| Purified Reagents for Trace Metal Analysis (John R. Moody and Ellyn S. Beary--U.S. National Bureau of Standards, Center for Analytical Chemistry, Inorganic Analytical Research Division. Washington, DC 20234, U.S.A.). |
| WACOM IPA Recovery Refinery System (Introduction of IPA Recovery Refinery Function into IPA Vapor Drying System). |
| Surface Cleanliness--Products in Action--New Drying Technique Controls Watermarks (Circle Reader Service No.346--Microcontamination Aug. 1993). |
| Kimmon International Fax (Mar. 21, 1994)--Kimmon IPA Vapor Dryers. |
| Vapor-Liquid Equilibria at 760 Mm. Pressure (Louis H. Ballard and M. Van Winkle--University of Texas, Austin, Texas). |
| Vapor-Liquid Equilibria--2-Propanol-Water System (Abraham Wilson and Edward L. Simons--Rutgers University, New Brunswick, N.J.). |
| Ultra-pure IPA Purification and Recycling System (Yukio Yanaga, Mgr., Production Technology and Engineering Ctr, Kurosaki Plant). |
| Consider Membrane Pervaporation (Hubert L. Fleming, Zenon Environmental, Inc.--Chemical Engineering Progress Jul. 1992). |
| Carbone Lorraine--Carbone of America (Jun. 9, 1994)--Project #PV7167R1. |
| S&K Products International Inc. (Jul. 25, 1994)--Model #I.G.-200 IPA Cleaning, Degreasing, Drying System. |
| SCI Systems, Inc. (Aug. 30, 1994)--Technical Data--IPA High Purity Recycling System--SCI Model 7175. |
| Mitsubishi Kasei (Sep. 13, 1994)--IPA Vapor Dryer. |
| Wafer Cleaning (Christopher F. McConnell--Microcontamination Feb. 1991)--Examining the Effects of Wafer Surface Chemistry on Particle Removal Using Direct-Displacement Isopropyl Alcohol Drying. |
| Ultrapure Chemicals (Alan E. Walter and Christopher F. McConnell--Microcontamination Jan. 1990)--Direct Displacement Wet Processing: How It Affects Wafer Surface Phenomena. |