The present invention pertains to a semiconductor sensor device, and in particular to a convective accelerometer.
Accelerometers have emerged as a ubiquitous sensor having high demand in the fields of consumer electronics, automotive, biomedical, defense, aerospace, navigation and industrial applications. Rapid progress of semiconductor fabrication technology has led to the development of predominantly silicon-based micro-electromechanical (MEMS) accelerometers.
Thermal micro-sensors have been developed for many applications during the past 25 years. Some of the earliest thermal sensors comprised of micro-platforms were physically configured as infrared detectors fabricated using semiconductor wafers. T
Thermal micro-platforms have been physically configured for inertial, gravimetric, flow, pressure, photonic, chemical, nuclear and electrical.
Thermal accelerometers have been developed based on both MEMS and micro-thermal technologies. Prior art convective accelerometers comprised of a suspended heater and thermistor are disclosed in prior art U.S. Pat. Nos. 5,581,034 and 6,589,433. Prior art discloses convective accelerometers comprised of a thermal heater and a thermal sensor as separate structures disposed within a convective fluid sensitive to inertial forces including physical movement and gravity.
Convective accelerometers have no solid proof mass which changes its position or shape due to an applied acceleration. Convective accelerometers sense the displacement of a tiny heated fluid bubble present within a sealed cavity. As there is no solid seismic mass, the shock survivability and opportunity for useful of very high acceleration magnitudes is more readily obtained with a convective accelerometer. The integration of the a convective accelerometer with complementary metal-oxide semiconductor (CMOS) signal conditioning integrated circuitry on the same silicon die is also convenient.
There is a need for convective accelerometers providing increased dynamic range, accuracy, inertial sensitivity, power efficiency, manufacturing process compatibility, robustness, and reduced cost and smaller footprint. There is also the need for a convective accelerometer of increased dynamic range physically configured to provide a 6-axis inertial measurement unit (IMU).
The present invention provides a convective inertial accelerometer which in embodiments provides one or more of a linear accelerometer, angular (rate sensor) accelerometer and inclinometer function. In embodiments, the accelerometer is configured to provide a multi-axis accelerometer. One some embodiments, the accelerometer is configured to provide a 6-axis inertial measurement unit (IMU).
The salient features of the convective inertial accelerometer include: A convective accelerometer formed by creating thermal heaters and thermal temperature sensors at fixed positions within a cavity which is filled with a fluid. The convective accelerometer is comprised of one or more heater thermal elements and sensor thermal elements disposed within a cavity. The cavity is filled with a fluid providing a convective thermal transport from the heater thermal elements to sensor thermal elements, wherein:
The dimensions of the cavity and placement of thermal elements therein permits monitoring the convective flow of fluid within the cavity under the influence of acceleration. In this invention, the thermal transport rate from heater to sensor is a function of acceleration forces resulting from vibration, shock and gravity. Convective thermal transport as monitored by a thermal sensor, therein provides an accelerometer function. The thermal heater element and a thermal sensor element are separated from one another by a distance wherein convective thermal conductivity through the fluid is greater than molecular thermal conductivity. For a gas fluid, the minimum separation distance must be much greater than the mean free path for collisions between individual gas molecules within the cavity. In embodiments of the present invention, this separation is generally greater than 50 micrometers.
The thermal response of the convective accelerometer to acceleration is linear over a wide range. However, at sufficiently large acceleration levels, the thermal response saturates. In embodiments, the accelerometer is operated to provide a linear response over a wide range of acceleration vector magnitudes. In other embodiments, wherein the accelerometer response saturates, the accelerometer provides a means of determining if the sensed acceleration has crossed a threshold value.
In embodiments, the accelerometer is configured with multiple convective paths to monitor accelerations in selected vectored directions, thereby providing a multi-axis accelerometer. The accelerometer may be structured to provide a more sensitive response for some vectored directions. In applications wherein only a threshold level for saturation is of interest, the required signal conditioning circuitry is simplified.
