Claims
- 1. A composition comprising:
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; and (b) at least one film former different from said at least one polymethylsilsesquioxane film former; wherein x is the number of repeating units; and further wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide at least one property chosen from long wear and transfer resistance to said composition.
- 2. The composition according to claim 1, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide long wear and transfer resistance to said composition.
- 3. The composition according to claim 1, wherein said composition is waterproof.
- 4. The composition according to claim 3, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide waterproof properties.
- 5. The composition according to claim 1, wherein x is less than or equal to 500.
- 6. The composition according to claim 1, wherein x ranges from 50 to 500.
- 7. The composition according to claim 1, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 8. The composition according to claim 1, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 9. The composition according to claim 1, wherein said at least one polymethylsilsesquioxane film former is present in said composition in an amount ranging from 0.1% to 70% by weight relative to the total weight of said composition.
- 10. The composition according to claim 1, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 11. The composition according to claim 10, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 12. The composition according to claim 1, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 13. The composition according to claim 1, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 14. The composition according to claim 1, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 15. The composition according to claim 1, wherein said at least one polymethylsilsesquioxane film former is present in said composition in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 16. The composition according to claim 1, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the at least one film former different from the at least one polymethylsilsesquioxane film former.
- 17. An emulsion comprising:
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; and (b) at least one film former different from said at least one polymethylsilsesquioxane film former; wherein x is the number of repeating units; further wherein said emulsion is chosen from a water-in-oil emulsion and an oil-in-water emulsion; and further wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide at least one property chosen from long wear and transfer resistance.
- 18. The emulsion according to claim 17, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide long wear and transfer resistance.
- 19. The emulsion according to claim 17, wherein said emulsion comprises a water phase and an oil phase, and further wherein said at least one polymethylsilsesquioxane film former and said at least one film former different from the at least one polymethylsilsesquioxane film former are both present in the oil phase of said emulsion.
- 20. The emulsion according to claim 17, wherein x is less than or equal to 500.
- 21. The emulsion according to claim 17, wherein x ranges from 50 to 500.
- 22. The emulsion according to claim 17, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 23. The emulsion according to claim 17, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 24. The emulsion according to claim 17, wherein said at least one polymethylsilsesquioxane film former is present in said composition in an amount ranging from 0.1% to 70% by weight relative to the total weight of said composition.
- 25. The emulsion according to claim 17, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 26. The emulsion according to claim 25, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 27. The emulsion according to claim 17, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 28. The emulsion according to claim 17, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 29. The emulsion according to claim 17, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 30. The emulsion according to claim 17, wherein said at least one polymethylsilsesquioxane film former is present in said emulsion in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 31. The emulsion according to claim 17, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the at least one film former different from the at least one polymethylsilsesquioxane film former.
- 32. A composition comprising:
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; and (b) at least one film former different from said at least one polymethylsilsesquioxane film former; wherein x is the number of repeating units; further wherein said composition is a cosmetic foundation composition; and further wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide at least one property chosen from long wear and transfer resistance.
- 33. The composition according to claim 32, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide long wear and transfer resistance.
- 34. The composition according to claim 32, further comprising at least one entity chosen from thickening agents and emollients.
- 35. The composition according to claim 34, wherein said composition further comprises at least one thickening agent and at least one emollient.
- 36. The composition according to claim 34, wherein said composition comprises at least one thickening agent in an amount ranging from 0.1 to 10% by weight relative to the total weight of the composition.
- 37. The composition according to claim 34, wherein said composition comprises at least one emollient in an amount ranging from 0.5% to 8% by weight relative to the total weight of the composition.
- 38. The composition according to claim 32, wherein x is less than or equal to 500.
- 39. The composition according to claim 32, wherein x ranges from 50 to 500.
- 40. The composition according to claim 32, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 41. The composition according to claim 32, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 42. The composition according to claim 32, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 43. The composition according to claim 42, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 44. The composition according to claim 32, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 0.1% to 30% by weight relative to the total weight of the composition.
- 45. The composition according to claim 44, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 15% by weight relative to the total weight of the composition.
- 46. The composition according to claim 32, wherein said at least one polymethylsilsesquioxane film former is present in said composition in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 47. The composition according to claim 32, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 48. The composition according to claim 32, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 49. The composition according to claim 32, wherein said at least one film former different from the at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 50. The composition according to claim 32, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the at least one film former different from the at least one polymethylsilsesquioxane film former.
