CURABLE LIQUID COMPOSITION CURED FILM AND ANTISTATIC LAMINATE

Information

  • Patent Application
  • 20100188196
  • Publication Number
    20100188196
  • Date Filed
    November 19, 2007
    17 years ago
  • Date Published
    July 29, 2010
    14 years ago
Abstract
The present invention relates to A curable liquid composition comprising 0.5-20 wt % of conductive particles, 0.4-10 wt % of a curable compound having at least two polymerizable groups, 15-50 wt % of water, 5-50 wt % of a solvent D and 30-80 wt % of a solvent E, wherein solvent D is an alcohol or a keton and solvent E is an organic compound comprising one hydroxy group and one ether group, wherein the organic compound comprises between 3 and 8 carbon atoms, which forms an azeotrope with water.
Description
FIELD OF THE INVENTION

The present invention relates to a curable liquid composition, a cured film, and an antistatic laminate. More particularly, the present invention relates to a curable liquid composition excelling in curability and capable of forming a coating (film) which excels in antistatic properties, hardness, scratch resistance, and transparency on various substrates such as plastic (polycarbonate, polymethylmethacrylate, polystyrene, polyester, polyolefin, epoxy resin, melamine resin, triacetylcellulose resin, ABS resin, AS resin, norbornene resin, etc.), metal, wood, paper, glass, ceramics, and slate. The present invention also relates to a cured film of the composition and an antistatic laminate.


BACKGROUND OF THE INVENTION

Curable liquid compositions for making antistatic films are known in the art. WO 2004/090053 discloses a composition comprising antistatic particles (A), a radiation curable component (B) and two solvents, one being a good solvent for component (B), the other being a bad solvent for component (B). This composition has a number of drawbacks. The amount of antistatic particles that can be applied in the composition is limited and the film has a limited transparency. Furthermore the amount of water that can be used in these compositions is limited, which results in either inferior antistatic properties or limited stability of the coating composition.


The object of the present invention is to provide a coating composition which has a wide applicability, giving a coating with high transparency, low surface resistivity and superior mechanical robustness.


This object is achieved by a curable liquid composition comprising

    • a) 0.5-20 wt % of conductive particles
    • b) 0.4-10 wt % of a curable component B having at least two polymerizable groups
    • c) 15-50 wt % of water
    • d) 5-50 wt % of a solvent D
    • e) 30-80 wt % of a solvent E
    • wherein solvent D is an alcohol or a keton and solvent E is an organic compound comprising one hydroxy group and one ether group, wherein the organic compound comprises between 3 and 8 carbon atoms, which forms an azeotrope with water.


The liquid composition of the present invention has the advantage that it can be used to make a film which has a high transparency and good conductive properties. The composition contains a relative high amount of water. Water is used to stabilize the conductive particles. Furthermore the high amount of water is preferred in order to achieve the conductive properties of the film after applying it to a substrate and cure. The presence of solvents D and E gives the right combination of coating stability and conductive properties of the film.







DETAILED DESCRIPTION OF THE INVENTION
Conductive Particle A

The composition of the present invention comprises particles. The particles used in the present invention contain, as a major component, an oxide of at least one element selected from the group consisting of indium, antimony, zinc, and tin from the viewpoint of securing conductivity and transparency of the cured film of the curable liquid composition. These oxide particles are conductive particles.


As specific examples of the oxide particles used, at least one type of particles selected from the group consisting of tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), fluorine-doped tin oxide (FTO), phosphorus-doped tin oxide (PTO), zinc antimonate (AZO), indium-doped zinc oxide (IZO), and zinc oxide can be given. Of these, antimony-doped tin oxide (ATO) and tin-doped indium oxide (ITO) are preferable. These particles may be used either individually or in combination of two or more.


In a preferred embodiment the particles comprise organic surface groups. Examples of such groups are alkylsilanes such as methyltrimethoxysilane, methyltriethoxysilane, trimethylmonomethoxysilane and phenyltrimethoxysilane compounds. These compounds may be used either individually or in combination of two or more.


