eFuse and method of manufacturing eFuse

Abstract

A silicide region includes a first contact region, a fuse region having a narrower longitudinal width than that of the first contact region, and a second contact region provided on an opposite side of the fuse region with respect to the first contact region. A non-silicide region is provided at a position adjacent to a non-fuse-contacting side that is opposite to a side on which the second contact region in contact with the fuse region.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-section of a conventional eFuse;

FIG. 2 is a plan view of the conventional eFuse;

FIG. 3A is a cross-section of the conventional eFuse before blowing; and

FIG. 3B is a cross-section of the conventional eFuse after blowing.

FIG. 4 is a cross-section of an eFuse according to an embodiment of the present invention;

FIG. 5 is a cross-section of an eFuse according to an example of the embodiment;

FIG. 6A is a plan view of an eFuse according the example;

FIG. 6B illustrates another example of the eFuse according the embodiment;

FIG. 7 illustrates still another example of the eFuse according the embodiment;

FIG. 8A is a schematic for illustrating a manufacturing process of the eFuse according to the embodiment;

FIG. 8B is a schematic for illustrating the manufacturing process of the eFuse according to the embodiment;

FIG. 8C is a schematic for illustrating the manufacturing process of the eFuse according to the embodiment;

FIG. 8D is a schematic for illustrating the manufacturing process of the eFuse according to the embodiment;

FIG. 8E is a schematic for illustrating the manufacturing process of the eFuse according to the embodiment;

FIG. 8F is a schematic for illustrating the manufacturing process of the eFuse according to the embodiment;

FIG. 9 illustrates still another example of the eFuse according to the embodiment;

FIG. 10 illustrates still another example of the eFuse according the embodiment;

FIG. 11 illustrates still another example of the eFuse according to the embodiment;

FIG. 12 illustrates still another example of the eFuse according to the embodiment;

FIG. 13 illustrates still another example of the eFuse according to the embodiment;

Claims

1. An efuse, comprising: a first contact region;a second contact region;a fuse region provided between the first contact region and the second contact region and configured to connect the first contact region and the second contact region; anda non-silicide region arranged in at least a part of region adjacent to the second contact region.

2. The eFuse according to claim 1, wherein, the non-silicide region is arranged on a side on which the second contact region is in contact with the fuse region.

3. The eFuse according to claim 1, wherein, the non-silicide region is arranged on a side opposite to a side on which the second contact region is in contact with the fuse region.

4. The eFuse according to claim 3, wherein the non-silicide region is configured to have approximately same width as a width of the fuse region in a direction perpendicular to a longitudinal direction thereof.

5. The eFuse according to claim 3, wherein the non-silicide region is configured to have approximately same width as a width of the fuse region in a direction perpendicular to a longitudinal direction thereof, and is arranged on an extension of the fuse region.

6. The eFuse according to claim 1, wherein the non-silicide region is arranged on at least one of sides of the second contact region, the sides with respect to a side on which the second contact region is in contact with the fuse region and a side opposite to the side on which the second contact region is in contact with the fuse region.

7. The eFuse according to claim 1, wherein the non-silicide region is arranged in at least a part of region adjacent to the fuse region.

8. The eFuse according to claim 1, wherein at least one of the first contact region and the second contact region is configured to have a polygonal shape, and one side of the polygonal shape is connected to the fuse region.

9. An eFuse, comprising: a first contact region;a second contact region;a fuse region provided between the first contact region and the second contact region and configured to connect the first contact region and the second contact region; anda non-silicide region-arranged in at least a part of region adjacent to the fuse region.

10. A method of manufacturing an eFuse, comprising: forming a poly-silicon layer;forming a silicon oxide layer in a predetermined position on the poly-silicon layer;forming a metal film on the poly-silicon layer and the silicon oxide layer; andapplying an annealing process on the metal film to form a silicide region on an upper layer of the poly-silicon layer.

11. The method according to claim 10, wherein the silicon oxide layer is formed using a photo-resist.