Claims
- 1. A stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:
- (a) from about 0.5 part to 10 parts of a crystalline, hydroxyl-containing stabilizer selected from the group consisting of: ##STR4## wherein ##STR5## wherein R.sub.7 is --R.sub.4 (CHOH).sub.x R.sub.5 (CHOH).sub.y R.sub.6 with R.sub.4, R.sub.5, R.sub.6, x and y being the same as shown above;
- M is Na.sup.+, K.sup.+ or Mg.sup.++, or H; and
- (iii) mixtures thereof;
- (b) from about 1 part to about 80 parts of lipid skin moisturizing agent having a shear index at 35.degree. C. in the range 0.1 to 0.9 and a consistency k at 35.degree. C. in the range 5 to 5,000 poise;
- (c) from about 5 parts to about 30 parts of surfactant having a combined critical micelle concentration equilibrium surface tension value of from 15 to 50 dynes/cm; and
- (d) water;
- wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 1000 .mu.g/sq. cm and wherein said composition is stable for at least 2 weeks at 38.degree. C.
- 2. The stress stable lathering skin cleansing liquid composition of claim 1 wherein said lathering skin cleansing liquid composition has a shear index at 35.degree. C. in the range 0.30-0.05 and a consistency k at 35.degree. C. in the range 175-500 poise.
- 3. The stress stable lathering skin cleansing liquid composition of claim 1 which comprises (a) from about 0.75 to about 8 parts crystalline, hydroxyl-containing stabilizer, (b) from about 5 to about 30 parts lipid skin moisturizing agent, wherein said lipid skin moisturizing agent has a viscosity consistency k value of 10 poise to 3,000 poise at 35.degree. C. and a shear index at 35.degree. C. in the range 0.1 to about 0.5; (c) from about 5 to about 25 parts of a surfactant having a combined critical micelle concentration equilibrium surface tension value of from 25 to 40 dynes per cm at 25.degree. C.; and (d) from about 30 parts to about 80 parts water; wherein said liquid composition has a Lipid Deposition Value of 15 to 200 .mu.g/sq. cm.
- 4. The stress stable, lathering skin cleansing liquid composition of claim 3 wherein said lipid skin moisturizing agent is selected from the group consisting of: hydrocarbon oils and waxes, silicones, fatty acid derivatives, cholesterol, cholesterol derivatives, di- and tri-glycerides, vegetable oils, vegetable oil derivatives, liquid nondigestible oils, blends of liquid digestible or nondigestible oils with solid polyol polyesters, acetoglyceride esters, alkyl esters, alkenyl esters, lanolin and lanolin derivatives, milk triglycerides, wax esters, beeswax derivatives, sterols, phospholipids and mixtures thereof.
- 5. The stress stable, lathering skin cleansing liquid composition of claim 4 wherein the crystalline, hydroxyl-containing stabilizer comprises tri-12-hydroxystearin.
- 6. The stress stable lathering skin cleansing liquid composition of claim 5 which comprises from about 1.25 to about 5 parts of the crystalline, hydroxyl-containing stabilizer.
- 7. The stress stable lathering skin cleansing liquid composition of claim 3 wherein said lipid skin moisturizing agent is selected from the group consisting of: petrolatum, mineral oil, micro-crystalline waxes, polyalkenes, paraffin, cerasin, ozokerite, polyethylene, perhydrosqualene, dimethicones, cyclomethicones, alkyl siloxanes, polymethylsiloxanes, methylphenylpolysiloxanes, hydroxylated milk glyceride, castor oil, soy bean oil, maleated soy bean oil, safflower oil, cotton seed oil, corn oil, walnut oil, peanut oil, olive oil, cod liver oil, almond oil, avocado oil, palm oil, sesame oil, liquid sucrose octaesters, blends of liquid sucrose octaesters and solid polyol polyesters, lanolin oil, lanolin wax, lanolin alcohol, lanolin fatty acid, isopropyl lanolate, acetylated lanolin, acetylated lanolin alcohols, lanolin alcohol linoleate, lanolin alcohol riconoleate, beeswax, beeswax derivatives, spermaceti, myristyl myristate, stearyl stearate, carnauba and candelilla waxes, cholesterol, cholesterol fatty acid esters and homologs thereof, lecithin and derivatives, Sphingo lipids, ceramides, glycosphingo lipids and homologs thereof, and mixtures thereof.
