The present application is a non-provisional patent application claiming priority to Netherlands Patent Application No. NL 2032932, filed Sep. 1, 2022, the contents of which are hereby incorporated by reference.
The present disclosure is related to a digital radiofrequency, RF, amplifier. The present disclosure is particularly related to a digital transmitter in which the digital RF amplifier is used. The digital RF amplifier can for example be used in high-speed and high-power applications, such as 5G mMIMO base stations.
Within the context of the present disclosure, a digital RF amplifier is an amplifier that receives a digital input signal and outputs an analog signal, more in particular an analog RF signal.
Digital RF amplifiers are known in the art. An example thereof is schematically shown in
The control signals can either have an active level, in which the application of the control signal causes the connected transistor cell 4 to become saturated, or an inactive level, in which the application of the control signal causes connected transistor cell 4 to switch off and/or to not output any signal. The outputs of transistors cells 4 are combined into an RF output signal, RF out, emerging at transistor output 3.
In the example of
A detail of a known implementation of a transistor 1 for a digital amplifier, such as digital RF amplifier 20, is shown in
As shown, source regions 7 are interrupted to allow a connection to be made between transistor inputs 2 of transistor 1 and gate regions 6. Furthermore, all drain regions 5 of transistor 1 are electrically connected to each other and to transistor output 3 (not shown).
In
To reduce Ohmic losses and/or resistance, gate regions 6 can be connected to finger-shaped metal structures. As gate regions 6 are relatively narrow, a via connection with an upper-lying metal layer of the finger-shaped metal structure is not possible. For that reason, the connection between the finger-shaped metal structures and the various gate regions 6 is typically realized in the regions where source regions 7 are interrupted. In these regions, relatively wide patches are formed that are connected to gate regions 6 and that allow a via connection with an upper-lying metal layer. The finger-shaped metal structures connected to gate regions 6, if used, are referred to as gate runners.
Drain regions 5 can also be connected to finger-shaped metal structures for reducing Ohmic losses and/or resistance. Typically, drain regions 5 are sufficiently wide to allow a via connection with an upper-lying metal layer.
Clock generator 13A generates a clock signal, such as a pulse signal, having a constant frequency but with a phase offset that depends on the received phase value. The generated digital word and generated clock signal are fed to a second logic unit 14A that generates control signals to be fed to the transistor cells 4A of transistor 1A. Second logic unit 14A comprises a plurality of cells 141A, wherein each cell 141A generates a respective control signal for a respective transistor cell 4A in dependence of the clock signal and a respective bit of the generated digital word. For example, the control signal may have an active level when both the corresponding bit of the generated digital word and the clock signal have a logical high value, and an inactive level when either the corresponding bit of the generated digital word or the clock signal has a logical low value.
Primary digital word generator 12B_1 generates a first digital word based on the received I signal and secondary digital word generator 12B_2 generates a second digital word based on the received Q signal.
Primary and secondary second logic unit 14B_1, 14B_2 operate as second logic unit 14A of digital amplifier 20A shown in
For proper control of the output power, and to achieve high gain and efficiency values for the digital amplifier, it is important that the transistor inputs can be driven separately. The Applicant has found that these objectives are difficult to achieve with the layout of the transistor shown in
US 2003/218185A1 discloses a semiconductor device using an emitter top heterojunction bipolar transistor formed above a semiconductor substrate and having a planar shape in a ring-like shape. A structure is provided in which a base electrode is present only on an inner side of a ring-like emitter-base junction region.
An object of the present disclosure is to provide a digital RF amplifier in which the abovementioned problem is at least partially solved. This object is achieved with a digital RF amplifier as defined in claim 1 that is characterized in that the transistor is a circular transistor of which the control terminal and the output terminal of each transistor cell have a circular geometry and are concentrically arranged.
