The present disclosure relates to the field of couplable devices for cleaning substrates and related methods.
Chemical mechanical planarization is a process in which substrates are planarized and conditioned via a combination of chemical oxidation and mechanical abrasion. The process of chemical mechanical planarization produces residues, particles, and contaminants.
Some embodiments relate to a device. In some embodiments, the device comprises a polymeric pad having a top surface and a bottom surface. In some embodiments, the device comprises a frame body. In some embodiments, at least a portion of the frame body extends between the top surface and the bottom surface of the polymeric pad. In some embodiments, the device comprises a coupling member extending from at least a portion of the frame body.
In some embodiments, the coupling member is configured for coupling the device to an apparatus.
In some embodiments, the coupling member comprises a clamp configured for clamping the device to an apparatus.
In some embodiments, the coupling member comprises a fastener configured for fastening the device to an apparatus.
In some embodiments, the device further comprises a magnet configured for coupling the device to an apparatus.
In some embodiments, the polymeric pad is configured for at least one of cleaning, polishing, or brushing a surface of a semiconductor substrate.
In some embodiments, the polymeric pad comprises a plurality of surface structures extending from the bottom surface of the polymeric pad.
In some embodiments, the plurality of surface structures is integral with the polymeric pad.
In some embodiments, the polymeric pad comprises at least one of a planar bottom surface, a planar top surface, or any combination thereof.
In some embodiments, the polymeric pad comprises a first polymeric material. In some embodiments, the frame body comprises a second polymeric material. In some embodiments, the second polymeric material is different from the first polymeric material.
In some embodiments, the first polymeric material comprises at least one of polyvinyl alcohol, polysulfone, polyether sulfone, polyaryl sulfone, nylon, polyamide, fluoropolymer, polytetrafluoroethylene (PTFE), polyethylene, polypropylene, cellulose, acetate, or any combination thereof.
In some embodiments, the second polymeric material comprises at least one of polypropylene, polyethylene, copolymers thereof, or any combination thereof.
In some embodiments, the polymeric pad has a disc shape.
In some embodiments, the frame body has a disc shape.
In some embodiments, the frame body comprises a plurality of through-holes in a surface of the frame body.
In some embodiments, the frame body and the coupling member are a single unitary structure.
In some embodiments, the polymeric pad is integrally formed with the frame body.
In some embodiments, a diameter of the polymeric pad is 1 mm to 450 mm.
In some embodiments, a porosity of the polymeric pad is 50% to 99%.
Some embodiments relate to a method. In some embodiments, the method comprises obtaining the device according to any of the embodiments disclosed herein in any combination. In some embodiments, the method comprises coupling the device to an apparatus.
In some embodiments, the coupling comprises clamping the device onto a mandrel of the apparatus.
In some embodiments, the coupling comprises fastening the device to a mandrel of the apparatus.
In some embodiments, the coupling comprising securing the device to a mandrel of the apparatus via a magnet(s).
Some embodiments relate to a method for forming a device. In some embodiments, the method comprises obtaining a frame. In some embodiments, the frame comprises a frame body comprising a plurality of through-holes; and a coupling member extending from an edge portion of the frame body. In some embodiments, the method comprises disposing at least the frame body in a mold. In some embodiments, the method comprises obtaining a polymeric material. In some embodiments, the method comprises disposing the polymeric material in the mold. In some embodiments, the method comprises solidifying the polymeric material.
In some embodiments, the method further includes heating the polymeric material to a temperature sufficient to obtain a flowable polymeric material.
In some embodiments, the solidifying comprises cooling the polymeric material to a temperature sufficient to solidify the polymeric material.
Some embodiments of the disclosure are herein described, by way of example only, with reference to the accompanying drawings. With specific reference now to the drawings in detail, it is stressed that the embodiments shown are by way of example and for purposes of illustrative discussion of embodiments of the disclosure. In this regard, the description taken with the drawings makes apparent to those skilled in the art how embodiments of the disclosure may be practiced.
Among those benefits and improvements that have been disclosed, other objects and advantages of this disclosure will become apparent from the following description taken in conjunction with the accompanying figures. Detailed embodiments of the present disclosure are disclosed herein; however, it is to be understood that the disclosed embodiments are merely illustrative of the disclosure that may be embodied in various forms. In addition, each of the examples given regarding the various embodiments of the disclosure which are intended to be illustrative, and not restrictive.
Any prior patents and publications referenced herein are incorporated by reference in their entireties.
