Device and Method of Plasma Polishing Stainless Steel Wire

Information

  • Patent Application
  • 20190062941
  • Publication Number
    20190062941
  • Date Filed
    August 23, 2017
    7 years ago
  • Date Published
    February 28, 2019
    5 years ago
  • Inventors
    • Li; Chun-Jen
    • Liu; Kuang-Te
Abstract
A device of plasma polishing a stainless steel wire contains: at least one accommodation tank, a polished metal wire having a stainless steel substrate, a collection device, a DC controller, and a DC power generator. The collection device includes a supply segment and a rolling segment, and at least two positive-electrode conductive rollers are arranged above each accommodation tank. A first end of the connection portion is connected with the stainless steel substrate, and a second end of the connection portion is coupled with the first isolative guide section of the polished metal wire, wherein a first cleaning tank is configured to clean the polished metal wire, a second cleaning tank is configured to clean a plasma polished metal wire, and multiple electric insulation structures are respectively mounted beneath each accommodation tank, the supply segment, the rolling segment, the first cleaning tank, and the second cleaning tank.
Description
FIELD OF THE INVENTION

The present invention relates to a device and method of plasma polishing stainless steel wire which move a stainless steel substrate of a polished metal wire to soak in negative-electrode polishing solution of each accommodation tank, thus continuously plasma polishing the stainless steel substrate of the polished metal wire.


BACKGROUND OF THE INVENTION

A conventional method of plasma polishing flexible metal wire contains steps of: connecting a predetermined section of 5 m to 6 m of a polished metal wire with positive electrode of electric current; and soaking the predetermined section of the polished metal wire in negative-electrode polishing solution of each accommodation tank so as to plasma polish the predetermined section of the polished metal wire in electric field.


However, this conventional method cannot continuously plasma polish the polished metal wire when the polished metal wire is long.


To solve above-mentioned defects, the waves are applied to generate the electricity currently, yet it destroys power generation facilities easily. Furthermore, as fixing a conventional wave power generator on a ship or on a seabed, cables transmit the electricity in a long time and at limited quantity.


The present invention has arisen to mitigate and/or obviate the afore-described disadvantages.


SUMMARY OF THE INVENTION

The primary objective of the present invention is to provide a device and method of plasma polishing stainless steel wire which move a stainless steel substrate of a polished metal wire to soak in negative-electrode polishing solution of each accommodation tank, thus continuously plasma polishing the stainless steel substrate of the polished metal wire.


Another objective of the present invention is to provide a device and method of plasma polishing stainless steel wire in which multiple electric insulation structures are respectively mounted beneath bottoms of each accommodation tank, the supply segment, the rolling segment, the first cleaning tank, and the second cleaning tank so that when the polished metal wire is plasma polished, each accommodation tank electrically insulates from an exterior environment.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a flow chart of a method of plasma polishing a stainless steel wire according to a first embodiment of the present invention.



FIG. 2 is a schematic view showing the application of the method of plasma polishing the stainless steel wire according to the first embodiment of the present invention.



FIG. 3 is another schematic view showing the application of the method of plasma polishing the stainless steel wire according to the first embodiment of the present invention.



FIG. 4 is a flow chart of a method of plasma polishing a stainless steel wire according to a second embodiment of the present invention.



FIG. 5 is a schematic view showing the application of the method of plasma polishing the stainless steel wire according to the second embodiment of the present invention.



FIG. 6 is another schematic view showing the application of the method of plasma polishing the stainless steel wire according to the second embodiment of the present invention.



FIG. 7 is a schematic view showing the application of the method of plasma polishing the stainless steel wire according to a third embodiment of the present invention.





DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

With reference to FIGS. 2-3, a device of plasma polishing a stainless steel wire according to a first embodiment of the present invention comprises: at least one accommodation tank 10 configured to accommodate negative-electrode polishing solution 11, a polished metal wire 20 having a stainless steel substrate 21, a collection device 30, a direct current (DC) controller 12, and a direct current (DC) power generator 13.


