DISPLAY PANEL AND MANUFACTURING METHOD, PANEL DISPLAY DEVICE THEREOF

Abstract

The present invention provides a display panel, which includes active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area. The present invention also provides a manufacturing method of display panel and a panel display device. The present invention disposes dummy pattern area along boundary active area to withstand loading effect and to ensure active area is not affected by loading effect and display patterns are normal and uniform.

Description

The present application claims priority of “DISPLAY PANEL AND MANUFACTURING METHOD, PANEL DISPLAY DEVICE THEREOF”, application number 201210331726.4 submitted to China Patent Bureau on date Sep. 10, 2012.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to the field of image displaying techniques, and in particular to a panel display and manufacturing method thereof, panel display device.

2. The Related Arts

Optical etching process is important to the manufacturing of panel display device. The main steps comprise: thin film deposition→photo-resist coating→exposure→photo-resist lithography→thin film etching→photo-resist removal. Under normal circumstances, photo-resist lithography uses liquid lithography solution, and the thin film etching of metal (alloy) layer uses liquid etching solution for etching. Both are so called wet processes. In wet process, the thin film pattern on substrate will affect the partial density of the ingredient in the solution. That is, if the area of the photo-resist or the area of the metal (alloy) requires lithography is large, more ingredient will be consumed; on the other hand, if the area of the photo-resist or the area of the metal (alloy) requires lithography is small, less ingredient will be consumed.

Solution has a diffusion effect to maintain the same density everywhere in the solution. When differences exist in the thin film patterns on the substrate, the ingredient in the solution will diffuse from high density place to lower density place during the lithography or etching process, which leads to different lithography or etching result for boundary area of the pattern and the center area of the pattern. This effect is referred to as loading effect.

The following takes photo-resist lithography process of pixel electrode layer of liquid crystal panel as example to explain the bad influence of loading effect on active area (AA) of liquid crystal panel.

FIG. 1 shows a design of pixel electrode layer of a known liquid crystal panel. The center of the panel is active area 1, which has small photo-resist area requiring lithography. The majority outside of active area 1 is vacant area 2, which has large photo-resist area requiring lithography. By enlarging the view of the boundary area A′ of active area 1 in FIG. 1, the inner side design is normal pixel area 3, with tidy ITO electrode array, and the outer side design is vacant area (without ITO electrode array) 4. Because of loading effect, the actual photo-resist lithography process is different from the idealistic design. The actual result is shown in FIG. 2. Similarly, By enlarging the view of the boundary area A′ of active area 1 in FIG. 2, boundary area 5 near vacant area 4 will show pattern irregularity because of insufficient photo-resist lithography. The pixel irregularity becomes less towards the inner side, and the idealistic design appears at pixel area 3 that is in sufficiently inner side. The specific process of loading effect on photo-resist lithography is as follows: at the beginning of the lithography process, active area 1 slowly consumes a small amount of lithography ingredient and vacant area 2 rapidly consumes a large amount of lithography ingredient. The density different leads to lithography ingredient in active area 1 diffusing towards vacant area 2. From the perspective of boundary area A′ of active area 1, lithography solution density at boundary area 5 shows obvious gradient decreasing; that is, the closer to vacant area, the lower the density of lithography solution. In subsequent lithography process, lithography capability in boundary area 5 decreases in gradient manner, and the photo-resist lithography result is less for pixels closer to vacant area 4. Loading effect lessens the photo-resist lithography result of boundary area 5, which leads to pattern irregularity of etching process (mainly, unable to etch pattern or coarse etched pattern).

The pattern irregularity in boundary area 5 will cause defective image display. Not only the luminance, view angle and response time are different from those of normal pixel area 3, but also influences the charging and discharging characteristics of normal pixel area 3. Hence, it is desirable to eliminate pattern irregularity.

SUMMARY OF THE INVENTION

The technical issue to be addressed by the present invention is to provide a display panel, manufacturing method and panel display device thereof, able to maintain normal and uniform patterns in active area.

The present invention provides a display panel, which comprises active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area.

According to a preferred embodiment of the present invention, in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

According to a preferred embodiment of the present invention, solution density at active area stays unchanged.

According to a preferred embodiment of the present invention, the active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

According to a preferred embodiment of the present invention, the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.

