Claims
- 1. A copolyimide-polyamide comprising the following recurring structure: ##STR7## wherein R and R" are the same or different divalent aliphatic or aromatic hydrocarbon radicals and R' a tetravalent aliphatic or aromatic radical.
- 2. The polymer of claim 1 wherein R and R' are the same or different aliphatic hydrocarbons from 2 to 18 carbon atoms.
- 3. The copolyimide-polyamide of claim 1 wherein R and R' are the same or different aromatic hydrocarbons from 6 to 20 carbon atoms.
- 4. The copolyimide-polyamide of claim 1 wherein the copolyimide-polyamide is in the form of a molded object.
- 5. The copolyimide-polyamide of claim 1 wherein the copolyimide-polyamide is in the form of a laminate.
- 6. The copolyimide-polyamide of claim 1 wherein the copolyimide-polyamide is in the form of a film.
- 7. The copolyimide-polyamide of claim 1 wherein the copolyimide-polyamide is in the form of a metal coating suitable for electrical service.
- 8. A copolyimide-polyamide comprising the following recurring structure: ##STR8## wherein R is an aromatic hydrocarbon radical comprising from about 6 to about 10 carbon atoms joined directly or by stable linkage consisting essentially of --O--, methylene, ##STR9## --SO--, --SO.sub.2 --, and --S-- radicals and R" is a divalent aliphatic or aromatic hydrocarbon radical and R' is a tetravalent aliphatic or aromatic radical.
Parent Case Info
This application is a continuation-in-part application of Ser. No. 286,697, filed July 24, 1981, now U.S. Pat. No. 4,366,304.
Non-Patent Literature Citations (1)
Entry |
Nakanishi et al., Aliphatic Poly (Amido Acids) and Polyimides (1973), Polymers 14, 440. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
286697 |
Jul 1981 |
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