Each of the at least one accommodation tank 10 is made of metal conductive material or includes metal conductive material (such as copper material) accommodated therein, and each accommodation tank 10 is connected with a negative electrode of electric current.


The collection device 30 includes a supply segment 31 and a rolling segment 32 which are located outside two ends of each accommodation tank 10 respectively, at least two positive-electrode conductive rollers 34 arranged above the negative-electrode polishing solution 11 of each accommodation tank 10 and electrically connected with a positive electrode of the electric current, and multiple transmission rollers 33 arranged in each accommodation tank 10, wherein a length of a part of the stainless steel substrate 21 between any two adjacent positive-electrode conductive rollers 34 depends on a resistance tolerance range of a length of a stainless steel wire between said any two adjacent positive-electrode conductive rollers 34, a connection portion 23 is fixed on a front end of the stainless steel substrate 21 of the polished metal wire 20, wherein a first end of the connection portion 23 is connected with the stainless steel substrate 21, and a second end of the connection portion 23 is coupled with the rolling segment 32 of the collection device 30 so as to pull a first isolative guide section 22 of the polished metal wire 20, and a distal end of the polished metal wire 20 is joined with a second isolative guide section 24 of the polished metal wire 20. In addition, a first cleaning tank 40 is configured to clean the polished metal wire 20 which does not move into each accommodation tank 10 and is pulled by the rolling segment 32, and a second cleaning tank 50 is configured to clean a plasma polished metal wire 20′ which moves across each accommodation tank 10 and is pulled by the rolling segment 32. Multiple electric insulation structures 60 are respectively mounted beneath bottoms of each accommodation tank 10, the supply segment 31, the rolling segment 32, the first cleaning tank 40, and the second cleaning tank 50 so that when the polished metal wire 20 is plasma polished, each accommodation tank 10 electrically insulates from an exterior environment.


Referring to FIGS. 1-3, a method of plasma polishing the stainless steel wire according to a first embodiment of the present embodiment comprises steps of:


(a1). fixing the polished metal wire 20 on the supply segment 31, wherein a first end of the first isolative guide section 22 is connected with the connection portion 23 of the stainless steel substrate 21, the first isolative guide section 22 is rolled among the multiple transmission rollers 33 and the at least two positive-electrode conductive rollers 34, and a second end of the first isolative guide section 22 is coupled with the rolling segment 32 of the collection device 30, such that the first isolative guide section 22 is delivered to soak in the negative-electrode polishing solution 11 of an accommodation tank 10 and to contact with the at least two positive-electrode conductive rollers 34 by way of the multiple transmission rollers 33, thereafter a power supply is started so that the DC controller 12 and the DC power generator 13 transmit positive and negative electrode currents to the accommodation tank 10 and the at least two positive-electrode conductive rollers 34 respectively, wherein the accommodation tank 10 is made of the metal conductive material or includes the metal conductive material accommodated therein so that a negative electrode area produces in the negative-electrode polishing solution 11, and a part of the first isolative guide section 22 in the accommodation tank 10 electrically insulates from the negative-electrode polishing solution 11, wherein when the first isolative guide section 22 is continuously pulled and rolled by the rolling segment 32 to contact with a first zone 22′ of each of the at least two positive-electrode conductive rollers 34, it electrically insulates from the exterior environment until the stainless steel substrate 21 of the polished metal wire 20 exposes;


(a2). pre-processing (i.e. ultrasonic cleaning), wherein the stainless steel substrate 21 of the polished metal wire 20 is pulled and rolled by the rolling segment 32 to move into the first cleaning tank 40 so as to be cleaned ultrasonically in the first cleaning tank 40;


