The present disclosure relates to the field of display technologies, and in particular, to a display panel and a manufacturing method thereof, a display device, and a splicing display device.
Compared with a traditional light-emitting diode (LED), a micro light-emitting diode (Micro LED) or a mini light-emitting diode (Mini LED) is a smaller particle, i.e., has a smaller size.
In an aspect, a display panel is provided. The display panel includes a substrate, a light-blocking layer, a plurality of connection leads and a light-emitting device layer. The substrate includes a first surface and a second surface opposite to each other, and a plurality of side surfaces connecting the first surface and the second surface. At least one of the plurality of side surfaces of the substrate is a selected side surface. The light-emitting device layer is disposed on the second surface of the substrate. Each of the plurality of connection leads includes a first portion located on the first surface of the substrate, a second portion located on the selected side surface of the substrate and a third portion located on the second surface of the substrate. The light-blocking layer is located between the plurality of connection leads and the substrate, and is at least located between first portions of the plurality of connection leads and the first surface of the substrate.
In some embodiments, the light-blocking layer includes a first light-blocking layer disposed on the first surface of the substrate. The first surface of the substrate has a wiring region and a non-wiring region, and the wiring region is closer to the selected side surface of the substrate than the non-wiring region. The first portions of the plurality of connection leads are located in the wiring region. The first surface of the substrate includes a plurality of sides. The first light-blocking layer is located in the wiring region and the non-wiring region of the first surface of the substrate, and a border of an orthographic projection of the first light-blocking layer on the first surface of the substrate and a corresponding side of the first surface of the substrate have a set distance therebetween.
In some other embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate. The first surface of the substrate includes the wiring region and the non-wiring region, and the wiring region is closer to the selected side surface of the substrate than the non-wiring region. The first portions of the plurality of connection leads are located in the wiring region. The first surface of the substrate includes the plurality of sides. The first light-blocking layer is located in the wiring region of the first surface of the substrate, and a border of the orthographic projection of the first light-blocking layer on the first surface of the substrate and a corresponding side of the first surface of the substrate have a set distance therebetween.
In some embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate, and the first light-blocking layer is located in the wiring region of the first surface of the substrate. In the first portions of the plurality of connection leads, a region located between first portions of every two adjacent connection leads is a gap region. The first light-blocking layer includes a plurality of first light-blocking patterns. An orthographic projection of each first light-blocking pattern in the plurality of first light-blocking patterns on the first surface of the substrate covers at least a portion of an orthographic projection of the gap region on the first surface of the substrate that is overlapped with an orthographic projection of the light-emitting device layer on the first surface of the substrate.
In some embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate, and the first light-blocking layer includes the plurality of first light-blocking patterns. A dimension of each first light-blocking pattern in the plurality of first light-blocking patterns in a first direction perpendicular to an extending direction of the first light-blocking pattern is greater than or equal to a dimension of the gap region corresponding to the first light-blocking pattern in a direction perpendicular to an extending direction of the gap region.
In some embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate, and the first light-blocking layer is located in the wiring region of the first surface of the substrate. A border of the first light-blocking layer away from the selected side surface of the substrate is farther from the selected side surface of the substrate than borders of the plurality of connection leads away from the selected side surface of the substrate.
In some embodiments, the display panel further includes a plurality of electrodes disposed on the second surface of the substrate, and each of the plurality of electrodes is connected to a third portion of a connection lead. The light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate, and the first light-blocking layer includes the plurality of first light-blocking patterns. A dimension of the first light-blocking pattern in a first direction perpendicular to an extending direction of the first light-blocking pattern is less than a distance between two adjacent electrodes to which two adjacent connection leads corresponding to the first light-blocking pattern are respectively electrically connected.
In some embodiments, the display panel further includes the plurality of electrodes disposed on the second surface of the substrate, and each of the plurality of electrodes is connected to the third portion of the connection lead. The plurality of electrodes are arranged side by side in the first direction. A sum of a distance between first portions of the two adjacent connection leads and a dimension of a first portion of a connection lead in the two adjacent connection leads in the first direction, is equal to a sum of the distance between the two adjacent electrodes to which the two adjacent connection leads are respectively electrically connected and a dimension of an electrode in the two adjacent electrodes in the first direction.
In some embodiments, the display panel further includes the plurality of electrodes disposed on the second surface of the substrate, and each of the plurality of electrodes is connected to the third portion of the connection lead. The plurality of electrodes are arranged side by side in the first direction. The two adjacent electrodes are respectively electrically connected to the two adjacent connection leads. A difference between the distance between the two adjacent electrodes and the distance between the first portions of the two adjacent connection leads is greater than a difference between the dimension of the first portion of the connection lead in the two adjacent connection leads in the first direction and a dimension of an electrode electrically connected to this connection lead in the first direction.
In some embodiments, the light-blocking layer further includes a second light-blocking layer disposed on the second surface of the substrate. The second surface of the substrate has a display region and a peripheral region disposed on a side of the display region. An orthographic projection of the second light-blocking layer on the second surface of the substrate covers at least a portion, overlapped with the display region, of a region of the second surface of the substrate corresponding to the wiring region. Moreover, a border of the orthographic projection of the second light-blocking layer on the second surface of the substrate and a corresponding side of the second surface of the substrate have a set distance therebetween.
In some embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate, and the second surface of the substrate includes the display region and the peripheral region disposed on the side of the display region. A distance between a border, proximate to the selected side surface, of the orthographic projection of the first light-blocking layer on the first surface of the substrate and the selected side surface of the substrate is less than a distance between a border of the display region proximate to the selected side surface and the selected side surface of the substrate.
In some embodiments, the first surface of the substrate includes the plurality of sides, and in the plurality of sides included in the first surface of the substrate, a side proximate to the selected side surface of the substrate is a first selected side. A distance between a border, proximate to a side in the plurality of sides of the first surface except the first selected side, of the orthographic projection of the first light-blocking layer on the first surface of the substrate and the side in the plurality of sides included the first surface of the substrate except the first selected side, is less than a distance between a border, proximate to the first selected side, of the orthographic projection of the first light-blocking layer on the first surface of the substrate and the first selected side.
In some other embodiments, the light-blocking layer further includes a second light-blocking layer disposed on the second surface of the substrate. The second surface of the substrate includes a plurality of sides, and in the plurality of sides included in the second surface of the substrate, a side proximate to the selected side surface of the substrate is a second selected side. A distance between a border, proximate to a side in the plurality of sides of the second surface except the second selected side, of an orthographic projection of the second light-blocking layer on the second surface of the substrate and the side in the plurality of sides included the second surface of the substrate except the second selected side, is less than a distance between a border, proximate to the second selected side, of the orthographic projection of the second light-blocking layer on the second surface of the substrate and the second selected side.
In yet other embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate and the second light-blocking layer disposed on the second surface of the substrate. The first surface of the substrate includes the plurality of sides, and in the plurality of sides included in the first surface of the substrate, the side proximate to the selected side surface of the substrate is the first selected side. The distance between the border, proximate to the side in the plurality of sides of the first surface except the first selected side, of the orthographic projection of the first light-blocking layer on the first surface of the substrate and the side in the plurality of sides included the first surface of the substrate except the first selected side, is less than the distance between the border, proximate to the first selected side, of the orthographic projection of the first light-blocking layer on the first surface of the substrate and the first selected side. The second surface of the substrate includes the plurality of sides, and in the plurality of sides included in the second surface of the substrate, the side proximate to the selected side surface of the substrate is the second selected side. The distance between the border, proximate to the side in the plurality of sides of the second surface except the second selected side, of the orthographic projection of the second light-blocking layer on the second surface of the substrate and the side in the plurality of sides included the second surface of the substrate except the second selected side, is less than the distance between the border, proximate to the second selected side, of the orthographic projection of the second light-blocking layer on the second surface of the substrate and the second selected side.
In some embodiments, the light-blocking layer includes the first light-blocking layer disposed on the first surface of the substrate. The first surface of the substrate includes the plurality of sides, and in the plurality of sides included in the first surface of the substrate, the side proximate to the selected side surface of the substrate is the first selected side. The distance between the border, proximate to the side in the plurality of sides of the first surface except the first selected side, of the orthographic projection of the first light-blocking layer on the first surface of the substrate and the side in the plurality of sides included in the first surface of the substrate except the first selected side is greater than or equal to 30 μm.
