The disclosure generally relates to display technology, especially that which is focused on emissive LED display technology.
Various display technologies (e.g., liquid crystal displays (LCDs)) are widely used in displays for electronic devices, such as laptops, smart phones, digital cameras, billboard-type displays, and high-definition televisions. In addition, other display technologies, such as organic light-emitting diodes (OLEDs) and electronic paper displays (EPDs), are gaining in public attention.
LCD panels may be configured as disclosed, for example, in Wu et al., U.S. Pat. No. 6,956,631, which is assigned to AU Optronics Corp., the parent company of the assignee of the current application, and hereby incorporated by reference in its entirety. As disclosed in Wu et al. FIG. 1, the LCD panel may comprise a top polarizer, a lower polarizer, a liquid crystal cell, and a back light. Light from the back light passes through the lower polarizer, through the liquid crystal cell, and then through the top polarizer. As further disclosed in Wu et al. FIG. 1, the liquid crystal cell may comprise a lower glass substrate and an upper substrate containing color filters. A plurality of pixels comprising thin film transistor (TFT) devices may be formed in an array on the glass substrate, and a liquid crystal compound may be filled into the space between the glass substrate and the color filter forming a layer of liquid crystal material.
Still, the structure of TFTs in displays may be various. For instance, The TFTs, gate and data lines, and pixel electrodes may be formed in a multilayer structure such as that shown in FIGS. 1 and 2E of Lai et al., U.S. Pat. No. 7,170,092 and in its division U.S. Pat. No. 7,507,612, both of which are assigned to AU Optronics Corp., the parent company of the assignee of the current application, and both of which are hereby incorporated by reference in their entireties. The multilayer structure may comprise a first conducting layer, a first insulating layer, a semiconductor layer, a doped semiconductor layer, and a second conducting layer disposed in sequence on the substrate. It may further comprise a second insulating layer and a pixel electrode disposed on the second insulating layer. The first conducting layer may comprise at least one of a gate line or a gate electrode. The doped semiconductor layer may comprise a source and a drain. The second conducting layer may comprise a source electrode and a drain electrode. The multilayer structure may be formed using a series of wet and dry etching processes, for example as disclosed in Lai et al. FIGS. 2A-2D.
Additional techniques for forming TFTs are disclosed in Chen, U.S. Pat. No. 7,652,285, which is assigned to AU Optronics Corp., the parent company of the assignee of the current application, and hereby incorporated by reference in its entirety. As disclosed in Chen, to form the channel of the TFT, the second metal layer is etched in order to open a portion of the second metal layer over the gate electrode and to separate the source region and drain region. This etching can be performed in multiple ways, including the back-channel etching process disclosed for example in Chen FIGS. 2A-2E and the etch stop process disclosed for example in Chen FIGS. 5A-5D and 6. Chen discloses that TFT leakage currents may be reduced by adding a spacer layer formed at the sidewalls of the conductive doped amorphous silicon layer, isolating the conductive amorphous silicon layer from the insulating layer. Chen discloses that this spacer layer can be formed by oxidizing the exposed surface of the conductive amorphous silicon layer after the etch of the second metal layer is performed. Chen discloses that this surface may be oxidized by a number of different techniques, including oxygen plasma ashing, or the use of ozone plasma in the presence of carbon tetrafluoride and sulfur hexafluoride gases
As explained in Sawasaki et al., U.S. Pat. No. 7,557,895, which is assigned to AU Optronics Corp., the parent company of the assignee of the current application, and hereby incorporated by reference in its entirety, the thickness of the liquid crystal layer typically must be uniformly controlled, in order to avoid unevenness in brightness across the LCD panel. As disclosed in Sawasaki et al., the required uniformity may be achieved by disposing a plurality of pillar spacers between the TFT substrate and the color filter substrate. As further disclosed in Sawasaki et al., the pillar spacers may be formed with different heights, such that some spacers have a height that is greater than the gap between the substrates and other spacers have a height that is less than the gap between the substrates. This configuration may permit the spacing between the substrates to vary with temperature changes but also prevent excessive deformation when forces are applied to the panel.
