This disclosure relates to display technology, in particular, to a display panel, a manufacturing method thereof, and a display apparatus.
A trend of flexible display and stretchable display such as OLED (Organic Light Emitting Diodes) display or quantum dot light emitting display is to minimize bezel for full screen actualization. Flexible display is being considered as the most optimal display for full screen actualization. As such, many display panel manufacturers invest heavily on mass production line of flexible display, rather than rigid display.
Accordingly, one example of the present disclosure is a display panel. The display panel may include a display substrate, a plurality of light emitting units on the display substrate, and a first organic layer covering the plurality of light emitting units. A surface of the first organic layer opposite from the light emitting units may include a plurality of raised portions and a plurality of recessed portions. The first organic layer may be directly in contact with the plurality of light emitting units.
Another example of the present disclosure is a display apparatus. The display apparatus may include the display panel according to one embodiment of the present disclosure.
Another example of the present disclosure is a method of manufacturing a display panel. The method may include providing a display substrate with a plurality of light emitting units on the display substrate and forming a first organic layer covering the plurality of light emitting units. A surface of the first organic layer opposite from the light emitting units may include a plurality of raised portions and a plurality of recessed portions. The first organic layer may be directly in contact with the plurality of light emitting units.
The subject matter which is regarded as the invention is particularly pointed out and distinctly chimed in the claims at the conclusion of the specification. The foregoing and other objects, features, and advantages of the invention are apparent from the following detailed description taken in conjunction with the accompanying drawings in which:
The present disclosure will be described in further detail with reference to the accompanying drawings and embodiments in order to provide a better understanding by those skilled in the art of the technical solutions of the present disclosure. Throughout the description of the disclosure, reference is made to
In this specification, the terms “first,” “second,” etc. may be added as prefixes. These prefixes, however, are only added in order to distinguish the terms and do not have specific meaning such as order and relative merits. In the description of the present disclosure, the meaning of“plural” is two or more unless otherwise specifically defined.
In the description of the specification, references made to the term “some embodiments,” “one embodiment,” “exemplary embodiments,” “example,” “specific example,” “some examples” and the like are intended to refer that specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least some embodiments or examples of the present disclosure. The schematic expression of the terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be included in any suitable manner in any one or more embodiments or examples. A number modified by “about” herein means that the number can vary by 10% thereof.
In the description of the specification, the term “light emitting unit” may be referred to organic light emitting unit, inorganic light emitting unit, or quantum dot light emitting unit.
In the description of the specification, the term “distance” may be referred to the shortest distance between two objects such as two surfaces or one point to one surface.
Accordingly,
According to the embodiments of the present disclosure, when the display panel is laterally stretched, the first organic layer can effectively relieve some of the lateral stress because of the plurality of raised portions and the plurality of recessed portions on the surface of the first organic layer.
In some embodiments, the first organic layer 201 includes at least a material selected from the group consisting of polydimethylsiloxane, polyimides, silicone resins, polyurethane, acrylic resins, rubbers and their derivatives, and mixtures thereof.
In some embodiments, as shown in
In some embodiments, the first distance h1 is about 6 um.
In some embodiments, the second distance h2 is about 2 um.
In some embodiments, a distance h5 from a top surface of the dam structure N to a top surface of the pixel define layer 206 is in a range from about 1.2 um to about 2.8 um, for example, about 2.0 um.
In some embodiments, as shown in
In some embodiments, the first inorganic layer 202 and the second inorganic layer 204 each include at least a material selected from the group consisting of SiNx, SiO2, SiC, Al2O3, ZnS, ZnO and ZSM zeolites. The ZSM zeolite includes a structure of ZnO/Al2O3/MgO.
In some embodiments, a Young's modulus of the first organic layer 201 is not larger than a Young's modulus of the second organic layer 203.
In some embodiments, since a surface of the first organic layer opposite from the light emitting units includes a plurality of raised portions and a plurality of recessed portions, the first inorganic layer, the second organic layer, and the second inorganic layer are sequentially arranged on the first organic layer and conform to the surface of the first organic layer opposite from the light emitting units. That is, the first inorganic layer, the second organic layer, and the second inorganic layer conform to the shape of the plurality of raised portions and the plurality of recessed portions on the surface of the first organic layer.
