Claims
- 1. A non-Lambertian diffuser comprising:a substrate body having at least a first side; and a diffuser surface relief structure formed non-holographically in the first side, the surface relief structure defining a plurality of irregularities in the first side and having light propagating characteristics defined by at least one of the size, depth, length, width, orientation, and contour of the plurality of irregularities; wherein the surface relief structure is etched into the first side by an etching agent carrying a plurality of particles each having a size, shape and mass.
- 2. The diffuser according to claim 1, wherein the substrate body is a glass material substrate.
- 3. The diffuser according to claim 1, wherein the substrate body is a plastic material substrate.
- 4. The diffuser according to claim 1, wherein the substrate body is a metallic material substrate.
- 5. The diffuser according to claim 1, wherein the surface relief structure comprises a plurality of scratches in the first side formed by buffing the first side with a buffing agent having a predetermined grit, each of the plurality of scratches having a depth, a contour, a length, a width, and a shape.
- 6. The diffuser according to claim 1, wherein the surface relief structure comprises a plurality of closely spaced depressions in the first side each having a depth and a contour and each formed by forcing a plurality of shot particles at a predetermined velocity against the first side, the shot particles each having a predetermined size, shape and mass.
- 7. The diffuser according to claim 1, wherein the surface relief structure is further etched into the first side by pressing the plurality of particles into the first side.
- 8. A non-Lambertian diffuser comprising:a substrate body having at least a first side; and a diffuser surface relief structure formed non-holographically in the first side, the surface relief structure defining a plurality of irregularities in the first side and having light propagating characteristics defined by at least one of the size, depth, length, width, orientation, and contour of the plurality of irregularities; wherein the surface relief structure is further etched into the first side by an etching agent contacting the first side through a plurality of openings in a mask, the plurality of openings each having a length, a width, an orientation and a shape.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a divisional of application Ser. No. 09/137,398, filed on Aug. 20, 1998, now U.S. Pat. No. 6,241,903.
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