Sawasaki et al. further discloses a method for assembling the substrates with the liquid crystal material between them. This method comprises steps of preparing the two substrates, coating a sealing material on the circumference of the outer periphery of one of the pair of substrates, dropping an appropriate volume of liquid crystal on one of the pair of substrates, and filling in the liquid crystal between the pair of substrates by attaching the pair of substrates in a vacuum followed by returning the attached pair of substrates to atmospheric pressure.
In LCD panels, the semiconductor material making up the TFT channel may be amorphous silicon. However, as disclosed in Chen, U.S. Pat. No. 6,818,967, which is assigned to AU Optronics Corp., the parent company of the assignee of the current application, and hereby incorporated by reference in its entirety, poly-silicon channel TFTs offer advantages over amorphous silicon TFTs, including lower power and greater electron migration rates. Poly-silicon may be formed by converting amorphous silicon to poly-silicon via a laser crystallization or laser annealing technique. Use of the laser permits fabrication to occur at temperatures below 600° C., and the fabricating technique is thus called low temperature poly-silicon (LTPS). As disclosed in Chen, the re-crystallization process of LTPS results in the formation of mounds on the surface of the poly-silicon layer, and these mounds impact the current characteristics of the LTPS TFT. Chen discloses a method to reduce the size of the LTPS surface mounds, by performing a first anneal treatment, then performing a surface etching treatment, for example using a solution of hydrofluoric acid, and then performing a second anneal treatment. The resulting LTPS surface has mounds with a height/width ratio of less than 0.2. A gate isolation layer, gate, dielectric layer, and source and drain metal layers can then be deposited above the LTPS layer to form a complete LTPS TFT.
As disclosed in Sun et al., U.S. Pat. No. 8,115,209, which is assigned to AU Optronics Corp., the parent company of the assignee of the current application, and hereby incorporated by reference in its entirety, a disadvantage of LTPS TFTs compared to amorphous silicon TFTs is a relatively large leakage current during TFT turn off. Use of multiple gates reduces leakage current, and Sun et al. discloses a number of different multi-gate structures for a polycrystalline silicon TFT, including those shown in Sun et al. FIGS. 2A-2B and 3-6.
Recently, emerging display technologies such as AMOLED, microLED or AMLED for use as the backlight of a TFT-LCD all require a TFT matrix circuit to control the emissive brightness of the emissive display, which is typically an emissive LED display. Typically, the brightness of the emissive LED is controlled by the amplitude of the current passing through a control TFT matrix circuit, which is sensitive to the threshold of the control TFT. Also, a significant amount of power tends to be consumed by the control TFT.
Therefore, there is a perceived need for improvements in power consumption and/or sensitivity to TFT threshold voltage variation.
Display systems and methods involving time-modulated current control are provided. In one embodiment, a display system comprises: a pixel array having a plurality of pixels, a plurality of gate lines, and a plurality of data lines; a first of the plurality of pixels having a first thin film transistor (TFT), a second TFT, a storage capacitor, and a light emitting diode (LED); the first TFT having a first gate electrode, a first source electrode, and a first drain electrode, the first gate electrode being electrically coupled to a first of the plurality of gate lines, the first source electrode and the first drain electrode being electrically coupled between a first of the plurality of data lines and a first terminal of the storage capacitor; the second TFT having a second gate electrode, a second source electrode, and a second drain electrode, the second gate electrode being electrically coupled between the first TFT and the storage capacitor; the LED being electrically coupled to the second TFT; wherein the storage capacitor is configured to store a data voltage corresponding to a data signal, coupled to the first terminal, from the first of the plurality of data lines during an on-time of the first TFT; and wherein the LED is controllable to emit light at a brightness corresponding to duration of a driving current flowing through the LED, the driving current being provided to the LED in response to the data voltage from the storage capacitor and a pulse width modulated (PWM) signal, coupled to a second terminal of the storage capacitor terminal and configured as a sawtooth waveform, being provided to the second gate electrode.
In some embodiments, the display system further comprises: a third TFT coupled to the PWM signal; and a fourth TFT coupled to a reference signal.