Relating to the micro-platform and thermal time constants: The thermal heater element and a temperature sensing element are generally disposed on separate micro-platforms thermally-coupled through fluid within the cavity. In embodiments, the micro-platform thermal elements and a cavity are formed from a semiconductor-on-insulator (SOI) starting wafer. The SOI wafer, in exemplary embodiments, is a silicon SOI starting wafer processed at wafer scale. Wafer dicing to provide micro-platforms is performed as a post-cleanroom step prior to die bonding and die packaging. Individual die may be comprised of both convective accelerometers and integrated circuits including CMOS circuits.
The micro-platform is physically configured with submicron thickness and appropriate area. The ratio of thermal heat capacity of the micro-platform to the thermal conductivity of the supporting nanowires determines a first thermal time constant for the accelerometer. This first thermal time constant, in embodiments, varies from microseconds to seconds. The propagation of heat through the cavity fluid through the thermal transport path determines a second thermal time constant for the accelerometer. The overall thermal time constant for accelerometer response is determined by cascade of the first and second component time constants. In this invention, this overall time constant is determined by the fluid species and density, heater and sensor dimensions, heater and sensor locations within the cavity, platform and nanowire materials together with nanowire phononic structures. The overall thermal time constant in embodiments varies from less than 1 millisecond to over 1 second.
Relating now to the nanowires: The micro-platform is supported by semiconductor nanowires comprised of phononic structures which scatter and/or provide a local resonance for heat conducting phonons thereby reducing thermal conductivity along the length of the nanowire. In embodiments, nanowires are comprised of the device layer of a starting SOI wafer. The phononic structures are configured to not limit the scattering range for electrons.
In embodiments of this invention, a nanowire first film is comprised of a semiconductor where the difference in mean free path for phonons and electrons is significant. Typically, in embodiment nanowires, the mean free path for electron ranges from less than 1 nm up to 10 nm. The mean free path for phonons that dominate the thermal transport within nanowires of the present invention is within the range 20 to 2000 nm, significantly larger than for electrons. In embodiments comprising silicon nanowires, the structures restricting phonon thermal transport have dimensions of less than the phonon mean free path and greater than the electron mean free path. The semiconductor nanowires used to support micro-platforms in this invention are lithographically formed from a phononically-structured first semiconductor film. These structures reduce the thermal conductivity of the nanowire without appreciably reducing the electrical conductivity.
In some embodiments, nanowires are comprised of phononic scattering and/or resonant structures created by patterning the first layer of a nanowire with physical holes of nanometer dimension using submicron lithography. This particular type of texturing creates a patterned “holey” or cavitated structure into the first layer of nanowires and provides a desirable reduction in thermal conductivity along the length of the wire.
In some other embodiments, the semiconductor first layer film of a nanowire is created using a solgel, electrochemical or multi-source evaporation/sputtering process to deposit a film which is appropriately lithographically patterned. Upon subsequent thermal annealing, porous and/or particulate structures form providing a desirable phononic scattering. In these embodiments, phononic scattering structures of desirable dimensions are created “in situ” within the nanowire, somewhat randomly disposed, to provide a reduction in the mean free path of thermally conducting phonons. Synthesis of thin films of submicron thickness with porous or particulate-structure is well known to those familiar with the art.
In embodiments, the semiconductor first layer of a nanowire is a semiconductor selected from a group including, without limitation, Si, Ge, SiGe, ZnO2, GaAs, Ga2O3, GaN, Bi2Te3, CoSb3, AsH3, Sb2Te3, La3Te4, SiC, GaN, (Bi1-xSbx)2Te3 and binary/ternary alloys thereof.
In embodiments, some nanowires are comprised of multiple, stacked films in addition to the semiconductor first film. These additional films are dielectrics and/or nano-thickness ALD metal films with limited thermal conduction. In some embodiments a metal ALD of nano-thickness provides a desirable additional electrical conductance in addition to the electrical conductance of the first nanowire layer for signals or power through the nanowire. The metal ALD film of nanometer thickness in nanowire embodiments is selected from a group including, without limitation, Pt, W. Pd, Cu, Mo and Al. In embodiments, the metal ALD film extends beyond the nanowire onto a micro-platform providing an ohmic connection to a thermal heating element.