(a3). plasma polishing, wherein the stainless steel substrate 21 of the polished metal wire 20 is contentiously pulled and rolled by the rolling segment 32 after the step (a2) so that the stainless steel substrate 21 of the polished metal wire 20 moves toward the accommodation tank 10, wherein the stainless steel substrate 21 contacts with each positive-electrode conductive roller 34 so that each positive-electrode conductive roller 34 conducts electricity to the polished metal wire 20 and the positive electrode of the electric current produces on the stainless steel substrate 21, thereafter the stainless steel substrate 21 is pulled by the rolling segment 32 to be soaked in the negative-electrode polishing solution 11, such that the stainless steel substrate 21 contacts with the negative-electrode polishing solution 11 to form a current loop, and the stainless steel substrate 21 is plasma polished to reduce roughness and friction coefficient, wherein when the stainless steel substrate 21 is pulled by the rolling segment 32 to move across a second zone 21′ of each positive-electrode conductive roller 34, it electrically insulates from the exterior environment by using one of the multiple electric insulation structures 60;


(a4). post-processing (i.e. ultrasonic cleaning), wherein the plasma polished metal wire 20′ after the step (a3) is pulled and rolled by the rolling segment 32 to move into the second cleaning tank 50 to be cleaned ultrasonically; and


(a5). rolling, wherein the collection segment 32 rolls the plasma polished metal wire 20′ after the step (a4), and the supply segment 31 supplies the polished metal wire 20 to drive the stainless steel substrate 21 having positive electrode to move into the accommodation tank 10, hence the polished metal wire 20 is soaked in the negative-electrode polishing solution 11 of the accommodation tank 10, thus plasma polishing the polished metal wire 20 again.


With reference to FIGS. 4-6, a method of plasma polishing the stainless steel wire according to a second embodiment comprises steps of:


(b1). fixing a polished metal wire 20 on a supply segment 31, wherein a first end of a first isolative guide section 22 is connected with a connection portion 23 of a stainless steel substrate 21, the first isolative guide section 22 is rolled among a transmission rollers 33 and two positive-electrode conductive rollers 34 of each of multiple accommodation tanks 10, and a second end of the first isolative guide section 22 is coupled with the rolling segment 32 of the collection device 30, such that the first isolative guide section 22 is delivered to soak in the negative-electrode polishing solution 11 of each accommodation tank 10 and to contact with the two positive-electrode conductive rollers 34 by way of the multiple transmission rollers 33, thereafter a power supply is started so that a DC controller 12 and a DC power generator 13 transmit negative electrode currents to each accommodation tank 10 and transmit positive electrode currents to the two positive-electrode conductive rollers 34 respectively, wherein each accommodation tank 10 is made of metal conductive material or includes metal conductive material accommodated therein so that a negative electrode area produces in the negative-electrode polishing solution 11, and a part of the first isolative guide section 22 in each accommodation tank 10 electrically insulates from the negative-electrode polishing solution 11, wherein when the first isolative guide section 22 is continuously pulled and rolled by the rolling segment 32 to contact with one positive-electrode conductive roller 34 and to move across a first zone 21′ between any two adjacent accommodation tanks 10, it electrically insulates from an exterior environment until the stainless steel substrate 21 of the polished metal wire 20 exposes;


(b2). pre-processing (i.e. ultrasonic cleaning), wherein the stainless steel substrate 21 of the polished metal wire 20 is pulled and rolled by the rolling segment 32 to move into the first cleaning tank 40 so as to be cleaned ultrasonically in the first cleaning tank 40;


(b3). plasma polishing, wherein the stainless steel substrate 21 of the polished metal wire 20 is contentiously pulled and rolled by the rolling segment 32 after the step (b2) so that the stainless steel substrate 21 of the polished metal wire 20 moves toward the multiple accommodation tanks 10, wherein the stainless steel substrate 21 contacts with each positive-electrode conductive roller 34 so that each positive-electrode conductive roller 34 conducts electricity to the polished metal wire 20 and positive electrode of electric current produces on the stainless steel substrate 21, thereafter the stainless steel substrate 21 is pulled by the rolling segment 32 to be soaked in the negative-electrode polishing solution 11, such that the stainless steel substrate 21 contacts with the negative-electrode polishing solution 11 to form a current loop, and the stainless steel substrate 21 is plasma polished to reduce roughness and friction coefficient, wherein when the stainless steel substrate 21 is pulled by the rolling segment 32 to move into each accommodation tank 10 via the second zone 21′ of each positive-electrode conductive roller 34, it electrically insulates from the exterior environment by using an electric insulation structure 60 located below each accommodation tank 10;


