Claims
- 1. A cyclic siloxane which has at least one group of the formula
- --(CH.sub.2).sub.x --R"--[--L--A--].sub.y --(L).sub.z--T ( 1)
- bonded to a silicon atom in which x is an integer having a value of from 2 to 10, R" is selected from the group consisting of a chemical bond, and a divalent radical selected from the group consisting of the formulas --COO--, --OOC--, --CH.sub.2 --CH.sub.2, --CH.dbd.CH--, --C.tbd.C--, --N.dbd.N--, --N.dbd.N(O)--, --CH.dbd.N--, --N.dbd.CH-- and --Si(R).sub.2 --, where the radical R is selected from the group consisting of a hydrocarbon radical having from 1 to 18 carbon atoms and a substituted hydrocarbon radical having from 1 to 18 carbon atoms, L is selected from the group consisting of the 1,4-phenylene and the 1,4-cyclohexylene radicals which may be optionally substituted at the 2-, 3-, 5- and/or 6 position by at least one radical Q, Q is selected from the group consisting of hydrogen, fluorine, chlorine, cyano, methyl and trifluoromethyl groups, A is a radical selected from the group consisting of the divalent radicals R", radicals of the formula --CH.sub.2 --O-- and --O--CH.sub.2 --, y is an integer having a value of from 0 to 10, z is an integer having a value of from 0 to 10, with the proviso that the sum y+z is at least 1, and T is a cholesteryl radical.
- 2. A process for preparing the cyclosiloxane of claim 1, which comprises reacting a cyclic siloxane having at least one hydrogen atom bonded directly to silicon with a compound selected from the group consisting of formulas
- H.sub.2 C.dbd.CH--(CH.sub.2).sub.(x-2)--R"--[--L--A--].sub.y --(L).sub.z--T( 14),
- and ##STR7## in which R" is selected from the group consisting of a chemical bond, and a divalent radical selected from the group consisting of the formulas --COO--, --OOC--, --CH.sub.2 --CH.sub.2, --CH.dbd.CH--, --C.tbd.C--, --N.dbd.N--, --N.dbd.N(O)--, --CH.dbd.N--, --N.dbd.CH-- and --Si(R).sub.2 --, where the radical R is selected from the group consisting of a hydrocarbon radical having from 1 to 18 carbon atoms and a substituted hydrocarbon radical having from 1 to 18 carbon atoms, L is selected from the group consisting of the 1,4-phenylene and the 1,4-cyclohexylene radicals which may be optionally substituted at the 2-, 3-, 5- and/or 6 position by at least one radical, Q, Q is selected from the group consisting of hydrogen, fluorine, chlorine, cyano, methyl and trifluoromethyl groups, A is a radical selected from the group consisting of the divalent radicals R", radicals of the formula --CH.sub.2 --O-- and -- O--CH.sub.2 --, y is an integer having a value of from 0 to 10, z is an integer having a value of from 0 to 10, with the proviso that the sum y+z is at least 1, and T is a cholesteryl radical and x is an integer having a value of from 2 to 10.
- 3. A process for preparing the cyclosiloxane of claim 1, which comprises reacting a cyclic siloxane having at least one alkenyl group of the formula
- --(CH.sub.2).sub.(x-2) --CH.dbd.CH.sub.2 ( 16),
- bonded directly to silicon with a compound selected from the group consisting of the formulas ##STR8## in which R" is selected from the group consisting of a chemical bond, and a divalent radical selected from the group consisting of the formulas --COO--, --OOC--, --CH.sub.2 --CH.sub.2, --CH.dbd.CH--, --C.tbd.C--, --N.dbd.N--, --N.dbd.N(O)--, --CH.dbd.N--, --N.dbd.CH-- and --Si(R).sub.2 --, where the radical R is selected from the group consisting of a hydrocarbon radical having from 1 to 18 carbon atoms and a substituted hydrocarbon radical having from 1 to 18 carbon atoms, L is selected from the group consisting of the 1,4-phenylene and the 1,4-cyclohexylene radicals which may be optionally substituted at the 2-, 3-, 5- and/or 6 position by at least one radical Q, Q is selected from the group consisting of hydrogen, fluorine, chlorine, cyano, methyl and trifluoromethyl groups, A is a radical selected from the group consisting of the divalent radicals R", radicals of the formula --CH.sub.2 --O-- and -- O--CH.sub.2 --, y is an integer having a value of from 0 to 10, z is an integer having a value of from 0 to 10, with the proviso that the sum y+z is at least 1, and T is a cholesteryl radical and x is an integer having a value of from 2 to 10.