In some embodiments, a dimension of the light-blocking layer in a direction perpendicular to the substrate is greater than or equal to 0.3 μm.
In some embodiments, the light-blocking layer is made of an insulating light-shielding material.
In some embodiments, a reflectivity of the light-blocking layer to laser is greater than a reflectivity of the plurality of connection leads to the laser.
In some embodiments, the light-blocking layer is made of any one of silicon nitride, monocrystalline silicon, silicon oxide, fluoride and ink.
In some embodiments, the display panel further includes a protective layer disposed on a side of the plurality of connection leads away from the substrate.
In another aspect, a display device is provided. The display device includes the display panel in any one of the above embodiments.
In yet another aspect, a splicing display device is provided. The splicing display device includes display devices in any one of the above embodiments.
In yet another aspect, a manufacturing method of a display panel is provided. The manufacturing method of the display panel includes following steps.
An initial substrate is provided. The initial substrate includes a first surface and a second surface opposite to each other, and the initial substrate has a plurality of substrate partitions arranged in an array.
A plurality of light-blocking layers are formed on the initial substrate. Forming the plurality of light-blocking layers on the initial substrate, includes: at least forming a plurality of first light-blocking layers on the first surface of the initial substrate. Two adjacent first light-blocking layers have an interval therebetween, and each substrate partition includes at least one first light-blocking layer.
A plurality of driving circuit layers arranged in an array are formed on the second surface of the initial substrate. Each substrate partition includes a driving circuit layer.
The initial substrate is cut to obtain a plurality of substrates. Each substrate is provided with a driving circuit layer and at least one first light-blocking layer. The substrate includes a first surface and a second surface opposite to each other, and a plurality of side surfaces connecting the first surface and the second surface. At least one of the plurality of side surfaces is a selected side surface, and the first surface of the substrate and the first surface of the initial substrate are in a same plane.
A plurality of connection leads are formed on a side of the at least one first light-blocking layer away from the substrate. Each of the plurality of connection leads includes a first portion located on the first surface of the substrate, a second portion located on the selected side surface of the substrate and a third portion located on the second surface of the substrate. The at least one first light-blocking layer is located between first portions of the plurality of connection leads and the substrate.
A light-emitting device layer is formed on a side of the driving circuit layer away from the substrate.
In some embodiments, forming the plurality of light-blocking layers on the initial substrate, further includes a following step.
A plurality of second light-blocking layers are formed on the second surface of the initial substrate. Two adjacent second light-blocking layers have an interval therebetween, and each substrate partition includes a second light-blocking layer.
The plurality of driving circuit layers arranged in the array are formed on the second surface of the initial substrate, includes: forming the plurality of driving circuit layers arranged in the array on a side of the plurality of second light-blocking layers away from the initial substrate. Each driving circuit layer is disposed on a second light-blocking layer.
The initial substrate is cut to obtain the plurality of substrates, so that each substrate is further provided with a second light-blocking layer.
In order to describe technical solutions in the present disclosure more clearly, accompanying drawings to be used in some embodiments of the present disclosure will be introduced briefly below. Obviously, the accompanying drawings to be described below are merely accompanying drawings of some embodiments of the present disclosure, and a person of ordinary skill in the art may obtain other drawings according to these drawings. In addition, the accompanying drawings to be described below may be regarded as schematic diagrams, and are not limitations on an actual size of a product, an actual process of a method, and an actual timing of a signal involved in the embodiments of the present disclosure.
Technical solutions in some embodiments of the present disclosure will be described clearly and completely below with reference to the accompanying drawings. Obviously, the described embodiments are merely some but not all embodiments of the present disclosure. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure shall be included in the protection scope of the present disclosure.
Unless the context requires otherwise, throughout the description and the claims, the term “comprise” and other forms thereof such as the third-person singular form “comprises” and the present participle form “comprising” are construed as an open and inclusive meaning, i.e., “including, but not limited to.” In the description of the specification, the terms such as “one embodiment,” “some embodiments,” “exemplary embodiments,” “an example,” “specific example” or “some examples” are intended to indicate that specific features, structures, materials or characteristics related to the embodiment(s) or example(s) are included in at least one embodiment or example of the present disclosure. Schematic representations of the above terms do not necessarily refer to the same embodiment(s) or example(s). In addition, the specific features, structures, materials or characteristics may be included in any one or more embodiments or examples in any suitable manner.
Hereinafter, the terms such as “first” and “second” are only used for descriptive purposes, and are not to be construed as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, a feature defined with “first” or “second” may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present disclosure, the term “a plurality of/the plurality of” means two or more unless otherwise specified.
In the description of some embodiments, the term “coupled” and “connected” and derivatives thereof may be used. For example, the term “connected” may be used in the description of some embodiments to indicate that two or more components are in direct physical or electrical contact with each other. The embodiments disclosed herein are not necessarily limited to the contents herein.
The phrase “A and/or B” includes following three combinations: only A, only B, and a combination of A and B.
The use of the phase “applicable to” or “configured to” herein means an open and inclusive expression, which does not exclude devices that are applicable to or configured to perform additional tasks or steps.
As used herein, the term “about,” “substantially” or “approximately” includes a stated value and an average value within an acceptable range of deviation of a particular value. The acceptable range of deviation is determined by a person of ordinary skill in the art, considering measurement in question and errors associated with measurement of a particular quantity (i.e., limitations of a measurement system).
As used herein, the term such as “parallel,” “perpendicular” or “equal” includes a stated condition and condition(s) similar to the stated condition. The similar condition(s) are within an acceptable range of deviation as determined by a person of ordinary skill in the art, considering measurement in question and errors associated with measurement of a particular quantity (i.e., limitations of a measurement system). For example, the term “parallel” includes “absolutely parallel” and “approximately parallel”, and for the phrase “approximately parallel”, an acceptable range of deviation may be, for example, within 5°. The term “perpendicular” includes “absolutely perpendicular” and “approximately perpendicular”, and for the phrase “approximately perpendicular”, an acceptable range of deviation may also be, for example, within 5°. The term “equal” includes “absolutely equal” and “approximately equal”, and for the phrase “approximately equal”, an acceptable range of deviation may be that, for example, a difference between two that are equal to each other is less than or equal to 5% of any one of the two.
It will be understood that when a layer or element is described as being on another layer or substrate, the layer or element may be directly on the another layer or substrate, or intermediate layer(s) may exist between the layer or element and the another layer or substrate.
Exemplary embodiments are described herein with reference to sectional views and/or plan views as idealized exemplary drawings. In the accompanying drawings, thicknesses of layers and sizes of regions are enlarged for clarity. Thus, variations in shape relative to the accompanying drawings due to, for example, manufacturing techniques and/or tolerances may be envisaged. Therefore, the exemplary embodiments should not be construed to be limited to the shapes of regions shown herein, but to include deviations in shape due to, for example, manufacturing. Therefore, the regions shown in the accompanying drawings are schematic in nature, and their shapes are not intended to show actual shapes of the regions in a device, and are not intended to limit the scope of the exemplary embodiments.
In order to improve product reliability and reduce transportation costs and maintenance costs, a large-size display device may be assembled by splicing a plurality of small-size display devices.
In order to avoid fragmentation of a display picture caused by splicing, it is necessary to reduce a bezel size of a single small-size display device to reduce a width of a splicing seam. The small-size display device includes a display panel. For example, a wiring located on a display surface of the display panel may be connected to a circuit board (e.g., a flexible printed circuit) disposed on a non-display surface of the display panel through a side wiring, so that when the plurality of small-size display devices are spliced to form the large-size display device with a larger size, a distance between adjacent small-size display devices may be smaller, thereby improving the display quality.
