Patent Application
20250176272
The present disclosure relates to the field of display, and in particular, to a display panel and a display device.
In recent years, in order to pursue better display performance, high pixel density has been continuously pursued, whereas high pixel density has resulted in an increase in metal line density. Under limitations of processes, the increase in the metal line density generally increases number of metal film layers by overlapping different film layers on top of each other. However, such a method will increase number of masks and processes. As a result, for high pixel density display panels, how to reduce the number of processes and masks is particularly important.
Therefore, it is imperative to provide a display panel and a display device to solve the above-mentioned technical problem.
Some embodiments of the present disclosure provide a display panel, including:
a substrate;
a first metal layer disposed on a side of the substrate;
a second metal layer disposed on a side of the first metal layer away from the substrate, where the second metal layer includes a gate electrode and a source/drain electrode disposed in the same layer as the gate electrode, and the source/drain electrode includes a source electrode; and
a data line disposed in the same layer as the first metal layer and electrically connected to the source electrode;
where an extension direction of the source electrode is parallel to an extension direction of the data line in a top view.
Some embodiments of the present disclosure provide a display device including a display panel and a device body integrated with the display panel, the display panel includes:
a substrate;
a first metal layer disposed on a side of the substrate;
a second metal layer disposed on a side of the first metal layer away from the substrate, where the second metal layer includes a gate electrode and a source/drain electrode disposed in the same layer as the gate electrode, and the source/drain electrode includes a source electrode; and
a data line disposed in the same layer as the first metal layer and electrically connected to the source electrode;
where an extension direction of the source electrode is parallel to an extension direction of the data line in a top view.
The present disclosure provides a display panel and a display device. In order to make the objectives, technical solutions, and effects of the present disclosure clearer, the present disclosure will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to illustrate the present disclosure, and are not used to limit the present disclosure.
Embodiments of the present disclosure provide a display panel and a display device. Detailed descriptions are given below. It should be noted that the description order of the following embodiments is not intended to limit the preferred order of the embodiments.
Please refer to
In the present disclosure, by disposing the gate electrodes and the source/drain electrodes in the same layer, and the data lines and the first metal layer in the same layer, and by using the first metal layer for a wiring arrangement of the data lines, film thickness is reduced, along with formation of the gate electrodes and the source/drain electrodes through one mask process, which reduces number of processes and masks, improves production efficiency, increase a display aperture ratio, and enhances display performance.
The technical solutions of the present disclosure will now be described with reference to specific embodiments.
In this embodiment, please refer to
The gate electrodes 410 and the source/drain electrodes 420 can be formed at a same time through one mask process, and a wiring of the data lines 500 is arranged on a side of the second metal layer 400 close to the substrate 200 in the first metal layer 300. The first metal layer 300 is configured for a wiring arrangement of the data lines 500, and the data lines 500 and the source/drain electrodes 420 are bridged by the second metal layer 400. In this way, it can reduce film thickness as well as number of processes and masks, thus improving production efficiency, increasing a display aperture ratio, and enhancing display performance.
In some embodiments, referring to
In order to reduce influence of signals of the data line 500 on the active layer 600, the data line 500 needs to avoid the active layer 600. In a top view direction, the data line 500 and the active layer 600 do not coincide, which can reduce the influence of the data lines 500 on the active layer 600, thereby improving the display performance of the display panel 100.
In some embodiments, please refer to
Each of the gate electrodes 410 is changed to the first metal layer 300 and the active layer 600 through the first via hole 810 and the second via hole 820, respectively, and the data lines 500 are disposed in a first direction, which is a Y-axis direction shown in the drawings. A scan line 411 configured to connect to the gate electrode is disposed in a second direction, which is an X-axis direction. An arrangement direction in which a wire changing portion for the wiring change of the gate electrode 410 is oriented is parallel to an extending direction of the data line 500, which can save an arrangement space in the second direction, and is conducive to arranging more pixels and wirings and improving display pixel density of the display panel 100.