Specific examples of alkoxysilane compounds with an reactive group comprise (meth)acrylate compounds, vinyl compounds, epoxy compounds, amine compounds, and mercapto compounds. Examples are methacryloxypropyltrimethoxysilane, acryloxypropyltrimethoxysilane, and vinyltrimethoxysilane; glycidoxypropyltriethoxysilane and glycidoxypropyltrimethoxysilane; aminopropyltriethoxysilane and aminopropyltrimethoxysilane; mercaptopropyltrimethoxysilane and mercaptopropyltriethoxysilane.


Of these, methyltrimethoxysilane, methyltriethoxysilane, and methacryloxypropyltrimethoxysilane are preferable from the viewpoint of dispersion stability of the surface-treated oxide particles.


The conductive particles preferably have a small size in view of the conductivity or low surface resistivity of the layer prepared from the composition. Preferably the particles have a mean average size (measured with dynamic light scattering in a suitable solvent according to ASTM 4519.1) between 1 and 100 nm, preferably a mean average size between 5 and 50 nm.


The composition of the present invention comprises between 0.5 and 20 wt % of conductive particles, relative to the total weight of the composition. Preferably the amount of conductive particles ranges between 1 and 10 wt %.


Curable Component B

Component B used in the present invention comprises a compound having at least two reactive groups. In general, component B may increase the hardness, scratch resistance and chemical stability of the coated substrate. In the case that component A has reactive surface groups, it is preferable that the reactive groups of component B may react with the surface groups of component A.


The reactive groups in component B may be acrylate, methacrylate, vinyl, epoxy, urethane, isocyanate, or hydroxyl groups. In a preferred embodiment of the present invention, the groups are acrylate and/or methacrylate groups.


As examples of suitable compound trimethylolpropane tri (meth)acrylate, ditrimethylolpropane tetra (meth)acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth)acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth)acrylate, glycerol tri (meth)acrylate, tris (2-hydroxyethyl) isocyanurate tri (meth)acrylate, ethylene glycol di (meth)acrylate, 1,3-butandiol di (meth)acrylate, 1,4-butanediol di (meth)acrylate, 1,6-hexanediol di (meth)acrylate, neopentyl glycol di (meth)acrylate, diethylene glycol di (meth)acrylate, triethylene glycol di (meth)acrylate, dipropylene glycol di (meth)acrylate, bis(2-hydroxyethyl) isocyanurate di (meth) acrylate, tricyclodecanediyldimethanol di (meth)acrylate, poly (meth)acrylates of ethylene oxide or propylene oxide addition product of a starting alcohol used to produce these compounds, oligoester (meth)acrylates having at least two (meth) acryloyl groups in the molecule, oligoether (meth)acrylates, oligourethane (meth) acrylates, oligoepoxy (meth)acrylates, and the like can be given.


The component (B) may be used as a single compound or combinations of two or more may be used. The component (B) is added in an amount of 0.4-10 wt % relative to the total weight of the coating composition. Preferably the amount of component (B) is between 0.5 and 5 wt %.


Water.

The composition of the present invention comprises a relatively high amount of water. Water is used to stabilize the conductive particles. Furthermore the high amount of water is preferred in order to achieve the conductive properties of the film after applying it to a substrate and cure. In the composition of the present invention the amount of water is typically between 15 and 50 wt % of the total weight of the composition, preferably between 20 and 40 wt %.


Solvent D

The composition of the present invention comprises a solvent D. Solvent D is chosen from the group consisting of alcohols and ketons. As examples of alcohols methanol, ethanol, isopropyl alcohol, isobutanol, diethylene glycol, benzyl alcohol, phenethyl alcohol, and the like can be given. As examples of ketones, acetone, methyl ethyl ketone, methyl isobutyl ketone, and the like can be given.


Preferably solvent D is chosen from the group consisting of methanol, ethanol, isopropyl alcohol and isobutanol. Most preferably solvent D is isopropylalcohol.


The amount of solvent D ranges typically between 5 and 50 wt % of the total composition, preferably between 20 and 40 wt % of the composition.


Solvent E

The composition of the present invention comprises a solvent E, which forms an azeotrope with water. Solvent E is an organic compound comprising one hydroxy group and one ether group, wherein the organic compound comprises between 3 and 8 carbon atoms, preferably between 3 and 5 carbon atoms.


The presence of solvent E ensures a complete removal of water from the coating during the drying step, and ensures high transparency and low surface resistivity of the coating due to a very homogeneous coating with homogeneous distribution of conductive particles A.