As shown in
The first surface 1a of the substrate is a back of the display panel, and the second surface 1b of the substrate is a front of the display panel. As shown in
The first portions 31 of the plurality of connection leads 3 located on the first surface 1a are configured to be connected to a flexible printed circuit located on the first surface 1a. For example, an end of the first portion 31 away from the selected side surface 1cc is used as a bonding electrode connected to the flexible printed circuit 7. That is, it is necessary to reserve a large space for wirings on the back of the display panel for external wiring bonding. Therefore, in a direction perpendicular to the selected side surface, a line length of the first portion 31 of the connection lead 3 is greater than a line length of the third portion 33 of the connection lead. That is, the first portions of the plurality of connection leads 3 located on the first surface 1a of the substrate 1 have a length of d1, and the third portions 33 of the plurality of connection leads located on the second surface 1b of the substrate 1 have a length of d2, and d1 is greater than d2. An orthographic projection of the first portion 31 of the connection lead 3 on the second surface extends into the display region AA.
For the lengths d1 of the first portions of the plurality of connection leads 3 located on the first surface 1a of the substrate 1, there are following cases.
In some embodiments, the first portion 31 is linear. For example, as shown in
In some other embodiments, the first portion 31 is curved and bent. The first portion 31 includes a plurality of portions with different extending directions that are connected end to end in sequence. For example, as shown in
In some examples, a manufacturing process of the plurality of connection leads 3 is as follows. Connection metal layer(s), each of which is a whole layer, are respectively formed on the at least one side surface 1c of the substrate 1. For example, the connection metal layer(s) are formed by a three-dimensional sputtering coating process. The connection metal layer is located on the first surface 1a of the substrate 1, the side surface 1c of the substrate 1, and the second surface 1b of the substrate 1. Then, the connection metal layer(s) are patterned by laser process trimming to form the plurality of independent connection leads 3.
It will be understood that each connection lead 3 includes the first portion 31 located on the first surface 1a of the substrate 1, the second portion 32 located on the selected side surface 1cc of the substrate 1, and the third portion 33 located on the second surface 1b of the substrate 1, and the line length of the first portion 31 of the connection lead 3 is greater than the line length of the third portion 33 of the connection lead, so that an area of a portion of the connection metal layer located on the first surface 1a of the substrate 1 is larger than an area of a portion of the connection metal layer located on the second surface 1b of the substrate 1. In this way, in an actual laser process, a longer line length needs to be obtained by laser etching on the first surface 1a of the substrate 1. In the etching process to obtain the first portions 31 of the connection leads 3, laser may pass through the substrate 1, and may be incident into the display region AA of the second surface 1b. Referring to
In some embodiments, the driving circuit layer includes thin film transistors. When the laser is used for etching to obtain the first portions 31 of the connection leads 3, active layers of the thin film transistors in the front driving circuit layer are irradiated by the laser, so that characteristics of the thin film transistors are changed. For example, a threshold current for turning off the thin film transistor is increased, thereby affecting the display effect. The above manufacturing processes, such as the sputtering coating process and the laser process, are only described as examples, and are not intended to limit an actual production process.
A display panel, a display device and a splicing display device provided in the present disclosure will be described below.
In the present disclosure,
Hereinafter, a side of the display panel 10 provided with light-emitting devices 41, i.e., a side of the display panel 10 where a second surface 1b is located, is referred to as a front of the display panel 10, and accordingly, a side of the display panel 10 where a first surface 1a is located is referred to as a back of the display panel 10.
Some embodiments of the present disclosure provide the display panel 10. As shown in
For example, as shown in
For example, the substrate 1 is made of, for example, a rigid material such as glass, quartz, or plastic.
The driving circuit layer 6 is disposed on the second surface 1b of the substrate 1, and is located in the display region AA. The light-emitting device layer 4 is disposed on a side of the driving circuit layer 6 away from the substrate 1. The light-emitting device layer 4 includes a plurality of light-emitting devices 41. The driving circuit layer 6 includes signal wirings connected to the light-emitting devices 41, and the signal wirings are configured to transmit signals to the light-emitting devices 41 to drive the plurality of light-emitting devices 41 in the light-emitting device layer 4 to emit light. The above laser damage to the film layers on the front of the display panel includes damage to the driving circuit layer 6 and the light-emitting device layer 4.
The light-blocking layer 2 is located between the plurality of connection leads 3 and the substrate 1, and is at least located between the first portions 31 of the plurality of connection leads 3 and the substrate 1. That is, the light-blocking layer 2 is disposed on a surface of the substrate 1, and is closer to the substrate 1 than the plurality of connection leads, and is at least disposed on the first surface 1a of the substrate 1. Moreover, the light-blocking layer 2 is closer to the substrate 1 than the first portions 31 of the plurality of connection leads 3.
The light-blocking layer 2 is configured to block the laser to prevent the laser from damaging the film layers on the front of the display panel 10. For example, the light-blocking layer is capable of reflecting or absorbing the laser.
The light-blocking layer 2 is at least disposed between the first portions 31 of the plurality of connection leads 3 and the substrate 1, so that in a manufacturing process of the plurality of connection leads 3 of the display panel 10, when the laser is used for etching the connection metal layer(s), after the connection metal layer(s) are etched by laser travelling to the first surface 1a of the substrate 1 to form the first portions 31 of the plurality of connection leads, the laser is blocked by the light-blocking layer 2. For example, the light-blocking layer 2 is capable of reflecting or absorbing the laser to prevent photons from entering the front of the display panel 10, so that residual energy of the laser is prevented from generating thermal effects or even damage to the film layers (e.g., the driving circuit layer 6 shown in
In some examples, as shown in
In a case where the driving circuit layer includes thin film transistors, when etching is performed to obtain the first portions 31 of the connection leads 3 located in the wiring region(s) BB, active layers of the thin film transistors in the front driving circuit layer are irradiated by the laser, so that characteristics of the thin film transistors are changed. For example, a threshold current for turning off the thin film transistor is increased, thereby affecting the display effect.
The second light-blocking layer(s) 22 may be disposed at a position corresponding to orthographic projections, on the substrate 1, of the active layers of the thin film transistors in the driving circuit layer. In this way, after passing through the substrate 1, the laser travelling to the first surface of the substrate may be blocked by the second light-blocking layer(s) 22, so that the laser is prevented from affecting the film layers (e.g., the active layers of the thin film transistors in the driving circuit layer) on the front of the display panel 10, thereby ensuring the display effect of the display panel 10.
It will be noted that limitations on the distribution position and the shape of the light-blocking layer in the present disclosure only need to ensure that the light-blocking layer is distributed at a position of laser etching, and is capable of preventing the laser from passing through the substrate 1 to reach the front film layers.
Following descriptions of a thickness and a material of the light-blocking layer 2 are applicable to both the first light-blocking layer 21 and the second light-blocking layer 22.
Hereinafter, a dimension of the light-blocking layer 2 in a direction Z perpendicular to the substrate 1 is referred to as the thickness of the light-blocking layer 2.
In some examples, the light-blocking layer 2 is designed to be a plane layer, and thicknesses of the light-blocking layer 2 at various positions are the same or substantially the same.
In some other examples, the light-blocking layer 2 is designed to be a gradient layer, and a thickness of a portion of the light-blocking layer 2 located in a region corresponding to the display region AA is greater than a thickness of the rest of the light-blocking layer 2.
For example, as shown in
In some embodiments, the light-blocking layer 2 includes the first light-blocking layer(s) 21 disposed on the first surface 1a of the substrate 1 and the second light-blocking layer(s) 22 disposed on the second surface 1b of the substrate 1. Then, the orthographic projection of the light-blocking layer 2 on the second surface 1b of the substrate 1 refers to an orthographic projection of the first light-blocking layer(s) 21 on the second surface 1b of the substrate 1 and an orthographic projection of the second light-blocking layer(s) 22 on the second surface 1b of the substrate 1. Thicknesses of the first light-blocking layer 21 and the second light-blocking layer 22 satisfy the above description.
In some other embodiments, the light-blocking layer 2 includes only the first light-blocking layer(s) 21 disposed on the first surface 1a of the substrate 1 or the second light-blocking layer(s) 22 disposed on the second surface 1b of the substrate 1. Then, the orthographic projection of the light-blocking layer 2 on the second surface 1b of the substrate 1 refers to the orthographic projection of the first light-blocking layer(s) 21 on the second surface 1b of the substrate 1 or the orthographic projection of the second light-blocking layer(s) 22 on the second surface 1b of the substrate 1.