In some embodiments, referring to
The source electrode 421 is electrically connected to the first segment 510, so that conduction between the source electrode 421 and the data line 500 can be realized. From the first segment 510 to the second segment 520, the data line 500 is routed to avoid the active layer 600 corresponding to the source/drain electrodes 420, so as to prevent the influence of the data line 500 on the active layer 600 as well as facilitating arrangement of the wire changing portion in the first direction, thereby saving the arrangement space in the second direction, which is conducive to arranging more pixels and wirings and improving the display pixel density of the display panel 100.
In some embodiments, referring to
The data line 500 is routed to avoid the active layer 600, so as to prevent the influence of the data line 500 on the active layer 600 and further facilitate the arrangement of the wire changing portion in the first direction, thereby saving the arrangement space in the second direction, which is conducive to arranging more pixels and wirings and improving the display pixel density of the display panel 100.
In some embodiments, please refer to
Specifically, in
In some embodiments, referring to
Specifically,
In some embodiments, referring to
The gate electrode 410, the source electrode 421, and the drain electrode 422 disposed in the same layer correspond to different regions of the active layer 600. The gate electrode 410 is located corresponding to the channel region 610. The source electrode 421 is correspondingly connected to the heavily doped region 630 through the second via hole 820, and the drain electrode 422 is connected to the heavily doped region 630 through the fourth via hole 840. The gate electrode 410 can implement switching on the channel region 610 of the active layer 600. Each of the source electrode 421 and the drain electrode 422 is connected to the heavily doped region 630 that is beneficial to improve semiconductor performance of the active layer 600.
In some embodiments, the doping of the active layer 600 may be N-type doping, the heavily doped region 630 may be represented by N+, and the lightly doped region 620 may be represented by N−.
In some embodiments, please refer to
The first metal layer 300 further includes a light-shielding unit 310 for shielding light directed to the active layer 600 to reduce photoelectric influence of the light on the active layer 600. Furthermore, the light-shielding unit 310 is spaced apart from any of the data lines 500 and is insulated from the data line 500 to reduce the influence of the data lines 500 on the signal of the light-shielding unit 310.
In some embodiments, the first metal layer 300 further includes a light-reflecting unit disposed between adjacent ones of the data lines 500 and is spaced apart from any of the data lines 500.
When the display panel 100 is a self-luminous display panel 100, the light-reflecting unit can reflect light emitted in a direction from the first metal layer 300 away from the substrate 200 toward the first metal layer 300, so as to improve light extraction efficiency of the display panel 100.
In some embodiments, please refer to
The scan lines 411 and the data lines 500 are disposed horizontally and vertically in staggered relationship to each other, and the data lines 500 are electrically connected to the gate electrodes 410 to provide signals for the gate electrodes 410.
In some embodiments, the display panel 100 may be a liquid crystal display panel 100 or a self-luminous display panel 100.
In some embodiments, the display panel 100 is a liquid crystal display panel 100 and further includes a passivation layer 240 disposed on the pixel electrode layer 230 and a common electrode layer 250 disposed on the passivation layer 240. In
The display panel 100 further includes a liquid crystal layer, a color filter layer, and upper and lower polarizing layers.
In some embodiments, the display panel 100 is a self-luminous display panel 100 and further includes a light-emitting device layer disposed on the pixel electrode layer 230.
In some embodiments, the light-emitting device layer includes the pixel electrode layer 230 disposed above the interlayer dielectric layer, a light-emitting material layer disposed on the pixel electrode layer 230, and a cathode layer disposed on the light-emitting material layer. The display panel 100 further includes a pixel definition layer disposed in the same layer as the light-emitting material layer, a polarizing layer disposed on the light-emitting device layer, and a flexible cover disposed on the polarizing layer. The display panel 100 further includes bonding layers disposed between the polarizing layer and the flexible cover, between the light-emitting device layer and the polarizing layer, and between a backplate and the substrate 200, respectively.