- 4. A cyclic siloxane which has at least one group of the formula ##STR9## bonded to a silicon atom in which x is an integer having a value of from 2 to 10, R" is selected from the group consisting of a chemical bond, and a divalent radical selected from the group consisting of the formulas --COO--, --OOC--, --CH.sub.2 --CH.sub.2, --CH.dbd.CH--, --C.tbd.C--, --N.dbd.N--, --N.dbd.N(O)--, --CH.dbd.N--, --N.dbd.CH-- and --Si(R).sub.2 --, where the radical R is selected from the group consisting of a hydrocarbon radical having from 1 to 18 carbon atoms and a substituted hydrocarbon radical having from 1 to 18 carbon atoms, Q is selected from the group consisting of hydrogen, fluorine, chlorine, cyano, methyl and trifluoromethyl groups, A is a radical selected from the group consisting of the divalent radicals R", radicals of the formula --CH.sub.2 --O-- and --O--CH.sub.2 --, y is an integer having a value of from 0 to 10, z is an integer having a value of from 0 to 10, with the proviso that the sum y+z is at least 1, and T is a cholesteryl radical.
- 5. An organocyclosiloxane of the formula
- [RXSiO].sub.n ( 5)
- in which X is selected from the group consisting of an R radical, a radical of the formula
- --(CH.sub.2).sub.x --R"--[--L--A--].sub.y --(L).sub.z--T ( 1)
- and a radical of the formula ##STR10## where R" is selected from the group consisting of a chemical bond, and a divalent radical selected from the group consisting of the formulas --COO--, --OOC--, --CH.sub.2 --CH.sub.2, --CH.dbd.CH--, --C.tbd.C--, --N.dbd.N--, --N.dbd.N(O)--, --CH.dbd.N--, --N.dbd.CH-- and --Si(R).sub.2 --, where the radical R is selected from the group consisting of a hydrocarbon radical having from 1 to 18 carbon atoms and a substituted hydrocarbon radical having from 1 to 18 carbon atoms, L is selected from the group consisting of the 1,4-phenylene and the 1,4-cyclohexylene radicals which may be optionally substituted at the 2-, 3-, 5- and/or 6 position by at least one radical Q, Q is selected from the group consisting of hydrogen, fluorine, chlorine, cyano, methyl and trifluoromethyl groups, A is a radical selected from the group consisting of the divalent radicals R", radicals of the formula --CH.sub.2 -- and --O--CH.sub. 2 --, y is an integer having a value of from 0 to 10, z is an integer having a value of from 0 to 10, with the proviso that the sum y+z is at least 1, and T is a cholesteryl radical, x is an integer having a value of from 2 to 10, and with a further proviso that the q radicals X per molecule of formula (2) are radicals of formula (1), and the radical R" has been replaced in the maximum of q-1 of these radicals of formula (1) by a radical selected from the group consisting of the formulas --O--, --CH.sub.2 --O--, and --O--CH.sub.2 --, q is an integer having a value of from 1 to n, and n is an integer having a value of at least 3.
Priority Claims (1)
Number |
Date |
Country |
Kind |
4022151 |
Jul 1990 |
DEX |
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Parent Case Info
This application is a division of application Ser. No. 07/728,479, filed on Jul. 11, 1991.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
5221759 |
Haeberle et al. |
Jun 1993 |
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Divisions (1)
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Number |
Date |
Country |
Parent |
728479 |
Jul 1991 |
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