Claims
- 1. A process for the manufacture of fine powder of silicon nitride, comprising the reaction, in a nitrogen countercurrent and in continuous fashion, of silica, carbon and a seed crystal, in the presence of a volatile compound of a metal chosen from the group consisting of Be, Mg, Ca, Sr, Ge, Sn, Ti, Hf, Na and Ba, in a reaction zone possessing a temperature gradient comprising a hot zone in which the said metal compound passes into the gaseous state and a cold zone in which the said metal compound in the gaseous state condenses, the said metal compound in the gaseous state being carried from the hot zone to the cold zone by the nitrogen countercurrent.
- 2. A process according to claim 1, characterized in that the said reaction zone is fed with two charges, the first charge consisting of silica, carbon and seed crystal, the second charge containing at least the said volatile metal compound.
- 3. A process according to claim 2, characterized in that the said second charge consists of silica, carbon, seed crystal and the said volatile metal compound.
- 4. A process according to claim 2, characterized in that the said second charge consists of the said volatile metal compound, optionally mixed with carbon.
- 5. A process according to claim 2, 3 or 4, characterized in that the said first and second charges are introduced simultaneously.
- 6. A process according to claim 2, 3 or 4, characterized in that the said first and second charges are introduced alternately.
- 7. A process according to claim 1, 2, 3 or 4, characterized in that the reaction zone is fed initially with a charge containing silica, carbon, seed crystal and an excess of the said volatile metal compound.
- 8. A process according to claim 1, 2, 3 or 4, characterized in that the said temperature gradient is a gradient from 1000.degree. to 1500.degree. C.
- 9. A process according to claim 1, 2, 3 or 4, characterized in that the said temperature gradient is followed by a substantially constant region at a temperature of between 1350.degree. C. and 1500.degree. C.
- 10. A process according to claim 1, 2, 3 or 4, characterized in that the residence time in the reaction zone is from 0.5 to 20 h.
- 11. A process according to claim 1, 2, 3 or 4, characterized in that the said metal is magnesium.
- 12. A process according to claim 11, characterized in that the said magnesium compound is MgO.
- 13. A process according to claim 1, 2, 3 or 4, characterized in that the silica is in the form of SiO.sub.2.
- 14. A process according to claim 1, 2, 3 or 4, characterized in that the carbon is in the form of carbon black.
- 15. A process according to claim 1, 2, 3 or 4, characterized in that the silica/carbon ratio, expressed as SiO.sub.2 /C, is between 0.05 and 0.5.
- 16. A process according to claim 1, 2, 3 or 4, characterized in that the seed crystal is chosen from the group consisting of Si.sub.3 N.sub.4 in .alpha. and .beta. form, SiC and Si.sub.2 ON.sub.2.
- 17. A process according to claim 16, characterized in that the seed crystal .alpha.-Si.sub.3 N.sub.4.
- 18. A process according to claim 1, characterized in that the seed crystal represents from 1 to 50% by weight of the silica.
- 19. A process according to claim 1, 2, 3 or 4, characterized in that the charge is in the form of extrudates.
Priority Claims (1)
Number |
Date |
Country |
Kind |
92 01806 |
Feb 1992 |
FRX |
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Parent Case Info
This is a division of application Ser. No. 08/273,070, filed Aug. 23, 1994, abandoned, which is a continuation of application Ser. No. 08/016,393, filed Feb. 11, 1993, abandoned.
Foreign Referenced Citations (5)
Number |
Date |
Country |
082343 |
Jun 1983 |
EPX |
131894 |
Oct 1984 |
EPX |
60-251108 |
Dec 1985 |
JPX |
63-239104 |
May 1988 |
JPX |
63-297205 |
Dec 1988 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
273070 |
Aug 1994 |
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Continuations (1)
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Number |
Date |
Country |
Parent |
16393 |
Feb 1993 |
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