The present application claims priority to Chinese Patent Application No. 202310423575.3, filed on Apr. 19, 2023, the content of which is incorporated herein by reference in its entirety.
The present disclosure relates to the technical field of displays, and in particular to a display panel and a display apparatus.
With an active-array flat-panel display (FPD) technology, a display apparatus tends to be lighter, thinner, clearer, and larger in screen-to-body ratio. As an important component in the active-array FPD technology, an array base plate, namely a base plate including transistors arranged in an array, can drive pixels sequentially and accurately.
The array base plate has been widely applied to the fields of liquid crystal display (LCD), organic light-emitting diode (OLED), micro-LED, and mini-LED. Therefore, how to optimize performance and preparation of the existing display panel using the array base plate is an important research topic.
According to a first aspect, some embodiments of the present disclosure provide a display panel, and the display panel includes a first base plate. The first base plate includes a first substrate, a transistor array layer, a pixel electrode layer, a common electrode layer, a first inorganic insulating layer, and a second inorganic insulating layer. The transistor array layer is provided at a side of the first substrate. Both the pixel electrode layer and the common electrode layer are arranged at a side of the transistor array layer away from the first substrate. The transistor array layer includes a transistor, the pixel electrode layer includes a pixel electrode, and the common electrode layer includes at least one common electrodes. An insulating layer between the transistor array layer and one of the pixel electrode layer and the common electrode layer close to the transistor array layer is the first inorganic insulating layer. The second inorganic insulating layer is provided between the pixel electrode layer and the common electrode layer.
According to a second aspect, an embodiment of the present disclosure provides a display apparatus, and the display apparatus includes a display panel. The display panel includes a first base plate. The first base plate includes a first substrate, a transistor array layer, a pixel electrode layer, a common electrode layer, a first inorganic insulating layer, and a second inorganic insulating layer. The transistor array layer is provided at a side of the first substrate. Both the pixel electrode layer and the common electrode layer are arranged at a side of the transistor array layer away from the first substrate. The transistor array layer includes a transistor, the pixel electrode layer includes a pixel electrode, and the common electrode layer includes common electrodes. An insulating layer between the transistor array layer and one of the pixel electrode layer and the common electrode layer close to the transistor array layer is the first inorganic insulating layer. The second inorganic insulating layer is provided between the pixel electrode layer and the common electrode layer.
To describe the technical solutions of the embodiments of the present disclosure more clearly, the following briefly describes the accompanying drawings presented in the embodiments. The accompanying drawings in the following description show merely some examples of the present disclosure, and a person of ordinary skill in the art can still derive other drawings from these accompanying drawings.
For a better understanding of the technical solutions of the present disclosure, the following describes in detail the embodiments of the present disclosure with reference to the accompanying drawings.
The described embodiments are merely some but not all of the embodiments of the present disclosure. All other embodiments obtained by a person of ordinary skill in the art base plated on the embodiments of the present disclosure shall fall within the scope of the present disclosure.
Terms in the embodiments of the present disclosure are merely used to describe the embodiments, and are not intended to limit the present disclosure. Unless otherwise specified in the context, words, such as “a”, “the”, and “this”, in a singular form in the embodiments and appended claims of the present disclosure include plural forms.
It should be understood that the term “and/or” in this specification merely describes associations between associated objects, and it indicates three types of relationships. For example, A and/or B may indicate that A alone, A and B, or B alone. The character “/” in this specification generally indicates that the associated objects are in an “or” relationship.
In the description of this specification, it should be understood that the terms such as “substantially”, “approximate to”, “approximately”, “about”, “roughly”, and “in general” described in the claims and embodiments of the present disclosure mean general agreement within a reasonable process operation range or tolerance range, rather than an exact value.
It should be understood that although the terms such as first, second, and third may be used to describe regions in the embodiments of the present disclosure, these regions should not be limited to these terms. These terms are used only to distinguish the regions from each other. For example, without departing from the scope of the embodiments of the present disclosure, a first region may also be referred to as a second region, and similarly, a second region may also be referred to as a first region.