Furthermore, a thickness of a portion where the first portion of the light-blocking layer 2 is connected to the second portion of the light-blocking layer 2 is gradually changed. In a region of the portion where the first portion of the light-blocking layer 2 is connected to the second portion of the light-blocking layer 2, the closer to the first portion of the light-blocking layer 2, the greater the thickness of the light-blocking layer 2.
For example, as shown in
Under a premise of not affecting a stress of the light-blocking layer 2, the thickness of the light-blocking layer 2 may be appropriately increased. On one hand, due to the increased thickness of the light-blocking layer 2, the light-blocking layer 2 is capable of better blocking the laser penetration, so that an extinction ability of the light-blocking layer 2 is enhanced to weaken the laser. On another hand, the light-blocking layer 2 may further be used as a sacrificial layer. In this way, even if the light-blocking layer 2 is subjected to a mechanical damage or a chemical damage due to bumps or other reasons in the laser etching process or other processes, which results in a reduction in thickness of a damaged portion of the light-blocking layer 2, the light-blocking layer 2 may still maintain a certain thickness, and is still capable of preventing the laser from entering the display region AA on the front of the display panel 10, thereby preventing the film layers on the front of the display panel 10 from being damaged by the laser.
In some embodiments, a reflectivity of the light-blocking layer to the laser is greater than a reflectivity of the plurality of connection leads to the laser.
The reflectivity of the plurality of connection leads to the laser herein refers to a reflectivity of a material of the plurality of connection leads to the laser. When the plurality of connection leads are manufactured, after a portion between two adjacent connection leads is etched, the laser meets the light-blocking layer with a higher reflectivity to the laser. It will be understood that the absorption of the laser is reduced, thereby weakening the laser. Furthermore, the laser is prevented from passing through the substrate to be irradiated onto the film layer structures in the display region.
For example, the foregoing laser is an ultraviolet laser, and a wavelength band of the ultraviolet laser is, for example, 266 nm, 308 nm or 355 nm. An absorption rate of the light-blocking layer to the laser is greater than 1.2%.
The laser herein is a laser used when the plurality of connection leads are manufactured by the laser etching.
The light-blocking layer 2 has good optical properties. That is, the reflectivity of the light-blocking layer 2 is not less than a reflectivity of the connection metal layer(s) for manufacturing the plurality of connection leads 3 included in the display panel 10. In this way, in the process of manufacturing the plurality of connection leads 3, after the connection metal layer(s) are etched, the laser meets the light-blocking layer 2 with a higher reflectivity, and the absorption of the laser is reduced, so that the laser is weakened, thereby ensuring that the laser emitted from the back of the display panel 10 does not pass through the light-blocking layer 2 to travel to the front of the display panel 10, and thus does not cause damage to the film layers (e.g., the driving circuit layer 6 located in the display region AA) on the front of the display panel 10.
In some embodiments, the light-blocking layer 2 is made of an insulating light-shielding material.
The light-blocking layer cannot affect the drive of the display panel 10 under a premise of blocking the laser. For example, the light-blocking layer is connected to (in direct contact or electrical connection with) other structures of the display panel such as the film layers on the front of the display panel, which does not result in short circuit and signal interference problems of the display panel 10.
For example, the light-blocking layer 2 is made of any one of silicon nitride, monocrystalline silicon, silicon oxide, fluoride and ink.
The light-shielding performance of the light-blocking layer 2 is used for blocking the laser, so that the laser is prevented from damaging the film layers (e.g., the driving circuit layer 6) on the front of the display panel 10 during the processing of the display panel 10. Moreover, since the light-blocking layer 2 is made of an insulating material, in a case where the display panel 10 is further provided with conductive structures such as other connection leads, the normal operation of the display panel 10 is prevented from being affected caused by a short circuit of wirings on the back due to a fact that the light-blocking layer 2 is connected to conductive structures such as connection leads on the back of the display panel 10.
In some examples, the light-blocking layer 2 is designed to be a single layer. The light-blocking layer 2 is made of, for example, any one of silicon nitride, monocrystalline silicon, silicon oxide, fluoride and ink.
In some other examples, the light-blocking layer 2 is designed to be stacked layers. For example, the light-blocking layer 2 includes a silicon nitride layer and a silicon oxide layer arranged in sequence from a side of the substrate 1.
A specific location of the light-blocking layer 2, and the shape and the size of the light-blocking layer 2 will be described below.
In some examples, the light-blocking layer 2 is arranged next to the substrate 1. That is, the first light-blocking layer(s) 21 are arranged next to the first surface 1a of the substrate 1, and/or the second light-blocking layer(s) 22 are arranged next to the second surface 1b of the substrate 1.
In some other examples, other film layer structure(s) are included between the light-blocking layer 2 and the substrate 1. For example, a first buffer layer is further included between the first surface 1a of the substrate 1 and the first light-blocking layer 21, and/or a second buffer layer is further included between the second surface 1b of the substrate 1 and the second light-blocking layer 22.
It will be noted that the film layer structure(s) between the light-blocking layer 2 and the substrate 1 herein are not used for signal transmission, and do not participate in circuit connection. Therefore, even if the film layer structure(s) are damaged by the laser when the plurality of connection leads 3 are manufactured, the normal operation of the display panel 10 is not affected.
In some embodiments, an orthographic projection of the first light-blocking layer 21 on the first surface 1a of the substrate 1 is substantially overlapped with the first surface 1a of the substrate 1, and borders of the orthographic projection of the first light-blocking layer 21 on the first surface 1a of the substrate 1 are surrounded by borders of the first surface 1a of the substrate 1.
In some other embodiments, the first light-blocking layer 21 is only disposed between a region covered by the first portions 31 of the connection leads 3 and the substrate 1, and a border of the orthographic projection of the first light-blocking layer 21 on the first surface 1a of the substrate 1 is farther from the second portions 32 of the plurality of connection leads 3 than a corresponding border of the region covered by the first portions 31 of the connection leads 3.
In the manufacturing process of the display panel 10, the light-blocking layer 2 mainly functions to prevent photons of the laser from penetrating and reacting with the film layer structures on the front of the display panel 10 to generate heat when the plurality of connection leads 3 are manufactured by the laser etching process. Therefore, it is necessary to ensure the light-blocking layer 2 to be distributed at positions of laser etching. However, the manufacturing process of the display panel 10 further includes other laser processes.
For example, when the display panel 10 is manufactured, firstly, film layer structures required by the display panel are prepared on a whole initial substrate, and an initial light-blocking layer is formed on a surface of the initial substrate. The initial light-blocking layer is of, for example, an integral planar structure, and covers the entire surface of the initial substrate. Next, the entire initial substrate with the required film layer structures is cut, for example, by laser, so that the initial substrate is divided, along a cutting line, into a plurality of substrates on each of which the light-blocking layer is formed but the plurality of connection leads are not formed.
In this process, since the initial light-blocking layer covers the entire surface of the initial substrate, when the entire initial substrate with the required film layer structures is cut by the laser, the effect of the laser cutting is affected due to the presence of the light-blocking layer at the position of the cutting line, and defects such as edge chipping and burrs are further generated on an edge of a cut portion of the light-blocking layer along the cutting line, which results in poor adhesion of edge portions of the light-blocking layers on respective surfaces of the plurality of substrates obtained by cutting to the respective surfaces of the substrates.
Therefore, in some embodiments, in the manufacturing of the light-blocking layers, firstly, a plurality of light-blocking layers are manufactured on the entire initial substrate. The entire initial substrate may be divided into a plurality of substrate partitions. Each light-blocking layer is located in a substrate partition, and the light-blocking layer has a certain distance from a boundary region of the substrate partition. After the initial substrate is cut to obtain the plurality of substrates, the surface of the substrate is provided with the light-blocking layer, and the effect of the laser cutting is not affected by the light-blocking layer during cutting. The structure of the finally obtained display panel is as follows.
In some embodiments, as shown in
It will be understood that, due to scratching of other components of the display panel 10 and the edges of the light-blocking layer 2 in a manufacturing process of the other components of the display panel 10, the use of such design is able to effectively prevent a portion of the substrate 1 covered by the light-blocking layer 2 from being exposed caused by peeling of edges of the light-blocking layer 2 from the substrate 1, thereby avoiding a problem that the light-blocking layer 2 cannot achieve the desired light-blocking effect.
