1. Field of the Invention
The present invention relates to a discharge element substrate, a recording head, and a recording apparatus.
2. Description of the Related Art
With an inkjet recording head, ink is discharged from a discharge opening using energy emitted from a discharge element. Japanese Patent Laid-Open No. 2010-155452 discloses a configuration in which transistors are respectively arranged between the discharge element and a first power supply line, and between the discharge element and a second power supply line. Accordingly, the voltage applied to the discharge element is less likely to be influenced by voltage fluctuation of the first power supply line and voltage fluctuation of the second power supply line.
With a configuration in which two transistors are arranged for each discharge element as in Japanese Patent Laid-Open No. 2010-155452, the transistor size is increased in order to raise the driving capability, thus leading to upsizing of the substrate.
The present invention provides a technique advantageous to improving the capability to drive discharge elements, and downsizing the discharge element substrate.
One of aspects of the present invention provides a discharge element substrate comprising a first power supply line, a second power supply line, and a plurality of discharge element units, wherein each of the plurality of discharge element units includes a common transistor, a plurality of discharge elements, and a plurality of individual transistors, in each of the plurality of discharge element units, one of a source and drain of the common transistor is connected to the first power supply line, first nodes of the plurality of discharge elements are connected to other of the source and drain of the common transistor, one of a source and drain of each of the plurality of individual transistors is connected to a second node of a corresponding discharge element of the plurality of discharge elements, other of the source and drain of each of the plurality of individual transistors is connected to the second power supply line in common, and, a channel width of the common transistor is greater than a channel width of each of the plurality of individual transistors, an arrangement direction of the plurality of discharge element units and an arrangement direction of the plurality of discharge elements in each of the discharge element units are a first direction, the first power supply line and the second power supply line extend in the first direction, and a width of the second power supply line when viewed in the first direction is greater than a width of the first power supply line when viewed in the first direction.
Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
Hereinafter, the present invention will be described by way of exemplary embodiments with reference to the accompanying drawings.
The discharge element substrate 100 includes a first power supply line 108 that is connected to a first power supply terminal (first power supply pad) 104, a second power supply line 109 that is connected to a second power supply terminal (second power supply pad) 105, and multiple discharge element units 120. Each discharge element unit 120 can include a common transistor 102, multiple discharge elements 101, and multiple individual transistors 103. One of the source and drain of the common transistor 102 is connected to the first power supply line 108. First nodes of the discharge elements 101 are connected to the other of the source and drain of the common transistor 102. One of the source and drain of each of the individual transistors 103 is connected to the second node of a corresponding discharge element 101 out of the discharge elements 101. Out of the source and drain of each of the individual transistors 103, the other is connected to the second power supply line 109 in common. The gate of the common transistor 102 receives a bias voltage via a third power supply terminal (third power supply pad) 106.
The discharge element substrate 100 can further include a control unit 110 that generates control signals CS that are supplied to the gates of the individual transistors 103. The control unit 110 has multiple control circuits 112, and each control circuit 112 corresponds to one individual transistor 103. The control circuits 112 supply the control signals CS to the gates of the corresponding individual transistors 103. The control circuits 112 that constitute the control unit 110 generate the control signals CS such that current does not flow to multiple discharge elements 101 in each discharge element unit 120 at the same time. Specifically, the control circuits 112 that constitute the control unit 110 generate the control signals CS such that the individual transistors 103 in each discharge element unit 120 are switched on in mutually different periods.
In one example, the common transistor 102 is constituted by a PMOS transistor, the individual transistors 103 are constituted by NMOS transistors, a ground voltage GNDH is supplied to the first power supply line 108, and a positive voltage VH is supplied to the second power supply line 109. In another example, the common transistor 102 is constituted by an NMOS transistor, the individual transistors 103 are constituted by PMOS transistors, a positive potential VH is supplied to the first power supply line 108, and a ground potential GNDH is supplied to the second power supply line 109. In yet another example, the common transistor 102 and the individual transistors 103 are constituted by bipolar transistors, and in this case, the gates, drains, and sources are respectively replaced with bases, emitters, and collectors.
In the example shown in
Next, a preferable design for the common transistor 102 and the individual transistors 103 will be described. It is preferable that the channel width of the common transistor 102 is greater than the channel widths of each of the individual transistors 103. The reason for this will be described below. The one common transistor 102 is provided in common for the discharge elements 101 of each discharge element unit 120. Accordingly, even if the channel width of the common transistor 102 is increased, this has little influence on an increase in the size of the discharge element substrate 100. Specifically, letting X be the increase in the channel width of the common transistor 102, and n be the number of discharge elements 101 in one discharge element unit 120, an increase in the size of the discharge element substrate 100 per discharge element 101 is suppressed to X/n. In this case, the driving capability of the common transistor 102 with respect to the discharge elements 101 can be increased by increasing the channel width of the common transistor 102.