As shown in
The transistor array layer 12, the pixel electrode layer 13, and the common electrode layer 14 may be provided at a same side of the first substrate 11. The transistor array layer 12 includes multiple transistors 120, the pixel electrode layer 13 includes multiple pixel electrodes 130, and the common electrode layer 14 includes a common electrode 140.
Both the pixel electrode layer 13 and the common electrode layer 14 are provided at a side of the transistor array layer 12 away from the first substrate 11. The pixel electrode layer 13 and the common electrode layer 14 are prepared upon preparation of the transistor array layer 12. Along a direction Z perpendicular to a plane of the first substrate 11, the common electrodes 140 each cover at least two pixel electrodes 130, namely pixels to which a plurality of the pixel electrodes 130 belong share the common electrode 140.
The transistors 120 each may function as a switch. Referring to
An insulating layer between one of the pixel electrode layer 13 and the common electrode layer 14 close to the transistor array layer 12 and the transistor array layer 12 is the first inorganic insulating layer 15. That is, the insulating layer between one of the pixel electrode layer 13 and the common electrode layer 14 close to the transistor array layer 12 and the transistor array layer 12 only includes the inorganic insulating layer.
A surface of the first inorganic insulating layer 15 close to the first substrate 11 may come in contact with the transistor array layer 12, and a surface of the first inorganic insulating layer 15 away from the first substrate 11 may come in contact with one of the pixel electrode layer 13 and the common electrode layer 14 close to the transistor array layer 12.
For example, as shown in
For example, as shown in
In the embodiment of the present disclosure, the second inorganic insulating layer 16 is provided between the pixel electrode layer 13 and the common electrode layer 14. In some embodiments, an insulating layer between the pixel electrode layer 13 and the common electrode layer 14 is the second inorganic insulating layer 16. That is, the insulating layer between the pixel electrode layer 13 and the common electrode layer 14 only includes the inorganic insulating layer.
One of a surface of the second inorganic insulating layer 16 close to the first substrate 11 and a surface of the second inorganic insulating layer 16 away from the first substrate 11 may be in contact with the pixel electrode layer 13, and the other one of the surface of the second inorganic insulating layer 16 close to the first substrate 11 and the surface of the second inorganic insulating layer 16 away from the first substrate 11 may be in contact with the common electrode layer 14.
In the embodiments of the present disclosure, the insulating layer between one of the pixel electrode layer 13 and the common electrode layer 14 close to the transistor array layer 12 and the transistor array layer 12 serves as the inorganic insulating layer. The inorganic insulating layer is thinner than the organic insulating layer. Therefore, the display panel provided by the embodiments of the present disclosure can be thinner. The inorganic insulating layer is usually prepared by chemical deposition. The inorganic insulating layer has a lower cost and a simpler preparation process than the organic insulating layer, thereby reducing a preparation cost of the display panel. Meanwhile, the method for preparing the inorganic insulating layer does not produce a harmful substance to a device in the first base plate, thus improving a preparation yield of the display panel.
The insulating layer between the pixel electrode layer 13 and the common electrode layer 14 also includes the inorganic insulating layer. When preparing vias penetrating the first inorganic insulating layer 15 and the second inorganic insulating layer 16, the first inorganic insulating layer 15 and the second inorganic insulating layer 16 can be etched at the same time in a same etching process to form the vias in the first inorganic insulating layer 15 and the vias in the second inorganic insulating layer 16. Meanwhile, when the second inorganic insulating layer 16 includes vias not communicating with the via located in the first inorganic insulating layer 15, and the via can also be formed in the above etching process, which greatly reduces the etching process.
