Claims
- 1. A cosmetic composition comprising a diblock copolymer, comprising two blocks A and B, wherein
block A is a polycationic block in the pH conditions of the composition, block B is a neutral block in the pH conditions of the composition, and block A and block B both comprise units deriving from alpha-ethylenically-unsaturated monomers.
- 2. A composition according to claim 1, wherein block A is a polycationic block and comprises repeating units deriving from monomers selected from the group consisting of:
dimethylaminoethyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, ditertiobutylaminoethyl (meth)acrylate, dimethylaminomethyl (meth)acrylamide, dimethylaminopropyl (meth)acrylamide; ethylenimine, vinylamine, 2-vinylpyridine, 4-vinylpyridine; trimethylammonium ethyl (meth)acrylate chloride, trimethylammonium ethyl (meth)acrylate methyl sulphate, dimethylammonium ethyl (meth)acrylate benzyl chloride, 4-benzoylbenzyl dimethylammonium ethyl acrylate chloride, trimethyl ammonium ethyl (meth)acrylamido chloride, trimethyl ammonium propyl (meth)acrylamido chloride, vinylbenzyl trimethyl ammonium chloride, diallyidimethyl ammonium chloride, their mixtures, and macromonomers deriving therefrom.
- 3. A composition according to claim 1, wherein block B comprises repeating units deriving from monomers selected from the group consisting of:
polyethylene and/or polypropylene oxide (meth)acrylates vinyl acetate, amides of alpha-ethylenically-unsaturated carboxylic acids, esters of alpha-ethylenically-unsaturated monocarboxylic acids, vinyl nitriles, vinylamine amides vinyl alcohol vinyl pyrrolidone, and vinyl aromatic compounds.
- 4. A composition according to claim 1, wherein block B comprises repeating units deriving from monomers selected from the group consisting of:
styrene, acrylamide, methacrylamide, acrylonitrile, methylacrylate, ethylacrylate, n-propylacrylate, n-butylacrylate, methylmethacrylate, ethylmethacrylate, n-propylmethacrylate, n-butylmethacrylate, 2-ethyl-hexyl acrylate and 2-hydroxyethylacrylate.
- 5. A composition according to claim 1, wherein block B is a hydrophilic water-soluble block and comprises units deriving from monomers selected from the group consisting of:
vinyl alcohol, vinyl pyrrolidone, polyethylene oxide (meth)acrylate (i.e. polyethoxylated (meth)acrylic acid), hydroxyalkylesters of alpha-ethylenically-unsaturated, monocarboxylic acids, hydroxyalkylamides of alpha-ethylenically-unsaturated monocarboxylic acids. acrylamide, and methacrylamide.
- 6. A composition according to claim 1, wherein block B is a hydrophobic block, and comprises units deriving from monomers selected from the group consisting of:
alkylesters of an alpha-ethylenically-unsaturated monocarboxylic acid, acrylonitrile vinyl nitriles, comprising from 3 to 12 carbon atoms, vinylamine amides, and vinylaromatic compounds such as styrene.
- 7. A composition according to claim 1, wherein block B is a hydrophobic block, and comprises units deriving from monomers selected from the group consisting of methylacrylate, ethylacrylate, n-propylacrylate, n-butylacrylate, methylmethacrylate, ethylmethacrylate, n-propylmethacrylate, n-butylmethacrylate, and 2-ethyl-hexyl acrylate, and styrene.
- 8. A composition according to claim 1, wherein the diblock copolymer is obtained by a living or controlled free-radical polymerization process.
- 9. A composition according to claim 1, comprising ingredients of a composition to be use on skin.
- 10. A composition according to claim 1, comprising ingredients of a composition to be use on hair.
- 11. A process for making a cosmetic composition, comprising the step of adding to a cosmetic composition a diblock copolymer, comprising two blocks A and B, wherein
block A is a polycationic block in the pH conditions of the composition, block B is a neutral block in the pH conditions of the composition, and block A and block B both comprise units deriving from alpha-ethylenically-unsaturated monomers.
CROSS REFERENCES TO RELATED APPLICATIONS
[0001] This application claims the priority under 35 U.S.C. 119 and/or 365 to 60/340,375 filed in the United States on Dec. 12, 2001.
Provisional Applications (1)
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Number |
Date |
Country |
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60340375 |
Dec 2001 |
US |