In each discharge element unit 120, the individual transistors 103 are switched on in mutually different periods. In other words, in each discharge element unit 120, when one individual transistor 103 is on, the other individual transistors 103 are off. The value of the current flowing in the individual transistor 103 that is switched on is a value obtained by subtracting the value (sum) of the current flowing in the individual transistors 103 that are switched off from the value of the current that flows in the common transistor 102. In other words, the value of the current flowing in the individual transistor 103 that is switched on can be increased by reducing the value of the current flowing in the individual transistors 103 that are switched off. The reduction of the value of the current flowing in the individual transistors 103 that are switched off can be realized by increasing the resistance value of the individual transistors 103 that are switched off (e.g., reducing the channel width of these individual transistors 103). Note that in general, the on resistance value and off resistance value of a transistor are proportional to the channel width of that transistor. In this case, if the channel width of an individual transistor 103 is reduced, the on resistance value of the individual transistor 103 also increases, but since the on resistance value is sufficiently small, it is possible to ignore the reduction in the driving capability with respect to the individual transistors 103 caused by reducing the channel width.
As described above, it is advantageous to increase the channel width of the common transistor 102 and decrease the channel width of the individual transistors 103. As one guide, it can be said to be preferable to set the channel width of the common transistor 102 higher than the channel width of each of the individual transistors 103. This configuration is advantageous to improving the capability to drive the discharge elements 101, and downsizing the discharge element substrate 100.
The capability to drive the discharge elements 101 (driving capability) can be expressed by the value of current that can flow in the discharge elements 101. The common transistor 102 and the individual transistors 103 operate in a saturated region. The value of current that can flow in the discharge elements 101 is the value of the drain current of the common transistor 102 and the individual transistors 103 in the saturated region. A value IDi of the drain current of the common transistor 102 in the saturated region and a value IDc of the drain current of the individual transistors 103 in the saturated region are expressed by Equations 1 below. In these equations, βc represents the gain coefficient of the common transistor 102, and βi represents the gain coefficient of the individual transistors 103. Also, VGSc represents the gate-to-source voltage of the common transistor 102, and VGSi represents the gate-to-source voltage of the individual transistors 103. Also, VTHc represents the threshold voltage of the common transistor 102, and VTHi represents the threshold voltage of the individual transistors 103.
IDc=(βc/2)·(VGSc−VTHc)2
IDi=(βi/2)·(VGSi−VTHi)2 (Eq. 1)
As shown by Equations 1, the driving capability with respect to the discharge elements 101, that is to say the drain currents IDc and IDi, can be increased by increasing the gain coefficients βc and βi. The gain coefficients βc and βi are expressed by Equations 2 below. In these equations, Wc represents the channel width of the common transistor 102, Wi represents the channel width of the individual transistors 103, Lc represents the channel length of the common transistor 102, and Li represents the channel length of the individual transistors 103. Also, μc represents the carrier mobility in the common transistor 102 and μi represents the carrier mobility in the individual transistors 103. Also, COX represents the capacitor per unit area of the gate of the common transistor 102 and the individual transistors 103.
βc=(Wc/Lc)·μc·COX
βi=(Wi/Li)·μi·COX (Eq. 2)
As described above, as one guide, it is preferable that the channel width Wc of the common transistor 102 is greater than the channel width Wi of each of the individual transistors 103. Alternatively, as another guide, the relationship Wc/Lc>Wi/Li or βc>βi may be applied. In other words, satisfying Wc/Lc>Wi/Li or βc>βi is also advantageous to improving the capability to drive the discharge elements 101, and downsizing the discharge element substrate 100.
In one example, the common transistor 102 can be arranged such that its channel width direction (the direction extending along the channel width) matches the first direction, and the individual transistors 103 can be arranged such that their channel width direction (direction extending along the channel width) matches the second direction. In other words, the common transistor 102 can be arranged such that the direction of current flowing therein matches the second direction, and the individual transistors 103 can be arranged such that the direction of current flowing therein matches the first direction.
The first power supply line 108 connects the first power supply terminal 104 to the drain of the common transistor 102 in each of the discharge element units 120. The second power supply line 109 connects the second power supply terminal 105 to the drains of the individual transistors 103 in each discharge element unit 120. The discharge elements 101 can be connected to the common transistor 102 and the individual transistors 103 by connection lines arranged in a first interconnect layer, for example. The first power supply line 108 and the second power supply line 109 can be arranged in a second interconnect layer arranged above the first interconnect layer. The first power supply terminal 104 can be arranged in the vicinity of the end portion of the first power supply line 108 on the first direction side, and the second power supply terminal 105 can be arranged in the vicinity of the end portion of the second power supply line 109 on the first direction side.
In the example shown in
In the example shown in
While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
This application claims the benefit of Japanese Patent Application No. 2014-100784, filed May 14, 2014, which is hereby incorporated by reference herein in its entirety.
Number | Date | Country | Kind |
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2014-100784 | May 2014 | JP | national |
Number | Name | Date | Kind |
---|---|---|---|
6890048 | Hirayama | May 2005 | B2 |
7044572 | Hirayama | May 2006 | B2 |
8226190 | Hirayama et al. | Jul 2012 | B2 |
20050264608 | Hirayama | Dec 2005 | A1 |
Number | Date | Country |
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2004-050742 | Feb 2004 | JP |
2010-155452 | Jul 2010 | JP |