1. Field of the Invention
The present invention relates to a device integrating capacitive touch and resistive touch and an operation method thereof, and particularly to a device integrating capacitive touch and resistive touch and an operation method thereof that can utilize a first sensing layer to support a resistive touch function of a second sensing layer.
2. Description of the Prior Art
A capacitive touch panel has multi-touch and better operational sense advantages, so the capacitive touch panel gradually substitutes for a resistive touch panel. Although the capacitive touch panel has the multi-touch and the better operational sense advantages, the capacitive touch panel cannot locate precisely like the resistive touch panel (e.g. a touch point position corresponding to a nib or a nail). Therefore, the prior art has provided a touch panel having capacitive touch and resistive touch. But, the prior art directly superposes a capacitive touch panel on a resistive touch panel to form a touch panel integrating capacitive touch and resistive touch. Thus, the touch panel integrating capacitive touch and resistive touch provided by the prior art not only has a complicated structure, but can not also reduce cost of the touch panel.
An embodiment provides a device integrating capacitive touch and resistive touch. The device includes a first sensing layer, a second sensing layer, and a processing unit. The first sensing layer includes a plurality of sensing units, wherein the plurality of sensing units are insulated from each other. The second sensing layer is installed below the first sensing layer including a plurality of electrodes. The processing unit is used for charging the first sensing layer, detecting capacitance variation of the plurality of sensing units, and determining a position of at least one first touch point according to the capacitance variation of the plurality of sensing units in a capacitive touch mode; and charging the first sensing layer, detecting resistance variation of the plurality of electrodes, and determining a position of at least one second touch point according to the resistance variation of the plurality of electrodes in a resistive touch mode.
Another embodiment provides an operation method of a device integrating capacitive touch and resistive touch. The device includes a first sensing layer, a second sensing layer, and a processing unit, wherein the first sensing layer includes a plurality of sensing units, and the second sensing layer includes a plurality of electrodes. The operation method includes the processing unit charging the first sensing layer when the device is in a capacitive touch mode; the processing unit detecting capacitance variation of the plurality of sensing units; determining a position of at least one first touch point the processing unit according to the capacitance variation of the plurality of sensing units; and the processing unit generating at least one first corresponding control signal according to the position of the at least one first touch point.
Another embodiment provides an operation method of a device integrating capacitive touch and resistive touch. The device includes a first sensing layer, a second sensing layer, and a processing unit, wherein the first sensing layer includes a plurality of sensing units, and the second sensing layer includes a plurality of electrodes. The operation method includes the processing unit charging the first sensing layer when the device is in a resistive touch mode; the processing unit detecting resistance variation of the plurality of electrodes; the processing unit determining a position of at least one second touch point according to the resistance variation of the plurality of electrodes; and the processing unit generating at least one second corresponding control signal according to the position of the at least one second touch point.
Another embodiment provides an operation method of a device integrating capacitive touch and resistive touch. The device includes a first sensing layer, a second sensing layer, and a processing unit, wherein the first sensing layer includes a plurality of sensing units, and the second sensing layer includes a plurality of electrodes. The operation method includes the processing unit charging the second sensing layer when the device is in a resistive touch mode; the processing unit detecting resistance variation of the plurality of sensing units; the processing unit determining a position of at least one third touch point according to resistance variation of the plurality of sensing units; and the processing unit generating at least one third corresponding control signal according to the at least one third touch point.
The present invention provides a device integrating capacitive touch and resistive touch and an operation method thereof. Because the device and the operation method utilize a first sensing layer (corresponding to a capacitive touch function) to support a resistive touch function of a second sensing layer in a resistive touch mode, the present invention can simultaneously have the capacitive touch function and the resistive touch function by only two sensing layers (the first sensing layer and the second sensing layer). In addition, compared to the prior art, the present invention further has advantages as follows: first, because the present invention only has the first sensing layer to correspond to the capacitive touch function, the first sensing layer does not need a conductance bridge; second, because the present invention only has the two sensing layers and does not have an alignment problem between electrode units of the two sensing layers, the present invention can tolerate greater alignment shift; and third, because the present invention only has the two sensing layers, the present invention has higher transmittance and simpler processes.
These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.
Please refer to
Please refer to
Because the device 100 integrates capacitive touch and resistive touch, the processing unit 112 can execute a capacitive touch mode and a resistive touch mode in turn. When the device 100 is in a capacitive touch mode, the processing unit 112 is used for charging the sensing unit 1041-104N of the first sensing layer 104, detecting capacitance variation of the sensing unit 1041-104N, and determining a position of at least one first touch point according to the capacitance variation of the sensing unit 1041-104N. For example, the processing unit 112 can obtain an X coordinate corresponding to a touch point P according to the capacitance variation of the sensing unit 1042-1044 in the first axis direction corresponding to the touch point P shown in
When the device 100 is in a resistive touch mode, the processing unit 112 is used for charging the sensing unit 1041-104N of the first sensing layer 104 in turn or simultaneously, detecting resistance variation of the 4 electrodes 1081-1084 of the second sensing layer 108, and determining a position of at least one second touch point according to the resistance variation of the 4 electrodes 1081-1084. After the processing unit 112 determines the position of the at least one second touch point, the processing unit 112 can generate at least one second corresponding control signal according to the position of the at least one second touch point. For example, after the processing unit 112 determines the position of the at least one second touch point, the processing unit 112 can generate at least one second corresponding control signal to a second predetermined application program according to the position of the at least one second touch point. Then, the second predetermined application program can execute a corresponding operation according to the at least one second corresponding control signal.