Throughout the specification and claims, the following terms take the meanings explicitly associated herein, unless the context clearly dictates otherwise. The phrases “in one embodiment,” “in an embodiment,” and “in some embodiments” as used herein do not necessarily refer to the same embodiment(s), though it may. Furthermore, the phrases “in another embodiment” and “in some other embodiments” as used herein do not necessarily refer to a different embodiment, although it may. All embodiments of the disclosure are intended to be combinable without departing from the scope or spirit of the disclosure.
As used herein, the term “based on” is not exclusive and allows for being based on additional factors not described, unless the context clearly dictates otherwise. In addition, throughout the specification, the meaning of “a,” “an,” and “the” include plural references. The meaning of “in” includes “in” and “on.
Some embodiments of the present disclosure relate to devices for cleaning substrates. The devices include a polymeric pad embedded with a frame body, and a coupling member extending upwards from the frame body for securing the device to equipment. The frame body and coupling member are constructed of a material which is generally more rigid than the soft polymeric material which is used to form the polymeric pads. The rigidity of the frame body and coupling member enhances the structural integrity of the polymeric pad, while also replacing the soft polymeric extensions with more rigid coupling members to more securely attach the device to equipment. Additional advantages include easy attachment and detachment from equipment, longer lifetimes of the polymeric pad, improved reliability, among numerous others, which will be apparent based on the disclosure herein.
In some embodiments, the devices disclosed herein are employed for cleaning or brushing substrates, such as silicon wafers, used in semiconductor fabrication. That is, for example, in some embodiments, substrates undergo polishing processes, such as chemical mechanical planarization (CMP) processes, in which chemical oxidation and mechanical abrasion is used to achieve high substrate planarity. Processes, such as CMP, often result in the formation of various residues and contaminants on the surface of the substrate. These residues and contaminants need to be removed prior to being subjected to further semiconductor fabrication processes. Accordingly, the devices disclosed herein may be useful in post-CMP cleaning modules, post-CMP pre-cleaning modules, and the like.
As used herein, the term “residue” refers to particles generated during a process(es). The term includes “post-CMP residue(s).” A post-CMP residue may include, for example and without limitation, particles from a polishing slurry, such as, for example and without limitation, at least one of silica-containing particles, chemicals in the polishing slurry, reaction by-products of the polishing slurry, carbon-rich particles, polishing pad particles, brush deloading particles, metals (e.g., at least one of copper, aluminum, tungsten, or any combination thereof), metal oxides, organic residues, barrier layer residues, any other materials that are the by-products of the CMP process, or any combination thereof. It will be appreciated that the term may include other types of residues without departing from the scope of this disclosure.
As used herein, the term “contaminant” refers to an undesirable substance(s). The term includes, for example and without limitation, at least one of chemicals in the CMP slurry, reaction by-products of the polishing slurry, any other materials which are by-products of the CMP process, or any combination thereof. An example of a contaminant includes benzotriazole. It will be appreciated that the term may include other types of contaminants without departing from the scope of this disclosure.
Although the side view depicts coupling members 106, in some embodiments, the device 100 includes a single coupling member. In some embodiments, the device 100 includes a plurality of coupling members. In some embodiments, the polymeric pad 102 is formed in the shape of a disc, with the coupling member extending upwards from a periphery or outer perimeter of the disc. In some of these embodiments, the coupling member may extend around all or a portion of the outer perimeter of the disc.
The polymeric pad 102 generally includes a material which is softer than the frame body 104 and the coupling member 106. For example, in some embodiments, the polymeric pad includes a soft polymeric material, such as polyvinyl alcohol. In some embodiments, the polymeric pad comprises at least one of polysulfone, polyether sulfone, polyaryl sulfone, nylon, polyamide, fluoropolymer, polytetrafluoroethylene (PTFE), polyethylene, polypropylene, cellulose, acetate, or any combination thereof. In some embodiments, the frame body 104, the coupling member 106, or any combination thereof includes a more rigid polymeric material, such as, at least one of polypropylene, polyethylene, any copolymer thereof, or any combination thereof. In some embodiments, the frame body 104, the coupling member 106, or any combination thereof includes a flowable polymeric material which, once solidified, results in the coupling member 106 being sufficiently resilient such that the coupling member 106 can be flexed, while also being sufficiently tensile to bias the clamp inwardly sufficient to engage the apparatus 200 (e.g., snap on and/or snap off a mandrel).