The present invention provides a manufacturing method of display panel, which comprises the steps of: disposing active area and vacant area surrounding the active area; and disposing dummy pattern area without display functionality along boundary between active area and vacant area.

According to a preferred embodiment of the present invention, the dummy pattern area satisfies the following conditions: in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

According to a preferred embodiment of the present invention, the active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

According to a preferred embodiment of the present invention, the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.

The present invention provides a panel display device, which comprises a display panel, the display panel further comprising: active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area.

According to a preferred embodiment of the present invention, in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

According to a preferred embodiment of the present invention, solution density at active area stays unchanged.

According to a preferred embodiment of the present invention, the active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

According to a preferred embodiment of the present invention, the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.

The efficacy of the present invention is that to be distinguished from the state of the art. Because the display panel, manufacturing method and panel display device provided by the present invention dispose dummy pattern area along boundary of active area to withstand loading effect, the present invention ensures active area free from loading effect and the patterns are normal and uniform.

BRIEF DESCRIPTION OF THE DRAWINGS

To make the technical solution of the embodiments according to the present invention, a brief description of the drawings that are necessary for the illustration of the embodiments will be given as follows. Apparently, the drawings described below show only example embodiments of the present invention and for those having ordinary skills in the art, other drawings may be easily obtained from these drawings without paying any creative effort. In the drawings:

FIG. 1 is a schematic view showing the design of a known display panel;

FIG. 2 is a schematic view showing the actual result of the design of a known display panel;

FIG. 3 is a schematic view showing the design of a display panel according to the present invention;

FIG. 4 is a schematic view showing the actual result of the design of a display panel according to the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The following description refers to drawings and preferred embodiments of the present invention.

An embodiment of the present invention provides a display panel, which comprises active area and vacant area surrounding the active area, and dummy pattern area without display functionality being disposed along boundary between active area and vacant area.

The present invention is applicable to pattern layers using wet process for lithography or etching, such as, pixel electrode layer, first metal layer or second metal layer. For convenience of description, the following uses pixel electrode layer as example for description.

Specifically, referring to FIGS. 3-4, FIG. 3 is a schematic view showing the design of a display panel according to the present invention; and FIG. 4 is a schematic view showing the actual result of the design of a display panel according to the present invention.

As shown in FIG. 3, a display panel of the embodiment of the present invention comprises active area (AA) 1 and vacant area 2 surrounding the active area 1, and dummy pattern area 6 without display functionality being disposed along boundary of active area 1 between active area 1 and vacant area 2. From an enlarged view of boundary area A of active area 1 in FIG. 3, dummy pattern area 6 comprises a plurality of dummy pixels 7. The pattern design of dummy pixel 7 can be identical to the pixel of normal pixel area 3, or can be adjusted depending on application. Dummy pixel 7 has not electrical or optical functionality and is not connected to drive signal; therefore, dummy pixel 7 will neither affect the charging and discharging of normal pixel area 3, nor increase the load of driver circuit.

The following uses lithography process as example to explain how the display panel of the present invention achieve normal display pattern without the loading effect.

At the beginning of lithography process, active area 1 slowly consumes a small amount of lithography ingredient, and vacant area 2 rapidly consumes a large amount of lithography ingredient. The density difference drives the lithography ingredient to diffuse from active area 1 toward vacant area 2. In contrast to known design in FIG. 1, the display panel of the present invention disposes a dummy pattern area 6 on boundary of active area 1. Under the influence of loading effect, lithography solution density at dummy pattern area 6 shows obvious gradient decreasing outwards (that is, from normal pixel area 3 towards vacant area 4). The area closer to the vacant area 4 is, the lower the lithography solution density is. In other words, solution density at intersection area of dummy pattern area 6 and the active area 1 is roughly equal to solution density at active area 1, and solution density at dummy pattern area 6 gradually decreases from intersection towards vacant area 2.

In subsequent lithography process, lithography capability in dummy pattern area 6 decreases in gradient manner, and the photo-resist lithography result is less for pixels closer to vacant area 4. The actual result is as shown in FIG. 4. From an enlarged view of boundary area A of active area 1 in FIG. 4, the pattern of dummy pixel 8 near vacant area 4 is affected by loading effect to the entire normal pixel area 3 away from vacant area 4 stays normal and uniform, in contrast with FIG. 2 showing a irregular boundary area 5.

