Claims
- 1. A surfactant composition which comprises at least one compound of the following formula (I): ##STR14## in which: Z is a bicyclo�a.b.c!heptenyl or bicyclo�a.b.c!heptyl radical, wherein:
- a+b+c=5,
- a=2, 3 or 4,
- b=2 or 1,
- c=0 or 1,
- said radical optionally being substituted by at least one C.sub.1 -C.sub.6 -alkyl, and comprising a skeleton of a formula selected from the group consisting of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6, Z.sub.7, and a respective heptyl analog thereof without the double bond: ##STR15## wherein R.sup.2 and R.sup.3 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl group;
- and R.sup.4 and R.sup.5 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl radical;
- R.sup.6 is hydrogen, SO.sub.3 M, OPO.sub.3 (M).sub.2, or --(CH.sub.2).sub.y --COOM, wherein y is from 1 to 6, or --(CH.sub.2).sub.Z --SO.sub.3 M, wherein z is from 1 to 6; and M is H, Na, K, Li or N(R.sup.7),.sub.4.sup.+, wherein R.sup.7 is H or a C.sub.1 -C.sub.22 -(cyclo)alkyl, which is optionally hydroxylated;
- m is 0 or 1;
- .ltoreq. p.ltoreq.20; and
- 1.ltoreq.q.ltoreq.200;
- with the proviso that when m is 0, at least one of R.sup.4 and R.sup.5 is other than hydrogen.
- 2. The surfactant composition according to claim 1, wherein the surfactant composition is non-foaming.
- 3. The surfactant composition according to claim 1, wherein the surfactant composition has a surfactant power which is adjustable according to the sum of p+q in formula (I).
- 4. The surfactant composition according to claim 1, wherein the Z radical is substituted on at least one of its carbons by at least two C.sub.1 -C.sub.6 -alkyl groups.
- 5. The surfactant composition according to claim 1, wherein m is 1 in formula (I).
- 6. The surfactant composition according to claim 5, wherein the Z radical comprises a skeleton selected from the group consisting of Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6, Z.sub.7, and a respective heptyl analog thereof without the double bond.
- 7. The surfactant composition according to claim 6, wherein the Z radical comprising a skeleton is selected from the group consisting of Z.sub.4, Z.sub.5, and a respective heptyl analog thereof without the double bond.
- 8. The surfactant composition according to claim 1, wherein m is 0 in formula (I).
- 9. The surfactant composition according to claim 8, wherein the Z radical comprises the heptyl analog of skeleton Z.sub.3 without the double bond.
- 10. The surfactant composition according to claim 9, wherein the Z radical comprises at least one alkyl radical substituent on carbon number 2 or 5 of the skeleton.
- 11. The surfactant composition according to claim 1, wherein the p and q repeating units of formula (I) are present in an amount and arranged so as to form a random or block polymer chain.
- 12. A fragrant composition which comprises at least one compound of the following formula (I): ##STR16## in which Z is a bicyclo�a.b.c!heptenyl or bicyclo�a.b.c!heptyl radical, wherein:
- a+b+c=5,
- a=2, 3 or 4,
- b=2 or 1,
- c=0 or 1,
- said radical optionally being substituted by at least one C.sub.1 -C.sub.6 -alkyl, and comprising a skeleton of a formula selected from the group consisting of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6, Z.sub.7, and a respective heptyl analog thereof without the double bond: ##STR17## wherein R.sup.2 and R.sup.3 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl group;
- R.sup.4 and R.sup.5 are identical or different and are hydrogen or a linear branched (cyclo)alkyl or (cyclo)alkenyl radical;
- R.sup.6 is hydrogen, SO.sub.3 M, OPO.sub.3 (M).sub.2, or --(CH.sub.2).sub.y --COOM, wherein y is from 1 to 6, or --(CH.sub.2).sub.z --SO.sub.3 M, wherein z is from 1 to 6; and M is H, Na, K, Li or N(R.sup.7).sub.4.sup.+, wherein R.sup.7 is H or a C.sub.1 -C.sub.22 -(cyclo)alkyl, which is optionally hydroxylated;
- m is 0 or 1;
- .ltoreq. p.ltoreq.20; and
- 1.ltoreq.q.ltoreq.200;
- with the proviso that when m is 0, at least one of R.sup.4 and R.sup.5 is other than hydrogen.
- 13. The fragrant composition according to claim 12, wherein the fragrant composition has a fragrant note which is adjustable according to the sum of p and q in formula (I).
- 14. The fragrant composition according to claim 12, wherein the Z radical is substituted on at least one of its carbons by at least two C.sub.1 -C.sub.6 -alkyl groups.
- 15. The fragrant composition according to claim 12, wherein m is 1 in formula (I).
