Claims
- 1. An electroless plating composition which comprises a source for a metal ion, an electroless plating reducing agent, insoluble particulate matter dispersed therein and a quantity of particulate matter stabilizer, and wherein said particulate matter stabilizer is an admixture of a nonionic compound along with a member selected from the group consisting of anionics, cationics, and amphoterics, and mixtures thereof.
- 2. The composition according to claim 1 wherein said metal ions are nickel.
- 3. The composition according to claim 1 wherein said particulate matter is a wear resistant particle.
- 4. The composition according to claim 1 wherein said particulate matter is a lubricating particle.
- 5. The composition according to claim 1 wherein said particulate matter stabilizer is an organic non-fluorinated compound.
- 6. The composition according to claim 1 wherein said particulate matter stabilizer is an organic fluorinated compound.
- 7. The composition according to claim 5 wherein said stabilizer is a surfactant.
- 8. The process according to claim 6 wherein said stabilizer is a nonionic surfactant in combination with a cationic surfactant.
- 9. An electroless plating composition which comprises a source for a metal ion, an electroless plating reducing agent, insoluble particulate matter dispersed therein and a quantity of particulate matter stabilizer, said particulate matter stabilizer being an amphoteric compound.
- 10. The composition according to claim 9 wherein said amphoteric compound is a surfactant.
- 11. The composition according to claim 9 wherein said amphoteric compound is a dispersant.
- 12. The composition according to claim 1 wherein the incorporation of said particulate matter stabilizer increases the tolerance for said composition to the addition of anxillary palladium source.
- 13. An electroless plating composition comprising a source of a metal salt, an electroless reducing agent, a complexing agent and/or chelating agent, insoluble particulate matter dispersed therein, an electroless plating stabilizer and a particulate matter stabilizer being capable of shifting the zeta potential for said insoluble particulate matter by at least 10 mv in comparison to the measured zeta potential of said insoluble particulate matter alone in water.
- 14. The composition according to claim 10 wherein said surfactant is a fluorocarbon type.
- 15. The composition according to claim 10 wherein said surfactant is a hydrocarbon.
- 16. The composition according to claim 9 wherein said metal ion is nickel.
- 17. The composition according to claim 9 wherein said reducing agent is sodium hypophosphite.
- 18. An electroless plating composition comprising a source of metal salt, an electroless reducing agent, a complexing agent or chelating agent, insoluble particulate matter dispersed therein, and a particulate matter stabilizer, said stabilizer is a non-ionic surfactant with an HLB number of 17.
- 19. The composition according to claim 18 wherein said insoluble particulate matter is a lubricating particle.
- 20. The composition according to claim 1 further containing ammonium ions.
- 21. The composition according to claim 9 further containing ammonium ions.
- 22. The composition according to claim 13 further containing ammonium ions.
- 23. The composition according to claim 18 further containing ammonium ions.
- 24. An electroless plating composition comprising a source of a metal salt, an electroless reducing agent, a complexing agent and/or chelating agent, insoluble particulate matter dispersed therein and a non-ionic particulate matter stabilizer capable of shifting the zeta potential for said insoluble particulate matter by at least 5 mv in comparison to measured zeta potential of said insoluble particulate matter alone in water.
- 25. The composition according to claim 24 further containing ammonium ions.
- 26. The composition according to claim 24 wherein said non-ionic particulate matter is a hydrocarbon type compound.
- 27. The composition according to claim 24 wherein said insoluble particulate matter is a wear-resistant particle.
- 28. An electroless plating composition comprising a source of a metal salt, an electroless reducing agent, a complexing agent and/or chelating agent, insoluble particulate matter dispersed therein and a cationic particulate matter stabilizer capable of shifting the zeta potential for said insoluble particulate matter by at least 10 mv in comparison to measured zeta potential of said insoluble particulate matter alone in water.
- 29. The composition according to claim 28 further containing ammonium ions.
- 30. The composition according to claim 28 wherein said non-ionic particulate matter is a hydrocarbon type compound.
- 31. The composition according to claim 28 wherein said insoluble particulate matter is a wear-resistant particle.
- 32. An electroless plating composition comprising a source of a metal salt, an electroless reducing agent, a complexing agent and/or chelating agent, insoluble particulate matter dispersed therein and an anionic particulate matter stabilizer capable of shifting the zeta potential for said insoluble particulate matter by at least 15 mv in comparison to measured zeta potential of said insoluble particulate matter alone in water.
- 33. The composition according to claim 32 further containing ammonium ions.
- 34. The composition according to claim 32 wherein said non-ionic particulate matter is a hydrocarbon type compound.
- 35. The composition according to claim 32 wherein said insoluble particulate matter is a wear-resistant particle.
- 36. The composition according to claim 1 wherein said particulate matter stabilizer is the admixture of a non-ionic compound along with an anionic compound.
- 37. The composition according to claim 1 wherein said particulate matter stabilizer is the admixure of a non-ionic compound along with an amphoteric compound.
REFERENCE TO PRIOR APPLICATIONS
This Application is a continuation of co-pending application Ser. No. 510,770 filed Apr. 16, 1990, now abandoned, which is a division of application Ser. No. 137,270 filed Dec. 23, 1987, now abandoned, which is a divisional application of application Ser. No. 822,335 filed Jan. 27, 1986, now abandoned, which is a continuation of application Ser. No. 598,483, filed on Apr. 9, 1984, now abandoned, which is a continuation of application Ser. No. 408,433, filed on Aug. 16, 1982, now abandoned, which is a divisional application of application Ser. No. 249,773, filed Apr. 1, 1981, now abandoned.
US Referenced Citations (16)
Foreign Referenced Citations (1)
Number |
Date |
Country |
3333121 |
Mar 1985 |
DEX |
Non-Patent Literature Citations (3)
Entry |
Reinhold, "The Condensed Chemical Dictionary", Eighth edition, 1971, pp. 327 and 821. |
Helle, K. et al.,-Proceedings of Tenth World Congress on Mutual Finishing, Oct. 12-17, 1980, Kyoto, Japan, pp. 234-236. |
G. A. Gawrilov, "Chemical (Electroless) Nickel Plating", Portcullis Press, 1979, pp. 18-25; 36-39; 164-167. |
Divisions (3)
|
Number |
Date |
Country |
Parent |
137270 |
Dec 1987 |
|
Parent |
822335 |
Jan 1986 |
|
Parent |
249773 |
Apr 1981 |
|
Continuations (3)
|
Number |
Date |
Country |
Parent |
510770 |
Apr 1990 |
|
Parent |
598483 |
Apr 1984 |
|
Parent |
408433 |
Aug 1982 |
|