Take the first inorganic layer for example, when the display panel is laterally stretched, the first organic layer can effectively relieve some of the stress of the first inorganic layer, thereby maintaining the water/oxygen blocking capacity of the first inorganic layer. As a result, the lifespan of the display substrate is extended.
In some embodiments, the material of the first inorganic layer includes SiNx or SiON, and the thickness of the first inorganic layer is in a range from about 700 nm to about 1400 nm, for example, about 800 nm.
In some embodiments, the material of the first inorganic layer includes SiO2, and the thickness of the first inorganic layer is in a range from about 50 nm to about 400 nm, for example, about 200 nm.
In some embodiments, the material of the first inorganic layer includes Al2O3, and the thickness of the first inorganic layer is in a range from about 50 nm to about 300 nm, for example, about 120 nm.
In some embodiments, the thickness of the second organic layer is in a range from about 2 um to about 4 um, for example, about 2 um.
In some embodiments, the thickness of the second inorganic layer is in a range from about 0.05 μm to about 3 um
In some embodiments, the material of the second inorganic layer includes SiNx or SiON, and the thickness of the second inorganic layer is in a range from about 700 nm to about 1400 nm, for example, about 800 nm.
In some embodiments, the material of the second inorganic layer includes SiO2, and the thickness of the second inorganic layer is in a range from about 50 nm to about 400 nm, for example, about 200 nm.
In some embodiments, the material of the second inorganic layer includes Al2O3, and the thickness of the second inorganic layer is in a range from about 50 nm to about 300 nm, for example, about 120 nm.
In some embodiments, as shown in the
As shown in
Without being held to a particular theory,
The force F at the point A can be decomposed into force f1 and force f2 in the tangent direction and the normal direction to the waveform 405 respectively. The force F′ at the point B can be decomposed into force f3 and force f4 in the tangent direction and the normal direction to the waveform 405 respectively. As shown in
While in the direction of axis y, the waveform of the first inorganic layer 202 is transformed from waveform 405′ to waveform 406′ when the display panel is laterally stretched in the direction of 404, as shown in
In some embodiments, as shown in
In some embodiments, as shown in
As shown in
In some embodiments, the display substrate 200 includes a material selected from the group consisting of polyimides and derivatives thereof, rubbers, silicones, polyurethanes, and acrylic resins.
In some embodiments, the maximum lateral stretching rate of the display panel is in a range from about 4% to about 8%, preferably from about 5% to about 7%, for example, about 5%.
Another example of the present disclosure is a display apparatus. The display apparatus includes the display panel according to any one of the embodiments of the present disclosure.
In some embodiments, the display apparatus further includes a circular polarizer. The circular polarizer may be configured to improve at least the outdoor display quality of the display panel.
Another example of the present disclosure is a method of manufacturing a display panel. The method may include steps of providing a display substrate with a plurality of light emitting units arranged on the display substrate and forming a first organic layer covering the plurality of light emitting units. A surface of the first organic layer opposite from the light emitting units includes a plurality of raised portions and a plurality of recessed portions, and the first organic layer is directly in contact with the plurality of light emitting units.
In some embodiments, forming the first organic layer covering the plurality of light emitting units includes steps of forming a film of an first organic material, forming a plurality of recessed portions on the film of the first organic material, and forming a plurality of raised portions among the plurality of recessed portions on the film of the first organic material.
In some embodiments, prior to the step of forming the plurality of light emitting units, the method further includes a step of forming a pixel define layer. The pixel defining layer defines the plurality of light emitting units.
In some embodiments, the method of manufacturing a display panel further includes a step of forming a dam structure. The dam structure surrounds the plurality of the light emitting units. The step of forming a dam structure may be prior to forming the first organic layer.
The method of manufacturing a display panel according to some embodiments of the present disclosure is described in detail below with reference to
In some embodiments, as shown in
In some embodiments, as shown in
In some embodiments, forming the film of the first organic material includes forming a film of oligomers by an ink-jet printing technique, followed by curing the film of the oligomers by ultra violet light.