- 51. A composition comprising
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; and (b) at least one film former different from said at least one polymethylsilsesquioxane film former, wherein said composition is a mascara composition; further wherein x is the number of repeating units; and further wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide at least one property chosen from long wear and transfer resistance.
- 52. The composition according to claim 51, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide long wear and transfer resistant properties.
- 53. The composition according to claim 51, wherein x is less than or equal to 500.
- 54. The composition according to claim 51, wherein x ranges from 50 to 500.
- 55. The composition according to claim 51, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 56. The composition according to claim 51, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 57. The composition according to claim 51, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 58. The composition according to claim 57, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 59. The composition according to claim 51, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 60. The composition according to claim 59, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 5% to 20% by weight relative to the total weight of the composition.
- 61. The composition according to claim 51, wherein said at least one polymethylsilsesquioxane film former is present in said composition in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 62. The composition according to claim 51, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 63. The composition according to claim 51, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 64. The composition according to claim 51, wherein said at least one film former different from the at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 65. The composition according to claim 51, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the at least one film former different from the at least one polymethylsilsesquioxane film former.
- 66. The composition according to claim 51, wherein said composition comprises at least two film formers different from the at least one polymethylsilsesquioxane film former.
- 67. The composition according to claim 66, wherein at least one of said at least two film formers is chosen from allyl stearate/vinyl acetate copolymer film formers.
- 68. The composition according to claim 67, wherein said allyl stearate/vinyl acetate copolymer film former is present in an amount ranging from 0.5% to 10% by weight relative to the total weight of the composition.
- 69. The composition according to claim 68, wherein said composition is waterproof.
- 70. The composition according to claim 69, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide waterproof properties.
- 71. A composition comprising:
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; (b) at least one film former different from said at least one polymethylsilsesquioxane film former; and (c) at least one UV absorber wherein x is the number of repeating units; and further wherein said at least one polymethylsilsesquioxane film former present in an amount effective to provide at least one property chosen from long wear, transfer resistance, and waterproof properties.
- 72. The composition according to claim 71, wherein said at least one polymethylsilsesquioxane film former present in an amount effective to provide long wear, transfer resistance, and waterproof properties.
- 73. The composition according to claim 71, wherein x is less than or equal to 500.
- 74. The composition according to claim 71, wherein x ranges from 50 to 500.
- 75. The composition according to claim 71, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 76. The composition according to claim 71, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 77. The composition according to claim 71, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 78. The composition according to claim 77, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 79. The composition according to claim 71, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 80. The composition according to claim 79, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 5% to 20% by weight relative to the total weight of the composition.
- 81. The composition according to claim 71, wherein said at least one polymethylsilsesquioxane film former is present in said composition in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 82. The composition according to claim 71, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 83. The composition according to claim 71, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 84. The composition according to claim 71, wherein said at least one film former different from the at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 85. The composition according to claim 71, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the at least one film former different from the at least one polymethylsilsesquioxane film former.
- 86. A composition comprising:
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; and (b) at least one film former different from said at least one polymethylsilsesquioxane film former, wherein said composition is an eyeliner composition; further wherein x is the number of repeating units; and further wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide at least one property chosen from long wear and transfer resistance.
- 87. The composition according to claim 86, wherein x is less than or equal to 500.
- 88. The composition according to claim 86, wherein x ranges from 50 to 500.
- 89. The composition according to claim 86, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 90. The composition according to claim 86, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 91. The composition according to claim 86, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 92. The composition according to claim 91, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 93. The composition according to claim 86, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 5% to 70% by weight relative to the total weight of the composition.
- 94. The composition according to claim 93, wherein said at least one polymethylsilsesquioxane film former is present in an amount ranging from 20% to 70% by weight relative to the total weight of the composition.
- 95. The composition according to claim 86, wherein said at least one polymethylsilsesquioxane film former is present in said composition in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 96. The composition according to claim 86, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 97. The composition according to claim 86, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 98. The composition according to claim 86, wherein said at least one film former different from the at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 99. The composition according to claim 86, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the at least one film former different from the at least one polymethylsilsesquioxane film former.