The Applicant has found that electromagnetic coupling between ends of adjacently arranged gate regions, as indicated in region R in
The driver can be configured, when setting the signal level at a given output to the active level, to drive the at least one transistor cell corresponding to said given output into saturation. According to the disclosure, each output of the driver is connected to a respective transistor input. However, each transistor output can be connected to one or a plurality of transistor cells. Additionally or alternatively, all transistor cells are identical.
The control terminals of the plurality of transistor cells may have equal widths measured along a circumferential direction. Similarly, the control terminals of the plurality transistor cells may have equal lengths measured in a radial direction.
The driver can be configured to set a signal level at the outputs such that the number of outputs for which the signal level is set to the active level corresponds to a signal amplitude of the analog RF signal to be outputted. This is particularly useful when the total width of the control terminal associated with each transistor cell is identical. However, the total width of the control terminal for the transistor cells may be different. For example, by using a combination of relatively small and large transistor cells, an improvement in resolution can be obtained with respect to the signal amplitude. For example, in an embodiment wherein 5 transistor inputs are used that are each connected to a single transistor cell, and if 5 transistor cells are used that can output 1 W, 2 W, 2 W, 5 W, 10 W, respectively, it becomes possible to generate an analog RF output signal having a power between OW and 20 W with increments of 1 W. In an embodiment wherein 5 transistor cells are used that are each connected to a respective transistor input, and that can each output 4 W, it becomes possible to generate an analog RF output signal having a power between OW and 20 W with increments of 4 W. This improvement in resolution can also be used if the 5 transistor inputs are connected to respectively 1, 2, 2, 5, and 10 transistor cells that each have a saturated output power of 1 W.
The digital amplifier may further comprise a conductive semiconductor substrate on which an epitaxial layer is arranged. The transistor can be integrated on and/or in the epitaxial layer, wherein the common terminals of all transistor cells are electrically connected to the conductive semiconductor substrate by means of one or more vias or highly doped regions extending between the common terminals and the conductive semiconductor substrate. Furthermore, the transistor cells may each form a Silicon-based laterally diffused metal oxide semiconductor, LDMOS, transistor. A width of the smallest control terminal among the transistor cells may then lie in a range between 10 and 100 micrometer, preferably between 10 and 50 micrometer.
Alternatively, the digital amplifier may comprise an isolating semiconductor substrate on which an epitaxial layer is arranged, wherein the transistor is integrated on and/or in the epitaxial layer. The transistor may further comprise a further transistor output electrically connected to the common terminals of the plurality of transistor cells. The transistor cells may each form a Gallium Nitride-based high electron mobility transistor. A width of the smallest control terminal among the transistor cells may then lie in a range between 10 and 100 micrometer, preferably between 10 and 50 micrometer.
For each transistor cell, the control terminal may surround the output terminal. For each such transistor cell the control terminal may comprise an island that extends radially away from a remainder of the control terminal through a passage between two regions of the common terminal of that transistor cell or over the common terminal of that transistor cell.
Alternatively, for each transistor cell the output terminal may surround the control terminal. A connection between each transistor input and a control terminal it is connected to may extend over the output terminal that corresponds to that control terminal and is separated from that output terminal by one or more dielectric layers.
In case the output terminal surrounds the control terminal and the abovementioned isolating semiconductor substrate is used, a connection between the further transistor output and a common terminal it is connected to may extend over the control terminal and the output terminal that corresponds to that common terminal and may be separated from the control terminal and the output terminal by one or more dielectric layers.
The driver may be flip-chipped onto the transistor. To this end, the transistor inputs of the transistor may each comprise a respective pad, and the outputs of the driver may each comprise a respective pad, wherein the pad of each transistor input is connected to the pad of a respective output of the driver, for example using a solder ball or other type of conductive connection. The solder balls may have a diameter ranging from 10 to 80 micrometer.
According to a second aspect of the present disclosure, a digital transmitter is provided that comprises an antenna and the digital RF amplifier described above, wherein the digital RF amplifier is configured to output the analog RF signal to the antenna.
