The present invention relates to an image display device which utilizes emission of electrons into vacuum, and more particularly to the electrode structure which protects a drive circuit system.
Recently, as an image display device which exhibits high brightness and high definition, a color cathode ray tube has been popularly used. However, along with the recent efforts for achieving high image quality in information processing equipment and television broadcasting, a demand for a planar display (panel display) which is lightweight and space-saving while having favorable characteristics such as high brightness and high definition is increasing.
As a representative example, a liquid crystal display device, a plasma display device and the like have been commercially available. Further, with respect to the image display device which aims at high brightness particularly, various types of panel-type display devices such as a display device which makes use of emission of electron in vacuum from electron sources (hereinafter referred to as an electron emission type display device or a field emission type display device, hereinafter abbreviated as FED) and an organic EL display device which features low power consumption.
Further, there has been also known the structure which provides insulating space holding members ISP between the back substrate SUB1 and the face substrate SUB2 to hold a distance of given size between the back substrate SUB1 and the fade substrate SUB2. Here, with respect to these types of prior art, for example, following Patent Document 1 and Patent Document 2 can be named.
[Patent Document 1]
Japanese Unexamined Patent Publication Hei 10-134701
[Patent Document 2]
Japanese Unexamined Patent Publication 2000-306508
In the FED having such a constitution, the control electrode G1 which has electron passing holes EHL is provided between the cathodes K which are formed on the cathode line CL on the back substrate SUB1 and the anode ADE which is formed on the face substrate SUB2, wherein by imparting the given potential difference to the control electrode G1 with respect to the cathode line G1, electrons E are pulled out from the cathodes K and the electrons E are made to pass through the electron passing holes EHL and are made to impinge on the phosphors at the anode ADE side thus performing an image display.
However, the FED having such a constitution is configured to define a space size of approximately several mm between opposing surfaces of the anode ADE and the cathode line CL and, to make the phosphors PHS efficiently emit light, a high voltage of approximately 5 kV to 30 kV is applied to the anode ADE, a voltage of approximately 1 kV or less is applied to the control electrode G1, and a voltage of several hundreds V is applied to the cathodes K. Due to such a constitution, in the FED, the anode voltage is relatively high compared to other various electrode voltages and hence, there has always existed a possibility that an abnormal discharge is generated between the anode ADE and other electrode with some probability.
Further, in the FED having the electrode structure shown in
Since the control electrode G1 and the cathodes K are usually driven by matrix driving in the FED to overcome such a drawback, in each drive circuit, it is necessary to take countermeasure to prevent the abnormal discharge for every-row line and every-column line. Accordingly, it is necessary to provide elements of each drive circuit in number which corresponds to the number of lines and hence, this becomes a factor for pushing up a cost of parts. Further, with respect to the drive circuit having the sufficient dielectric strength characteristics, since the dielectric strength characteristics are abnormally high with respect to a rated voltage, the cost of the drive circuit elements per se becomes substantially equal to the cost of elements for high drive voltage thus also pushing up the cost. Here, conventionally, there has been found no countermeasures which are provided for preventing the generation of the abnormal discharge from this point of view.
Accordingly, the present invention has been made to solve the above-mentioned conventional drawbacks and it is an object of the present invention to provide an image display device which can absorb a high voltage when an abnormal discharge is generated between an anode and respective other electrodes and hence, a dielectric strength of each drive circuit can be suppressed low whereby a cost of drive circuit elements can be reduced. Further, it is another object of the present invention to provide an image display device which can enhance the quality and the reliability by suppressing the generation of the abnormal discharge.
To achieve the above-mentioned objects, in the image display device of the present invention, by arranging a surge current absorbing electrode having apertures which allow electrons to pass therethrough between opposing surfaces of the anode and the control electrode, the high voltage at the time of generation of the abnormal discharge can be absorbed.
In the above-mentioned constitution of the present invention, it is desirable that the surge current absorbing electrode is formed of a plate-like electrode which has a plurality of electron beam passing holes which allow electrons to pass therethrough at regions which correspond to the electron passing holes formed in the control electrode and, at the same time, a DC bias power source and a spark gap are connected in parallel between the plate-like electrode and a ground surface whereby the high voltage at the time of generation of the abnormal discharge can be absorbed.
