Claims
- 1. A fabric constructed to act as a diffractive grating to deBroglie waves, said fabric having opposed emissive surfaces wherein one emissive surface is etched in a regular repeating pattern and the opposite emissive surface is continuous such that the thickness of the fabric and the width of the etched area determine the wavelength of diffracted radiation.
- 2. A method of diffracting deBroglie waves comprising:
- providing a source of radiation having a given deBroglie wavelength;
- allowing the radiation to impinge upon the etched surface of the fabric of claim 1;
- wherein the thickness of the fabric and the width of the etched area are selected to produce constructive interference of the diffracted waves such as to increase the amplitude and energy of the wave by an amount proportional to the amplitude squared.
- 3. A method of diffracting deBroglie waves comprising:
- providing a source of radiation having a given deBroglie wavelength;
- allowing the radiation to impinge upon the etched surface of the fabric of claim 1;
- wherein the thickness of the fabric and the width of the etched area are selected to produce destructive interference of the diffracted waves such as to decrease the amplitude and energy of the wave by an amount proportional to the amplitude squared.
CROSS REFERENCE TO RELATED CASE
This application claims benefit of U.S. Provisional Patent Ser. No. 60/074,407 filed Feb. 11, 1998.
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Number |
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Date |
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5314767 |
Bussard |
May 1994 |
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5629074 |
Klocek et al. |
May 1997 |
|