Claims
- 1. A cutting oil, comprising:(a) a polyether compound represented by the formula (I): R1O(EO)m(AO)nR2 wherein each of R1 and R2, which may be identical or different, is hydrogen atom or a hydrocarbon group having 1 to 24 carbon atoms, at least one of which is a hydrocarbon group; EO is oxyethylene group; AO is an oxyalkylene group having 3 or 4 carbon atoms; and each of m and n is 1 to 50, wherein a sum of m and n is from 4 to 100; and (b) silica particles having a particle size of a primary particle of between 5 nm or more and 50 nm or less.
- 2. The cutting oil according to claim 1, further comprising (c) one or more surfactants selected from the group consisting of alkylene oxide adducts of alkylamines, alkylene oxide adducts of fatty acid esters of polyhydric alcohols, and imidazoline surfactants.
- 3. The cutting oil according to any one of claim 1 or 2, wherein said polyether compound represented by the formula (I) is contained in an amount of 60% by weight or more, and wherein a water content is 4% by weight or less.
- 4. A cutting oil composition comprising the cutting oil of claim 1 and an abrasive.
- 5. A cutting method using the cutting oil composition of claim 4.
- 6. The cutting method according to claim 5, wherein an ingot is cut-off by using a wire saw.
- 7. The cutting oil according to claim 1, wherein said silica particles are anhydrous silica.
- 8. The cutting oil according to claim 7, wherein said anhydrous silica is a hydrophobic silica.
- 9. The cutting oil according to claim 1, wherein said silica particles are contained in an amount of 0.05% by weight or more and 3% by weight or less.
- 10. A cutting oil composition comprising the cutting oil of claim 2 and an abrasive.
- 11. A cutting oil composition comprising the cutting oil of claim 3 and an abrasive.
- 12. The cutting oil according to claim 1, wherein said polyether compound represented by the formula (I) has a cloud point of 0° to 100° C., when the polyether compound is diluted with water 20 times.
- 13. A process of cleaning a wafer, comprising the steps of cleaning a wafer obtainable by cutting an ingot with a wire saw using the cutting oil composition of claim 6; heating the resulting waste water to a temperature equal to or higher than a cloud point of a polyether compound represented by the formula (I):R1O(EO)m(AO)nR2 (I) wherein each of R1 and R2, which may be identical or different, is hydrogen atom or a hydrocarbon group having 1 to 24 carbon atoms, at least one of which is a hydrocarbon group; EO is oxyethylene group; AO is an oxyalkylene group having 3 or 4 carbon atoms; and each of m and n is 1 to 50, wherein a sum of m and n is from 4 to 100, the polyether compound being contained in the waste water, to allow separation into an oil phase and an aqueous phase; and removing the oil phase comprising the polyether compound from the waste water.
Priority Claims (3)
Number |
Date |
Country |
Kind |
10-092080 |
Apr 1998 |
JP |
|
10-126428 |
May 1998 |
JP |
|
10-217207 |
Jul 1998 |
JP |
|
Parent Case Info
This application is the national phase under 35 U.S.C. §371 of PCT International Application No. PCT/JP99/01737 which has an International filing date of Apr. 2, 1999, which designated the United States of America.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/JP99/01737 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO99/51711 |
10/14/1999 |
WO |
A |
US Referenced Citations (9)
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Aug 1996 |
JP |
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Mar 1997 |
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Mar 1998 |
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