- 16. The fragrant composition according to claim 15, wherein the Z radical comprises a skeleton selected from the group consisting of Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6, Z.sub.7, and a respective heptyl analog thereof without the double bond.
- 17. The fragrant composition according to claim 16, wherein the Z radical comprising a skeleton is selected from the group consisting of Z.sub.4, Z.sub.5, and a respective heptyl analog thereof without the double bond.
- 18. The fragrant composition according to claim 12, wherein m is 0 in formula (I).
- 19. The fragrant composition according to claim 18, wherein the Z radical comprises the heptyl analog of skeleton Z.sub.3, without the double bond.
- 20. The fragrant composition according to claim 19, wherein the Z radical comprises at least one alkyl radical substituent on carbon number 2 or 5 of the skeleton.
- 21. The fragrant composition according to claim 12, wherein the p and q repeating units of formula (I) are present in an amount and arranged so as to form a random or block polymer chain.
- 22. A surfactant and fragrant composition which comprises at least one compound of the following formula (I): ##STR18## in which: Z is a bicyclo�a.b.c!heptenyl or bicyclo�a.b.c!heptyl radical, wherein:
- a+b+c=5,
- a=2, 3 or 4,
- b=2 or 1,
- c=0 or 1,
- said radical optionally being substituted by at least one C.sub.1 -C.sub.6 -alkyl, and comprising a skeleton of a formula selected from the group consisting of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6, Z.sub.7, and a respective heptyl analog thereof without the double bond: ##STR19## wherein R.sup.2 and R.sup.3 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl group;
- R.sup.4 and R.sup.5 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl radical;
- R.sup.6 is hydrogen, SO.sub.3 M, OPO.sub.3 (M).sub.2, or --(CH.sub.2).sub.y --COOM, wherein y is from 1 to 6, or --(CH.sub.2).sub.z --SO.sub.3 M, wherein z is from 1 to 6; and M is H, Na, K, Li or N(R.sup.7).sub.4.sup.+, wherein R.sup.7 is H or a C.sub.1 -C.sub.22 -(cyclo)alkyl, which is optionally hydroxylated;
- m is 0 or 1;
- .ltoreq. p.ltoreq.20; and
- 1.ltoreq.q.ltoreq.200;
- with the proviso that when m is 0, at least one of R.sup.4 and R.sup.5 is other than hydrogen.
- 23. A detergent formulation which contains one or more of a surfactant composition, a fragrant composition and a surfactant and fragrant composition, wherein the one or more of said compositions comprise at least one compound of the following formula (I): ##STR20## in which: Z is a bicyclo�a.b.c!heptenyl or bicyclo�a.b.c!heptyl radical, wherein:
- a+b+c=5,
- a=2, 3 or 4,
- b=2 or 1,
- c=0 or 1,
- said radical optionally being substituted by at least one C.sub.1 -C.sub.6 -alkyl, and comprising a skeleton of a formula selected from the group consisting of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6, Z.sub.7, and a respective heptyl analog thereof without the double bond: ##STR21## wherein R.sup.2 and R.sup.3 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl group;
- R.sup.4 and R.sup.5 are identical or different and are hydrogen or a linear or branched (cyclo)alkyl or (cyclo)alkenyl radical;
- R.sup.6 is hydrogen, SO.sub.3 M, OPO.sub.3 (M).sub.2, or --(CH.sub.2).sub.y --COOM, wherein y is from 1 to 6, or --(CH.sub.2).sub.z --SO.sub.3 M, wherein z is from 1 to 6; and M is H, Na, K, Li or N(R.sup.7).sub.4.sup.+, wherein R.sup.7 is H or a C.sub.1 -C.sub.22 -(cyclo)alkyl, which is optionally hydroxylated;
- m is 0 or 1;
- .ltoreq. p.ltoreq.20; and
- 1.ltoreq.q.ltoreq.200;
- with the proviso that when m is 0, at least one of R.sup.4 and R.sup.5 is other than hydrogen.
Priority Claims (1)
Number |
Date |
Country |
Kind |
94 08 366 |
Jul 1994 |
FRX |
|
Parent Case Info
This application is a divisional of application Ser. No. 08/498,261, filed Jul. 3, 1995, now U.S. Pat. No. 5,674,823.
US Referenced Citations (6)
Foreign Referenced Citations (4)
Number |
Date |
Country |
1294933 |
Oct 1962 |
FRX |
2429213 |
Jan 1980 |
FRX |
3822202 |
Jan 1990 |
DEX |
61-233650 |
Oct 1986 |
JPX |
Non-Patent Literature Citations (1)
Entry |
N. Imamura et al, "Unsaturated Esters of Nopol or Derivatives," Chemical Abstracts, vol. 106, No. 22, Jun. 1, 1987. |
Divisions (1)
|
Number |
Date |
Country |
Parent |
498261 |
Jul 1995 |
|