Solvent E preferably has a boiling point below 150°, more preferably the boiling point is below 130° C. Solvent E forms an azeotrop with water, wherein the amount of water is preferably at least 32 wt %, more preferably at least 40 wt %, and still more preferably more then 45 wt %.


Solvent E preferably is chosen from the group consisting of 1-methoxy-2-propanol, 3-methoxy-1-butanol, and 2-methoxy-ethanol. Most preferably solvent E is 1-methoxy-2-propanol.


Solvent E may be used as a single component or combinations of solvents that form an azeotrope may be used.


The amount of solvent E typically ranges between 30 and 80 wt % of the coating composition. Preferably the amount of solvent E is between 41 and 70 wt %. In one embodiment of the present invention it is also preferred that the amount of solvent E is higher then the amount of water present in the coating composition.


Additional Components.

The coating composition may contain additional components. Examples of additional components include, but are not limited by, photoinitiators, antioxidants, antistatic agents, light stabilizers, inhibitors, leveling agents, surfactants, and lubricants. Also, non-conductive nanoparticles may be added to the coating composition as sofar that they do not cause settling or gellation of the coating liquid.


Specifically, silica nanoparticles may be added to the coating composition. These nanoparticles may enhance the scratch resistance of the coated substrate, lower the refractive index of the coating composition or reduce the reflection of the coated substrate. These silica nanoparticles may or may not contain surface groups, as described in the silane modification of component A. Examples of silica nanoparticles are IPA-ST, MT-ST, MEK-ST, NBA-ST, ST-UP, ST-20, ST-40 and the like from Nissan Chemical Industries.


Photoinitiators can be used to cure component (B) of the coating composition. The cure reaction may be initiated thermally or by actinic radiation. In the present invention, actinic radiation refers to visible rays, ultraviolet rays, deep ultraviolet rays, X-rays, electron beams, and the like. As examples of a photoinitiator 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-2-phenylacetophenone, xanthone, fluorenone, benzaldehyde, fluorene, anthraquinone, triphenylamine, carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4,4′-dimethoxybenzophenone, 4,4′-diaminobenzophenone, Michler's ketone, benzoin propyl ether, benzoin ethyl ether, benzyl dimethyl ketal, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, thioxanethone, diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2-methyl-1-[4-(methylthio) phenyl]-2-morpholino-propan-1-one, 2,4,6-trimethylbenzoyidiphenylphosphine oxide, bis-(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, and the like can be given.


The photoinitiator may be added in an amount of preferably 0.01-3 parts by weight, and still more preferably 0.1-2 parts by weight relative to the total composition.


II. Cured Film and Antistatic Laminate

The cured film of the present invention can be obtained by applying and drying the curable liquid composition, and curing the dried composition by applying radiation.


The surface resistivity of the resulting cured film is 1×1012Ω/□ or less, preferably 1×1010Ω/□ or less, and still more preferably 1×108Ω/□ or less. If the surface resistivity exceeds 1×1012Ω/□, the antistatic properties may be insufficient, whereby dust may easily adhere, or the adhering dust may not be easily removed.


There are no specific limitations to the method of applying the composition. For example, a conventional method such as a roll coating method, spray coating method, flow coating method, dipping method, screen printing method, or ink jet printing method may be used.


There are no specific limitations to the radiation source used to cure the composition insofar as the applied composition can be cured in a short period of time.


As examples of the source of visible rays, sunlight, a lamp, a fluorescent lamp, a laser, and the like can be given. As the source of ultraviolet rays, a mercury lamp, a halide lamp, a laser, and the like can be given. As examples of the source of electron beams, a method of utilizing thermoelectrons produced by a commercially available tungsten filament, a cold cathode method which causes electron beams to be generated by applying a high voltage pulse to a metal, a secondary electron method which utilizes secondary electrons produced by the collision of ionized gaseous molecules and a metal electrode, and the like can be given.


The thickness of the cured film is preferably 0.1-20 μm. In applications such as a touch panel or a CRT in which scratch resistance of the outermost surface is important, the thickness of the cured film is preferably 2-15 μm. in the case of using the cured film as an antistatic film for an optical film, the thickness of the cured film is preferably 0.1-10 μm.