In embodiments, a dielectric film of low thermal conductivity is disposed between a metal ALD film and the semiconductor first film of the nanowire providing two separate, isolated electrical connections between on- and off-platform circuits. In other embodiments, the semiconductor first nanowire is created with a covering dielectric film which provides a desirable longitudinal mechanical stress to change the elevation of the suspended micro-platform and/or reduce stress across the micro-platform. The dielectric layer, in embodiments, is disposed beyond the nanowire and onto the micro-platform providing a biaxial compressive or tensile stress as appropriate to reduce overall stress across the micro-platform. In embodiments, the thin film dielectric material is selected from one or more of, without limitation, silicon nitride, silicon oxynitride, aluminum oxide, silicon dioxide, PDMS and SU-8.
Relating now to the heater thermal elements: In embodiments, the temperature of the micro-platform may be controlled by powering a resistive heater with closed loop control over a wide range of temperature. The heater may be comprised of a resistive metal film or a semiconductor film. In embodiments, the heater of metal film is typically comprised of one or more of the same semiconductor as the nanowire, but may also be an ALD metal such as W, NiCr, Pd, Ti, Cu, Pt, and Al of nanometer thickness with an underlying ALD adhesion enhancer such as Ti or Cr. For embodiments with a silicon micro-platform, the maximum long term heater temperature is 500° C. By comparison, an accelerometer with a SiC microplatform and SiC nanowires can operate at temperatures of over 1000° C. In some embodiments, the heater thermal element is a thermistor or thermoelectric element externally driven to a power level providing an adequate source of heat for thermal excitation.
Relating now to the sensor thermal elements: The thermal sensor element is positioned to sense temperature of the fluid after it is heated by convective thermal transport from the heater element and modulated by acceleration. In embodiments, the thermal sensing element is a thermistor comprising a metal ALD film or a semiconductor. A thermister thermal sensing element may be comprised of an extended portion of a nanowire.
In other embodiments, the thermal sensor element is comprised of a thermoelectric device operated in the Seebeck mode providing a precision measurement of temperature of the contacting fluid. The Seebeck sensor generates a voltage proportional to the temperature difference between the on-platform junction and the off-platform junctions. A plurality of Seebeck sensors are generally series-connected to provide an optimized overall sensor signal-to-noise ratio. In embodiments, the Seebeck thermal element provides a determination of convective temperature differential ranging from less than 1 microdegree Centigrade to over 1 degree Centigrade in response to acceleration vectors.
In embodiments, in addition to the thermal elements disposed within the cavity on a micro-platform, a reference sensor for temperature is disposed in the off-platform surrounding support area. The reference sensor is used for calibration purposes. The reference sensor may be comprised of one or more of a metal film thermistor, a semiconductor thermister, bandgap diode, MOS transistor and bipolar transistor operated in a VPTAT/IPTAT mode.
In embodiments, signal conditioning circuitry, typically in the form of CMOS-compatible structures, may include a Wheatstone bridge, amplification, synchronous double-sampled filtering, conventional filtering, analog to digital converter and threshold level trigger.
Relating now to processing, packaging and assembly: In embodiments, electrical connection with circuits external to the accelerometer may be comprised of bonding pads or bonding bumps. Electrical interconnects with supporting nanowires may be formed as a metal film, semiconductor and through-semiconductor-via (TSV).
In embodiments, thermal elements are disposed on two separate wafers processed to provide a 2-level accelerometer. The two wafers are bonded by appropriate wafer bonding using materials such as epoxy, metallization and in some cases a direct semiconductor-to-semiconductor thermal bonding prior to additional post-cleanroom wafer processing. In other embodiments, the convective accelerometer is structured from more than two starting wafers.