Next, the certain distance is reserved between the border of the light-blocking layer 2 and the corresponding side of the surface of the substrate 1. That is, the borders of the light-blocking layer 2 on the surface of the substrate 1 are surrounded by the borders of the surface of the substrate 1, and an area of the light-blocking layer 2 is less than an area of the surface of the substrate 1, so that a covering area of the light-blocking layer 2 on the substrate 1 and the adhesion degree of the light-blocking layer 2 and the substrate 1 are able to be ensured.
The surface of the substrate 1 refers to the first surface 1a and/or the second surface 1b of the substrate 1. In some examples, the light-blocking layer 2 includes only the first light-blocking layer(s) 21. Then, the distance between the border of the light-blocking layer 2 and the corresponding side of the surface of the substrate 1 refers to a distance between a border of the first light-blocking layer 21 and a corresponding side included in the first surface 1a of the substrate 1. In some other examples, the light-blocking layer 2 includes the second light-blocking layer(s) 22 in addition to the first light-blocking layer(s) 21. Then, the distance between the border of the light-blocking layer 2 and the corresponding side of the surface of the substrate 1 further refers to a distance between a border of the second light-blocking layer 22 and a corresponding side included in the second surface 1b of the substrate 1.
Next, the set distance between the border of the light-blocking layer 21 and the corresponding side of the first surface 1a and/or the second surface 1b of the substrate 1 may also be used as a laser clearance distance. As described above, the initial light-blocking layer as a whole layer is manufactured on the initial substrate, so that when the initial substrate is cut by the laser, the problem of poor adhesion between the edge portion of the light-blocking layer and the surface of the substrate occurs. Therefore, the initial light-blocking layer on the initial substrate is manufactured as a plurality of mutually independent patterns, and each of which is located in a region surrounded by cutting lines. When the initial substrate is cut, the cutting line is located between two adjacent light-blocking layers formed on the surface of the initial substrate. This effectively avoids the problem of poor adhesion between the edges of the light-blocking layer 2 and the substrate 1 in the manufacturing process of the display panel 10.
In some embodiments, cutting the entire initial substrate to obtain the plurality of substrates may be performed in other ways than the laser cutting, such as glass knife cutting or water jet cutting, which is not be affected by the initial light-blocking layer, so that there is no need to reserve a laser clearance distance. In this way, the initial light-blocking layer covers the entire surface of the initial substrate. In the obtained plurality of substrates, the light-blocking layer 2 is arranged next to the sides of the surface of the substrate 1, so that the distance between the border of the light-blocking layer and the corresponding side of the surface of the substrate may be zero. For example, a border of the first light-blocking layer 21 proximate to a selected side of the first surface coincides with the selected side.
For example, a distance (e.g., d9 or d10 shown in
In some embodiments, as shown in
In some embodiments, as shown in
In some embodiments, as shown in
As shown in
For example, as shown in
In some embodiments, as shown in
In some other embodiments, as shown in
In yet other embodiments, as shown in
As shown in
In this way, the second light-blocking layer 22 is able to cover at least a region of the display region AA that is overlapped with the region of the second surface 1b of the substrate 1 corresponding to the wiring region BB, and the second light-blocking layer 22 is located between an entirety of the driving circuit layer 6 and the light-emitting device layer 4 and the substrate 1. Therefore, in the manufacturing process of the display panel 10, for example, the problem of the damage to the front film layers, due to the fact that the laser emitted from the back or side of the display panel 10 is irradiated into the front display region AA, is able to be effectively avoided.
For example, the light-blocking layer 2 may cover the entire surface of the substrate 1, or only a region between the plurality of connection leads 3 and the substrate 1. There are following cases.
In some embodiments, as shown in
The first surface 1a of the substrate 1 includes the plurality of sides 1c1. The first light-blocking layer 21 is located in the wiring region(s) BB and the non-wiring region BN of the first surface 1a of the substrate 1, and there is a set distance between a border of the orthographic projection of the first light-blocking layer 21 on the first surface 1a of the substrate 1 and a corresponding side 1c1 of the first surface 1a of the substrate 1 the sides 1c1 of a surface 1a. The set distances are, for example, d9 to d12 in
In the above embodiments, the border of the orthographic projection of the first light-blocking layer 21 and the corresponding side 1c1 of the first surface 1a has the set distance therebetween. By reserving a certain distance, under the basis of ensuring that the light-blocking layer 2 functions to block the laser, the adhesion degree of the light-blocking layer 2 and the substrate 1 is able to be ensured, and other laser processes are able to be facilitated in the manufacturing process of the display panel 10.
Furthermore, as shown in
In some other embodiments, as shown in
The first surface 1a of the substrate 1 includes the plurality of sides 1c1. The first light-blocking layer(s) 21 are respectively located in the wiring region(s) BB of the first surface 1a of the substrate 1, and the border of the orthographic projection of the first light-blocking layer 21 on the first surface 1a of the substrate 1 and the corresponding side 1c1 of the first surface 1a of the substrate 1 have the set distance therebetween. The set distances are, for example, d10 to d12 in
In the above embodiments, the border of the orthographic projection of the first light-blocking layer 21 and the corresponding side 1c1 of the first surface 1a has the set distance therebetween. By reserving a certain distance, under the basis of ensuring that the light-blocking layer 2 functions to block the laser, the adhesion degree of the light-blocking layer 2 and the substrate 1 is able to be ensured, and other laser processes are able to be facilitated in the manufacturing process of the display panel 10.
In some examples, as shown in
In some other examples, as shown in
Furthermore, as shown in
Moreover, in a case where the first light-blocking layer 21 is located in the wiring region BB, and the second light-blocking layer 22 is disposed in the region corresponding to the wiring region BB on the second surface 1b of the substrate 1, the orthographic projections of the first light-blocking layer 21 and the second light-blocking layer 22 on the same surface (i.e., the first surface 1a or the second surface 1b) of the substrate 1 are overlapped or substantially overlapped.
In order to clearly describe the first light-blocking layer 21 located in the wiring region BB, structures of the first portions 31 of the connection leads 3 distributed in the wiring region BB will be described below.
In some embodiments, as shown in
As shown in
Furthermore, a plurality of first portions 31 are arranged side by side, and extend in a direction perpendicular to the selected side surface 1cc. Furthermore, the plurality of first portions 31 are equally spaced.
In some other embodiments, as shown in
Furthermore, as shown in
Furthermore, as shown in
An end of the first portion 31 of each of the plurality of connection leads 3 away from the selected side surface 1cc is referred to as a first end of the first portion 31. Accordingly, a portion of the first light-blocking layer 21 away from the selected side surface is referred to as a first end of the first light-blocking layer 21. The first light-blocking layer 21 is located in the wiring region BB, and covers all of portions of the first portions 31 of the connection leads 3 in a region corresponding to the display region AA. That is, when the first portions 31 of the plurality of connection leads 3 are formed by the laser etching, the laser does not pass through the first light-blocking layer 21, and does not travel to the film layer structures in the display region AA.
Furthermore, as shown in
The border of the first light-blocking layer 21 away from the selected side surface 1cc of the substrate 1 is farther from the selected side surface 1cc of the substrate 1 than the borders of the connection leads 3 away from the selected side surface 1cc of the substrate 1. It will be understood that a distance between the border of the first light-blocking layer 21 away from the selected side surface 1cc and the selected side surface 1cc is greater than a distance between a border, away from the selected side surface 1cc, of a region covered by the first portions 31 of the connection leads 3 and the selected side surface 1cc.
This is able to better protect the front film layer structures, compared with a design in which the border of the first light-blocking layer 21 away from the selected side surface 1cc is flush with the border, away from the selected side surface 1cc, of the region covered by the first portions 31 of the connection leads 3, i.e., the distance between the border of the first light-blocking layer 21 away from the selected side surface 1cc and the selected side surface 1cc is equal to the distance between the border, away from the selected side surface 1cc, of the region covered by the first portions 31 of the connection leads 3 and the selected side surface 1cc. It will be understood that when the plurality of connection leads 3 are formed by the laser etching, a path of the laser is dynamic. When the first end of the first portion 31 of the connection lead 3 is formed by the laser etching, in order to completely separate the first portions 31 of the connection leads 3 to avoid a short circuit between the connection leads 3 caused by a residual connection between the first ends of the first portions 31, a problem that a region irradiated by the laser exceeds the region covered by the first portions 31 of the connection leads 3 may exist. Since the border of the first light-blocking layer 21 is farther from the selected side surface 1cc, when the laser is irradiated onto the first light-blocking layer 21, the laser is able to be effectively blocked by the first light-blocking layer 21, and is not irradiated to the front of the display panel 10 to avoid the damage to the front film layers.