In some embodiments, the light-emitting device layer may include an organic light-emitting diode (OLED) material, organic light-emitting semiconductor), or may include a micro light-emitting diode (LED) or mini LED, which is not specifically limited here.
In some embodiments, the first metal layer 300 and the second metal layer 400 may be a single metal layer or a stacked metal layer, which is not specifically limited herein.
In the present disclosure, by disposing the gate electrodes and the source/drain electrodes in the same layer, and the data lines and the first metal layer in the same layer, and by using the first metal layer for the wiring arrangement of the data lines, film thickness is reduced, along with formation of the gate electrodes and the source/drain electrodes through one mask process, which reduces number of processes and masks, improves production efficiency, increase a display aperture ratio, and enhances display performance.
Please refer to
Step S100: providing a substrate 200;
Step S200: forming a plurality of data lines 500 on the substrate 200 to form a first metal layer 300;
Step S300: forming an interlayer dielectric layer 700 including a plurality of first via holes 810 on a side of the data lines 500 away from the substrate 200, wherein the first via holes 810 expose the data lines 500;
Step S400: forming a second metal material layer 401 on a side of the interlayer dielectric layer 700 away from the data lines 500; and
Step S500: patterning the second metal material layer 401 to form a plurality of gate electrodes 410 and a plurality of source/drain electrodes 420 to form a second metal layer 400, wherein the source/drain electrodes 420 are electrically connected to the data lines 500 through the first via holes 810.
In the present disclosure, by disposing the gate electrodes and the source/drain electrodes in the same layer, and the data lines and the first metal layer in the same layer, and by using the first metal layer for the wiring arrangement of the data lines, film thickness is reduced, along with formation of the gate electrodes and the source/drain electrodes through one mask process, which reduces number of processes and masks, improves production efficiency, increase a display aperture ratio, and enhances display performance.
The technical solutions of the present disclosure will now be described with reference to specific embodiments.
In this embodiment, the method of manufacturing the display panel 100 includes:
Step S100: providing the substrate 200, as shown in
In some embodiments, the substrate 200 may be a rigid substrate 200, such as a glass material, or may be a flexible substrate 200, such as polyimide.
Step S200: forming the plurality of data lines 500 on the substrate 200 to form the first metal layer 300, as shown in
In some embodiments, step S200 includes:
Step S210: forming a buffer layer 210 on the substrate 200.
In some embodiments, step S210 includes: forming the buffer layer 210 including a plurality of third via holes 830 on the substrate 200.
Step S220: forming a first metal material layer on the buffer layer 210.
Step S230: patterning the first metal material layer to form the plurality of data lines 500 in order for formation of the first metal layer 300.
In some embodiments, the data lines 500 are disposed in a first direction.
In some embodiments, step S230 includes:
Step S231a: patterning the first metal material layer to form the plurality of data lines 500 and a plurality of light-shielding units 310 to form the first metal layer 300.
In some embodiments, the first metal layer 300 includes a plurality of light-shielding units 310 spaced apart from any of the data lines 500 and disposed in the same layer as the data lines 500, wherein an orthographic projection of the active layer 600 on the first metal layer 300 is located within a corresponding one of the light-shielding units 310.
The first metal layer 300 further includes a light-shielding unit 310 for shielding light directed to the active layer 600 to reduce photoelectric influence of the light on the active layer 600. Furthermore, the light-shielding unit 310 is spaced apart from any of the data lines 500 and is insulated from the data line 500 to reduce the influence of the data lines 500 on the signal of the light-shielding unit 310.
In some embodiments, step S230 includes:
Step S231b: patterning a first metal material layer to form the plurality of data lines 500, a plurality of light-shielding units 310, and a plurality of light-reflecting units to form the first metal layer 300.
In some embodiments, the first metal layer 300 further includes a light-reflecting unit disposed between adjacent ones of the data lines 500 and is spaced apart from any of the data lines 500.
When the display panel 100 is a self-luminous display panel 100, the light-reflecting unit can reflect light emitted in a direction from the first metal layer 300 away from the substrate 200 toward the first metal layer 300, so as to improve light extraction efficiency of the display panel 100.