In some embodiments of the present disclosure, the first inorganic insulating layer 15 includes at least one of silicon oxide or silicon nitride. That is, the first inorganic insulating layer 15 may be a silicon oxide layer, a silicon nitride layer or a composite layer by stacking silicon oxide and silicon nitride. In some embodiments, the first inorganic insulating layer 15 may also be a layer including a mixture of the silicon oxide and the silicon nitride.
In some embodiments of the present disclosure, the second inorganic insulating layer 16 includes at least one of silicon oxide and silicon nitride. The second inorganic insulating layer 16 may be a silicon oxide layer, a silicon nitride layer, or a composite layer by stacking silicon oxide and silicon nitride. In some embodiments, the second inorganic insulating layer 16 may also be a layer including a mixture of the silicon oxide and the silicon nitride.
In an embodiment of the present disclosure, both the first inorganic insulating layer 15 and the second inorganic insulating layer 16 include silicon oxide, or silicon nitride. For example, the first inorganic insulating layer 15 is a composite layer by stacking silicon oxide and silicon nitride. The second inorganic insulating layer 16 is a silicon oxide layer or a silicon nitride layer.
Since the preparation process and patterning process of the silicon oxide and silicon nitride are very mature, when the first inorganic insulating layer 15 and the second inorganic insulating layer 16 include the silicon oxide and/or silicon nitride, the preparation difficulty of the display panel can be reduced. In addition, the silicon oxide and silicon nitride have a desirable compactness, can protect the device from water and oxygen, and can prevent mutual interference of conductive particles between the transistor array layer, the pixel electrode layer and the common electrode layer.
In an embodiment of the present disclosure, the first inorganic insulating layer 15 has a thickness of less than or equal to 6,000 angstroms. For example, the first inorganic insulating layer 15 may have a thickness of about 3,000 angstroms, about 2,000 angstroms, or about 1,000 angstroms.
In an embodiment of the present disclosure, the second inorganic insulating layer 16 has a thickness of less than or equal to 6,000 angstroms. For example, the second inorganic insulating layer 16 may have a thickness of about 3,000 angstroms, about 2,000 angstroms, or about 1,000 angstroms.
The first inorganic insulating layer 15 and the second inorganic insulating layer 16 each have the thickness of less than 6,000 angstroms, which can effectively shorten a preparation cycle of the display panel. Meanwhile, at least one of the vias of the first inorganic insulating layer 15 communicates with at least one of the vias of the second inorganic insulating layer 16. When these communicating vias are prepared in the etching process, the process difficulty is low and the process yield is high.
In an embodiment of the present disclosure, as shown in
The first inorganic insulating layer 15 is provided on the transistor array layer 12. With the larger thickness of the first inorganic insulating layer 15, the surface of the first inorganic insulating layer 15 away from the transistor array layer 12 is relatively flat, which can provide the flat bearing surface for the structure thereon.
With the smaller thickness of the second inorganic insulating layer 16, the display panel is lighter and thinner, and the preparation cycle of the first base plate is shortened. Since both the pixel electrode layer 13 and the common electrode layer 14 are relatively thin, the surface of the second inorganic insulating layer 16 away from the first inorganic insulating layer 15 is relatively flat, no matter whether the second inorganic insulating layer 16 is prepared upon preparation of the pixel electrode layer 13 or upon preparation of the common electrode layer 14, and there is no adverse risk to the process.
In an embodiment of the present disclosure, the transistor 120 includes a polysilicon semiconductor layer. In an embodiment of the present disclosure, the transistor in the transistor array layer 12 may be a low-temperature polysilicon transistor.
In the drawings of the following embodiment, the common electrode layer 14 is located between the pixel electrode layer 13 and the first substrate 11, for the sake of clarity. Unless otherwise specified, the principle in the following embodiment is also applied to the display panel, in which the pixel electrode layer 13 is located between the common electrode layer 14 and the first substrate 11.