In some embodiments, the first TFT, second TFT, and fourth TFT are a same type of TFT; and the third TFT is a different type of TFT
In some embodiments, each of the first TFT, second TFT, and fourth TFT is an N-type TFT; and the third TFT is a P-type TFT.
In some embodiments, each of the first TFT, second TFT, and fourth TFT is a P-type TFT; and the third TFT is an N-type TFT.
In some embodiments, the third TFT has a third gate electrode, a third source electrode, and a third drain electrode; and the third source electrode and the third drain electrode are electrically coupled to the second terminal of the storage capacitor.
In some embodiments, the fourth TFT has a fourth gate electrode, a fourth source electrode, and a fourth drain electrode; and the fourth source electrode and the fourth drain are electrically coupled to the second terminal of the storage capacitor.
In some embodiments, the fourth source electrode and the fourth drain electrode are electrically coupled between the second terminal of the storage capacitor and third TFT.
In one embodiment, a method of controlling a pixel array comprises: providing a pixel array having plurality of pixels, a plurality of gate lines, and a plurality of data lines; a first of the plurality of pixels having a first thin film transistor (TFT), a second TFT, a storage capacitor, and a light emitting diode (LED); the first TFT having a first gate electrode, a first source electrode, and a first drain electrode, the first gate electrode being electrically coupled to a first of the plurality of gate lines, the first source electrode and the first drain electrode being electrically coupled between a first of the plurality of data lines and a first terminal of the storage capacitor; the second TFT having a second gate electrode, a second source electrode, and a second drain electrode, the second gate electrode being electrically coupled between the first TFT and the storage capacitor; the LED being electrically coupled to the second TFT; storing, with the storage capacitor, a data voltage corresponding to a data signal from the first of the plurality of data lines during an on-time of the first TFT; and controlling the LED to emit light at a brightness corresponding to the duration of a driving current flowing through the LED, the driving current being provided to the LED in response to the data voltage on the storage capacitor and a pulse width modulated (PWM) signal, configured as a sawtooth waveform, corresponding to a threshold voltage of the second TFT.
In some embodiments, the controlling the LED to emit light comprises controlling the LED to begin emitting light only a time at which a voltage level, which corresponds to the data voltage and the PWM signal combined, exceeds the threshold voltage of the driving TFT.
In some embodiments, the controlling the LED to emit light comprises providing a reference signal coupled to the storage capacitor.
In some embodiments, the reference signal is a fixed voltage signal.
In some embodiments, the reference signal is a shifted waveform corresponding to the PWM signal.
In some embodiments, the on-time of the first transistor is controlled by a scan signal coupled to the gate electrode of the first transistor; and a lowest voltage level of the scan signal is lower than a lowest voltage level of the data signal.
In one embodiment, a pixel circuit comprises: a light emitting diode (LED) and a storage capacitor; a first transistor having a gate electrode, a source electrode, and a drain electrode, the gate electrode being electrically coupled to a gate line, the source electrode and the drain electrode being electrically coupled between a data line and a first terminal of the storage capacitor; a second transistor having a gate electrode, a source electrode, and a drain electrode, the gate electrode of the driving transistor being electrically coupled between the first transistor and the first terminal of the storage capacitor; the LED being electrically coupled between the second transistor and a first fixed voltage source (VDD); wherein the storage capacitor is configured to store a data voltage corresponding to a data signal, coupled to the first terminal, from the data line during an on-time of the first transistor; and wherein the LED is controllable to emit light at a brightness corresponding to duration of a driving current flowing through the LED, the driving current being provided to the LED in response to the data voltage from the storage capacitor and a pulse width modulated (PWM) signal, coupled to a second terminal of the storage capacitor and configured as a sawtooth waveform, being provided to the gate electrode of the second transistor.
In some embodiments, the pixel circuit further comprises: a third transistor coupled to the PWM signal; and a fourth transistor coupled to a reference signal.
In some embodiments, the reference signal is a fixed voltage signal.
In some embodiments, the reference signal is a shifted waveform corresponding to the PWM signal.