Step S300: forming an interlayer dielectric layer 700 including a plurality of first via holes 810 on a side of the data lines 500 away from the substrate 200, wherein the first via holes 810 expose the data line 500, as shown in
In some embodiments, each of the first via holes 810 is formed extending through a corresponding one of the third via holes 830, so that the data line 500 is exposed.
In some embodiments, step S300 includes:
Step S310: forming an active layer 600 on the side of the data line 500 away from the substrate 200.
In some embodiments, step S310 includes:
Step S311: forming an active material layer on the side of the data line 500 away from the substrate 200.
Step S312: doping the active material layer to form a channel region 610 close to a central region of the active material layer, a heavily doped region 630 away from the central region of the active material layer, and a lightly doped region 620 disposed between the channel region 610 and the heavily doped region 630.
In some embodiments, the active layer 600 includes the channel region 610, the heavily doped region 630, and the lightly doped region 620 disposed between the channel region 610 and the heavily doped region 630. Specifically, the gate electrode 410 is disposed corresponding to the channel region 610, the source electrode 421 is correspondingly connected to the heavily doped region 630 through the second via hole 820, and the drain electrode 422 is correspondingly connected to the heavily doped region 630 through the fourth via hole 840.
Step S320: forming the interlayer dielectric layer 700 including the plurality of first via holes 810, a plurality of the second via holes 820, and a plurality of fourth via holes 840 on the side of the active layer 600 away from the substrate 200, so that the first via holes 810 expose the data lines 500, and the second via holes 820 and the fourth via holes 840 expose the active layer 600.
In some embodiments, the display panel 100 further includes the active layer 600 disposed between the second metal layer 400 and the first metal layer 300, wherein an orthographic projection of any one of the data lines 500 on the substrate 200 is located outside an orthographic projection of the active layer 600 on the substrate 200.
Step S400: forming the second metal material layer 401 on the side of the interlayer dielectric layer 700 away from the data lines 500, as shown
In some embodiments, the first metal layer and the second metal layer may be a single metal layer or a stacked metal layer, which is not specifically limited herein.
Step S500: patterning the second metal material layer 401 to form the plurality of gate electrodes 410 and the plurality of source/drain electrodes 420 to form the second metal layer 400, wherein the source/drain electrodes 420 are electrically connected to the data lines 500 through the first via holes 810, as shown in
In some embodiments, step S500 includes:
Step S510: patterning the second metal material layer 401 to form the gate electrodes 410 and the plurality of source/drain electrodes 420 to form the second metal layer 400. The source/drain electrodes 420 are electrically connected to the data line 500 through the first via hole 810, and the source/drain electrodes 420 are electrically connected to the active layer 600 through the second via hole 820 and the fourth via hole 840.
In some embodiments, the display panel 100 further includes a buffer layer 210 disposed between the active layer 600 and the first metal layer 300, and an interlayer dielectric layer 700 disposed between the active layer 600 and the second metal layer 400. The interlayer dielectric layer 700 includes a plurality of first via holes 810 and a plurality of second via holes 820, the buffer layer 210 includes a plurality of third via holes 830, and each set of the source/drain electrodes 420 includes a source electrode 421 and a drain electrode 422 arranged opposite to each other. Each of the first via holes 810 is formed extending through a corresponding one of the third via holes 830, the source electrode 421 is electrically connected to the data line 500 through the first via hole 810 and the third via hole 830, and the source electrode 421 is electrically connected to the active layer 600 through the second via hole 820. Specifically, an extending direction of a connection line defined between the first via hole 810 and the second via hole 820 corresponding to a same source electrode 421 is parallel to an extending direction of the data line 500.
In some embodiments, each of the data lines 500 includes a first segment 510 and a second segment 520 located parallel to each other. Specifically, an orthographic projection of the active layer 600 on the first metal layer 300 is located on an extending line of the first segment 510 and is positioned outside an extending line of the second segment 520, and the source electrode 421 is electrically connected to a corresponding one of the first segments 510.