Referring to
In an embodiment of the present disclosure, as shown in
In the embodiment of the present disclosure, the touch line TL is provided at a side of the common electrode layer 14 close to the first substrate 11. For example, the touch line TL may be provided at a side of the first inorganic insulating layer 15 close to the first substrate 11.
In a technical solution of the present disclosure, referring to
The insulating layer between the touch line TL and the common electrode layer 14 is mainly the first inorganic insulating layer 15 or mainly the first inorganic insulating layer 15 and the second inorganic insulating layer 16. There is a small distance between the touch lines TL and the common electrode layer 14 along the direction Z perpendicular to the plane of the display panel. Consequently, between the touch line TL and the common electrode 140 overlapping with the touch line TL and not electrically connected to the touch line TL, the coupling capacitance and the signal interference are increased.
The first slit 141 partially overlapping with the touch line TL is formed in the common electrode 140. Between the common electrode 140 and the touch line TL along the direction perpendicular to the plane of the display panel, the overlapping area is reduced, the coupling capacitance is reduced, and the signal interference is effectively relieved.
In a technical solution of the present disclosure, referring to
By arranging a part of the touch line TL at the second slit 142, the overlapping area between the part of the touch line TL and the common electrode 140 can be reduced, and thus the coupling capacitance and signal interference between the part of the touch line TL and the common electrode 140 are reduced.
In an implementation of the technical solution, a part of the touch line TL overlapping with the second slit 142 is completely exposed by the second slit 142.
In a technical solution of the present disclosure, referring to
In an embodiment of the present disclosure, referring to
In an implementation of the embodiment, as shown in
When the first slit 141 is formed in the common electrode 140, along the direction Z perpendicular to the plane of the display panel, a part of the first slit 141 partially overlaps with the touch line TL, and a part of the first slit 141 partially overlaps with the dummy touch line TL′. That is, a part of the first slit 141 in the common electrode 140 exposes a part of the touch line TL, and a part of the first slit 141 in the common electrode 140 exposes at least a part of the dummy touch line TL′.
Multiple touch lines TL in the first base plate 01 have different lengths. A longer touch line TL can overlap with the common electrode 140 more than a shorter touch line TL. Among the common electrodes 140 arranged along an extension direction of the touch line TL, at least two common electrodes 140 overlap with different numbers of the touch lines TL, and there are different numbers of the first slits 141 overlapping with the touch lines TL for the at least two common electrodes 140, which causes different loads on the at least two common electrodes 140.
By providing the dummy touch line TL′ and the first slit 141 overlapping with the dummy touch line TL′, the above problem can be solved. By providing the dummy touch line TL′ and the first slit 141 overlapping with the dummy touch line TL1′, the touch line TL and the dummy touch line TL1′ can be taken as a set and can be distributed evenly, and the number of the first slits 141 on each common electrode 140 is also uniform. Such configuration prevents the problem of uneven display of the display panel arising from uneven distribution of the touch lines TL and uneven distribution of the first slits 141.
In some embodiments, along the extension direction of the touch line TL, different touch lines TL each overlap with a same number of the common electrodes 140, and the dummy touch line TL′ located in the same column with the touch line TL may not be provided. For example, as shown in
In another implementation of the embodiment, the dummy touch line TL′ may be arranged along a same direction with a plurality of the touch lines TL, the dummy touch line TL′ may be basically as long as each of the touch lines TL, and a number of the common electrodes 140 overlapping with the dummy touch line TL′ may be the same as a number of the common electrodes 140 overlapping with the touch line TL.
In some embodiments, the first slit 141 in the common electrode 140 may also overlap with the dummy touch line TL′. A number of the first slits 141 overlapping with the dummy touch line TL′ may be the same as a number of the first slits 141 overlapping with the touch line TL.
