Claims
- 1. A denitration catalyst for a waste gas containing nitrogen oxides and sulfur dioxide comprising at least three metal components, (A) titanium, (B) tungsten and/or magnesium, and (C) vanadium, the titanium and tungsten being contained as oxides and the magnesium and vanadium being contained in the form of an oxide or a sulfate or both, said catalyst being composed of a porous molded article of a mixture of an oxide of titanium as component A and at least one member of the group consisting of an oxide of tungsten, an oxide of magnesium and a sulfate of magnesium as component B, the atomic ratio of component B to component A being from 0.01 to 1, and a vanadium compound localized in that area of said molded article which extends from its outermost surface to a depth of 500 microns or less, the content of the vandium compound in said area being 0.1 to 15% by weight.
- 2. The catalyst of claim 1 wherein the content of the vanadium compound is 0.3 to 6% by weight.
- 3. The catalyst of claim 1 wherein the vanadium compound is localized in an area extending from the outermost surface of said molded article to a depth of at least 30 microns.
- 4. The catalyst of claim 3 wherein the depth is at least 50 microns.
- 5. A method of removing nitrogen oxides from a waste gas, which comprises contacting a waste gas containing nitrogen oxides and sulfur dioxide, together with ammonia and molecular oxygen, at a temperature of 150.degree. to 650.degree. C., with a catalyst comprising at least three metal components, (A) titanium, (B) tungsten and/or magnesium and (C) vanadium, the titanium and tungsten being contained as oxides and the magnesium and vanadium being contained in the form of an oxide or a sulfate or both, said catalyst being composed of a porous molded article of a mixture of an oxide of titanium as component A and at least one member of the group consisting of an oxide of tungsten, an oxide of magnesium and a sulfate of magnesium as component B, the atomic ratio of component B to component A being from 0.01 to 1, and a vanadium compound localized in that area of said molded article which extends from its outermost surface to a depth of 500 microns or less, the content of the vanadium compound in said area being 0.1 to 15% by weight.
Priority Claims (1)
Number |
Date |
Country |
Kind |
55-72170 |
May 1980 |
JPX |
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Parent Case Info
This is a continuation of application Ser. No. 267,765, filed May 28, 1981, now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4048112 |
Matsushita et al. |
Sep 1977 |
|
4085193 |
Nakajima et al. |
Apr 1978 |
|
4152296 |
Okabe et al. |
May 1979 |
|
Foreign Referenced Citations (2)
Number |
Date |
Country |
11093 |
Jan 1979 |
JPX |
124886 |
Sep 1979 |
JPX |
Continuations (1)
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Number |
Date |
Country |
Parent |
267765 |
May 1981 |
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