In some embodiments, the PWM signal exhibits a cut-off at a predetermined voltage level.
In some embodiments, the LED is controlled to begin emitting light only a time at which an integration of a voltage level of the PWM signal and a voltage level of the data voltage from the storage capacitor corresponds to a threshold voltage of the second transistor.
In some embodiments, the on-time of the first transistor does not occur at a time associated with a falling voltage level of the PWM signal.
In some embodiments, the on-time of the first transistor is controlled by a scan signal coupled to the gate electrode of the first transistor; and a lowest voltage level of the scan signal is lower than a lowest voltage level of the data signal.
Other objects, features, and/or advantages will become apparent from the following detailed description of the preferred but non-limiting embodiments. The following description is made with reference to the accompanying drawings.
For ease in explanation, the following discussion describes several embodiments of systems and methods involving time-modulated current control. It is to be understood that the invention is not limited in its application to the details of the particular arrangements shown since the invention is capable of other embodiments. Also, the terminology used herein is for the purpose of description and not of limitation.
In this regard, as will be described in greater detail below, various systems and methods control the brightness of an emissive LED by controlling the width (i.e., the time duration) of a driving current flowing through the LED. In some embodiments, the ON period of an associated driving (or control) TFT is controlled by a data voltage, which is stored in a storage capacitor and transferred through a switch TFT when the switch TFT is turned ON during a line time. By controlling the brightness of the LED in each pixel by the width of driving current, potentially significant reductions in power consumption and/or reduced sensitivity of TFT threshold voltage variation may be achieved in some embodiments.
Preferred embodiments will now be described with reference to the drawings. In particular,
As shown in
In operation, storage capacitor 222 is configured to store, during an ON-time of TFT 202, a data voltage (VD[n]) corresponding to a data signal D[n] from data line 164. A driving current (Idt[n]) is provided to LED 232 in response to data voltage (VD[n]), which is combined with and a pulse width modulated (PWM) signal (VPWMCT[n]), being provided to gate electrode 214 of TFT 212. In this regard, PWM signal (VPWMCT[n]) is coupled to a second terminal 226 of storage capacitor 222. The data voltage (VD[n]) and the PWM signal (VPWMCT[n]) are combined and provided to gate electrode 214 of TFT 212, thus controlling LED 232 to emit light at a brightness corresponding to integration (i.e., a width) of the driving current (Idt[n]) flowing through LED 232. So configured, driving current (Idt[n]) is controlled by a time-modulated pulse at point Q[n], which corresponds to gate electrode 214 of TFT 212. The voltage at Q[n] is established by the inputs of the data voltage (VD[n]) at a scanning time and the PWM signal (VPWMCT[n]) so that, when the integration of the voltage levels of these signals corresponds to (e.g., exceeds) a threshold voltage of the second TFT, the driving current is provided to the LED. The level voltage at point D[n] (i.e., the data voltage (VD[n])) is a voltage stored in storage capacitor 222 when TFT 204 is turned ON at a line time on gate line 162. Notably, in some embodiments, the PWM signal is a sawtooth-like waveform with a cut-off below a threshold voltage.
As shown in
With continued reference to
In block 504, for the first of the plurality of pixels, a data voltage is stored. In particular, a data voltage corresponding to a data signal from the first of the plurality of data lines is stored by the storage capacitor during an ON-time of the first TFT. In some embodiments, the ON-time of the first TFT is controlled by a scan signal coupled to the gate electrode of the first TFT. Further, in some embodiments, a lowest voltage level of the scan signal is lower than a lowest voltage level of the data signal. Additionally or alternatively, in some embodiments, such as in that of
In block 506, for the first of the plurality of pixels, brightness of the LED is controlled based on a driving current that is responsive to the data voltage and a PWM signal. Specifically, the LED is controlled to emit light at a brightness corresponding to integration of a driving current flowing through the LED. The driving current is provided to the LED in response to the data voltage from the storage capacitor and a pulse width modulated (PWM) signal, which may be configured as a sawtooth waveform. In some embodiments, controlling the LED involves controlling the LED to begin emitting light only a time at which a voltage level of the PWM signal exceeds a voltage level of the data voltage from the storage capacitor. In some embodiments, the reference signal (mentioned in block 504) may be a fixed voltage signal or a shifted waveform corresponding to the PWM signal.