In a technical solution of the present disclosure, referring to
In an embodiment of the present disclosure, referring to
In a corresponding implementation of the embodiment, multiple first vias 150 are formed in the first inorganic insulating layer 15. Multiple second vias 160 are formed in the second inorganic insulating layer 16. A part of each of the second vias 160 communicates with each of the first vias 150. That is, the part of the second via 160 overlaps with the first via 150 along the direction Z perpendicular to the plane of the display panel. As shown in
In the implementation, referring to
In the embodiment of the present disclosure, the communicating first via 150 and second via 161 are respectively obtained by etching the first inorganic insulating layer 15 and the second inorganic insulating layer 16. Since the first inorganic insulating layer 15 and the second inorganic insulating layer 16 can form the vias with the same etching process, the communicating first via 150 and second via 161 can be formed in the same etching process. In addition, the second via 162 can also be formed with the second via 161 in the same etching process.
A case where the bridge electrode 131 is electrically connected to the common electrode 140 through the second via 160 refers to that the bridge electrode 131 is electrically connected to the common electrode 140 through a conductive structure in the second via 160. The conductive structure in the second via 160 may be a portion deposited in the second via 162 when the pixel electrode layer 13 is prepared.
A case where the bridge electrode 131 is electrically connected to the touch line TL through the communicating first via 150 and second via 160 refers to that the bridge electrode 131 is electrically connected to the common electrode 140 through a conductive structure in the communicating first via 150 and second via 160. The conductive structure in the communicating first via 150 and second via 160 may be a portion deposited in the second via 161 and a portion deposited in the first via 150 when the pixel electrode layer 13 is prepared.
In a technical solution of the present disclosure, referring to
The first via 150 overlaps with the first opening 143 in the common electrode 140, which is equivalent to that an avoidance design is provided for the common electrode 140 in the region of the first via 150. This reduces the coupling capacitance between the common electrode 140 and the touch line TL.
In an implementation, as shown in
In the implementation, the areas of the first openings 143 can be provided flexibly according to different positions of the first openings 143. For example, when the first opening 143 is formed at a position of the common electrode 140, the first opening 143 may have a larger area in case of no other functional structure (such as the conductive structure) under the position. When the first opening 143 is formed at a position of the common electrode 140, the first opening 143 may have a smaller area in case of other functional structure (such as the conductive structure) under the position, so as not to damage the other functional structure. In addition, when the first opening 143 is provided at different positions of the common electrode 140, there may be different surrounding environments around the different positions. For example, the different positions have different heights, such that an etchant has different etching degrees for the first opening 143, and an area of the first opening 143 at the different positions is different.
In an embodiment of the present disclosure, the first base plate 01 includes a data line DL. The data line DL is configured to provide a signal to the pixel electrode 130. The data line DL may be electrically connected to the pixel electrode 130 through the transistor 120. The data line DL provides the correspondingly and electrically connected pixel electrode 130 with a data signal required by the display panel for light emission.
In the embodiment of the present disclosure, the data line DL is provided at a side of the common electrode 140 close to the first substrate 11. For example, the data line DL is provided at the side of the first inorganic insulating layer 15 close to the first substrate 11.
In a technical solution of the present disclosure, referring to
The insulating layer between the data line DL and the common electrodes 140 is mainly the first inorganic insulating layer 15 or mainly the first inorganic insulating layer 15 and the second inorganic insulating layer 16. There is a small distance between the data line DL and the common electrode layer 14 along the direction Z perpendicular to the plane of the display panel. Consequently, a signal transmitted from the data line DL is riskier to interfere an electric field between the pixel electrode 130 and the common electrode 140.
For example, referring to
When the electric field between the pixel electrode 130 and the common electrode 140 is used for driving a liquid crystal to deflect, the signal transmitted from the data line DL is riskier for the liquid crystal to cause false deflection.
In the technical solution, the part of the data line DL overlapping with the common electrode 140 is covered by the solid conductive portions of the common electrode 140. The common electrode 140 can prevent the electric field between the data line DL and the common electrode 140 from propagating to a side of the common electrode 140 away from the first substrate 11, thereby effectively solving the above problem.
