Patent Application
20220399872
The present invention relates to a composite substrate and a method of producing a composite substrate.
For example, a filter utilizing a surface acoustic wave (SAW filter) has been used in a communication device such as a cellular phone for extracting an electric signal having any appropriate frequency. The SAW filter has a structure in which an electrode or the like is formed on a composite substrate having a piezoelectric layer (see, for example, Japanese Patent Application Laid-open No. 2020-150488).
In recent years, in the field of an information communication device, for example, communication traffic has been rapidly increasing, and hence an improvement in performance of the SAW filter has been required.
A primary object of the present invention is to provide a composite substrate that can contribute to an improvement in performance of a SAW filter.
According to one embodiment of the present invention, there is provided a composite substrate, including: a support substrate; and a piezoelectric layer arranged on one side of the support substrate, wherein an amplitude of a waviness having a spatial frequency of more than 0.045 cyc/mm according to a shape of the support substrate is 10 nm or less.
In one embodiment, a difference between a thickness T1 of the piezoelectric layer at a first point and a thickness T2 thereof at a second point has an absolute value of 100 nm or less.
In one embodiment, the piezoelectric layer has a thickness of 5 μm or less.
According to another embodiment of the present invention, there is provided a surface acoustic wave element, including the above-mentioned composite substrate.
According to still another embodiment of the present invention, there is provided a method of producing a composite substrate, including: joining a support substrate to a first main surface side of a piezoelectric substrate having a first main surface and a second main surface facing each other; and polishing a surface of the piezoelectric substrate on a second main surface side thereof, wherein an amplitude of a waviness having a spatial frequency of more than 0.045 cyc/mm according to a shape of the support substrate is 10 nm or less.
In one embodiment, a difference between a thickness T1 of a piezoelectric layer, which is obtained by polishing the piezoelectric substrate, at a first point and a thickness T2 thereof at a second point has an absolute value of 100 nm or less.
In one embodiment, a piezoelectric layer, which is obtained by polishing the piezoelectric substrate, has a thickness of 5 μm or less.
According to the embodiment of the present invention, for example, the composite substrate that can contribute to an improvement in performance of a SAW filter can be provided.
Embodiments of the present invention are described below, with reference to the drawings. However, the present invention is not limited to those embodiments. In addition, the drawings may be schematically illustrated in terms of, for example, the width, thickness, and shape of each portion as compared to the embodiments for further making the description clear. However, the drawings are merely examples, and do not limit the interpretation of the present invention.
The composite substrate 100 may be produced in any appropriate shape. In one embodiment, the substrate may be produced in the form of a so-called wafer as illustrated in
Any appropriate thickness may be adopted as the thickness of the support substrate 10. The thickness of the support substrate is, for example, from 100 μm to 1,000 μm.
The amplitude of the waviness of the shape of the support substrate having a spatial frequency of more than 0.045 cyc/mm is 0 nm or more and 10 nm or less, preferably 5 nm or less. The use of such support substrate can satisfactorily achieve the thickness accuracy of the piezoelectric layer to be described later.
Any appropriate substrate may be used as the support substrate. The support substrate may include a single crystalline substance or may include a polycrystalline substance. A material for forming the support substrate is preferably selected from: silicon; sapphire; glass; quartz; crystal; and alumina.
The silicon may be single crystalline silicon, polycrystalline silicon, or high-resistance silicon.
Typically, the sapphire is a single crystalline substance having the composition of Al2O3, and the alumina is a polycrystalline substance having the composition of Al2O3.
The thermal expansion coefficient of the material for forming the support substrate is preferably smaller than the thermal expansion coefficient of a material for forming the piezoelectric layer to be described later. Such support substrate can suppress changes in shape and size of the piezoelectric layer at the time of a temperature change, and hence can suppress, for example, a change in frequency characteristic of a surface acoustic wave element to be obtained.
Any appropriate piezoelectric material may be used as the material for forming the piezoelectric layer. A single crystal having the composition of LiAO3 is preferably used as the piezoelectric material. Herein, A represents one or more kinds of elements selected from: niobium; and tantalum. Specifically, LiAO3 may be lithium niobate (LiNbO3), lithium tantalate (LiTaO3), or a lithium niobate-lithium tantalate solid solution.
When the piezoelectric material is lithium tantalate, a layer whose normal direction is rotated about X-axis of the piezoelectric material, which is the direction in which a surface acoustic wave propagates, from Y-axis thereof to Z-axis thereof by from 32° to 55° (e.g., 42°), that is, is a direction represented as (180°, 58° to 35°, 180°) in Euler angle notation is preferably used as the piezoelectric layer because a propagation loss is small.