TFT 630 includes a gate electrode 634, which is electrically coupled to gate line 602, as well as source and drain electrodes 636, 638, which are electrically coupled to a second terminal 654 of storage capacitor 650. TFT 640 includes a gate electrode 644, which is electrically coupled to gate line 602, as well as source and drain electrodes 646, 648, which also are coupled to second terminal 654 of storage capacitor 650. In this embodiment, source and drain electrodes 646, 648 are electrically coupled between second terminal 654 of storage capacitor 650 and TFT 630. Notably, TFT 630 is coupled to a PWM signal (PWMCT[n]) and TFT 640 is coupled to a reference signal (CSTREF). Additionally, it should be noted that, in some embodiments, the TFTs 610, 620 and 640 are the same type of TFT, and TFT 630 is a different type of TFT. Thus, in some embodiments, TFTs 610, 620 and 640 are N-type TFTs, and TFT 630 is a P-type TFT, while in other embodiments, TFTs 610, 620 and 640 are P-type TFTs, and TFT 630 is an N-type TFT.
In a particular embodiment, TFT 630 is an N-type TFT and TFT 640 is a P-type TFT. In this embodiment, the gate electrodes 634, 644 of TFTs 630, 640 are electrically coupled to gate line 602; as one electrode of each of TFT 630, 640 are coupled to second terminal 654 of storage capacitor 650. TFT 630 and TFT 640 may not turn on during the same period. During the scanning time, TFT 630 receives the reference signal (CSTREF) at the second terminal 654 of storage capacitor 650; after the scanning time, TFT 640 receives the PWM signal (PWMCT[n]) at the second terminal 654 of storage capacitor 650.
The reference signal (CSTREF) may be a constant zero voltage, a fixed voltage, or a shifted waveform of the PWM signal (PWMCT[n]). If the reference signal (CSTREF) is a fixed voltage, a fixed grey level (e.g., L255) of the data signals D[n] at the voltage of the point Q[n] will be different for pixels VQ[1] and VQ[1080], because the waveforms of PWMCT[1] and PWMCT[1080] are different. The results to the brightness of different pixels D[1] and D[1080] will be slightly different. If the reference signal (CSTREF) is the shifted waveform of the PWM signal (PWMCT[n]), the brightness performance of different pixels will be physically the same, which may improve display quality of the display system 100.
In operation, when the gate signal (S[n]) provided on gate line 602 turns ON, TFTs 610 and 630 are turned ON and TFT 640 turns OFF. This enables the data voltage on data line 604 to be transferred to terminal 652 of storage capacitor 650 and the reference voltage of CSTREF to be transferred to terminal 654 of storage capacitor 650. When the gate signal is turned OFF (and becomes negative), TFTs 610 and 630 are turned OFF and TFT 640 turns ON. This enables the voltage of PWM signal (PWMCT[n]) to be transferred to terminal 654 of storage capacitor 650, which boosts the voltage of terminal 652 of storage capacitor 650. This results in a boost in voltage at Q[n] (i.e., at gate electrode 624 of driving TFT 620) owing to the voltage combination of the data voltage and the voltage PWMCT[n] for the off period until the gate signal S[n] is turned on again. Notably, driving TFT 620 will turn ON and driving current (Idt[n]) will flow only when voltage at Q[n] is above the threshold voltage of driving TFT 620.
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The embodiments described above are illustrative of the invention and it will be appreciated that various permutations of these embodiments may be implemented consistent with the scope and spirit of the invention.
Number | Name | Date | Kind |
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20040246202 | Yamashita | Dec 2004 | A1 |
20060132053 | Cho | Jun 2006 | A1 |
20160351130 | Kikuchi | Dec 2016 | A1 |
Number | Date | Country |
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107481662 | Dec 2017 | CN |