In a technical solution of the present disclosure, referring to
For example, as shown in
The solution can also effectively solve the interference of the signal from the data line DL on the electric field between the pixel electrode 130 and the common electrode 140.
In an embodiment of the present disclosure, referring to
In an embodiment of the present disclosure, referring to
In a technical solution of the present disclosure, referring to
In an implementation, as shown in
In an implementation, as shown in
In a technical solution of the present disclosure, referring to
In an implementation, as shown in
In an implementation, as shown in
In a technical solution of the present disclosure, as shown in
In a technical solution of the present disclosure, referring to
In the implementation, the areas of the second openings 144 can be provided flexibly according to different positions of the second openings 144. For example, when the second opening 144 is formed at a position of the common electrode 140, the second opening 144 may have a larger area in case of no other functional structure (such as the conductive structure) under the position. When the second opening 144 is formed at a position of the common electrode 140, the second opening 144 may have a smaller area in case of other functional structure (such as the conductive structure) under the position, so as not to damage the other functional structure. In addition, when the second opening 144 is provided at different positions of the common electrode 140, there may be different surrounding environments around the different positions. For example, the different positions have different heights, such that an etchant has different etching degrees for the second opening 144, and an area of the second opening 144 at the different positions is different.
In a technical solution of the present disclosure, referring to
In the implementation, the areas of the third openings 145 can be provided flexibly according to different positions of the third openings 145. For example, when the third opening 145 is formed at a position of the common electrode 140, the third opening 145 may have a larger area in case of no other functional structure (such as the conductive structure) under the position. When the third opening 145 is formed at a position of the common electrode 140, the third opening 145 may have a smaller area in case of other functional structure (such as the conductive structure) under the position, so as not to damage the other functional structure. In addition, when the third opening 145 is provided at different positions of the common electrode 140, there may be different surrounding environments around the different positions. For example, the different positions have different heights, such that an etchant has different etching degrees for the third opening 145, and an area of the third opening 145 at the different positions is different.
In an embodiment of the present disclosure, as shown in
The data line DL and the touch line TL are provided in a same layer. The insulating layer between each of the data line DL and the touch line TL and the pixel electrode 130 is the inorganic insulating layer. The insulating layer between each of the data line DL and the touch line TL and the common electrode 140 is also the inorganic insulating layer. The via for electrically connecting the touch line TL and the common electrode 140 and the via for electrically connecting the data line DL and the pixel electrode 130 can be prepared in a same process, thereby reducing the preparation difficulty. In some embodiments, the via for electrically connecting the pixel electrode 130 and the data line DL and the via for electrically connecting the common electrode 140 and the touch line TL can be prepared in the same etching process. By providing the data line DL and the touch line TL on the same layer, the touch line TL and the data line DL can be prepared at the same time with a same manufacture procedure and a same mask. This reduces the manufacture process and saves the cost.
To sum up, the common electrode 140 can be multiplexed as the touch electrode. The touch line TL and the data line DL can be prepared at the same time. The via for electrically connecting the touch line TL and the common electrode 140 and the via for electrically connecting the data line DL and the pixel electrode 130 can be prepared at the same time. Therefore, when the display panel provided by the present disclosure is integrated with the structure having the touch function, both the manufacture process and the mask are not increased at all.
In an embodiment of the present disclosure, referring to
The support pillar 03 is provided between the first substrate 11 and the second substrate 21, and is configured to form a certain space between the first base plate 01 and the second base plate 02. The support pillar 03 may be provided on the first base plate 01, and formed in preparation of the first base plate 01. The support pillar 03 may also be provided on the second base plate 02, and formed in preparation of the second base plate 02.
In some embodiments, the display panel may include a display dielectric layer 04. The display dielectric layer 04 may be located between the first base plate 01 and the second base plate 02. The display dielectric layer 04 may include a liquid crystal. The display panel provided by the embodiment of the present disclosure may be an LCD panel.