As shown in
In some other embodiments, as shown in
In some embodiments, there is a certain interval between two adjacent first light-blocking patterns 211. A dimension d3 of each first light-blocking pattern 211 in the direction perpendicular to the substrate 1 is greater than or equal to 0.03 μm. The dimension d3 of the first light-blocking pattern 211 in the direction perpendicular to the substrate 1 is, for example, 0.03 μm, 0.04 μm or 0.05 μm.
The first light-blocking layer 21 includes the plurality of first light-blocking patterns 211, and the plurality of first light-blocking patterns 211 are spaced apart from each other. In this way, compared with the case that the first light-blocking layer 21 is the integral pattern, the first light-blocking pattern 211 has a smaller thickness. Moreover, in a direction perpendicular to the extending direction of the first portion 31 of the connection lead 3, portions of the first portion 31 of the connection lead 3 respectively located on two sides thereof are respectively disposed on the first light-blocking patterns 211, and a portion of the first portion 31 of the connection lead 3 located at a middle thereof is directly disposed on the substrate 1. Thus, the adhesion between the first portion 31 of the connection lead 3 and the first surface 1a of the substrate 1 is able to be improved.
Moreover, when the light-blocking layer 2 is damaged, e.g., is mechanically damaged caused by bumping, or when the plurality of connection leads 3 are formed by the laser etching, the laser is irradiated onto the light-blocking layer 2 to cause damage to the light-blocking layer 2. A thickness of a damaged portion of the light-blocking layer 2 is reduced compared with a thickness at another position, so that when the reliability test is performed in the subsequent manufacturing process of the display panel 10, water vapor enters the damaged portion of the light-blocking layer 2. Furthermore, the water vapor entering the damaged portion of the light-blocking layer 2 may spread to the first portion 31 of the connection lead 3. When the first portion 31 is in contact with the water vapor, on one hand, the first portion 31 is corroded by water and oxygen, and on another hand, a risk of peeling of the first portion 31 is generated.
By arranging the plurality of first light-blocking patterns 211 spaced apart from each other, even if one or more light-blocking patterns 211 are damaged during the laser etching process, only first portion(s) 31 of connection lead(s) 3 adjacent to the damaged light-blocking patterns 211 may be affected, and the rest is not be affected, so that when the problem of water and oxygen corrosion due to the fact that the first portion(s) 31 of one or more of the connection leads 3 are affected by water vapor in the subsequent reliability test occurs, a problem of series corrosion due to spreading of water vapor to positions of first portions 31 of other connection leads 3 is avoided.
In some embodiments, a border, proximate to the selected side surface 1cc, of an orthographic projection of the first light-blocking pattern 211 on the first surface 1a of the substrate 1 is located within the orthographic projection of the gap region Q on the first surface 1a of the substrate 1. A border, away from the selected side surface 1cc, of the orthographic projection of the first light-blocking pattern 211 on the first surface 1a of the substrate 1 is flush with or substantially flush with a border, away from the selected side surface 1cc, of the orthographic projection of the gap region Q on the first surface 1a of the substrate 1.
In some other embodiments, as shown in
By lengthening the dimension of the first light-blocking pattern 211 in a length direction (i.e., direction perpendicular to the selected side surface 1cc) of the first portion 31 of the connection lead 3, the first light-blocking pattern 211 is able to better cover the gap region Q (i.e., a region to be cut by the laser) between first portions 31 of two adjacent connection leads 3. Furthermore, the laser is prevented from passing through the gap region Q between the first portions 31 of the two connection leads 3, so as to be prevented from being irradiated onto the film layers on the front of the display panel 10.
In some embodiments, the second light-blocking layer 22 includes a plurality of second light-blocking patterns. The plurality of second light-blocking patterns are located in the region of the second surface 1b of the substrate 1 corresponding to the wiring region BB. In the first portions 31 of the plurality of connection leads 3, the region between the first portions 31 of every two adjacent connection leads 3 is a gap region, and an orthographic projection of each of the plurality of second light-blocking patterns on the second surface 1b of the substrate 1 covers at least a region of the second surface 1b of the substrate 1 corresponding to a portion of an orthographic projection of a gap region on the first surface 1a of the substrate 1 that is overlapped with the orthographic projection of the light-emitting device layer 4 on the first surface 1a of the substrate 1.
For example, the light-blocking layer 2 includes the first light-blocking layer(s) 21 and the second light-blocking layer(s) 22. The first light-blocking layer 21 includes the plurality of first light-blocking patterns 211 as described above, and the second light-blocking layer 22 includes the plurality of second light-blocking patterns. The orthographic projection of each second light-blocking pattern on the second surface 1b of the substrate 1 covers at least a region of the second surface 1b of the substrate 1 corresponding to a first light-blocking pattern 211.
The shapes and thicknesses of the plurality of second light-blocking patterns are respectively the same as those of the plurality of first light-blocking patterns 211 included in the first light-blocking layer 21, and will not be repeated here.
It will be noted that this is only described as an example. In a case where the first light-blocking layer 21 is the integral film layer as shown in
In some embodiments, as shown in
In some embodiments, as shown in
In some examples, as shown in
It will be understood that, as a portion of the light-blocking layer 2, the first light-blocking pattern 211 has the same function as the light-blocking layer 2. Therefore, the first light-blocking pattern 211 fills at least a portion between the first portions 31 of two adjacent connection leads 3 adjacent thereto. That is, the dimension d4 of the first light-blocking pattern 211 in the first direction X perpendicular to the extending direction Y thereof is at least equal to the distance d6 between the first portions 31 of the two connection leads 3 corresponding to the first light-blocking pattern 211.
Furthermore, as shown in
For example, as shown in
For example, as shown in
As shown in
In some embodiments, as shown in
As shown in
In some examples, in the plurality of connection leads 3, dimensions of first portions 31 of any two adjacent connection leads 3 in the first direction X are equal.
In some other examples, in the plurality of connection leads 3, the dimensions of the first portions 31 of any two adjacent connection leads 3 in the first direction X are different. The dimension of the first portion 31 of the connection lead 3 in the first direction X is positively correlated with the dimension d7 of the electrode 5 electrically connected to this connection lead 3 in the first direction X.
In some embodiments, as shown in
In order to clearly describe the specific location of the light-blocking layer 2, as shown in
For example, as shown in
As shown in
In some embodiments, d9 is equal to d10.
In some other embodiments, d9 is not equal to d10.
In some embodiments, d11 is equal to d12.
In some other embodiments, d11 is not equal to d12.
For example, the distance between the border, proximate to the side 1c1 except the first selected sides 1c1′, of the orthographic projection of the first light-blocking layer 21 on the first surface 1a of the substrate 1 and the side 1c1 except the first selected sides 1c1′ in the plurality of sides 1c1 included in the first surface 1a of the substrate 1 is greater than or equal to 30 μm.
As shown in
d11 is, for example, 30 μm, 35 μm, or 40 μm.
d12 is, for example, 30 μm, 35 μm, or 40 μm.
It will be understood that in a case where one, two or more first light-blocking layers 21 are disposed on the substrate 1, distance relationships between borders of an orthographic projection of each first light-blocking layer 21 on the first surface 1a of the substrate 1 and the plurality of sides 1c1 included in the first surface 1a of the substrate 1 satisfy the above description.
It will be noted that in a case where each substrate 1 includes a single selected side surface 1cc and a single first light-blocking layer 21, and the first light-blocking layer 21 does not integrally cover the first surface 1a of the substrate 1, as shown in
For example, as shown in
As shown in
In some embodiments, dc1 is equal to dc2.
In some other embodiments, dc1 is not equal to dc2.
In some embodiments, dc3 is equal to dc4.
In some other embodiments, dc3 is not equal to dc4.