Further, it is desirable that the surge current absorbing electrode is formed of a plate-like electrode which has a plurality of electron beam passing holes which allow electrons to pass therethrough at regions which correspond to the electron passing holes formed in the control electrode and, at the same time, a DC bias power source and a Zener diode are connected in parallel between the plate-like electrode and a ground surface whereby the high voltage at the time of generation of the abnormal discharge can be absorbed.
Here, it is needless to say that the present invention is not limited to the above-mentioned constitution and the constitutions of respective embodiments described later and various modifications can be made without departing from the technical concept of the present invention.
Preferred embodiments of the present invention are explained in detail in conjunction with drawings which show embodiments.
Further, above the back panel PN1, control electrodes G1 are arranged to face the back panel PN1 in a non-contact state. The control electrodes G1 cross the cathode lines CL in a non-contact state and extend in the x direction, are arranged in parallel in the y direction, and form pixels at portions thereof which cross cathode lines CL. Further, the control electrodes G1 have a plurality of electron passing apertures EHL in the pixels which allow electrons E emitted from the cathodes K to pass therethrough toward the face panel PN2 side.
Further, above the control electrodes G1, a surge current absorbing electrode G2 which has electron beam passing holes AHL for allowing the respective electron beams EB to pass therethrough in regions which face the respective electron passing apertures EHL formed in the control electrodes G1 is arranged to face an anode ADE in a non-contact state. Further, to the surge current absorbing electrode G2, a spark gap SG which is formed with an electrode gap of several μm to several tens μm between the spark gap SG and a ground surface is connected.
Here, the surge current absorbing electrode G2 is, for example, mounted on and fixed to an inner surface side of the face substrate SUB2 using a holding member not shown in the drawing and the spark gap SG is configured to be mounted on and fixed to the inner surface side of the back substrate SUB1.
Here, the cathode line CL is, for example, formed by patterning a conductive paste including silver or the like by printing and, thereafter, by baking the patterned paste. Further, to form the cathodes K which are arranged above (the face substrate SUB2 side) the crossing portions of the cathode lines CL with the control electrodes G1, for example, carbon nanotubes (CNT) are used. As one example, the cathodes K are formed by patterning a paste including silver, boron, carbon nanotubes (Ag—B—CNT paste) by printing and by baking the printed paste.
Further, the control electrodes G1 and the surge current absorbing electrode G2 are formed by forming a large number of circular electron passing apertures EHL and a large number of circular electron beam passing holes AHL in thin plates formed of a conductive metal plate material made of, for example, nickel, by a etching process using a photolithography method.
On the other hand, in the z direction with respect to the back panel PN1, the face panel PN2 is laminated to the back panel PN1 in the vertical direction with a given gap therebetween using a frame body not shown in the drawing. The face panel PN2 is constituted such that phosphors PHS which are divided by a black matrix BM and an anode ADE are formed in an inner surface of the face substrate SUB2 which is formed of a light transmitting insulation substrate such as a glass plate or the like. Further, on the surface of the front substrate SUB2 which faces the anode ADE, the surge current absorbing electrode G2 having the electron beam passing holes AHL which allow the electron beams EB to pass therethrough is arranged in a non-contact state, wherein a gap between the back panel PN1 and the face panel PN2 is held at a given gap and the inside thereof is sealed to create a vacuum therein.
In the FED having such a constitution, a DC power source DCA which applies a high voltage of approximately 5 to 30 kV is connected to the anode ADE and a DC bias power source DCG which applies a current bias voltage Vf of approximately 1 kV is connected to the surge current absorbing electrode G2. In this case, the DC bias power source DCG is configured to be connected in parallel with the spark gap SG with respect to the ground surface. Further, to the cathodes K and the control electrodes G1, although not shown in the drawing, pulse voltages Vk, Vg of approximately several 100 V which perform matrix driving from respective driving circuits are supplied in response to respective driving timings.
Here, assuming a rated amplitude voltage as Vs, dielectric strengths of respective driving circuits as Vmax, a DC bias voltage of the surge current absorbing electrode G2 as Vf, a dielectric strength of a spark gap SG (the charging start voltage) as Vo, the dielectric strength of the spark gap SG is acceptable when the relationship that Vs, Vf, Vmax are Vs, Vf<Vo<Vmax is satisfied.