In some embodiments, the data line 500 further includes a third segment 530 connecting the first segment 510 and the second segment 520, and a fourth segment 540 parallel to the first segment 510, and a fifth segment 550 connecting the second segment 520 and the fourth segment 540. The third segment 530 may be perpendicular to the first segment 510, and the fifth segment 550 may be perpendicular to the fourth segment 540.
In some embodiments, the method of manufacturing the display panel 100 further includes:
Step S600: forming a planarization layer 220 including a plurality of fifth via holes 850 on the side of the second metal layer 400 away from the substrate 200.
Step S700: forming a pixel electrode layer 230 on the side of the planarization layer 220 away from the substrate 200.
In some embodiments, the interlayer dielectric layer 700 further includes a plurality of fourth via holes 840, and the drain electrode 422 is electrically connected to the active layer 600 through the fourth via hole 840. The display panel 100 further includes a pixel electrode layer 230 located on a side of the second metal layer 400 away from the substrate 200, and a planarization layer 220 disposed between the pixel electrode layer 230 and the second metal layer 400. Specifically, the planarization layer 220 includes a plurality of fifth via holes 850, and the pixel electrode layer 230 is electrically connected to the drain electrodes 422 through the fifth via holes 850.
In the present disclosure, by disposing the gate electrodes and the source/drain electrodes in the same layer, and the data lines and the first metal layer in the same layer, and by using the first metal layer for the wiring arrangement of the data lines, film thickness is reduced, along with formation of the gate electrodes and the source/drain electrodes through one mask process, which reduces number of processes and masks, improves production efficiency, increase a display aperture ratio, and enhances display performance.
Referring to
For the specific structure of the display panel 100, please refer to any of the above-mentioned embodiments of the display panel 100 and the accompanying drawings, which will not be repeated here.
In this embodiment, the device body 20 may include a middle frame, a sealant, etc., and the display device 10 may be a display terminal, such as a mobile phone, a tablet, or a television, which is not limited herein.
In some embodiments, the display device 10 further includes a plurality of optical devices, which may be one or a combination of a camera, a distance sensor, a fingerprint identification device, or an infrared sensor combination.
The embodiments of the present disclosure disclose a display panel and a display device. The display panel includes a substrate, a first metal layer located on a side of the substrate, and a second metal layer located on a side of the first metal layer away from the substrate. The second metal layer includes a plurality of gate electrodes and a plurality of source/drain electrodes disposed in the same layer as the gate electrodes, wherein the display panel further includes a plurality of data lines, and any one of the data lines is disposed in the same layer as the first metal layer and is electrically connected to the source/drain electrodes. In the present disclosure, by disposing the gate electrodes and the source/drain electrodes in the same layer, and the data lines and the first metal layer in the same layer, and by using the first metal layer for a wiring arrangement of the data lines, film thickness is reduced, along with formation of the gate electrodes and the source/drain electrodes through one mask process, which reduces number of processes and masks, improves production efficiency, increase a display aperture ratio, and enhances display performance.
It can be understood that for those of ordinary skill in the art, equivalent substitutions or changes can be made according to the technical solution and inventive concept of the present disclosure, and all these changes or substitutions should fall within the protection scope of the appended claims of the present disclosure.
| Number | Date | Country | Kind |
|---|---|---|---|
| 202210393502.X | Apr 2022 | CN | national |
This application is a continuation of U.S. patent application Ser. No. 17/756,043 filed on May 14, 2022, which is a national stage application of International Application No. PCT/CN2022/088829, filed on Apr. 24,2022, which claims priority to Chinese Patent Application No. 202210393502.X, filed on Apr. 14, 2022, the contents of the aforementioned applications are incorporated herein by reference in their entireties.
| Number | Date | Country | |
|---|---|---|---|
| Parent | 17756043 | May 2022 | US |
| Child | 19038322 | US |
