Claims
- 1. A cleaning composition comprising:
- (a) detersive surfactant and
- (b) poly(amino acid) compound or precursor thereof protected from contact with a degradation-causing level of alkalinity:
- wherein the poly(amino acid) compound or precursor is in a form selected from the group consisting of:
- poly(amino acid) compounds or precursors coated with an additional carboxylic acid compound, a water-soluble polymer capable of forming a film, or mixtures thereof;
- poly(amino acid) compounds or precursors agglomerated with an alkaline compound, an alkaline-reacting compound, or mixtures thereof, wherein the alkaline compound, alkaline-reacting compound, or mixture thereof is present in an amount that is equimolar or less with respect to the poly(amino acid) constituent monomer units or precursor thereof;
- poly(amino acid) compounds or precursors spray-granulated in admixture with nonionic surfactant, wherein the nonionic surfactant comprises the detersive surfactant component (a) or a surfactant other than the detersive surfactant component (a); and
- poly(amino acid) compounds or precursors encapsulated with silicone resin.
- 2. A composition according to claim 1 in which the alkaline-reacting compound is a salt selected from the group consisting of carbonates, bicarbonates, silicates and mixtures thereof.
- 3. A composition according to claim 1 in which the poly(amino acid) compound is selected from the group consisting of polyaspartic acid and salts thereof, polyglutamic acid and salts thereof, and mixtures thereof.
- 4. A composition comprising a poly(amino acid) compound or precursor coated with a carboxylic acid compound according to claim 1 wherein the carboxylic acid compound comprises a monomer, oligomer or copolymer of an aliphatic or aromatic carboxylic acid.
- 5. A composition according to claim 4 in which the carboxylic acid compound comprises a monomeric aliphatic carboxylic acid.
- 6. A composition comprising poly(amino acid) compound or precursor coated with a water-soluble polymer capable of forming a film according to claim 1 in which the water-soluble polymer is selected from the group consisting of cellulose ethers, starches, starch ethers, homopolymers of carboxylic acids and salts of such homopolymers, copolymers of carboxylic acids and salts of such copolymers, carbon-chain polymers having nonionic hydrophilic groups, and mixtures thereof.
- 7. A composition according to claim 1 in which the poly(amino acid) precursor is polysuccinimide.
- 8. A composition according to claim 1 further comprising at least one additional ingredient selected from the group consisting of builders, bleaches, bleach activators, enzymes, polymeric soil-releasing agents, chelating agents, brighteners, suds suppressors, pH-buffering agents, dyes, and dye transfer inhibition agents.
- 9. A composition according to claim 1 comprising 0.1 to 50% by weight of the composition of poly(amino acid) compound or precursor thereof, and up to 70% by weight of the composition of detersive surfactant.
- 10. A cleaning composition according to claim 1 which contains no bleach.
- 11. A non-alkaline cleaning composition comprising detersive surfactant and a poly(amino acid) compound or precursor.
- 12. A cleaning composition according to claim 11 which contains no bleach.
- 13. A poly(amino acid) compound or precursor thereof protected from contact with a degradation-causing level of alkalinity and selected from the group consisting of:
- poly(amino acid) compounds or precursors coated with an additional carboxylic acid compound, a water-soluble polymer capable of forming a film, or mixtures thereof,
- poly(amino acid) compounds or precursors agglomerated with an alkaline compound, an alkaline-reacting compound, or mixtures thereof, wherein the alkaline compound, alkaline-reacting compound, or mixture thereof is present in an amount sufficient to effect complete neutralization of the poly(amino acid) compound or a precursor-derived poly(amino acid) compound, without causing degradation thereof;
- poly(amino acid) compounds or precursors spray-granulated in admixture with nonionic surfactant wherein the nonionic surfactant can be the detersive surfactant of component (a) or an additional nonionic surfactant; and
- poly(amino acid) compounds or precursors encapsulated with silicone resin.
- 14. A process for producing a poly(amino acid) compound in the form of an agglomerate according to claim 13 comprising the steps of:
- (a) mixing an alkaline compound, an alkaline-reacting compound, or mixture thereof with a precursor that is converted into the poly(amino acid) compound under alkaline conditions, and
- (b) agglomerating the alkaline compound, alkaline-reacting compound or mixture thereof and the precursor in the presence of sufficient moisture for the conversion to proceed,
- wherein the alkaline compound, alkaline-reacting compound, or mixture thereof is present in an amount sufficient to effect complete neutralization of the poly(amino acid) compound derived from its precursor without causing degradation thereof.
- 15. A process according to claim 14 in which the poly(amino acid) precursor is polysuccinimide.
- 16. An agglomerate of poly(amino acid) compound or precursor with alkaline-reacting compound according to claim 13.
- 17. An agglomerate according to claim 16 comprising an alkaline-reacting salt selected from the group consisting of carbonates, bicarbonates, and silicates.
- 18. An agglomerate according to claim 16 further comprising nonionic surfactant and zeolite.
- 19. A poly(amino acid) compound or precursor thereof protected from contact with a degradation-causing level of alkalinity by a stabilization method such that the amount of degradation of the poly(amino acid) compound or precursor thereof is less than 50% over an 8 week storage period under conditions of 32.2.degree. C. and 80% relative humidity.
Priority Claims (1)
Number |
Date |
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Kind |
9226942 |
Dec 1992 |
GBX |
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Parent Case Info
This is a continuation of application Ser. No. 08/454,335, filed Jun. 16, 1995, now abandoned which is a 371 of PCT/US93/1290, filed Dec. 13, 1993.
US Referenced Citations (12)
Foreign Referenced Citations (1)
Number |
Date |
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0454126 |
Oct 1991 |
EPX |
Continuations (1)
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Number |
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Parent |
454335 |
Jun 1995 |
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