe tools 600 within the scribe module 500. Again, since each of the scribe tools 600 is physically identical, the system controller 290 determines which of the scribe tools 600 is available and sends commands to the automation device 281 to transport the device substrate 303 to the available laser scribe tool 600. The system controller 290 then sends commands to the specific scribe tool 600 to perform a back contact isolation step 120 on the device substrate 303 to isolate different regions of the device substrate 303 surface from each other.
In the back contact isolation step 120, the system controller 290 selects and controls process parameters of the scribe tool 600 to perform laser scribing of a series of lines of trenches P3 into the back contact layer 350 of the device substrate 303 to isolate regions of the plurality of solar cells 312 contained on the surface of the device substrate from each other. In one embodiment, the system controller 290 determines the process parameters based on the location from which the device substrate 303 is received. In one embodiment, the laser scribe tool 600 comprises a fiber based pulsed amplifier laser configured to emit light at a wavelength from about 510 nm to about 560 nm, such as 532 nm. In one embodiment, the system controller 290 controls the laser pulse frequency of the fiber laser within the scribe tool 600 to between about 15 kHz and about 30 kHz, such as about 20 kHz. In one embodiment, the system controller 290 controls the laser power output from about 0.2 W to about 1 W. In one embodiment, the system controller 290 controls the laser pulse width between about 1 ns and about 30 ns. In one embodiment, the system controller 290 controls the laser pulse width to 4.2 ns. In one embodiment, the system controller 290 controls the scan speed between about 0.5 m/s and about 1.5 m/s, such as about 0.83 m/s. In one embodiment, the system controller 290 controls the laser spot size to about 50 μm or less. In one embodiment, the system controller sets and controls the spacing of the lines of trenches P3, such that they are appropriately spaced from the lines of trenches P1 and P2. The common scribe module 500 and the scribe tools 600 contained therein are described in more detail below with respect to FIGS. 5 and 6A-6D.
The device substrate 303 is next transported to the seamer/edge deletion module 226 in which a substrate surface and edge preparation step 126 is used to prepare various surfaces of the device substrate 303 to prevent yield issues later on in the process. In one embodiment of step 126, the device substrate 303 is inserted into seamer/edge deletion module 226 to prepare the edges of the device substrate 303 to shape and prepare the edges of the device substrate 303. Damage to the device substrate 303 edge can affect the device yield and the cost to produce a usable solar cell device. In another embodiment, the seamer/edge deletion module 226 is used to remove deposited material from the edge of the device substrate 303 (e.g., 10-12 mm) to provide a region that can be used to form a reliable seal between the device substrate 303 and the backside glass (i.e., steps 134-136 discussed below). Material removal from the edge of the device substrate 303 may also be useful to prevent electrical shorts in the final formed solar module.
In one embodiment, a diamond impregnated belt is used to grind the deposited material from the edge regions of the device substrate 303. In another embodiment, a grinding wheel is used to grind the deposited material from the edge regions of the device substrate 303. In another embodiment, dual grinding wheels are used to remove the deposited material from the edge of the device substrate 303. In yet another embodiment, a laser ablation technique is used to remove the deposited material from the edge of the device substrate 303. In one example, a high power infrared wavelength ND:YAG laser having a spot size of about 1 mm is used to ablate a portion of the material from the edge regions of the device substrate 303. In one aspect, the seamer/edge deletion module 226 is used to round or bevel the edges of the device substrate 303 by use of shaped grinding wheels, angled and aligned belt sanders, and/or abrasive wheels.
Next the device substrate 303 is transported to the pre-screen module 227 in which optional pre-screen steps 127 are performed on the device substrate 303 to assure that the devices formed on the substrate surface meet a desired quality standard. In step 127, a light emitting source and probing device are used to measure the output of the formed solar cell device by use of one or more substrate contacting probes. If the module 227 detects a defect in the formed device it can take corrective actions or the solar cell can be scrapped.
Next the substrate 303 is transported to a bonding wire attach module 231 in which step 131, or a bonding wire attach step, is performed on the substrate 303. Step 131 is used to attach the various wires/leads required to connect the various external electrical components to the formed solar cell device. Typically, the bonding wire attach module 231 is an automated wire bonding tool that is advantageously used to reliably and quickly form the numerous interconnects that are often required to form the large solar cells formed in the production line 200. In one embodiment, the bonding wire attach module 231 is used to form the side-buss 314 (
In the next step, step 132, a bonding material and “back glass” substrate are prepared for delivery into the solar cell formation process (i.e., process sequence 100). The preparation process is generally performed in the glass lay-up module 232, which generally comprises a material preparation module 232A, a glass loading module 232B, a glass cleaning module 232C, and a glass inspection module 232D. The back glass substrate is bonded onto the device substrate 303 formed in steps 102-131 above by use of a laminating process (step 134 discussed below). In general, step 132 requires the preparation of a polymeric material that is to be placed between the back glass substrate and the deposited layers on the device substrate 303 to form a hermetic seal to prevent the environment from attacking the solar cell during its life. Referring to
In the next sub-step of step 132, the back glass substrate is transported to the cleaning module 232C in which a substrate cleaning step, is performed on the substrate to remove any contaminants found on the surface of the substrate. Common contaminants may include materials deposited on the substrate during the substrate forming process (e.g., glass manufacturing process) and/or during shipping of the substrates. Typically, the cleaning module 232C uses wet chemical scrubbing and rinsing steps to remove any undesirable contaminants as discussed above.
The prepared back glass substrate is then positioned over the bonding material and partially device substrate 303 by use of an automated robotic device.