- 100. The composition according to claim 99, further comprising at least one additional ingredient chosen from hydrocarbon gels, bentone type gels, waxes, preservatives, propylene carbonate, isododecane, silica, silica silylate, petroleum distillates, polyethylene, preservatives, and pigments.
- 101. The composition according to claim 86, wherein said composition comprises at least two film formers different from the at least one polymethylsilsesquioxane film former.
- 102. The composition according to claim 101, wherein at least one of said at least two film formers different from the at least one polymethylsilsesquioxane film former is chosen from allyl stearate/vinyl acetate copolymer film formers.
- 103. The composition according to claim 102, wherein said allyl stearate/vinyl acetate copolymer film former is present in an amount ranging from 0.5% to 3.5% by weight relative to the total weight of the composition.
- 104. A composition comprising:
(a) at least one polymethylsilsesquioxane film former comprising repeating units of formula (CH3SiO3/2)x; and (b) at least one film former different from said at least one polymethylsilsesquioxane film former, wherein said composition is a make-up composition for lips; wherein x is the number of repeating units; and further wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide at least one property chosen from long wear and transfer resistance.
- 105. The composition according to claim 104, wherein said at least one polymethylsilsesquioxane film former is present in an amount effective to provide long wear and transfer resistant properties to said composition.
- 106. The composition according to claim 104, wherein x is less than or equal to 500.
- 107. The composition according to claim 104, wherein x ranges from 50 to 500.
- 108. The composition according to claim 104, wherein said at least one polymethylsilsesquioxane film former has a melting point ranging from 40° C. to 80° C.
- 109. The composition according to claim 104, wherein said at least one polymethylsilsesquioxane film former further comprises up to 1% of units of formula (CH3)2SiO2/2.
- 110. The composition according to claim 104, wherein said at least one polymethylsilsesquioxane film former is present in said composition in an amount ranging from 1% to 70% by weight relative to the total weight of said composition.
- 111. The composition according to claim 110, wherein said at least one polymethylsilsesquioxane film former is present in said composition in an amount ranging from 10% to 70% by weight relative to the total weight of said composition.
- 112. The composition according to claim 104, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight ranging from 500 to 20,000.
- 113. The composition according to claim 112, wherein said at least one polymethylsilsesquioxane film former has a weight average molecular weight of 10,000.
- 114. The composition according to claim 104, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from di-block copolymer film formers, tri-block copolymer film formers, multi-block copolymer film formers, radial block copolymer film formers, and star block copolymer film formers.
- 115. The composition according to claim 104, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is chosen from:
styrene-butadiene-styrene block copolymers; styrene-isoprene-styrene block copolymers; styrene-ethylenebutylene-styrene block copolymers; styrene-ethylenepropylene block copolymers; styrene-ethylenebutylene block copolymers; styrene-butadiene block copolymers; styrene-isoprene block copolymers; styrene-butylene-ethylene-styrene block copolymers; and ethylene-propylene-styrene block copolymers.
- 116. The composition according to claim 104, wherein said at least one film former different from said at least one polymethylsilsesquioxane film former is present in an amount ranging from 1% to 25% by weight relative to the total weight of the composition.
- 117. The composition according to claim 104, wherein said at least one polymethylsilsesquioxane film former is present in said composition in a higher amount than the amount of said at least one film former different from said at least one polymethylsilsesquioxane film former.
- 118. The composition according to claim 104, further comprising at least one additional ingredient chosen from gelling agents; oils; waxes; preservatives; suspending agents; thickening agents; solvents; surfactants; emollients; fatty substances; waxes; formulation aids; spherical compounds; hectorites; synthetic polymers; spreading agents; dispersants; antifoaming agents; wetting agents; UV-screening agents; antioxidants; perfumes; essential oils; essential fatty acids; pigments; mothers-of-pearl; fillers; cosmetic active agents; dermatological active agents; pharmaceutical active agents; moisturizers; vitamins; biological materials; and derivatives of any of the foregoing, wherein said at least one additional ingredient is different from both the at least one polymethylsilsesquioxane film former and the different from the at least one polymethylsilsesquioxane film former.
Parent Case Info
[0001] This application is a non-provisional application based on U.S. provisional application No. 60/212,640, filed Jun. 19, 2000, the disclosure of which is incorporated herein by reference.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60212640 |
Jun 2000 |
US |