Referring to
In the embodiment of the present disclosure, along a direction Z perpendicular to the plane of the display panel, the support pillar 03 does not overlap with at least one of the scan line SL and the data line DL. That is, the support pillar 03 does not overlap with the scan line SL and the data line DL at the same time. It is to be understood that the support pillar 03 is not provided at an intersection between the scan line SL and the data line DL.
Usually, the scan line SL is electrically connected to a gate of the transistor 120, and the data line DL is electrically connected to the first electrode 12 of the transistor 120. The scan line SL and the data line DL are usually provided in a same layer with a sub-layer of the transistor array layer 12, namely the scan line SL and the data line DL are located at a side of the first inorganic insulating layer 15 toward the first substrate 11. Due to effective planarization of the inorganic insulating layer, a protrusion at the intersection between the scan line SL and the data line DL is obvious, although the first inorganic insulating layer 15 and the second inorganic insulating layer 16 are provided at a side of the scan line SL away from the first substrate 11 and a side of the data line DL away from the first substrate 11. If the support pillar 03 is provided at the intersection between the scan line SL and the data line DL, the support pillar 03 will be poor in stability.
By keeping the support pillar 03 away from the intersection between the scan line SL and the data line DL, the embodiment of the present disclosure can ensure the stability of the support pillar 03 as much as possible.
In a technical solution of the present disclosure, referring to
As shown in
For example, when the d1 is greater than or equal to 2 the support pillar 03 can safely avoid the protrusion at the intersection between the scan line SL and the data line DL, and a position of the support pillar 03 is not affected.
In a technical solution of the present disclosure, as shown in
Along the direction Z perpendicular to the plane of the display panel, at least a part of the support pillar 03 overlaps with the first portion DL1, and at least a part of the support pillar 03 is provided above the widened first portion DL1 in the data line DL. Because of a larger width of the first portion DL1, a relatively flat and large bearing surface can be provided for the support pillar 03 overlapping with the first portion DL1.
Since the support pillar 03 does not overlap with the scan line SL, the first portion DL1 does not overlap with the scan line SL. Although the first portion DL1 is wider than the second portion DL2, coupling between the scan line SL and the data line DL may not be increased.
In an implementation, as shown in
With the cross-shaped peripheral contour of the first portion DL1, the stability of the support pillar 03 can be effectively ensured by the bearing surface contacting the support pillar 03, and the data line DL does not change a resistance suddenly at the first portion DL1.
In an implementation, referring to
The data line DL is provided in a same layer with the first electrode 121 of the transistor 120, and electrically connected to a semiconductor layer in the first electrode 121 of the transistor 120. It is to be understood that a part of the data line DL electrically connected to the semiconductor layer of the transistor 120 through the via forms the first electrode 121 of the transistor 120. The support pillar 03 overlaps with the first electrode 121 of the transistor 120 along the direction Z perpendicular to the plane of the display panel, which optimizes the position of the support pillar 03, and reduces influences of the support pillar 03 on a light emitting area of the pixel.
In a technical solution of the present disclosure, referring to
The touch line TL includes a third portion TL1 and a third portion TL2. A width of the third portion TL1 along the first direction is greater than a width of the fourth portion TL2 along the first direction X. The first direction X is perpendicular to the extension direction of the touch line TL. A position in the touch line TL is widened to form the third portion TL1.
Along the direction Z perpendicular to the plane of the display panel, at least a part of the support pillar 03 overlaps with the third portion TL1, and at least a part of the support pillar 03 is provided above the widened third portion TL1 in the touch line TL. Because of a larger width of the third portion TL1, a relatively flat and large bearing surface can be provided for the support pillar 03 overlapping with the third portion TL1.