Next, example embodiments will be described in more detail referring to the appended drawings, wherein identical or similar components will be referred to using identical reference signs.
Transistor cell 100A corresponds to an LDMOS transistor and comprises a gate pad 102 that connects to a ring-shaped gate region 106. In
Ring-shaped gate region 106 is typically realized using a relatively thin conductive layer, such as a polysilicon layer, whereas gate pad 102 is realized using a relatively thick layer. To this end, transistor cell 100A is realized using a layer stack of conductive layers, wherein the upper layers are relatively thick. Connection between the different layers of the layer stack is possible using well-known vias.
As may be appreciated from the figure, gate regions 106 of neighboring transistor cells 100A are much less likely to couple electromagnetically when compared to the known transistor cell layout shown in
In this example, it is assumed that the conductive substrate on which transistor cell 100A is realized is conductive. This allows a connection of source region 107 to ground through the substrate. In case the substrate is isolating, a via extending through the substrate could be used provided such technology is available for the semiconductor material system that is used for transistor cell 100A. For LDMOS transistors, the substrate typically comprises conductive Silicon substrates.
Typical dimensions of transistor cell 100A include an inner diameter of source region 107 in a range between 4 and 12 micrometer, an outer diameter of ring-shaped gate finger 106 in a range between 4 and 12 micrometer, and an outer diameter of circular drain patch 105 in a range between 1.5 and 4 micrometer. Typically, a source-gate separation lies in a range between 0.7 and 5, and a gate-drain separation in a range between 1 and 4 micrometer.
It is further noted that transistor cell 100A is realized on a Silicon semiconductor die having a conductive substrate and one or more epitaxial layers formed thereon. A cross section taken along line L1 corresponds to the cross section of known LDMOS transistors.
In this embodiment, connection between source patch 107 and ground is realized through source pad 107B. This transistor cell 100B can therefore be used on isolating substrates.
Transistor cells 100B are typically spaced apart from each other in such a manner that drain regions 105 do not touch each other.
Similar to transistor cell 100A, the transistor action is localized within the circular geometry of the transistor cell 100B itself and does not interfere with the transistor action of an adjacent transistor cell 100B.
To prevent short-circuits between the various contacts in transistor cells 100A, 100B, dielectric crossovers or air-bridges may be used in a manner known in the art.
It is further noted that transistor cell 10BA is realized on a Gallium Nitride, GaN, die having a isolating substrate and one or more epitaxial layers formed thereon. A cross section taken along line L2 corresponds to the cross section of known GaN HEMTs.
A transistor in accordance with the present disclosure comprises a plurality of transistor cells, such as transistor cell 100A or transistor cell 100B. Such transistor can be used in the topology of
A semiconductor die 210, in or on which the transistor in accordance with the present disclosure is integrated, is arranged on die pad 205. In
On the top surface of semiconductor die 210 a pad 211 is provided that is electrically connected to the transistor output and therefore to output terminals 105 of the various transistor cells of the LDMOS transistor. Pad 211 is connected, using a bondwire 212, to a pad (not shown) on PCB 201. This latter pad is connected to pad 203 through a via 207.
On the top surface of semiconductor die 210 a pad 213 is provided that is electrically connected, through a bondwire 214, to a pad (not shown) on PCB 201. This latter pad is connected to pad 202 through a via 208.
Pad 213 is electrically connected to a solder ball 215 that makes a connection to the input of the driver 10 that is integrated on and/or in semiconductor die 216, which is flip-chipped onto semiconductor die 210. The outputs of driver 10 are connected, using solder balls 217, to the transistor inputs of the LDMOS transistor realized on semiconductor die 210.
It should be noted that other connections, such as a connection for providing a supply voltage, are not shown in
In the above, detailed embodiments were explained. However, the present disclosure is not limited to these embodiments. Various modifications are possible without deviating from the scope of the present disclosure, which is defined by the appended claims and their equivalents.
Number | Date | Country | Kind |
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2032932 | Sep 2022 | NL | national |