Claims
- 1. A composite abrasive compact having high thermal stability at temperatures of at least 850.degree. C. and transverse rupture strength of at least 70 Kg/mm.sup.2 which includes
- a relatively thick table of well sintered abrasive particles bonded in particle-to-particle contact with interstices between adjacent particles,
- a strong chemically inert binder matrix dispersed throughout the table in the interstices, and
- a relatively thin layer of metal having a melting point above 1000.degree. C. bonded directly to the table in a HP/HT press.
- 2. A composite abrasive compact as set forth in claim 1 wherein the table is at least twice the thickness of the layer of metal.
- 3. A composite abrasive compact as set forth in claim 2 wherein the table is at least 10 mils thick and the layer of metal is no more than 5 mils thick.
- 4. A composite abrasive compact as set forth in claim 1 wherein the abrasive particles are diamond and the binder matrix is chosen from the group including silicon, boron, alloys/mixtures thereof with nickel, iron, or other Group VIII metals.
- 5. A composite abrasive compact as set forth in claim 4 wherein the thin layer of metal is chosen from the group including tungsten, tungsten carbide, tantalum, titanium and Group VIII metals.
- 6. A composite compact which is thermally stable at temperatures up to 1200.degree. C. and which includes
- an abrasive table of well sintered particles chosen from the group which includes diamond and boron nitride, said particles being bonded in particle-to-particle contact,
- a strong binder matrix which includes a non-catalyst solvent metal dispersed throughout the table, and
- a thin layer of metal having a melting point above 1000.degree. C. bonded directly to the table in a HP/HT press.
- 7. A composite compact as set forth in claim 6 wherein the thickness of the thin layer of metal is such that at temperatures up to 1200.degree. C. the differential forces due to thermal expansion do not exceed the fracture strength of the table.
- 8. A composite compact as set forth in claim 7 wherein the thickness of the thin layer of metal does not exceed one-half that of the table.
- 9. A composite compact as set forth in claim 7 wherein the binder matrix is chosen from the group including silicon, boron, alloys/mixtures of silicon or boron with nickel, iron, cobalt or other Group VIII metals.
- 10. A composite compact as set forth in claim 9 wherein the thin layer of metal is chosen from the group including tungsten, tungsten carbide, tantalum, titanium and Group VIII metals.
- 11. A composite compact which is thermally stable at temperatures up to 1200.degree. C. and which includes
- an abrasive table of well sintered particles chosen from the group which includes diamond and boron nitride, said particles being bonded in particle-to-particle contact, and
- a thin layer of metal having a melting point above 1200.degree. C. bonded directly to the table in a HP/HT press, the thickness of the layer being such that at temperatures up to 1200.degree. C. the differential forces due to thermal expansion do not exceed the fracture strength of the table.
- 12. A composite compact as set forth in claim 11 wherein the thickness of the thin layer of metal does not exceed one-half that of the table.
- 13. A composite compact as set forth in claim 12 wherein the thin layer of metal is chosen from the group including tungsten, tungsten carbide, tantalum, titanium and Group VIII metals.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. patent application Ser. No. 892,186, filed July 30, 1986, abandoned which is a continuation of U.S. patent application Ser. No. 690,136, filed Jan. 10, 1985, abandoned which is in turn a continuation-in-part of U.S. patent application Ser. No. 425,289, filed Sept. 29, 1982, abandoned and assigned to the assignee of the invention herein, is directed to a process of manufacturing a composite abrasive compact having high thermal stability which includes the steps of: sintering a mass of abrasive particles in a high pressure, high temperature (HP/HT) press in the presence of a solvent-catalyst sintering aid, such as cobalt; removing the solvent-catalyst from the resultant compact by leaching; re-sintering the compact in the HP/HT press in the presence of a non-catalyst sintering aid to create a tough bonding matrix; and bonding the compact to a metallic substrate in the HP/HT press.
US Referenced Citations (7)
Continuations (1)
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690136 |
Jan 1985 |
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Continuation in Parts (2)
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892186 |
Jul 1986 |
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425289 |
Sep 1982 |
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