In addition, when the device 100 is in the resistive touch mode, the processing unit 112 is used for charging the 4 electrodes 1081-1084 of the second sensing layer 108, detecting resistance variation of the sensing unit 1041-104N of the first sensing layer 104, and determining a position of at least one third touch point according to the resistance variation of the sensing unit 1041-104N. After the processing unit 112 determines the position of the at least one third touch point, the processing unit 112 can generate at least one third corresponding control signal to a third predetermined application program according to the position of the at least one third touch point. Then, the third predetermined application program can execute a corresponding operation according to the at least one third corresponding control signal.
Please refer to
Step 500: Start.
Step 502: When the device 100 is in a capacitive touch mode, go to Step 504; when the device 100 is in a resistive touch mode, go to Step 512.
Step 504: The processing unit 112 charges the first sensing layer 104.
Step 506: The processing unit 112 detects capacitance variation of the plurality of sensing units 1041-104N.
Step 508: The processing unit 112 determines a position of at least one first touch point according to the capacitance variation of the plurality of sensing units 1041-104N.
Step 510: The processing unit 112 generates at least one first corresponding control signal according to the position of the at least one first touch point, go to Step 502.
Step 512: The processing unit 112 charges the first sensing layer 104.
Step 514: The processing unit 112 detects resistance variation of the plurality of electrodes.
Step 516: The processing unit 112 determines a position of at least one second touch point according to the resistance variation of the plurality of electrodes.
Step 518: The processing unit 112 generates at least one second corresponding control signal according to the position of the at least one second touch point, go to Step 502.
In Step 510, after the processing unit 112 determines the position of the at least one first touch point, the processing unit 112 can generate the at least one first corresponding control signal according to the position of the at least one first touch point. For example, after the processing unit 112 determines the position of the at least one first touch point, the processing unit 112 can generate the at least one first corresponding control signal to a first predetermined application program according to the position of the at least one first touch point. Then, the first predetermined application program can execute a corresponding operation according to the at least one first corresponding control signal. In Step 518, after the processing unit 112 determines the position of the at least one second touch point, the processing unit 112 can generate the at least one second corresponding control signal to a second predetermined application program according to the position of the at least one second touch point. Then, the second predetermined application program can execute a corresponding operation according to the at least one second corresponding control signal.
Please refer to
Step 600: Start.
Step 602: When the device 100 is in a capacitive touch mode, go to Step 604; when the device 100 is in a resistive touch mode, go to Step 612.
Step 604: The processing unit 112 charges the first sensing layer 104.
Step 606: The processing unit 112 detects capacitance variation of the plurality of sensing units 1041-104N.
Step 608: The processing unit 112 determines a position of at least one first touch point according to the capacitance variation of the plurality of sensing units 1041-104N.
Step 610: The processing unit 112 generates at least one first corresponding control signal according to the position of the at least one first touch point, go to Step 602.
Step 612: The processing unit 112 charges the second sensing layer 108.
Step 614: The processing unit 112 detects resistance variation of the plurality of sensing units 1041-104N.
Step 616: The processing unit 112 determines a position of at least one third touch point according to the resistance variation of the plurality of sensing units 1041-104N.
Step 618: The processing unit 112 generates at least one third corresponding control signal according to the position of the at least one third touch point, go to Step 602.
A difference between the embodiment in
To sum up, because the device integrating capacitive touch and resistive touch and the operation method thereof utilize the first sensing layer (corresponding to the capacitive touch function) to support the resistive touch function of the second sensing layer in the resistive touch mode, the present invention can simultaneously have the capacitive touch function and the resistive touch function by only two sensing layers (the first sensing layer and the second sensing layer). In addition, compared to the prior art, the present invention further has advantages as follows: first, because the present invention only has the first sensing layer to correspond to the capacitive touch function, the first sensing layer does not need a conductance bridge; second, because the present invention only has the two sensing layers and does not have an alignment problem between electrode units of the two sensing layers, the present invention can tolerate greater alignment shift; and third, because the present invention only has the two sensing layers, the present invention has higher transmittance and simpler processes.
Those skilled in the art will readily observe that numerous modifications and alterations of the device and method may be made while retaining the teachings of the invention. Accordingly, the above disclosure should be construed as limited only by the metes and bounds of the appended claims.
Number | Date | Country | Kind |
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102135370 | Sep 2013 | TW | national |