The polymeric pad 102 may have a thickness in a range of 0.1 mm to 50 mm, or any range or subrange between 0.1 mm and 50 mm. In some embodiments, for example, the polymeric pad 102 has a thickness in a range of 1 mm to 10 mm, 1 mm to 9 mm, 1 mm to 8 mm, 1 mm to 7 mm, 1 mm to 6 mm, 1 mm to 5 mm, 1 mm to 4 mm, 1 mm to 3 mm, 1 mm to 2 mm, 2 mm to 10 mm, 3 mm to 10 mm, 4 mm to 10 mm, 5 mm to 10 mm, 6 mm to 10 mm, 7 mm to 10 mm, 8 mm to 10 mm, 9 mm to 10 mm, 2 mm to 7 mm, 2 mm to 6 mm, 2 mm to 5 mm, 2 mm to 4 mm, 3 mm to 7 mm, 4 mm to 7 mm, 5 mm to 7 mm, 6 mm to 7 mm, any range or subrange therebetween, or any combination thereof.
A diameter of the polymeric pad 102 may range from 1 mm to 450 mm, or any range or subrange between 1 mm and 450 mm. In some embodiments, for example, the polymeric pad 102 has a thickness in a range of 1 mm to 25 mm, 1 mm to 50 mm, 1 mm to 75 mm, 1 mm to 100 mm, 1 mm to 125 mm, 1 mm to 150 mm, 1 mm to 200 mm, 1 mm to 300 mm, 1 mm to 450 mm, 25 mm to 450 mm, 50 mm to 450 mm, 75 mm to 450 mm, 100 mm to 450 mm, 125 mm to 450 mm, 150 mm to 450 mm, 200 mm to 450 mm, or 300 mm to 450 mm.
In some embodiments, the diameter of the polymeric pad 102 is less than a diameter of a substrate. In some embodiments, the substrate is a silicon wafer. In some embodiments, the diameter of the polymeric pad 102 is less than 25 mm (e.g., 1 mm to 24 mm), less than 51 mm (e.g., 1 mm to 50 mm), less than 76 mm (e.g., 1 mm to 75 mm), less than 100 mm (e.g., 1 mm to 99 mm), less than 125 mm (e.g., 1 mm to 124 mm), less than 150 mm (e.g., 1 mm to 149 mm), less than 200 mm (e.g., 1 mm to 199 mm), less than 300 mm (e.g., 1 mm to 299 mm), or less than 450 mm (1 mm to 449 mm).
A porosity of the polymeric pad 102 may refer to a dimensionless ratio of the volume of void space to the volume of bulk material. In some embodiments, the porosity of the polymeric pad 102 is 50% to 99%, or any range or subrange between 50% and 99%. In some embodiments, the porosity of the polymeric pad 102 is 60% to 99%, 65% to 99%, 70% to 99%, 75% to 99%, 80% to 99%, 85% to 99%, 90% to 99%, 85% to 95%, 85% to 90%, or 90% to 95%.
The coupling member 106 may obviate the need for the polymeric pad 102 to have any extension configured to be inserted into the mandrel 202 to secure the device 100 to the apparatus 200. For example, while conventional polymeric pads have, on the top surface of the polymeric pad, dovetail structures which couple the conventional polymeric pad to an apparatus, the polymeric pad 102 disclosed herein does not include any structure for coupling the polymeric pad 102 to the apparatus 200. That is, in some embodiments, the polymeric pad 102 has a planar top surface. In some embodiments, the polymeric pad 102 has a non-planar top surface, wherein the non-planar top surface does not comprise any structure for coupling the polymeric pad 102 to the apparatus 200.
The polymeric pad 102 has a bottom surface configured for cleaning, polishing, or brushing a substrate surface. In some embodiments, the polymeric pad 102 has a planar bottom surface. In some embodiments, the polymeric pad 102 has a non-planar bottom surface. For example, in some embodiments, the polymeric pad 102 includes a plurality of surface structures extending from the bottom surface of the polymeric pad 102. Various embodiments of the surface structures are described below.
ASPECTS
Various Aspects are described below. It is to be understood that any one or more of the features recited in the following Aspect(s) can be combined with any one or more other Aspect(s).
It is to be understood that changes may be made in detail, especially in matters of the construction materials employed and the shape, size, and arrangement of parts without departing from the scope of the present disclosure. This Specification and the embodiments described are examples, with the true scope and spirit of the disclosure being indicated by the claims that follow.
Number | Date | Country | |
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63348815 | Jun 2022 | US |