ECR-Powered Sputtering Techniques for the Deposition of Metal Oxide Thin Films (Including Superconductors)

Information

• NSF Award
• 9160531

Owner

• Applied Science & Technology, Inc.

• Award Id

  9160531

• Award Effective Date

  1/1/1992 - 33 years ago

• Award Expiration Date

  11/30/1992 - 32 years ago

• Award Amount

  $ 50,000.00

• Award Instrument

  Standard Grant

This project will develop an electron cyclotron resonance (ECR) sputter source for metal oxide thin film deposition employing solid metal oxide targets as a material source. In Phase I, yttrium- barium-copper-oxide will be used as the specific metal oxide in order to evaluate and eliminate the effects of film damage by energetic particle bombardment ordinarily seen in conventional on- axis sputtering experiments. Recent work by another group suggests a way to develop a large area high rate ECR metal oxide deposition source which can overcome previous difficulties with on-axis sputter magnetrons. Experiments will be carried out on a suitably modified ECR test stand which will enable us to characterize both the plasma formation through microwave ECR plasma production and the RF sputtering of metal oxide targets. The technology would be compatible with currently available semiconductor tools.

• Program Officer

  Ritchie B. Coryell

• Min Amd Letter Date

  2/4/1992 - 33 years ago

• Max Amd Letter Date

  11/10/1992 - 32 years ago

• ARRA Amount

• Name

  Applied Science and Technology Inc

• City

  Woburn

• State

  MA

• Country

  United States

• Address

  35 Cabot Road

• Postal Code

  018011053

• Phone Number

  6179335560

• First Name

  Richard

• Last Name

  Post

• Start Date

  1/1/1992 12:00:00 AM

• Name

  Engineering-Metallurgy & Material

• Code

  57