When the piezoelectric material is lithium niobate, for example, a layer whose normal direction is rotated about X-axis of the piezoelectric material, which is the direction in which a surface acoustic wave propagates, from Z-axis thereof to −Y-axis thereof by 37.8°, that is, is a direction represented as (0°, 37.8°, 0°) in Euler angle notation is preferably used as the piezoelectric layer because an electromechanical coupling coefficient is large. In addition, for example, when the piezoelectric material is lithium niobate, a layer whose normal direction is rotated about X-axis of the piezoelectric material, which is the direction in which a surface acoustic wave propagates, from Y-axis thereof to Z-axis thereof by from 40° to 65°, that is, is a direction represented as (180°, 50° to 25°, 180°) in Euler angle notation is preferably used as the piezoelectric layer because a high sound velocity is obtained.
The thickness of the piezoelectric layer is preferably 5 μm or less, more preferably 3 μm or less, still more preferably 1 μm or less. Meanwhile, the thickness of the piezoelectric layer is, for example, 0.2 μm or more. Such thickness can provide a high-performance surface acoustic wave element. Specifically, such effects as described below are expected: the temperature characteristic (TCF) of the element can be improved; and the Q-value thereof can be improved.
The thickness of the piezoelectric layer is preferably uniform.
As described above, the composite substrate may include the intermediate layer. A material for forming the intermediate layer is, for example, silicon oxide, hafnium oxide, tantalum oxide, zirconium oxide, or aluminum oxide. The thickness of the intermediate layer is, for example, from 0.1 μm to 2 μm.
The intermediate layer may be formed by any appropriate method. The layer may be formed by, for example, physical vapor deposition, such as sputtering or ion beam-assisted deposition (IAD), chemical vapor deposition, or an atomic layer deposition (ALD) method.
In addition, as described above, the composite substrate may include the joining layer. A material for forming the joining layer is, for example, a silicon oxide, silicon, tantalum oxide, niobium oxide, aluminum oxide, titanium oxide, or hafnium oxide. The thickness of the joining layer is, for example, from 0.005 μm to 1 μm.
The joining layer may be formed by any appropriate method. Specifically, the layer may be formed by the same method as the above-mentioned method of forming the intermediate layer.
A method of producing a composite substrate according to one embodiment of the present invention includes: joining a support substrate to the first main surface side of a piezoelectric substrate having a first main surface and a second main surface facing each other; and polishing the surface of the piezoelectric substrate on its second main surface side. The polishing is typically performed after the joining.
The second main surface 22b of the piezoelectric substrate 22 of the resultant joined body 90 is subjected to processing, such as grinding or polishing, so that a piezoelectric layer having the above-mentioned desired thickness may be obtained.
A method for the polishing is, for example, mirror polishing based on chemical-mechanical polishing (CMP), lap polishing, or the like. Of those, chemical-mechanical polishing is preferably adopted. Specifically, chemical-mechanical polishing based on a polishing pad, the polishing including using polishing slurry (e.g., colloidal silica), is adopted.
At the time of the joining, the surface of each layer is preferably washed for, for example, removing the residue of a polishing agent, a work-affected layer, or the like. A method for the washing is, for example, wet washing, dry washing, or scrub washing. Of those, the scrub washing is preferred because the surface can be simply and efficiently washed. A specific example of the scrub washing is a method including washing the surface in a scrub washing machine with a detergent (e.g., a SUNWASH series manufactured by Lion Corporation) and then with a solvent (e.g., a mixed solution of acetone and isopropyl alcohol (IPA)).
The activation treatment is typically performed by irradiating the joining surface with a neutralized beam. The activation treatment is preferably performed by generating the neutralized beam with an apparatus such as an apparatus described in JP 2014-086400 A, and irradiating the joining surface with the beam. Specifically, a saddle-field fast atomic beam source is used as a beam source, and an inert gas, such as argon or nitrogen, is introduced into the chamber of the apparatus, followed by the application of a high voltage from the DC power source thereof to an electrode thereof. Thus, a saddle-field electric field is generated between the electrode (positive electrode) and the casing (negative electrode) thereof to cause electron motion, to thereby generate the beams of an atom and an ion by the inert gas. Of the beams that have reached the grid of the fast atomic beam source, an ion beam is neutralized by the grid, and hence the beam of a neutral atom is emitted from the fast atomic beam source. The voltage at the time of the activation treatment by the beam irradiation is preferably set to from 0.5 kV to 2.0 kV, and a current at the time of the activation treatment by the beam irradiation is preferably set to from 50 mA to 200 mA.
