Claims
- 1. A cryogenic device comprising:(a) a cryogenic electronic portion contained within a vacuum dewar assembly, the cryogenic electronic portion having an input end and an output end; (b) an ambient to cryogenic input connector having an ambient end, and passing into the vacuum dewar assembly to a cryogenic end connected to the input end of the cryogenic electronic portion, (c) a cryogenic to ambient output connector having a cryogenic end connected to the output end of the cryogenic electronic portion, and passing out of the vacuum dewar assembly to an ambient end; (d) a cryogenic source connected to the vacuum dewar assembly and in intimate contact with the cryogenic electronic portion, and (e) a non-cryogenic portion comprising an active semiconductor circuit; wherein: (f) the cryogenic electronic portion comprises at least one of a high temperature superconductor filter element and a cryogenic active semiconductor circuit, (g) a cryogenic active semiconductor circuit, if present, produces a total dissipated power into the cryogenic electronic portion of less than about 850 mW, and (h) the cryogenic source has a maximum cooler lift of less than about 3 W at 80K at an ambient temperature of 20° C.
- 2. The cryogenic device of claim 1, wherein the cryogenic electronic portion comprises a high temperature superconductor filter element having an input end and an output end, and a cryogenic active semiconductor circuit having an input end and an output end, wherein:the input end of the cryogenic active semiconductor circuit is connected to the cryogenic end of the input connector via the high temperature superconductor filter element; the input end of the filter element is connected to the cryogenic end of the input connector; and the output end of the filter element is connected to the input end of the cryogenic active semiconductor circuit.
- 3. The cryogenic device of claim 1, wherein the cryogenic electronic portion comprises a cryogenic active semiconductor circuit selected from one or a combination of an amplifier, a mixer, an analog-to-digital converter and a digital processor.
- 4. The cryogenic device of claim 3, wherein the cryogenic active semiconductor circuit is a cryogenic amplifier.
- 5. The cryogenic device of claim 1, wherein the cryogenic electronic portion comprises a high temperature superconductor filter element comprising one or more mini-filters based on self-resonant spiral resonators.
- 6. The cryogenic device of claim 5, further comprising a superconducting plate above at least the filter element and in intimate contact with the cryogenic source.
- 7. The cryogenic device of claim 1, wherein one or both of the ambient to cryogenic input connector and cryogenic to ambient output connector is a thermal break.
- 8. The cryogenic device of claim 1, wherein the cryogenic source is a cryocooler, and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 9. The cryogenic device of claim 1, wherein the cryogenic electronic portion comprises a high temperature superconductor filter element comprising one or more mini-filters based on self-resonant spiral resonators; one or both of the ambient to cryogenic input connector and cryogenic to ambient output connector is a thermal break; the cryogenic source is a cryocooler; and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 10. A cryogenic receiver comprising the cryogenic device of claim 1.
- 11. The cryogenic receiver of claim 10, wherein the cryogenic source is a cryocooler, and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 12. The cryogenic receiver of claim 10, wherein the cryogenic electronic portion comprises a high temperature superconductor filter element comprising one or more mini-filters based on self-resonant spiral resonators; one or both of the ambient to cryogenic input connector and cryogenic to ambient output connector is a thermal break; the cryogenic source is a cryocooler; and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 13. An integrated antenna assembly comprising the cryogenic receiver of claim 10 and an antenna assembled as an integrated unit.
- 14. The integrated antenna assembly of claim 13, wherein the cryogenic source is a cryocooler, and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 15. The integrated antenna assembly of claim 13, wherein the cryogenic electronic portion comprises a high temperature superconductor filter element comprising one or more mini-filters based on self-resonant spiral resonators; one or both of the ambient to cryogenic input connector and cryogenic to ambient output connector is a thermal break; the cryogenic source is a cryocooler; and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 16. A communications tower comprising an integrated antenna assembly according to claim 13 located at the top of the tower.
- 17. A telecommunications network comprising a communications tower according to claim 16.
- 18. A cryogenic device comprising a cryogenic electronic portion, a non-cryogenic electronic portion and an interconnect connecting the cryogenic electronic portion and the non-cryogenic electronic portion, wherein the interconnect comprises a thermal break between the cryogenic electronic portion and non-cryogenic electronic portions, and the non-cryogenic electronic portion comprises an active semiconductor circuit.
- 19. The cryogenic device of claim 18, wherein the interconnect comprises a microstrip line on a low thermal conductivity substrate.
- 20. The cryogenic device of claim 19, wherein the substrate comprises one or more of a fused silica and an aerogel.
- 21. The cryogenic device of claim 18, wherein the cryogenic electronic portion comprises one or both of a high temperature superconductor filter element and a cryogenic active semiconductor circuit.
- 22. The cryogenic device of claim 18, wherein the cryogenic electronic portion comprises a high temperature superconductor filter element comprising one or more mini-filters based on self-resonant spiral resonators.
- 23. A cryogenic device, comprising:(a) a cryogenic electronic portion contained within a vacuum dewar assembly, the cryogenic electronic portion having an input end and an output end; (b) an ambient to cryogenic input connector having an ambient end, and passing into the vacuum dewar assembly to a cryogenic end connected to the input end of the cryogenic electronic portion; (c) a cryogenic to ambient output connector having a cryogenic end connected to the output end of the cryogenic electronic portion, and passing out of the vacuum dewar assembly to an ambient end; and (d) a cryogenic source connected to the vacuum dewar assembly and in intimate contact with the cryogenic electronic portion, wherein, the cryogenic electronic portion comprises a high temperature superconductor filter element.