Next the device substrate 303, the back glass substrate, and the bonding material are transported to the bonding module 234 in which step 134, or lamination steps are performed to bond the backside glass substrate to the device substrate formed in steps 102-132 discussed above. In step 134, a bonding material, such as Polyvinyl Butyral (PVB) or Ethylene Vinyl Acetate (EVA), is sandwiched between the backside glass substrate and the device substrate 303. Heat and pressure are applied to the structure to form a bonded and sealed device using various heating elements and other devices found in the bonding module 234. The device substrate 303, the back glass substrate and bonding material thus form a composite solar cell structure 304 that at least partially encapsulates the active regions of the solar cell device. In one embodiment, at least one hole formed in the back glass substrate remains at least partially uncovered by the bonding material to allow portions of the cross-buss 316 or the side buss 314 to remain exposed so that electrical connections can be made to these regions of the solar cell structure 304 in future steps (i.e., step 138).
Next the composite solar cell structure 304 is transported to the autoclave module 236 in which step 136, or autoclave steps are performed on the composite solar cell structure 304 to remove trapped gases in the bonded structure and assure that a good bond is formed during step 136. In step 136, a bonded solar cell structure 304 is inserted in the processing region of the autoclave module where heat and high pressure gases are delivered to reduce the amount of trapped gas and improve the properties of the bond between the device substrate 303, back glass substrate, and bonding material. The processes performed in the autoclave are also useful to assure that the stress in the glass and bonding layer (e.g., PVB layer) are more controlled to prevent future failures of the hermetic seal or failure of the glass due to the stress induced during the bonding/lamination process. In one embodiment, it may be desirable to heat the device substrate 303, back glass substrate, and bonding material to a temperature that causes stress relaxation in one or more of the components in the formed solar cell structure 304.
Next the solar cell structure 304 is transported to the junction box attachment module 238 in which junction box attachment steps 138 are performed on the formed solar cell structure 304. The junction box attachment module 238, used during step 138, is used to install a junction box 308 (
Next, the solar cell structure 304 is transported to the device testing module 240 in which device screening and analysis steps 140 are performed on the solar cell structure 304 to assure that the devices formed on the solar cell structure 304 surface meet desired quality standards. In one embodiment, the device testing module 240 is a solar simulator module that is used to qualify and test the output of the one or more formed solar cells. In step 140, a light emitting source and probing device are used to measure the output of the formed solar cell device by use of one or more automated components that are adapted to make electrical contact with terminals in the junction box 308. If the module detects a defect in the formed device it can take corrective actions or the solar cell can be scrapped.
Next the solar cell structure 304 is transported to the support structure module 241 in which support structure mounting steps 141 are performed on the solar cell structure 304 to provide a complete solar cell device that has one or more mounting elements attached to the solar cell structure 304 formed using steps 102-140 to a complete solar cell device that can easily be mounted and rapidly installed at a customer's site.
Next the solar cell structure 304 is transported to the unload module 242 in which step 142, or device unload steps are performed on the substrate to remove the formed solar cells from the solar module production line 200.
In general operation, a device substrate 303 is transferred into the laser scribe tool 600 following a path A. In one embodiment, the device substrate 303 is oriented with the surface having one or more layers (e.g., front contact layer 310, PV layer 320, back contact layer 350) facing upwardly. The device substrate 303 is then passed over the laser devices 620 one or more times while a series of trenches (i.e., P1, P2, or P3) are scribed into the device substrate 303. The device substrate 303 then exits the laser scribe tool 600 following path Ao. Although
In one embodiment, the optical fiber 624 may include a core 626, an internal cladding 627, and an outer cladding 628 as depicted in the schematic, cross-sectional view shown in
Referring back to
Referring back to
In one embodiment, the substrate handling system 610 includes a support structure 605 that is positioned beneath the device substrate 303 and is adapted to support and retain the various components used to perform laser scribing processes on the device substrate 303. In one embodiment, the substrate handling system 610 includes a conveyor system 612 that has a plurality of conventional, automated conveyor belts for positioning and transferring the device substrate 303 within the laser scribe tool 600 in a controlled and automated fashion.
In one embodiment, the substrate handling system 610 further includes one or more substrate grippers 614 for retaining, guiding, and moving the device substrate 303 during laser scribing processes. The substrate grippers 614 are used to grip the edges of the device substrate 303 and include an actuator, such as a linear motor, to translate the device substrate 303 in the Y and −Y directions while the laser devices 620 form the trenches (e.g., P1, P2, or P3) into the desired layers of the device substrate 303.
Referring to
As previously mentioned, current state of the art laser ablation techniques used for forming trenches in the front contact layer 310 (or TCO layer) of thin film solar cells require the use of a higher wavelength laser, such as 1064 nm, than that used for the PV layer 320 and back contact layer 350. This is because the lower wavelength lasers, such as conventional 532 nm wavelength laser, are not capable of fully ablating a spot of the TCO material layer with a single pulse. In contrast, the configuration and processes described above with respect to the present invention allow the use of a 532 nm programmable fiber laser at significantly higher pulse frequencies to remove trenches P1 of the TCO material in a single pass. This is possible because the higher pulse frequency capability provides multiple pulses of energy at the same “spot” on the substrate 302, effectively “chipping away” at the TCO layer until the entire “spot” is ablated. Thus, the use of such apparatus and techniques allow the use of a plurality of identical lasers, such as 532 nm wavelength lasers, to scribe lines of the trenches P1, P2, and P2 in the multiple layers of the device substrate 303 without sacrificing throughput of the overall system.
While the foregoing is directed to embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.