The joining surfaces are preferably brought into contact with each other and pressurized in a vacuum atmosphere. A temperature at this time is typically normal temperature. Specifically, the temperature is preferably 20° C. or more and 40° C. or less, more preferably 25° C. or more and 30° C. or less. A pressure to be applied is preferably from 100 N to 20,000 N.
A surface acoustic wave element according to an embodiment of the present invention includes the above-mentioned composite substrate. The surface acoustic wave element typically includes the composite substrate and electrodes (interdigital transducers) arranged on the piezoelectric layer side of the composite substrate. Such surface acoustic wave element is suitably used as, for example, a SAW filter in a communication device such as a cellular phone.
Now, the present invention is specifically described by way of Examples. However, the present invention is not limited by these Examples.
A lithium tantalate (LT) substrate having a diameter of 4 inches and a thickness of 500 μm (such a 42° Y-cut X-propagation LT substrate that the direction in which a surface acoustic wave (SAW) propagated was represented by X, the substrate being a rotated Y-cut plate having a cut-out angle of 42°) was prepared.
In addition, a silicon substrate having a diameter of 4 inches and a thickness of 500 μm was prepared, and the surfaces (both the surfaces) of the silicon substrate were polished. Specifically, the silicon substrate was placed on the SUS carrier of a CMP polishing machine, and both the surfaces were polished by using a hard urethane pad and by using colloidal silica as a polishing agent.
Next, the LT substrate and the silicon substrate were directly joined. Specifically, the surface of the LT substrate and the surface of the silicon substrate were washed, and then both the substrates were loaded into the vacuum chamber of the apparatus, followed by its evacuation to a vacuum of the order of 10−6 Pa. After that, the surfaces of both the substrates were irradiated with fast atomic beams (acceleration voltage: 1 kV, Ar flow rate: 27 sccm) for 80 seconds. After the irradiation, the beam-irradiated surfaces of both the substrates were superimposed on each other, and both the substrates were joined by being pressurized at 1,200 kgf for 2 minutes. Thus, a joined body was obtained.
Next, the rear surface of the LT substrate of the joined body (composite substrate) was ground with a grinder processing machine until its thickness was reduced from its initial value, that is, 500 μm to 3 μm. Further, the rear surface was subjected to mirror polishing in a CMP polishing machine by using a hard urethane pad and by using colloidal silica as a polishing agent until the thickness became 1 μm. Thus, a composite substrate including the silicon substrate and a LT layer was obtained.
A composite substrate was obtained in the same manner as in Example except that a nonwoven fabric was used instead of the hard urethane pad at the time of the polishing of both the surfaces of the silicon substrate.
Example and Comparative Example described above were each subjected to the following evaluations.
The flatness of the silicon substrate after the polishing of both the surfaces in its X-axis direction was measured with a slating incidence interference method flatness tester (“FT-17” manufactured by NIDEK Co., Ltd.). In addition, the thickness of the LT layer of the resultant composite substrate in the X-axis direction was measured with a microspectroscopic thickness meter (“OPTM” manufactured by Otsuka Electronics Co., Ltd.). Specifically, the thickness was measured at 32 points in the range of from −43.4 mm to +43.4 mm when the center of the composite substrate serving as a wafer was defined as an origin at pitches of 2.8 mm.
The results of the silicon substrate of Example are shown in
The results obtained in the above-mentioned section 1 were subjected to FFT analysis. Specifically, each of the shapes and the thickness distributions obtained in the above-mentioned section 1 was multiplied by a Hanning window serving as a window function, and was subjected to the FFT analysis. At the time of the calculation, the analysis tool of Microsoft Excel was used after a tilt component and a DC component had been removed. For FFT conversion and amplitude calculation, each of the resultant absolute values was divided by 16 (number of data points, that is, 32/2), and was then doubled in consideration of the influence of the processing with the Hanning window.
When the silicon substrate was a shape that was convex downward (toward the side on which the LT substrate was not arranged), an unnecessary frequency component occurred at the time of the multiplication of the Hanning window. Accordingly, in order for the silicon substrate to be a shape that was convex upward, the calculation was performed after the respective data had been inverted by subtracting the data from the maximum.
The results of Example are shown in
As shown in
Typically, the composite substrate according to the embodiment of the present invention may be suitably used in a surface acoustic wave element.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2021-097962 | Jun 2021 | JP | national |
This application is a continuation under 35 U.S.C. 120 of International Application PCT/JP2022/006547 having the International Filing Date of Feb. 18, 2022, and having the benefit of the earlier filing date of Japanese Application No. 2021-097962, filed on Jun. 11, 2021. Each of the identified applications is fully incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/JP2022/006547 | Feb 2022 | US |
| Child | 17818040 | US |