The efficacy of the embodiment of the present invention is that to be distinguished from the state of the art. Because all the pixels in the active area in known technique are for displaying image, the boundary pixels are easily affected by loading effect during wet process. The present embodiment of the present invention disposes dummy pattern area 6 in place of boundary area 5 to withstand loading effect. With dummy pattern area 6 as buffer, normal pixel area 3 is away from vacant area 4 and not affected by loading effect. All the patterns in normal pixel area 3 are normal and uniform to ensure the patterns at each layer in active area 1 are the same as the design. On the other hand, because dummy pattern area 6 does not function for displaying, the displaying function of display panel will not be affected even when dummy pattern area 6 is affected by loading effect.

The size of dummy pattern area 6 and required number and pattern of dummy pixels can be determined by experiments. The only condition that must be met is: solution density at intersection area of dummy pattern area 6 and the active area 1 is roughly equal to solution density at active area 1, and solution density at dummy pattern area 6 gradually decreases from intersection towards vacant area 2.

Correspondingly, the second embodiment of the present invention provides a manufacturing method of display panel, comprising the steps of: disposing active area and vacant area surrounding the active area; and disposing dummy pattern area without display functionality along boundary between active area and vacant area.

According to a preferred embodiment of the present invention, the dummy pattern area satisfies the following conditions: in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

The active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

As a preferred embodiment, the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.

After disposing active area and vacant area like a known technique, the instant embodiment further disposes dummy pattern area without display functionality along boundary between active area and vacant area. The present invention uses dummy pattern area 6 to withstand loading effect, and ensure active area 1 free from loading effect. All the patterns in normal pixel area 3 are normal and uniform. Because dummy pattern area 6 does not function for displaying, the displaying function of display panel will not be affected even when dummy pattern area 6 is affected by loading effect.

The display panel in the first embodiment of the present invention can be applied to liquid crystal display (LCD), plasma display panel (PDP) organic LED (OLED), and so on. Hence, the third embodiment of the present invention provides a panel display device, comprising a display panel disclosed in the first embodiment of the present invention. The efficacy of the instant embodiment is based on the first embodiment, and the description is omitted.

Embodiments of the present invention have been described, but not intending to impose any unduly constraint to the appended claims. Any modification of equivalent structure or equivalent process made according to the disclosure and drawings of the present invention, or any application thereof, directly or indirectly, to other related fields of technique, is considered encompassed in the scope of protection defined by the clams of the present invention.

Claims

1. A display panel, which comprises an active area and a vacant area surrounding the active area, and a dummy pattern area without display functionality being disposed along boundary between active area and vacant area.

2. The display panel as claimed in claim 1, characterized in that in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

3. The display panel as claimed in claim 2, characterized in that solution density at active area stays unchanged.

4. The display panel as claimed in claim 3, characterized in that the active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

5. The display panel as claimed in claim 4, characterized in that the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.

6. A manufacturing method of display panel, which comprises the steps of: disposing active area and vacant area surrounding the active area; anddisposing dummy pattern area without display functionality along boundary between active area and vacant area.

7. The manufacturing method as claimed in claim 6, characterized in that the dummy pattern area satisfies the following conditions: in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

8. The manufacturing method as claimed in claim 7, characterized in that the active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

9. The manufacturing method as claimed in claim 8, characterized in that the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.

10. A panel display device, which comprises a display panel, the display panel further comprising: an active area and a vacant area surrounding the active area, and a dummy pattern area without display functionality being disposed along boundary between active area and vacant area.

11. The panel display device as claimed in claim 10, characterized in that in a wet process of the display panel, solution density at intersection area of dummy pattern area and the active area is roughly equal to solution density at active area, and solution density at dummy pattern area gradually decreases from intersection towards vacant area.

12. The panel display device as claimed in claim 11, characterized in that solution density at active area stays unchanged.

13. The panel display device as claimed in claim 12, characterized in that the active area, vacant area and dummy pattern area are disposed on pattern layers of the display panel for lithography or etching in wet process, and the pattern layers comprise: pixel electrode layer, first metal layer and second metal layer.

14. The panel display device as claimed in claim 13, characterized in that the active area, vacant area and dummy pattern area are disposed on the pixel electrode layer and the dummy pattern area comprises a plurality of dummy pixels.