In such a constitution, an abnormal discharge is generated between the anode ADE and the surge current absorbing electrode G2. Here, although the voltage of the surge current absorbing electrode G2 increases from the initially set DC bias voltage Vf, when the potential of the surge current absorbing electrode G2 exceeds the dielectric strength Vo of the spark gap SG, the surge current flows and the spark gap SG is short-circuited with the ground surface and is absorbed and hence, the potential of the surge current absorbing electrode G2 hardly becomes higher than Vo.
As a result, the discharge is hardly generated between the surge current absorbing electrode G2 and the control electrode G1 and the cathode K and hence, the dielectric strength of respective driving circuits of the control electrode G1 and the cathode K can be set at a low level. Further, since Vo is set such that Vo<Vmax, even when a discharge is generated between the surge current absorbing electrode G2 and the control electrode G1 and the cathode K by any chance, respective driving circuits are hardly damaged.
In such a constitution, when FED is made large-sized, to hold a gap between the cathodes K and the anode ADE, it is necessary to provide insulating spacers as gap holding members. To stabilize the face potential of these insulating spacers and to minimize the influence of the face potential to the electron beams EB, it is effective to use conductive spacers CSP. In this case, although the current flows in the conductive spacers CSP, by connecting low potential side to the constant voltage surge current absorbing electrode G2, the flow of the spacer current to respective driving circuits can be prevented. Accordingly, it is no more necessary to increase the rated current of the respective driving circuits.
Here, in these surge current absorbing electrodes G21, G22, G23, the electron beam passing holes AHL1, AHL3 and the electron beam passing holes AHL2 are formed in a conductive thin plate material such as a nickel plate or the like, for example, by etching using a photolithography method or press forming.
Also with the use of these constitutions, when an abnormal discharge is generated between the anode and the cathode and the control electrode, a high voltage can be absorbed by each one of the surge current absorbing electrodes G21, G22, G23 to which the DC bias power DCG is connected and hence, the risk that the high voltage is applied to each driving circuit can be eliminated.
Here, the above-mentioned surge current absorbing electrodes G21, G22, G23 may be also used as focusing electrodes of electron beams. Further, the respective surge current absorbing electrodes G21, G22, G23 may be constituted such that the potentials thereof are set to be operated as accelerating electrodes with respect to the cathode K, the control electrode G1 and the emission of electrons from the cathodes K may be conducted by the triode operation.
Here, although, in the above-mentioned respective embodiments, the explanation has been made with respect to the case in which the spark gap SG is used as the discharge electrode between respective surge current absorbing electrodes G21, G22, G23 and the ground surface, the present invention is not limited to such a constitution and, even when a Zener diode having a Zener voltage which exceeds a current bias voltage Vf is used in each of the embodiment instead of the spark gap SG, as shown in
Here, although, in the above-mentioned respective embodiments, the explanation has been made with respect to the case in which the present invention is applied to the field emission display (FED) using carbon nanotubes (CNT) as the electron sources as the image display device, it is needless to say that the present invention is not limited to such an application and even when the present invention is applied to a field emission panel display using other electron source structure, the exactly same advantageous effects as mentioned above can be obtained.
As explained heretofore, according to the image display device of the present invention, when the abnormal discharge is generated between the anode and each electrode, by making the surge current absorbing electrode absorb the high voltage, the risk that the high voltage is applied to each driving circuit can be eliminated and hence, the dielectric strength of driving circuits can be suppressed at a low level whereby the cost of the driving circuit elements can be suppressed. Further, since it is no more necessary to use the driving circuit elements having high dielectric strength characteristics, the cost of the set can be reduced and, at the same time, the generation of the abnormal discharge can be prevented whereby the extremely excellent advantageous effects including the enhancement of quality and reliability can be obtained.
Number | Date | Country | Kind |
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2003-156778 | Jun 2003 | JP | national |
Number | Name | Date | Kind |
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4614896 | Josephs et al. | Sep 1986 | A |
5760535 | Moyer et al. | Jun 1998 | A |
6078205 | Ohsawa et al. | Jun 2000 | A |
6580223 | Konishi et al. | Jun 2003 | B2 |
Number | Date | Country |
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10-134701 | May 1998 | JP |
10-255692 | Sep 1998 | JP |
2000-306508 | Nov 2000 | JP |
2003-0012154 | Feb 2003 | JP |
Number | Date | Country | |
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20040251811 A1 | Dec 2004 | US |