It will be understood that in a case where the substrate 1 includes one, two or more second light-blocking layers 22, distance relationships between borders of an orthographic projection of each second light-blocking layer 22 on the second surface 1b of the substrate 1 and the plurality of sides 1c2 included in the second surface 1b of the substrate 1 satisfy the above description.
It will be noted that in a case where each substrate 1 includes a single selected side surface 1cc and a single second light-blocking layer 22, and the second light-blocking layer 22 does not integrally cover the second surface 1b of the substrate 1, as shown in
For example, the third portion 33 of each connection lead 3 on the second surface 1b is connected to an electrode 5. In some examples, as shown in
Furthermore, as shown in
For example, as shown in
For example, each sub-pixel P includes at least one light-emitting device 41.
In some examples, as shown in
For example, the light-emitting device 41 is, but is not limited to, an organic light-emitting diode (OLED), a mini light-emitting diode (Mini LED), or a micro light-emitting diode (Micro LED).
As shown in
The buffer layer 61 is disposed on the first surface 1a of the substrate 1. The first metal layer 62 is disposed on a side of the buffer layer 61 away from the substrate 1, and includes a plurality of first signal lines 621. The insulating layer 63 is disposed on a side of the first metal layer 62 away from the substrate 1. The second metal layer 64 is disposed on a side of the insulating layer 63 away from the substrate 1, and includes the plurality of electrodes 5 and a plurality of second signal lines 641. The planarization layer 65 is disposed on a side of the second metal layer 64 away from the substrate 1. The passivation layer 66 is disposed on a side of the planarization layer 65 away from the substrate 1.
In some embodiments, as shown in
As shown in
For example, as shown in
As shown in
In some embodiments, the first metal layer 62 or the second metal layer 64 is a metal layer including a plurality of stacked structures. For example, the first metal layer 62 or the second metal layer 64 includes a titanium layer, a copper layer and a titanium layer arranged in sequence from the side of the substrate 1. Alternatively, the first metal layer 62 or the second metal layer 64 includes, for example, a molybdenum layer, a copper layer and a molybdenum layer arranged in sequence from the side of the substrate 1. Alternatively, the first metal layer 62 or the second metal layer 64 includes, for example, a molybdenum layer, an aluminum layer and a molybdenum layer arranged in sequence from the side of the substrate 1.
In some embodiments, the first metal layer 62 or the second metal layer 64 is a signal wiring layer of a single-layer structure. Furthermore, the driving circuit layer is, for example, a copper layer or an aluminum layer.
The first metal layer 62 or the second metal layer 64 needs to have good electrical conductivity, which is only described here as an example, and is not intended to limit a material used for the driving circuit layer 6.
For example, as shown in
An orthographic projection of the protective layer 8 on the substrate 1 covers an orthographic projection of the connection leads 3 on the substrate 1.
In some examples, the protective layer 8 directly covers the side of the connection leads 3 away from the substrate 1. An end of the protective layer 8 is located on the first surface 1a of the substrate 1, and a middle portion of the protective layer 8 is located on the selected side surface 1cc of the substrate 1, and another end of the protective layer 8 is located on the second surface 1b of the substrate 1.
By arranging the protective layer(s) 8, the plurality of connection leads 3 are covered, so that the plurality of connection leads 3 are isolated from external air and moisture, thereby effectively avoiding abnormal transmission of signals caused by a short circuit of the plurality of connection leads 3 due to corrosion of water and oxygen.
In another aspect, the display device 100 is provided. As shown in
Compared with traditional LEDs, mini light-emitting diodes or micro light-emitting diodes are used as the light-emitting devices 41, so that the light-emitting devices 41 occupy a smaller volume, and are smaller particles. In the same screen size, a density of light sources per unit area is higher, and a unit size of light sources is smaller. Therefore, more precise local control may be realized on the light-emitting device 41, and the problem of uneven brightness of the light-emitting device 41 does not occur, which may ensure a uniformity of display brightnesses, thereby ensuring the display quality of the display device 100.
In some embodiments, the display device 100 further includes an integrated circuit chip and the flexible printed circuit 7.
For example, as shown in
For example, the light-emitting device layer 4 further includes the pixel driving chips 42. It will be understood that the driving circuit layer 6 may also be connected to the pixel driving chips 42, so that the pixel driving chip 42 may control brightness(es) of the light-emitting device(s) 41. The pixel driving chip 42 may drive and control three light-emitting devices 41, which is not limited herein.
In yet another aspect, the splicing display device 1000 is provided. As shown in
For example, the plurality of display devices 100 in the splicing display device 1000 are arranged in an array.
For example, as shown in
In the display panel 10, the electrodes 5 are arranged side by side in the first direction X. Accordingly, the connection leads 3 are also arranged side by side in the first direction X. Another direction that is parallel to a display surface of the display device 100 and perpendicular to the first direction X is referred to as a second direction Y. The display device 100 includes a plurality of side surfaces. Hereinafter, a side surface in the plurality of side surfaces of the display device 100 proximate to the peripheral region AN of the substrate 1 is referred to as a selected side surface of the display device 100 for description.
For example, as shown in
Furthermore, as shown in
However, a dimension of the peripheral region AN in the second direction Y is very small, so that when the splicing display device 1000 is actually viewed, the splicing seam between two adjacent display devices 100 is difficult to be found by naked eyes within a viewing distance. Thus, a display picture of the splicing display device 1000 is complete, and may exhibit a good display effect.
For example, as shown in
Furthermore, as shown in
However, the dimension of the peripheral region AN in the second direction Y is very small, so that when the splicing display device 1000 is actually viewed, the splicing seam between two adjacent display devices 100 is difficult to be found by naked eyes within a viewing distance. Thus, the display picture of the splicing display device 1000 is complete, and may exhibit a good display effect.
In yet another aspect, a manufacturing method of a display panel 10 is provided.
The manufacturing method of the display panel 10, as shown in
In S1, an initial substrate 1′ is provided.
The initial substrate 1′ includes a first surface 1′a and a second surface 1′b opposite to each other.
The initial substrate 1′ includes a plurality of substrate partitions F arranged in an array.
In S2, a plurality of light-blocking layers 2 arranged in an array are formed on the initial substrate 1′.
As shown in
In S3, as shown in
In S4, the initial substrate 1′ is cut to obtain a plurality of substrates 1.
Each substrate 1 is provided with a driving circuit layer 6 and at least one first light-blocking layer 21 thereon. The substrate 1 includes a first surface 1a and a second surface 1b opposite to each other, and a plurality of side surfaces 1c connecting the first surface 1a and the second surface 1b. Each of at least one of the plurality of side surfaces 1c is a selected side surface 1cc. The first surface 1a of the substrate 1 and the first surface 1′a of the initial substrate 1′ are in the same plane.
In S5, a plurality of connection leads 3 are formed on a side of the light-blocking layer 2 away from the substrate 1.
Each of the plurality of connection leads 3 includes a first portion 31 located on the first surface 1a of the substrate 1, a second portion 32 located on the selected side surface 1cc of the substrate 1, and a third portion 33 located on the second surface 1b of the substrate 1. The first light-blocking layer 21 is located between the first portions 31 of the connection leads 3 and the substrate 1.
In S6, a light-emitting device layer 4 is formed on a side of the driving circuit layer 6 away from the substrate 1.
Since the substrate 1 is cut from the initial substrate 1′, it will be understood that the first surface 1a of the substrate 1 and the first surface 1′a of the initial substrate 1′ are in the same plane. The plurality of first light-blocking layers 21 formed on the first surface 1′a of the initial substrate 1′ are also located on the first surface 1a of the substrate 1. The driving circuit layer 6 formed on the second surface 1′b of the initial substrate 1′ is also located on the second surface 1b of the substrate 1. Hereinafter, a side of the substrate 1 provided with the light-emitting device layer 4, i.e., the second surface 1b of the substrate 1, is referred to as a front of the substrate 1, and the first surface 1a of the substrate 1 is referred to as a back surface of the substrate 1. Accordingly, initially The second surface 1′b of the initial substrate 1′ is a front of the initial substrate 1′, and the first surface 1′a of the initial substrate 1′ is a back of the initial substrate 1′.