- 8. The stress stable lathering skin cleansing liquid composition of claim 7, wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value in the range 30 to 150 .mu.g/sq. cm; and wherein at least 75% of said lipid skin moisturizing agent is selected from the group consisting of petrolatum, blends of petrolatum and high molecular weight polybutene, mineral oil, liquid sucrose octaesters, blends of liquid sucrose octaesters and solid polyol polyesters, hydrogenated or nonhydrogenated polybutene, micro-crystalline wax, polyalkene, paraffin, cerasin, ozokerite, polyethylene, perhydrosqualene; dimethicones, alkyl siloxane, polymethylsiloxane, methylphenylpolysiloxane and mixtures thereof.
- 9. The stress stable lathering skin cleansing composition of claim 8 wherein the lipid skin moisturizing agent comprises a blend of petrolatum and polybutene in a ratio of from about 5:1 to about 1:1.
- 10. The stress stable lathering skin cleansing composition of claim 8 wherein the lipid skin moisturizing agent comprises blends of liquid sucrose octaesters and solid polyol polyesters in a ratio of from about 96:4 to about 80:20.
- 11. The stress stable lathering skin cleansing liquid composition of claim 8 which comprises from about 10 parts to about 25 parts of lipid skin moisturizing agent; and wherein said lipid skin moisturizing agent has a consistency k value of 50 to 2000 poise and a shear index of from 0.20 to about 0.50.
- 12. The stress stable lathering skin cleansing liquid composition of claim 1 which comprises from about 5 to about 25 parts surfactant, and wherein said surfactant is selected from the group consisting of acyl isethionates, acyl sarcosinates, alkylglycerylether sulfonates, alkyl sulfates, acyl lactylate, methylacyl taurates, paraffin sulfonates, linear alkyl benzene sulfonates, N-acyl glutamates, alkyl sulfosuccinates, alpha sulfo fatty acid esters, alkyl ether carboxylates, alkyl phosphate esters, ethoxylated alkyl phosphate esters, alpha olefin sulphates, alkyl ether sulfates with 1 to 12 ethoxy groups and mixtures thereof, wherein said surfactants contain C.sub.8 to C.sub.22 alkyl chains and wherein the counterion is selected from the group consisting of: Na, K, NH.sub.4, and N(CH.sub.2 CH.sub.2 OH).sub.3.
- 13. The stress stable lathering skin cleansing liquid composition of claim 12 wherein said crystalline hydroxyl-containing stabilizer comprises tri-12-hydroxystearin.
- 14. The stress stable lathering skin cleansing liquid composition of claim 1 which additionally contains from 0.001 to about 1 part of a water-dispersible, gel-forming polymer.
- 15. The stress stable lathering skin cleansing liquid composition of claim 14 wherein the polymer is selected from the group consisting of cationic polysaccharides of the cationic guar gum class with molecular weights of 1,000 to 3,000,000; anionic, cationic and nonionic homopolymers derived from acrylic or methacrylic acid; anionic, cationic and nonionic cellulose resins; cationic copolymers of dimethyidialkylammonium chloride and acrylic acid; cationic homopolymers of dimethyldialkylammonium chloride; cationic polyalkylene and ethoxypolyalkylene imines; polyethylene glycol of molecular weight from 100,000 to 4,000,000; and mixtures thereof.
- 16. The stress stable lathering skin cleansing liquid composition of claim 1 wherein said stress stable, lathering skin cleansing liquid composition additionally comprises from about 0.5 to about 25 parts water soluble, organic material and wherein said water soluble organic material is selected from the group consisting of C.sub.2 -C.sub.10 alkane diols; guanidine; glycolic acid and glycolate salts, lactic acid and lactate salts; polyhydroxy alcohols; polyethylene glycol; sugars and starches; sugar and starch derivatives; panthenol; pyrrolidone carboxylic acid; hyaluronic acid; lactamide monoethanolamine; acetamide monoethanolamine; urea; and ethanol amines of the general structure (HOCH.sub.2 CH.sub.2).sub.x NH.sub.y where x=1-3; y=0-2, and x+y=3, and mixtures thereof; and wherein said water soluble organic material is at least 50% soluble in water.