(b4). post-processing, wherein a plasma polished metal wire 20′ after the step (b3) is pulled and rolled by the rolling segment 32 so as to move into a second cleaning tank 50 to be cleaned; and


(b5). rolling, wherein the rolling segment 32 rolls the plasma polished metal wire 20′ after the step (b4), and the rolling segment 32 supplies the polished metal wire 20 to drive the stainless steel substrate 21 having the positive electrode to move into each accommodation tank 10, hence the polished metal wire 20 is soaked in the negative-electrode polishing solution 11 of each accommodation tank 10 to be plasma polished.


Accordingly, the first isolative guide section 22 is delivered to soak in the negative-electrode polishing solution 11 of each accommodation tank 10 and to contact with the at least two positive-electrode conductive rollers 34, thus maintaining electric insulation.


Preferably, the multiple electric insulation structures 60 are respectively fixed beneath the bottoms of each accommodation tank 10, the supply segment 31, the rolling segment 32, the first cleaning tank 40, and the second cleaning tank 50 so that when the polished metal wire 20 is plasma polished, it is electrically insulated from the exterior environment.


In addition, the length of the part of the stainless steel substrate 21 between any two adjacent positive-electrode conductive rollers 34 depends on a resistance of the polished metal wire 20.


The polished metal wire 20 is pulled by the rolling segment 32 of the collection device 30 and is delivered by the multiple transmission rollers 33 so that the stainless steel substrate 21 of the polished metal wire 20 is moved into each accommodation tank 10 via the at least two positive-electrode conductive rollers 34 so as to soak in the negative-electrode polishing solution 11, thus finishing the plasma polishing. Thereafter, the rolling segment 32 of the collection device 30 rolls the plasma polished metal wire 20′ so that the stainless steel substrate 21 of the polished metal wire 20 moves into each accommodation tank 10 to be plasma polished in the negative-electrode polishing solution 11 via the at least two positive-electrode conductive rollers 34.


As illustrated in FIG. 7, in a third embodiment, each of multiple accommodation tanks 10 does not include multiple transmission rollers 33, i.e., at least two positive-electrode conductive rollers 34 are arranged above a negative-electrode polishing solution 11 of each accommodation tank 10, wherein a first isolative guide section 22 is delivered by the at least two positive-electrode conductive rollers 34 and is soaked in the negative-electrode polishing solution 11 of each accommodation tank 10 so that the first isolative guide section 22 electrically insulates from the negative-electrode polishing solution 11 after conducting electricity. Thereafter, a rolling segment 32 of a collection device 30 pulls the polished metal wire 20 until the stainless steel substrate 21 of the polished metal wire 20 exposes and contacts with the at least two positive-electrode conductive rollers 34, such that the stainless steel substrate 21 is plasma polished in the negative-electrode polishing solution 11.


While the preferred embodiments of the invention have been set forth for the purpose of disclosure, modifications of the disclosed embodiments of the invention as well as other embodiments thereof may occur to those skilled in the art. The scope of the claims should not be limited by the preferred embodiments set forth in the examples, but should be given the broadest interpretation consistent with the description as a whole.