- 24. The cryogenic device of claim 23, wherein the high temperature superconductor filter element in the cryogenic electronic portion has an input end and an output end; the input end of the high temperature superconductor filter element is connected to the cryogenic end of the input connector; and the output end of the high temperature superconductor filter element is connected to the cryogenic end of the output connector.
- 25. The cryogenic device of claim 23, wherein the high temperature superconductor filter element is comprised of one or more mini-filters based on self-resonant spiral resonators.
- 26. The cryogenic device of claim 23, wherein the high temperature superconductor filter element is comprised of one mini-filter based on self-resonant spiral resonators.
- 27. The cryogenic device of claim 23, wherein the high temperature superconductor filter element is comprised of two or more mini-filters based on self-resonant spiral resonators.
- 28. The cryogenic device of claim 23, further comprising a superconducting plate above the high temperature superconductor filter element and in intimate contact with the cryogenic source.
- 29. The cryogenic device of claim 23, wherein one or both of the ambient to cryogenic input connector and cryogenic to ambient output connector is a thermal break.
- 30. The cryogenic device of claim 23, wherein the cryogenic source is a cryocooler, and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 31. The cryogenic device of claim 30, wherein the cryocooler has a maximum cooler lift of less than about 3 W at 80K at an ambient temperature of 20° C.
- 32. The cryogenic device of claim 25, wherein one or both of the ambient to cryogenic input connector and cryogenic to ambient output connector is a thermal break; the cryogenic source is a cryocooler; and the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 33. The cryogenic device of claim 32, wherein the cryogenic device has a maximum cooler lift of less than about 3 W at 80K at an ambient temperature of 20° C.
- 34. The cryogenic device of claim 32, wherein the cryogenic device has a maximum cooler lift of less than about 2 W at 80K at an ambient temperature of 20° C.
- 35. The cryogenic device of claim 32, wherein the cryogenic device has a maximum cooler lift of less than about 1 W at 80K at an ambient temperature of 20° C.
- 36. A cryogenic receiver comprising the cryogenic device of claim 23, 25, 29 or 30.
- 37. An integrated antenna assembly comprising the cryogenic receiver of claim 35 and an antenna, assembled as an integrated unit.
- 38. A method of outgassing a vacuum dewar assembly of a cryogenic device that is comprised of said vacuum dewar assembly and a cryocooler, comprising:(a) pumping on said vacuum dewar assembly with a vacuum pump; (b) maintaining said cryocooler at a temperature at which said cryocooler is not damaged; and (c) raising the temperature of said vacuum dewar assembly to increase the rate of outgassing.
- 39. The method of claim 38 wherein the cryocooler is contacted with a heat sink.
- 40. The method of claim 38 wherein the temperature of said vacuum dewar assembly is raised by a heater external to the vacuum dewar assembly.
- 41. The method of claim 38 wherein the cryocooler and vacuum dewar assembly are formed as an integral unit or assembly.
- 42. The method of claim 38, wherein the internal temperature of said vacuum dewar assembly is raised to 50° C. or higher.
- 43. The method of claim 38, wherein the internal temperature of said vacuum dewar assembly is raised to 70° C. or higher.
- 44. The method of claim 38, wherein the internal temperature of said vacuum dewar assembly is raised to 100° C. or higher.
- 45. A cryogenic device comprised of a vacuum dewar assembly and a getter, wherein said getter is contained an appendage that is integral with said vacuum dewar assembly.
- 46. A cryogenic device according to claim 45 comprising a plurality of appendages.
- 47. A method of activating a getter in a cryogenic device that is comprised of a vacuum dewar assembly and a cryocooler, comprising:(a) providing the getter in an appendage that is integral with said vacuum dewar assembly; (b) pumping on said vacuum dewar assembly with a vacuum pump; and (c) raising the temperature of said appendage to a temperature sufficient to activate said getter.
- 48. The method of claim 47 wherein the temperature of the appendage is raised by a heater external to the vacuum dewar assembly.
- 49. The method of claim 47 further comprising a plurality of appendages.
- 50. The method of claim 47 further comprising protecting the remainder of the cryogenic device from damage caused by heating the appendage.
- 51. The method of claim 47 further comprising contacting said cryocooler with a heat sink to maintain the cryocooler at temperature at which it is not damaged by heating the appendage.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. Ser. No. 09/948,498, filed on Sep. 7, 2001, now ABN which claims priority under 35 U.S.C. §119 from U.S. Provisional Appln. Ser. No. 60/230,682, filed Sep. 7, 2000, and U.S. Provisional Appln. Ser. No. 60/265,917, filed Feb. 2, 2001, all of which are incorporated by reference herein as if fully set forth.
US Referenced Citations (5)
Number |
Name |
Date |
Kind |
4962083 |
Hermann et al. |
Oct 1990 |
A |
5017554 |
Subramanian |
May 1991 |
A |
5616538 |
Hey-Shipton et al. |
Apr 1997 |
A |
6104934 |
Patton et al. |
Aug 2000 |
A |
20030084677 |
Kagaya et al. |
May 2003 |
A1 |
Foreign Referenced Citations (2)
Number |
Date |
Country |
0281753 |
Jan 1988 |
EP |
WO 8805029 |
Jul 1988 |
WO |
Provisional Applications (2)
|
Number |
Date |
Country |
|
60/230682 |
Sep 2000 |
US |
|
60/265917 |
Feb 2001 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09/948498 |
Sep 2001 |
US |
Child |
10/187548 |
|
US |