In S5, the plurality of connection leads 3 are formed on the side of the light-blocking layer 2 away from the substrate 1. For example, firstly, metal layer(s), each of which is a whole layer, are respectively formed on the selected side surface(s) 1cc of the substrate 1 by a three-dimensional sputtering coating process. Then, the metal layer(s) are trimmed by a laser process, so that the metal layer(s) are patterned to form the plurality of connection leads 3, and a wiring (e.g. the connection lead 3) on the front of the substrate 1 detours to the back of the substrate 1 via the selected side surface 1cc. It is necessary to reserve a space for wirings on the back for external wiring bonding (for example, a portion, away from the selected side surface 1cc of the substrate 1, of the first portion 31 of each of the plurality of connection leads 3 is configured to be electrically connected to a flexible printed circuit and/or a driving chip). Therefore, the back requires longer line lengths by laser etching. That is, the first portions 31 of the plurality of connection leads 3 located on the first surface 1a of the substrate 1, are longer than third portions 33 of the plurality of connection leads 3 located on the second surface 1b of substrate 1.
That is, in an etching process of the back, the laser is irradiated into the front display region AA. As shown in
The above manufacturing processes, such as the sputtering coating process and the laser process, are only described as examples, and are not intended to limit the actual production process.
By adding S2, when S5 is performed, the first light-blocking layer(s) 21 are formed between the region covered by the first portions 31 of the plurality of connection leads 3 and the substrate 1. Therefore, when the laser process is used, the laser is able to be effectively prevented from passing through the substrate 1, so as to be prevented from being irradiated to the film layer structures on the front of the substrate 1.
In some embodiments, in S2, the light-blocking layer 2 is manufactured by using a plasma enhanced chemical vapor deposition (PECVD) method. In this way, by controlling conditions such as deposition temperature, materials with different optical properties may be produced, thereby ensuring that the properties of the manufactured light-blocking layer 2 are able to meet requirements.
In some other embodiments, in S2, the light-blocking layer 2 is manufactured by masking and printing.
In some examples, as shown in
In some other examples, as shown in
In this case, a mask is firstly placed on the first surface 1a of the substrate 1, hollows of the mask respectively correspond to the plurality of first light-blocking patterns 211. Then, the plurality of first light-blocking patterns 211 are formed by using a printing process.
For example, as shown in
In S3, the plurality of driving circuit layers 6 are formed on the second surface 1′b of the initial substrate 1′. The plurality of driving circuit layers 6 are formed on a side of the second light-blocking layers 22 away from the initial substrate 1′, and each driving circuit layer 6 is disposed on a second light-blocking layer 22. The plurality of first light-blocking layers 21 are arranged in the same layer, and different first light-blocking layers 21 are located in different substrate partitions F. The plurality of second light-blocking layers 22 are arranged in the same layer, and different second light-blocking layers 22 are located in different substrate partitions F. That is, a single substrate partition F may include a single first light-blocking layer 21 and/or a single second light-blocking layer 22.
In S4, the initial substrate 1′ is cut along the boundaries of the substrate partition F to obtain the plurality of substrates 1. Each substrate 1 is further provided with a second light-blocking layer 22.
In S2, the plurality of light-blocking layers 2 arranged in the array are formed on the initial substrate 1′. Forming the light-blocking layer 2 includes: forming the plurality of first light-blocking layers arranged in the array on the first surface 1′a of the initial substrate 1′; and/or forming the plurality of second light-blocking layers 22 arranged in an array on the second surface 1′b of the initial substrate 1′.
In some embodiments, in S2, the plurality of light-blocking layers 2 arranged in the array are directly formed on the surface of the initial substrate 1′.
The plurality of light-blocking layers 2 may be arranged next to the initial substrate 1′. That is, in the substrate 1 obtained by cutting the initial substrate 1′ with the light-blocking layers 2 and the driving circuit layers 6, the first light-blocking layer 21 is arranged next to the first surface 1a of the substrate 1, and/or the second light-blocking layer 22 is arranged next to the second surface 1b of the substrate 1.
In some other embodiments, other film structure(s) such as buffer layer(s) are formed on the surface (the first surface 1′a and/or the second surface 1′b) of the initial substrate 1′ in S1. Then, in S2, the light-blocking layer 2 is formed on a side of the formed other film structure(s) away from the initial substrate 1′.
For example, before S2, a first buffer layer is formed on the first surface 1′a of the initial substrate 1′, and the plurality of first light-blocking layers 21 formed in S2 are formed on a side of the first buffer layer away from the initial substrate 1′; and/or
before S2, a second buffer layer is formed on the second surface 1′b of the initial substrate 1′, and the plurality of second light-blocking layers 22 formed in S2 are formed on a side of the second buffer layer away from the initial substrate 1′.
It will be noted that the other film layer structure(s) such as the buffer layer(s) formed on the surface (the first surface 1′a and/or the second surface 1′b) of the initial substrate 1′ in S1 are not used for transmitting signals, and do not participate in circuit connections. Therefore, in the manufacturing process of the display panel 10, the film layer structure(s) are damaged by the laser, which does not affect the normal operation of the display panel 10.
As shown in
For example, the first surface 1a of the substrate 1 has a display region AA and peripheral region(s) AN respectively located on at least one side of the display region AA. The second surface 1b of the substrate 1 has wiring region(s) BB and a non-wiring region BN. The wiring region BB is closer to the selected side surface 1cc of the substrate 1 than the non-wiring region BN. The first portions 31 of the plurality of connection leads 3 are located in the wiring region(s) BB, and the third portions 33 of the plurality of connection leads 3 are located in the peripheral region(s) AN.
In some embodiments, as shown in
In some other embodiments, as shown in
In some embodiments, as shown in
By forming the second light-blocking layer 22 on the second surface 1b of the substrate 1, the film layer structures on the second surface 1b may be better protected. Moreover, compared with the case that the second light-blocking layer 22 is formed in the display region AA, the coverage of the second light-blocking layer 22 is slightly expanded compared with the display region AA, which is able to better protect the film layers in the display region AA.
In some examples, as shown in
Under the premise of not affecting the stress of the light-blocking layer 2, the thickness of the light-blocking layer 2 may be appropriately increased. On one hand, due to the increased thickness of the light-blocking layer 2, the light-blocking layer 2 is capable of better blocking the laser penetration, so that the extinction ability of the light-blocking layer 2 is enhanced to weaken the laser. On another hand, the light-blocking layer 2 may further be used as the sacrificial layer. In this way, even if the light-blocking layer 2 is damaged in the laser etching process or other processes, which results in a reduction in thickness of the light-blocking layer 2, the light-blocking layer 2 may still maintain a certain thickness, and is still capable of preventing the laser from entering the display region AA on the front of the display panel 10, thereby preventing the film layers on the front of the display panel 10 from being damaged by the laser.
After the plurality of connection leads 3 are formed on the side of the light-blocking layer 2 away from the substrate 1 in S3, and before the light-emitting device layer 4 is formed on the second surface 1b of the substrate 1 in S4, S3-1 is further included, i.e., protective layer(s) 8 are formed on a side of the plurality of connection leads 3 away from the substrate 1. The protective layer(s) 8 cover the plurality of connection leads 3.
In S3-1, the protective layer(s) 8 are formed to cover the side of the plurality of connection leads 3 away from the substrate 1. An end of the protective layer 8 is located on the first surface 1a of the substrate 1, and a middle portion of the protective layer 8 is located on the selected side surface 1cc of the substrate 1, and another end of the protective layer 8 is located on the second surface 1b of the substrate 1.
By arranging the protective layer(s) 8, the plurality of connection leads 3 are covered, so that the plurality of connection leads 3 are isolated from external air and moisture, thereby effectively avoiding abnormal transmission of signals caused by a short circuit of the plurality of connection leads 3 due to corrosion of water and oxygen.
The foregoing descriptions are merely specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Changes or replacements that any person skilled in the art could conceive of within the technical scope of the present disclosure shall be included in the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.
This application is a national phase entry under 35 USC 371 of International Patent Application No. PCT/CN 2022/106136 filed on Jul. 15, 2022, which is incorporated herein by reference in its entirety.
Filing Document | Filing Date | Country | Kind |
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PCT/CN2022/106136 | 7/15/2022 | WO |