In a technical solution of the present disclosure, referring to
Due to a brittle texture and the like of the inorganic insulating layer, the inorganic insulating layer may not be too thick. When the insulating layer between each of the touch line TL and the data line DL, and each of the common electrode 140 and the pixel electrode 130 is the inorganic insulating layer, there is a thin insulating layer at a side of the touch line TL toward the second base plate 02 and at a side of the data line DL toward the second base plate 02, and the thin insulating layer does not have the desirable planarization effect. In this case, a surface of a region with the touch line TL and the data line DL in the first base plate 01 toward the second base plate 02 has the poor planarization effect. If the surface of the region toward the second base plate 02 is directly used to bear the support pillar 03, the support pillar 03 is unstable.
In the technical solution, the first portion DL1 is equivalent to widening the portion of the data line DL overlapping with the support pillar 03, and the third portion DL3 is equivalent to widening the portion of the touch line TL overlapping with the support pillar 03. In a surface of a region with the first portion DL1 and the third portion DL3 in the first base plate 01 toward the second base plate 02, an area with good planarization is increased. Therefore, the support pillar 03 is stable.
Meanwhile, the third portion TL1 of the touch line TL is not excessively wider than the fourth portion TL2, such that the resistance of the touch line TL is not changed suddenly.
In an embodiment of the present disclosure, referring to
Along the direction Z perpendicular to the plane of the display panel, the black matrix 05 covers the scan line SL, the data line DL and the touch line TL. The black matrix 05 can make these signal lines invisible, so as not to affect the display effect of the display panel. In addition, the black matrix 05 can prevent mutual interference of light rays between adjacent sub-pixels.
Referring also to
The first main body portion 51 includes a first edge 511 and a second edge 512 opposite to each other. Both an extension direction of the first edge 511 and an extension direction of the second edge 512 are parallel to the scan line SL, and an arrangement direction for the first edge 511 and the second edge 512 is perpendicular to the extension direction of the scan line SL. As shown in
In some embodiments, the black matrix 05 includes multiple first protrusion portions 52. The first protrusion portions 52 are arranged at a side of the first edge 511 away from the second edge 512, and the first protrusion portions 52 are connected to the first edge 511. Along the direction Z perpendicular to the plane of the display panel, the first protrusion portions 52 each at least partially overlap with the support pillar 03. It is to be understood that the first edge 511 of the first main body portion 51 is closer to the support pillar 03 than the second edge 512, and the side of the first edge 511 away from the second edge 512 is provided with the first protrusion portion 52 overlapping with the support pillar 03.
The support pillar 03 can be covered by the black matrix 05, which makes the support pillar 03 invisible to human eyes, so as not to affect the display effect of the display panel.
In some embodiments, the black matrix 05 may include multiple second protrusion portions 53. The second protrusion portions 53 are arranged at a side of the second edge 512 away from the first edge 511, and the second protrusion portions 53 are connected to the second edge 512. Along the direction Z perpendicular to the plane of the display panel, the second protrusion portions 53 each do not overlap with the support pillar 03. It is to be understood that the second edge 512 of the first main body portion 51 is further away from the support pillar 03 than the first edge 511.
In the embodiment of the present disclosure, as shown in
The black matrix 05 includes a parallel portion 54 with an extension direction parallel to the extension direction of the data line DL and the extension direction of the touch line TL. The first protrusion portion 52 and the second protrusion portion 53 differ from the parallel portion 54 in: A width of the first protrusion portion 52 along the first direction X and a width of the second protrusion portion 53 along the first direction X are greater than a width of the parallel portion 54 along the first direction X.
In an implementation, as shown in
In an implementation, as shown in
In an embodiment of the present disclosure, as shown in
The display apparatus using the concept of the present disclosure has a small thickness, a simple process, and a low preparation cost.
The above descriptions are merely exemplary embodiments of the present disclosure and are not intended to limit the present disclosure. Any modification, equivalent replacement and improvement within the principle of the present disclosure shall be included within the scope of the present disclosure.
Number | Date | Country | Kind |
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202310423575.3 | Apr 2023 | CN | national |