Claims
- 1. A method of extracting technetium from radiocontaminated metal, comprising the steps of:
- dissolving metal contaminated with radioactive technetium in an aqueous solution to produce a solution containing pertechnetate ions and metal ions;
- reducing the pertechnetate ions to a technetium oxide precipitate; and
- cathodically depositing metal from the solution.
- 2. The method of claim 1, wherein the metal and the technetium are dissolved in a hydrochloric acid solution.
- 3. The method of claim 1, wherein the pertechnetate ions are reduced to a technetium oxide precipitate with a multivalent metal ion in a low valence state.
- 4. The method of claim 3, wherein the contaminated metal is nickel and the multivalent metal ion is a metal ion selected from the group consisting of Sn+.sup.2, Fe+.sup.2, Cu+.sup.2, Cr+.sup.2, Ti+.sup.2 and V+.sup.2.
- 5. The method of claim 4, wherein the metal ion is selected from the group consisting of Sn.sub.+.sup.2, Fe+.sup.2 and Cu+.sup.2.
- 6. The method of claim 4, wherein the metal ion is selected from the group consisting of Ti+.sup.2 and V+.sub.2.
- 7. The method of claim 3, wherein the multivalent metal ion is in a high valence state after reducing the pertechnetate, comprising an additional step of:
- cathodically reducing the multivalent metal ion to a low valence state without cathodically depositing the reductant.
- 8. The method of claim 3, comprising as an additional step:
- separating the technetium oxide precipitate from the metal-containing aqueous solution externally of an electrochemical cell; and then
- introducing the separated solution into the cell to cathodically deposit the metal.
- 9. The method of claim 3, wherein:
- the multivalent metal ions are added to the aqueous solution externally of an electrochemical cell to reduce the pertechnetate ions to a technetium oxide precipitate;
- the technetium oxide precipitate is separated from the aqueous solution externally of the cell and then the separated aqueous solution is introduced into the cell for cathodically depositing metal from the aqueous solution.
- 10. The method of claim 9, wherein the contaminated metal is nickel and a metal ion selected from the group consisting of Fe+.sup.2 and Sn+2 is added to the aqueous solution externally of the cell.
- 11. The method of claim 10, wherein the metal ion is present in the aqueous solution in a concentration of between 0.05 and about 5N.
- 12. The method of claim 10, wherein the metal ions are continuously added to the aqueous solution.
- 13. The method of claim 12, wherein the technetium oxide is continuously separated from the aqueous solution.
- 14. The method of claim 12, wherein the technetium oxide precipitate has a residence time in the aqueous solution of less than about one hour.
- 15. The method of claim 3, wherein the multivalent metal ion is added to the aqueous solution at a low valence by applying a voltage between an anode comprised of the multivalent metal and a cathode in an electrochemical cell.
- 16. The method of claim 15, wherein the contaminated metal is nickel and the aqueous solution has a pH of less than about 2.
- 17. The method of claim 15, wherein the multivalent metal is iron.
- 18. The method of claim 1, wherein the pertechnate ions are reduced by a gas selected from the group consisting of CO, H.sub.2 S and H.sub.2.
- 19. The method of claim 18, wherein the reductant gas is sparged into the solution in the anode chamber.
- 20. The method of claim 18, wherein the technetium oxide precipitate is separated from the aqueous solution externally of the cell before the metal is cathodically deposited.
REFERENCE
This is a continuation-in-part application based upon pending U.S. Ser. No. 07/506,044, filed Apr. 9, 1990.
US Referenced Citations (23)
Non-Patent Literature Citations (1)
Entry |
Lowenheim, F., "Modern Electroplating", 3rd Edition, John Wilby & Sons, 1974, pp. 287-289. |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
506044 |
Apr 1990 |
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