Claims
  • 1. A device of plasma polishing a stainless steel wire comprising: at least one accommodation tank configured to accommodate negative-electrode polishing solution, a polished metal wire having a stainless steel substrate, a collection device, a direct current (DC) controller, and a direct current (DC) power generator;wherein the collection device includes a supply segment and a rolling segment which are located outside two ends of each of the at least one accommodation tank respectively, at least two positive-electrode conductive rollers are arranged above the negative-electrode polishing solution of each accommodation tank and electrically connected with a positive electrode of an electric current, and each accommodation tank is connected with a negative electrode of the electric current, wherein a length of a part of the stainless steel substrate between any two adjacent positive-electrode conductive rollers depends on a resistance tolerance range of a length of a stainless steel wire between said any two adjacent positive-electrode conductive rollers, the polished metal wire is connected with a first isolative guide section coupling with the rolling segment, wherein a first cleaning tank is configured to clean the polished metal wire which does not move into each accommodation tank and is pulled by the rolling segment, and a second cleaning tank is configured to clean a plasma polished metal wire which moves across each accommodation tank and is pulled by the rolling segment, and multiple electric insulation structures are respectively mounted beneath bottoms of each accommodation tank, the supply segment, the rolling segment, the first cleaning tank, and the second cleaning tank.
  • 2. A method of plasma polishing the stainless steel wire using the device of claim 1 comprising steps of: (a1). fixing the polished metal wire on the supply segment, wherein a first end of the first isolative guide section is connected with the connection portion of the stainless steel substrate, the first isolative guide section is rolled among multiple transmission rollers and the at least two positive-electrode conductive rollers, and the second end of the first isolative guide section is coupled with the rolling segment of the collection device, such that the first isolative guide section is delivered to soak in the negative-electrode polishing solution of each accommodation tank and to contact with the at least two positive-electrode conductive rollers by way of the multiple transmission rollers, thereafter a power supply is started so that the DC controller and the DC power generator transmit positive and negative electrode currents to each accommodation tank and the at least two positive-electrode conductive rollers respectively, wherein each accommodation tank is made of metal conductive material or includes metal conductive material accommodated therein so that a negative electrode area produces in the negative-electrode polishing solution, and a part of the first isolative guide section in each accommodation tank electrically insulates from the negative-electrode polishing solution, wherein when the first isolative guide section is continuously pulled and rolled by the rolling segment to contact with a first zone of each of the at least two positive-electrode conductive rollers, it electrically insulates from an exterior environment until the stainless steel substrate of the polished metal wire exposes;(a2). pre-processing, wherein the stainless steel substrate of the polished metal wire is pulled and rolled by the rolling segment to move into the first cleaning tank so as to be cleaned in the first cleaning tank;(a3). plasma polishing, wherein the stainless steel substrate of the polished metal wire is contentiously pulled and rolled by the rolling segment after the step (a2) so that the stainless steel substrate of the polished metal wire moves toward each accommodation tank, wherein the stainless steel substrate contacts with each positive-electrode conductive roller so that each positive-electrode conductive roller conducts electricity to the polished metal wire and the positive electrode of the electric current produces on the stainless steel substrate, thereafter the stainless steel substrate is pulled by the rolling segment to be soaked in the negative-electrode polishing solution, such that the stainless steel substrate contacts with the negative-electrode polishing solution to form a current loop, and the stainless steel substrate is plasma polished to reduce roughness and friction coefficient, wherein when the stainless steel substrate is pulled by the rolling segment to move across a second zone of each positive-electrode conductive roller, it electrically insulates from the exterior environment by using one of the multiple electric insulation structures;(a4). post-processing, wherein the plasma polished metal wire after the step (a3) is pulled and rolled by the rolling segment to move into the second cleaning tank to be cleaned; and(a5). rolling, wherein the collection segment rolls the plasma polished metal wire after the step (a4), and the supply segment supplies the polished metal wire to drive the stainless steel substrate having positive electrode to move into each accommodation tank, hence the polished metal wire is soaked in the negative-electrode polishing solution of each accommodation tank, thus plasma polishing the polished metal wire again.
  • 3. The device as claimed in claim 1, wherein multiple transmission rollers are arranged in each accommodation tank.
  • 4. The device as claimed in claim 1, wherein each of the at least one accommodation tank is made of metal conductive material or includes metal conductive material accommodated therein, and the metal conductive material is copper material.
  • 5. The wave power generator as claimed in claim 1, wherein a connection portion of the stainless steel substrate is fixed on a front end of the stainless steel substrate of the polished metal wire, a first end of the connection portion is connected with the stainless steel substrate, and a second end of the connection portion is coupled with a first isolative guide section of the polished metal wire.
  • 6. The wave power generator as claimed in claim 1, wherein a distal end of the polished metal wire is joined with a second isolative guide section of the polished metal wire.