Claims
- 1. A process for the passive removal of a contaminant from a gas comprising water and the contaminant in an enclosed space, said process comprising contacting the gas with a uniform adsorbent sheet comprising a weak adsorbent to maintain effective gas quality within the enclosed space.
- 2. The process of claim 1 wherein the weak adsorbent is selected from the group consisting of silica gel, molecular sieves, activated aluminas, activated carbon and combinations thereof.
- 3. The process of claim 1 wherein the weak adsorbent comprises a high silica zeolite.
- 4. The process of claim 1 wherein the weak adsorbent is selected from the group consisting of clinoptilolite, boggsite, EMC-2, zeolite L, ZSM-5, ZSM-11, ZSM-18, ZSM-57, EU-1, offretite, faujasite, ferrierite, mordenite, zeolite Beta, and silicalite
- 5. The process of claim 1 wherein the weak adsorbent has a silica to alumina ratio greater than 10:1.
- 6. The process of claim 1 wherein the weak adsorbent comprises silicalite.
- 7. The process of claim 1 wherein the effective gas quality within the enclosed space includes a relative humidity between about 30 and about 70 percent.
- 8. The process of claim 1 wherein between about 50 to about 90 weight percent of the organic contaminants are removed from the gas.
- 9. The process of claim 1 wherein the enclosed space is defined by a housing surrounding a disk drive.
- 10. The process of claim 1 wherein the uniform adsorbent sheet has an asymmetric structure.
- 11. The process of claim 1 wherein the uniform adsorbent sheet is disposed in multiple layers.
- 12. The process of claim 1 wherein the uniform adsorbent sheet comprises a hydrophobic polymer binder.
- 13. The process of claim 1 wherein the uniform adsorbent sheet comprises a hydrophobic polymer binder and a hydrophilic adsorbent.
- 14. The process of claim 13 wherein the hydrophobic polymer binder comprises polysulfone and the hydrophilic adsorbent comprises 13X zeolite.
- 15. The process of claim 13 wherein the adsorbent material comprises a first layer consisting of a hydrophobic polymer and a hydrophilic adsorbent and at least one other layer consisting of a hydrophobic polymer and a hydrophilic or a hydrophobic adsorbent.
- 16. The process of claim 1 wherein the contaminant is selected from the group consisting of chlorine, hydrogen sulfide, nitrous oxide, mineral acids, silicone vapors, alcohols, ketones, hydrocarbons, and mixtures thereof.
- 17. The process of claim 1 wherein the contaminant comprises benzothiozole.
- 18. The process of claim 1 wherein the uniform adsorbent sheet is disposed as a filter media.
- 19. A disk drive using a passive humidity control and contaminant removal system according to the process of claim 1.
- 20. A process for the passive regulation of water and a contaminant from a gas comprising water and the organic contaminants in an enclosed space, said process comprising contacting the gas with an adsorbent sheet having an asymmetric structure containing a weak adsorbent to provide a relative humidity ranging from about 30 to about 70 percent over a temperature within the enclosed space ranging from about 20° to about 50° C. and to remove about 55 to about 90 percent of the contaminant.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a Continuation-in-Part of copending application Ser. No. 09/731,404 filed Dec. 6, 2000, the contents of which are hereby incorporated by reference.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09731404 |
Dec 2000 |
US |
Child |
10077302 |
Feb 2002 |
US |