In the case of using the cured film for an optical film, transparency is necessary. Therefore, the total light transmittance of the cured film is preferably 85% or more. More preferable, the cured film does not increase the total haze of the coated substrate by more than 2%, more preferable more than 1% with respect to the non-coated substrate.


As a substrate to which the cured film of the present invention is applied, a substrate made of a metal, ceramics, glass, plastic, wood, slate, or the like may be used without specific limitations. As a material for making use of high productivity and industrial applicability of radiation curability, it is preferable to apply the cured film to a film-type or fiber-type substrate. A plastic film or a plastic sheet is a particularly preferable material. As examples of plastic, polycarbonate, polymethylmethacrylate, polystyrene/polymethylmethacrylate copolymer, polystyrene, polyester, polyolefin, triacetylcellulose resin, diallylcarbonate of diethylene glycol(CR-39), ABS resin, AS resin, polyamide, epoxy resin, melamine resin, cyclic polyolefin resin (norbornene resin, for example), and the like can be given.


Applications

The crosslinked coating on a substrate in the present invention may be applied to prevent static electricity buildup, for scratch protection, for providing the substrate with a particular color or optical effect, or to provide IR absorption.


In the case of an antistatic coating on a plastic film, the coated substrate is suitable for use for example in the display industry, packaging industry, lens industry, optical discs, solar cells, automotive windows and architectural panels. In the display industry, the substrates can be used as coated protective sheets, polarizers, plasma films and Fresnel lenses and components thereof; substrates can be used in the appliance & household industry, i.e. protective covers etc; substrates can be used in the electronics industry, i.e. electrostatic chargeable films, protective sheets etc; substrates can be used in the packaging industry, i.e. electronics packaging, medical packaging, etc; Substrates may be used in combination with RFID chips.


In the case of providing an antireflection function to an optical article, it is known in the art that a method of forming a low-refractive-index layer or a multi-layer structure consisting of a low-refractive-index layer and a high-refractive-index layer on a substrate or a substrate provided with a hard coat treatment is effective. The cured film of the present invention is useful as a layer structure which makes up an antistatic laminate for providing an antireflection function to an optical article.


Specifically, an antistatic laminate having antireflection properties can be produced by using the cured film of the present invention in combination with a film having a refractive index lower than that of the cured film. As the antistatic laminate, a laminate including a coat layer having a thickness of 0.05-0.20 μm and a refractive index of 1.30-1.45 as a low-refractive-index layer formed on the cured film of the present invention can be given. As another examples of the antistatic laminate, a laminate including a coat layer having a thickness of 0.05-0.20 μm and a refractive index of 1.60-2.20 as a high-refractive-index layer formed on the cured film of the present invention, and a coat layer having a thickness of 0.05-0.20 μm and a refractive index of 1.30-1.45 as a low-refractive-index layer formed on the high-refractive-index layer can be given.


In the production of the antistatic laminate, in order to provide other functions such as a non-glare effect, a selective light-absorption effect, weatherability, durability, or transferability, a layer including light scattering particles with a thickness of 1 μm or more, a layer including dyes, a layer including UV absorbers, an adhesive layer, or an adhesive layer and a delamination layer may be added. Moreover, such a function providing component may be added to the antistatic curable composition of the present invention as one of the components.


The antistatic laminate of the present invention is suitably used as a hard coat material for preventing stains or cracks (scratches) on plastic optical parts, touch panels, film-type liquid crystal elements, plastic casing, plastic containers, or flooring materials, wall materials, and artificial marble used for an architectural interior finish; as an adhesive or a sealing material for various substrates; as a vehicle for printing ink; or the like.


EXAMPLES

The present invention is illustrated by the following examples, which should not be considered limiting to the scope of the present invention.


Example 1
Surface Modification ATO Particle

165.49 gr isopropylalcohol is added to 192.17 gr of an aqueous dispersion of Antimony doped Tinoxide particles. The ATO dispersion is commercially available from Nano Specials B.V. in Geleen (the Netherlands) and contains appr. 12 w % ATO particles.