In the exemplary embodiments of this invention, the starting wafer is a silicon SOI wafer. The SOI wafer in these exemplary embodiments is comprised of a silicon first semiconductor device layer of appropriate electrical conductivity, a buried silicon dioxide dielectric (BOX) film, and an underlying silicon handle substrate. The SOI starting wafer is typically manufactured by processes such as SMARTCUT™, SIMOX, and BESOI. The SOI wafer is processed using cleanroom tools including submicron optical and e-beam lithography, CVD, PVD, co-evaporation, multi-target magnetron and RF sputtering, RTP, RIE, DRIE, annealing/diffusion furnaces and metrology familiar to those of ordinary skill in the art. In embodiments, processing of the silicon device layer may include fabrication of integrated circuits, especially CMOS circuits disposed on or off the micro-platform. Final processing steps prior to assembly include release of the micro-platform using a backside or frontside etch followed by wafer dicing. Wafer handler cassettes designed to protect wafers with fragile micro-platform structures are used as necessary for wafers with released micro-platforms.
To package the accelerometer after it is processed at wafer scale, dicing techniques are used which do not damage the micro-platform and nanowire. For example, dicing is performed using a CO2 laser scribe operated to minimize ablation.
Silicon die are assembled on headers or other substrates by precision pick and place robotic tools or using a manual placement micromanipulator. Die bonding is implemented with assembly processes that avoid damage to the micro-platform and support structure. Ultrasonic wire bonding, metal pads or solder bumps are used for connections within headers or onto circuit boards.
It is an object of the present invention to provide an accelerometer sensitive to one or more vectored accelerations. In some embodiments, the accelerometer is physically configured to provide a 6-axis inertial measurement unit (IMU).
More specifically, it is an object of the present invention to provide a convective inertial accelerometer for monitoring linear acceleration, angular acceleration and inclination. It is an object of the present invention to provide an accelerometer physically configured with phononic nanowires. It is another object of the present invention to provide an accelerometer where a single thermal element is operated as both a thermal heater and a temperature sensor comprised of a resistive device and/or a thermoelectric device. It is an object of the present invention to provide an integrated accelerometer with integrated signal conditioning circuitry on the same semiconductor substrate. It is an object of the present invention to provide an accelerometer comprised of a mobile phone or a node within a wireless communication network. It is an object of the present invention to provide an accelerometer for mounting on machinery and wearable sports equipment for the purpose of monitoring vibration and shock. It is an object of the present invention to provide a cost effective convective accelerometer having increased dynamic range, accuracy, inertial sensitivity, power efficiency, manufacturing process compatibility, robustness, and reduced physical footprint
Definitions: The following terms as explicitly defined for use in this disclosure and the appended claims:
“disposed on” or “disposed in” means attached to and/or created within.
“providing” means physically configured and/or operated to provide.
“inertial accelerometer” means an accelerometer providing a vectored measurement of either linear acceleration and/or angular rate acceleration.
“inertial measurement unit” or “IMU is a sensor providing a measurement of both a linear acceleration vector and an angular acceleration vector.
“convective accelerometer” means an accelerometer wherein vectored accelerations are determined by sensing the convective flow of a convective fluid disposed within a cavity and affected by acceleration.
“convective cavity” or “cavity” in this invention means the hermetic volume containing the thermal elements.
“fluid media”, “convective fluid” or “fluid” means the gas or liquid within the cavity in thermal contact with the thermal elements.
“thermal micro-platform” means a platform supported by nanowires wherein the nanowires provide a conducted thermal isolation with respect to a surrounding support platform.
“thermal element” means the heater or the temperature sensor disposed within the cavity and comprised of a micro-platform and supporting metamaterial nanowires.
“heater thermal element” means any externally-powered device heating a micro-platform including a resistive heater.
“sensor thermal element” refers to a thermal element operated to monitor temperature such as a thermistor or Seebeck thermoelectric device.
“reference sensor” refers to a temperature sensor disposed outside the cavity and providing a calibration reference.