- 17. The stress stable lathering skin cleansing liquid composition of claim 1 which additionally comprises from about 0.5 parts to about 5 parts fumed silica.
- 18. The stress stable lathering skin cleansing liquid composition of claim 1 which additionally comprises from about 0.5 to about 3 parts of maleated soybean oil.
- 19. A stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:
- (a) from about 1.25 parts to 5 parts of a water insoluble crystalline hydroxy wax stabilizer; wherein the stabilizer comprises tri-12-hydroxystearin;
- (b) from about 10 parts to about 25 parts of lipid skin moisturizing agent having a shear index at 35.degree. C. in the range 0.2 to 0.5 and a consistency k at 35.degree. C. in the range 50 to 2,000 poise;
- (c) from about 10 parts to about 25 parts of surfactant having a combined critical micelle concentration equilibrium surface tension value of from 15 to 50 dynes/cm;
- (d) from about 40 to about 65 parts water;
- wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 30 to about 150 .mu.g/sq. cm.
- 20. The stress stable, lathering skin cleansing liquid composition of claim 19 wherein said stress stable, lathering skin cleansing liquid composition has a shear index at 35.degree. C. in the range 0.30-0.5 and a consistency k at 35.degree. C. in the range 175-500 poise.
- 21. A personal bath or body cleansing kit comprising:
- a) a light weight polymeric diamond mesh personal cleansing hand-held sponge; and
- b) the stress stable lathering skin cleansing liquid composition of claim 1.
- 22. A stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:
- (a) from about 0.5 part to 10 parts of a crystalline, hydroxyl-containing stabilizer selected from the group consisting of: ##STR6## wherein ##STR7## wherein R.sub.7 is --R.sub.4 (CHOH).sub.x R.sub.5 (CHOH).sub.y R.sub.6 with R.sub.4, R.sub.5, R.sub.6, x and y being the same as shown above:
- M is Na.sup.+, K.sup.+ or Mg.sup.++, or H; and
- (iii) mixtures thereof;
- (b) from about 1 part to about 80 parts of lipid skin moisturizing agent having a shear index at 35.degree. C. in the range 0.1 to 0.9 and a consistency k at 35.degree. C. in the range 5 to 5,000 poise;
- (c) from about 1 part to about 30 parts of surfactant having a combined critical micelle concentration equilibrium surface tension value of from 15 to 50 dynes/cm;
- (d) from about 0.001 part to about 10 parts of a water-dispersible, gel forming polymer; and
- (e) water;
- wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 1000 .mu.g/sq. cm and wherein said composition is stable for at least 2 weeks at 38.degree. C.
- 23. A stress stable composition according to claim 22, further comprising an antimicrobial agent.
- 24. An article of manufacture, comprising a container containing a stress stable lathering skin cleansing liquid composition according to claim 1, wherein said container has instructions for moisturizing the skin during the cleansing process, said instructions comprising instruction to apply the stress stable lathering skin cleansing liquid composition to skin and then rub or massage the composition on skin for at least 15 seconds before rinsing skin with water.
- 25. An article of manufacture, comprising a container containing a stress stable lathering skin cleansing liquid composition according to claim 14, wherein said container has instructions for moisturizing the skin during the cleansing process, said instructions comprising instruction to apply the stress stable lathering skin cleansing liquid composition to skin and then rub or massage the composition on skin with water at least 3 times a day.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part (CIP) of the U.S. application having Ser. No. 08/959,969, Filed Oct. 24, 1997, now U.S. Pat. No. 5,885,948, Issued Mar. 23, 1999 (incorporated herein by reference); which is in turn a continuation of the abandoned U.S. application having Ser. No. 08/529,258, Filed Sep. 15, 1995; which is in turn a continuation-in-part (CIP) of the abandoned U.S. application having the Ser. No. 08/388,961, Filed Feb. 15, 1995.
US Referenced Citations (32)
Foreign Referenced Citations (1)
Number |
Date |
Country |
3836907 A1 |
May 1990 |
DEX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
529258 |
Sep 1995 |
|
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
959969 |
Oct 1997 |
|
Parent |
388961 |
Feb 1995 |
|