Following this 2.36 gr 3-methacryloxypropyl-trimethoxysilane (Dynasylan-MEMO from Degussa AG) is diluted in 106.5 gr isopropylalcohol prior to adding to the ATO dispersion. Finally 230.14 gr isopropylalcohol is added. The obtained dispersion is then heated under constant mixing at 75° C. during the night. The solvents evaporating were refluxed by use of a condensor. Part of the solvents is finally destilled-off until the solid fraction in the dispersion has reached 9.6 w % solids. The water content of the dispersion was measured gravimetrically and was 40 w %. The IPA content was 50.4%.


Example 2
Nanosilica Modification

Surface modified nanosilica dispersions were prepared as follows. IPA-ST was used from Nissan Chemical Industries. To 100 gr of IPA-ST 6.558 gr of 3-methacryloxypropyl-trimethoxysilane (Dynasylan-MEMO from Degussa AG) and 2.789 gr water was added under stirring. The dispersion was left at 60° C. for four hours under gentle stirring and reflux. After cooling the dispersion was filtered over a 1 micron filter.


Example 3
Coating Compositions

In Table 1 the composition of two examples and two reference coatings is given. The SR399 is dipentaeritrythol pentaacrylate, available from Sartomer. The photoinitiator is Irgacure 184, from Ciba. The silicone additive is Byk UV3500, from Degussa. The amounts are given in parts.









TABLE 1







antistatic coating compositions














Reference
Reference



Coating 1
Coating 2
Coating 1
coating 2















ATO dispersion
80
80
80
80


SR399
4
4
4
4


Irgacure 184
0.1
0.1
0.1
0.1


Byk UV3500
0.01
0.01
0.01
0.01


1-Methoxy-2-propanol
115.89
215.89
0
0


Isopropanol
0
0
115.89
215.89









Example 4
Hardcoat Coating Compositions

A hardcoat comprising the nanosilica dispersion given in Example 2 was prepared. The composition is given in Table 2. PETIA is a mix of pentaeritrithol tri- and tetraacrylate from Cytec. The amounts are given in parts.









TABLE 2







hardcoating composition









Hardcoat composition














Nanosilica dispersion
58.27



PETIA
23.31



Irgacure 184
0.93



Methylethylketon
17.49










Example 5
Preparation of Antistatic Coated Substrates

Coated substrates were prepared with coating 1, 2, reference coating 1, 2 and the hardcoat in the following manner. Using a Meyer bar #12 coating formulation was spread on PET film, thickness 108 micron. The coating films were placed in an hot air oven of 70° C. for 3 minutes. The coatings were cured using a Fusion D-lamp at an intensity of 1.8 J/cm2. The coated substrates were left for at least 1 hour before characterization.


Example 6
Preparation of Hardcoated Antistatic Substrates

Coated substrates were prepared with hardcoating, coating 1, 2 and reference coating 1, 2 in the following manner. Using a Meyer bar #12 the hardcoating formulation was spread on PET film, thickness 108 micron. The coating films were placed in an hot air oven of 70° C. for 3 minutes. The coatings were cured using a Fusion D-lamp at an intensity of 0.6 J/cm2. Following this the antistatic and reference coatings were spread on the hardcoated substrate with Meyer bar#12. The coating films were placed in an hot air oven of 70° C. for 3 minutes. The coatings were cured using a Fusion D-lamp at an intensity of 1.8 J/cm2. The coated substrates were left for at least 1 hour before characterization.


Example 7
Characterisation of Coated Substrates

The coated substrates were characterized using the following techniques. The coated substrate was inspected visually for defects and appearance. The haze of the coated substrate was measured using a Byk-Gardner Haze-guard plus. The surface resistivity was measured using an IM6 Megohmeter with a ring electrode. The pencil hardness was measured according to ASTM D3363. The ranking starts at low hardness (4B, 3B, 2B, 1B, HB, F) towards higher hardness (H, 2H, 3H etc).






















Visual

Surface
Pencil



Hardcoat
Antistatic coating
appearance
Haze
resistivity
hardness






















Substrate 1
No
Coating 1
Clear
1.33
4 106 Ω/□
F


Substrate 2
Yes
Coating 1
Clear
1.63
1 107 Ω/□
2H


Substrate 3
No
Coating 2
Clear
1.19
1 107 Ω/□
B


Substrate 4
Yes
Coating 2
Clear
1.24
1 107 Ω/□
2H


Substrate 5
No
Reference
Hazy
8.30
2 1011 Ω/□
3B




coating 1


Substrate 6
Yes
Reference
Hazy
13.1
2 107 Ω/□
3B




coating 1


Substrate 7
No
Reference
Hazy
6.46
2 108 Ω/□
3B




coating 2


Substrate 8
Yes
Reference
Hazy
5.60
4 107 Ω/□
3B




coating 2


Bare PET


Clear
0.53
>1011 Ω/□
F









The examples demonstrate that the substrates coated with Coatings 1 and 2 have an excellent transparency, low haze, and a low surface resistivity. In the case that the substrate is coated with Coating 1 and 2 in combination with the hardcoat of Example 4, the coated substrate has an excellent pencil hardness of 2H as well.