“metamaterial nanowire” or “phononic-structured nanowire” means a semiconductor of nano-dimensioned structure physically configured for scattering or resonating phonons thereby providing a reduction in thermal conductivity. The metamaterial nanowire may comprise surface, bulk, and embedded structures for Umklapp and other scattering, Bragg resonance and Mie resonance of phonons
“convective conditioning structure” means a physical structure interposed into the convective path within the cavity, deflecting the convective thermal transport in a manner which improves one or more accelerometer performance parameters.
In all embodiments, the thermal conductivity of the nanowires 103A and 103B is advantageously reduced by the physical structuring. In an exemplary embodiment, separation between phononic scattering or resonant structures. In other embodiments, the phononic structure supports a phononic resonance. In all embodiments, the metamaterial nanowire structure lowers the ratio of thermal conductivity to electrical conductivity.
In
The accelerometer structure of
The accelerometer of
To obtain a measure of all vectored acceleration amplitudes, a multivariate analysis of signals from the 10 sensor thermal elements is processed by an acceleration analyzer. The accelerometer signals are determined for a range of accelerations using a rate table to obtain a reference calibration database. The accelerometer is placed in service and subjected to application specific accelerations to obtain an application database. An acceleration analyzer processes the reference database and the application database to quantify the vectored amplitudes of the application specific acceleration using multivariate analyses based on one or more of the 10 variables.
In
Sensing of accelerations in a lower range is provided by 8 of the 10 sensor thermal elements (including elements 510, 515) disposed symmetrically around the periphery of cavity 526, 529. The total of 10 sensor elements permit sensing of up to 6 acceleration axes including an extended range for linear accelerations for vectored axes x and y. This accelerometer is operated in a similar manner to that disclosed for the accelerometer of
The accelerometer in cross-sectional view of
In embodiments, the accelerometer is formed of semiconductor, ceramic, and glass wafers. In embodiments, the accelerometer if formed of surrounding support structures formed by 3-D additive printing technology.
In some other embodiments, nanowires 101 are physically created in situ by thin film deposition and annealing processes. These synthesis processes use appropriate precursors and specialized thermal annealing to form nanowires with mesoporous or clustered semiconductor phononic scattering structures comprised of one or more semiconductor material
In embodiments, the metal layer increases the electrical conductivity of the nanowire and is created by sputtering or evaporative deposition to provide a film, generally an ALD film.
The Seebeck thermoelectric sensors are formed into the silicon device layer by creating alternate heavily doped p- and n-type regions using typically SOG-based dopant with boron and phosphorus.
Next, level1 vias 1310, 1320 and 1330 and level2 vias 1340 and 1350 are created. The vias are typically formed using a combination of DRIE etching and electroless- or electro-plating of a conductor such as Cu over a thin adhesion layer. Cavities 108 are etched from the backside with cavity areas defined by patterned film such as silicon dioxide or a metal such as Cd. Next, wafers are bonded together using an epoxy, metal, direct bonding process. In this embodiment, solder bumps 1360 are created by electroplating the bonded wafers to provide a flip-chip accelerometer 1300 for soldering directly to a printed circuit board. In other embodiments, contact pads much smaller than solder bumps are used in order to reduce the accelerometer footprint.
Although various embodiments of this invention have been described above with a certain degree of particularity, or with reference to one or more individual embodiments, those skilled in the art could make numerous alterations to the disclosed embodiments without departing from the spirit or scope of this invention. It is intended that all matter contained in the above description and shown in the accompanying drawings shall be interpreted as illustrative only of particular embodiments and not limiting. Changes in detail or structure may be made without departing from the basic elements of the invention as defined in the following claims.
This case is a continuation-in-part with U.S. patent application Ser. No. 15/632,462 filed Jun. 26, 2017. This case claims priority from U.S. Provisional Patent No. 62/707,208 filed Oct. 25, 2017. The above listed cases are incorporated herein by reference. If there are any contradictions or inconsistencies in language between this application and the cases that have been incorporated by reference that might affect the interpretation of the claims in this case, these related claims should be interpreted to be consistent with the language in this case.
Number | Date | Country | |
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62707208 | Oct 2017 | US |
Number | Date | Country | |
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Parent | 15632462 | Jun 2017 | US |
Child | 15992134 | US |