In some embodiments, forming the film of the first organic material includes forming a film of a polymer solution by an ink-jet printing technique, followed by solidifying the film of the polymer solution through evaporation of the solvent.
In some embodiments, the thickness of the film of the first organic material is in a range from about 4 um to about 12 um, for example, about 7 um.
In some embodiments, as shown in
In some embodiments, as shown in
In some embodiments, the plurality of raised portions and the plurality of the recessed portions are formed on the film of the first organic material by a laser direct-writing technique. The energy of the laser can be controlled by applying a certain pulse so as to form a three-dimensional shape of the plurality of raised portions and the plurality of the recessed portions.
In some embodiments, as shown in
In some embodiments, the method of manufacturing a display panel further includes a step of forming a first inorganic layer by a chemical vapor deposition technique, a magnetron sputtering technique, or an atomic layer deposition technique.
In one embodiment, as shown in
In some embodiments, the material of the first inorganic layer includes SiNx or SiON, and the first inorganic layer is formed by a chemical vapor deposition technique. A thickness of the first inorganic layer is in a range from about 700 nm to about 1400 nm, for example, about 800 nm.
In some embodiments, the material of the first inorganic layer includes SiO2, and the first inorganic layer is formed by an atomic layer deposition technique. A thickness of the first inorganic layer is in a range from about 50 nm to about 400 nm, for example, about 200 nm.
In some embodiments, the material of the first inorganic layer includes Al2O3, and the first inorganic layer is formed by an atomic layer deposition technique. A thickness of the first inorganic layer is in a range from about 50 nm to about 300 nm, for example, about 120 nm.
In some embodiments, the method of manufacturing a display panel further includes a step of forming a second organic layer. The second organic layer may be formed using the same method described in the above embodiments of forming the first organic layer. A thickness of the film of the second organic material is in a range from about 2 um to about 4 um, for example, about 2 um.
In one embodiment, as shown in
In some embodiments, the method of manufacturing a display panel further includes a step of forming a second inorganic layer by a chemical vapor deposition technique, a magnetron sputtering technique, or an atomic layer deposition technique. A thickness of the second inorganic layer is in a range from about 0.05 μm to about 3 um, preferably from about 0.5 μm to about 2 μm
In some embodiments, the material of the second inorganic layer includes SiNx or SiON, and the second inorganic layer is formed by a chemical vapor deposition technique. A thickness of the second inorganic layer is in a range from about 700 nm to about 1400 nm, for example, about 800 m.
In some embodiments, the material of the second inorganic layer includes SiO2, and the second inorganic layer is formed by an atomic layer deposition technique. A thickness of the second inorganic layer is in a range from about 50 nm to about 400 nm, for example, about 200 nm.
In some embodiments, the material of the second inorganic layer includes Al2O3, and the second inorganic layer is formed by an atomic layer deposition technique. A thickness of the second inorganic layer is in a range from about 50 nm to about 300 nm, for example, about 120 nm.
In one embodiment, as shown in
In some embodiments, the method of manufacturing a display panel further include a step of forming a third organic layer by an ink-jet printing technique followed by a solidifying process or a curing process. The third organic layer has a substantially flat top surface opposite from the display substrate,
In one embodiment, as shown in
The method of manufacturing a display panel according to some embodiments of the present disclosure is compatible to the present manufacturing process. Thus, there's no need to modify the existing manufacturing line, thereby reducing the production cost.
The principle and the embodiment of the disclosure are set forth in the specification. The description of the embodiments of the present disclosure is only used to help understand the method of the present disclosure and the core idea thereof. Meanwhile, for a person of ordinary skill in the art, the disclosure relates to the scope of the disclosure, and the technical embodiment is not limited to the specific combination of the technical features, and also should covered other technical embodiments which are formed by combining the technical features or the equivalent features of the technical features without departing from the inventive concept. For example, technical embodiments may be obtained by replacing the features described above as disclosed in this disclosure (but not limited to) with similar features.
Filing Document | Filing Date | Country | Kind |
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PCT/CN2018/113452 | 11/1/2018 | WO | 00 |