In comparison, the substrates coated with Reference Coating 1 and 2 show a low transparency, a high haze, and high surface resistivity. Moreover, because of the poor coating homogeneity, the hardness of substrates coated with Reference Coating 1 and 2 with the hardcoat of Example 4 is low (3B) as well.

Claims
  • 1. A curable liquid composition comprising a) 0.5-20 wt % of conductive particlesb) 0.4-10 wt % of a curable compound having at least two polymerizable groupsc) 5-50 wt % of waterd) 5-50 wt % of a solvent De) 30-80 wt % of a solvent E wherein the solvent D is an alcohol or a keton and the solvent E is an organic compound comprising one hydroxy group and one ether group, wherein the organic compound comprises between 3 and 8 carbon atoms, which forms an azeotrope with water.
  • 2. The curable composition according to claim 1, wherein the composition comprises a) 1-10 wt % of the conductive particlesb) 0.5-5 wt % of a radiation curable compound having at least two polymerizable groupsc) 20-40 wt % waterd) 20-40 wt % of the solvent De) 41-70 wt % of the solvent E
  • 3. The composition according to claim 1, wherein the conductive particles are surface treated.
  • 4. The composition according to claim 1, wherein the curable compound contains methacrylate or acrylate groups.
  • 5. The composition according to claim 1, wherein the amount of the solvent E is larger then the amount of water.
  • 6. The composition according to claim 1, wherein the solvent D is chosen from the group consisting of methanol, ethanol, isopropyl alcohol and isobutanol.
  • 7. The composition according to claim 1, wherein the solvent D is isopropylalcohol.
  • 8. The composition according to claim 1, wherein the solvent E is chosen from the group consisting of 1-methoxy-2-propanol, 3-methoxy-1-butanol, and 2-methoxy-ethanol.
  • 9. The composition according to claim 1, wherein the solvent E is 1-methoxy-2-propanol.
  • 10. A method for making a film with a low surface resistivity, comprising acts of a) Applying a thin layer of a coating composition on a substrate, wherein the coating composition comprises 0.5-20 wt % of conductive particles, 0.4-10 wt % of a curable compound having at least two of polymerizable groups, 5-50 wt % of water 5-50 wt % of a solvent D, and 30-80 wt % of a solvent E, wherein the solvent D is an alcohol or a keton and the solvent E is an organic compound comprising one hydroxy group and one ether group, and wherein the organic compound comprises between 3 and 8 carbon atoms, which forms an azeotrope with waterb) Evaporating the solvents from the coating layer andc) Curing the film
  • 11. The method according to claim 10, wherein the act of curing comprises an act of curing the film by applying actinic radiation.
  • 12. An article of manufacture having at least one surface having a low surface resistivity, wherein the at least one surface includes a composition comprising: a) 0.5-20 wt % of conductive particlesb) 0.4-10 wt % of a curable compound having at least two polymerizable groupsc) 5-50 wt % of waterd) 5-50 wt % of a solvent De) 30-80 wt % of a solvent Ewherein solvent D is an alcohol or a keton and solvent E is an organic compound comprising one hydroxy group and one ether group, wherein the organic compound comprises between 3 and 8 carbon atoms, which forms an azeotrope with water.
  • 13. The curable composition according to claim 1, wherein the composition is a coating of a display film.
  • 14. (canceled)
  • 15. The article of manufacture according to claim 12, wherein the article of manufacture is an RIFD chip.
Priority Claims (1)
Number Date Country Kind
06124503.1 Nov 2006 EP regional
PCT Information
Filing Document Filing Date Country Kind 371c Date
PCT/EP07/62513 11/19/2007 WO 00 4/15/2010