W.C. Bigelow et al, “Oleophobic Monolayers, ” Colloid Sci., 1,513-38 (1946). |
E.E. Polymeropoulos et al, “Electrical Conduction Through Adsorbed Monolayers,” J. Chem. Phys., 69, 1836-1847 (1978). |
Cai, Chengzhi et al, “Self-Assembly in Ultrahigh Vacuum: Growth of Organic Thin Films with a Stable In-Plane Directional Order,” J.Am. Chem. Soc., 120, 8563-8564 (1998). |
Parikh, A.N. et al, “n-Alkylsiloxanes: From Single Monolayers to Layered Crystals,” J.Am.Chem. Soc., 119, 3135-3143 (1997). |
Baney, Ronald H., et al, “Silsesquioxanes,” Chem. Rev., 95, 1409-1430 (1995). |
Loy, Douglas A., et al, “Bridged Polysilsesquioxanes,” Chem. Rev., 95, 1431-1442 (1995). |
Forrest,Stephen R., “Ultrathin Organic Films Grown by Organic Molecular Beam Deposition and Related Techniques,” Chem. Rev., 119, 1793-1896 (1997). |
Lee, Lieng-Huang, “Wettability and Conformation of Reactive Polysiloxanes,” J. Colloid & Interface Sci., 27, 751-760 (1968). |
Peri,J.B., “Infrared study of OH and NH2Groups on the Surface of a Dry Silica Aerogel,” J. Phys. Chem., 70, 2937-2945 (1966). |
Armistead, C.G. et al, “Reactions of Chloromethyl Silanes with Hydrated Aerosil Silicas,” Trans. Faraday. Soc., 63, 2549-2556 (1967). |
Hair, Michael L. et al, “Reactions of Chlorosilanes with Silica Surfaces,” J. Phys. Chem., 73, 2372-2378 (1969). |
Tripp, C.P. et al, “Reaction of Chloromethylsilanes with Silica,” Langmuir, 7, 923-927 (1991). |
Tripp, C.P. et al, “Effect of Fluoroalkyl Substituents on the Reaction of Alkylchlorosilanes with Silica Surfaces,” Langmuir, 9, 3518-3522 (1993). |
Hoffman, Patrick W. et al, “Vapor Phase Self-Assembly of Flourinated Monolayers on Silicon and Germanium Oxide,” Langmuir, 13, 1877-1880 (1997). |