Claims
- 1. An electric dust collector system for collecting dust particles in the air utilizing electric field, comprising:
- charging means for charging the dust particles; and
- collector means for collecting the charged dust particles wherein a plurality of electrodes therefor include a metallic oxide semiconductive layer which is formed inwardly from the surface of the electrodes by an oxidation treatment, and wherein said metallic oxide semiconductive layer is formed inwardly within over the whole surface of said electrodes.
- 2. An electric dust collector system as claimed in claim 1, wherein said oxidation treatment is selected from the group consisting of a thermal treatment, an oxygen-ion implantation, an excess thermal oxidation followed by ionitriding, an anodic oxidation and a chemical conversion treatment.
- 3. An electric dust collector system as claimed in claim 1, wherein said charging means comprises ionizer means having a plurality of ionizer electrodes for charging the dust particles; and
- wherein said collector means has said plurality of collector electrodes for collecting the charged dust particles; the collector electrodes being disposed counter to the ionizer electrodes, the collector electrodes including said metallic oxide semiconductive layer being formed inwardly from the surface of the collector electrodes by said oxidation treatment.
- 4. The electric dust collector system according to claim 3, wherein the thickness of the metallic oxide semiconductive layer is in the range of 2-50 .mu.m.
- 5. The electric dust collector system according to claim 3, wherein the collector electrodes are treated by at least one of the treatments selected from the group consisting of a thermal oxidation, an oxygen-ion implantation, an excess thermal oxidation followed by ionitriding, an anodic oxidation, and a chemical conversion oxidation.
- 6. The electric dust collector system according to claim 3, wherein at least one of the positive and negative electrodes of the collector electrodes are oxidized.
- 7. An electric dust collector system as claimed in claim 1, wherein said charging means comprises ionizer means having a plurality of ionizer electrodes for charging the dust particles; and
- wherein said collector means has a plurality of collector electrodes for collecting the charged dust particles; the collector electrodes being connected to the ionizer electrodes, the collector electrodes including a metallic oxide semiconductive layer being formed inwardly from the surface of the collector electrodes by an oxidation treatment.
- 8. The electric dust collector system according to claim 7, wherein the thickness of the metallic oxide semiconductive layer is in the range of 2-50 .mu.m.
- 9. The electric dust collector system according to claim 7, wherein the collector electrodes are treated by at least one of the treatments selected from the group consisting of a thermal oxidation, an oxygen-ion implantation, an excess thermal oxidation followed by ionitriding, an anodic oxidation, and a chemical conversion oxidation.
- 10. The electric dust collector system according to claim 7, wherein at least one of positive and negative electrodes of the collector electrodes are oxidized.
- 11. An electric dust collector system as claimed in claim 1, wherein said collecting means comprises filter means having an electrostatic filter for collecting the dust particles; and
- wherein said electric dust collector further comprises an electric field means having a plurality of electrodes for applying the electric field; the electrodes being positioned in close proximity to the electrostatic filter, the electrodes including a metallic oxide semiconductive layer being formed inwardly from the surface of the electrodes by an oxidation treatment.
- 12. The electric dust collector system according to claim 11, wherein the thickness of the metallic oxide semiconductive layer is in the range of 2-50 .mu.m.
- 13. The electric dust collector system according to claim 11, wherein the electrodes are treated by at least one of the treatments selected from the group consisting of a thermal oxidation, an oxygen-ion implantation, an excess thermal oxidation followed by ionitriding, an anodic oxidation, and a chemical conversion oxidation.
- 14. An electric dust collector system as claimed in claim 1, wherein said collecting means comprises filter means having an electrostatic filter for collecting the dust particles; and
- wherein said electric dust collector further comprises a plurality of plate electrodes for applying an electric field, between which the electrostatic filters are positioned, the plate electrodes including a metallic oxide semiconductive layer being formed inwardly from the surface of the plate electrodes by an oxidation treatment.
- 15. The electric dust collector system according to claim 14, wherein the thickness of the metallic oxide semiconductive layer is in the range of 2-50 .mu.m.
- 16. The electric dust collector system according to claim 14, wherein the electrodes are treated by at least one of the treatments selected from the group consisting of a thermal oxidation, an oxygen-ion implantation, an excess thermal oxidation followed by ionitriding, an anodic oxidation, and a chemical conversion oxidation.
- 17. The electric dust collector system according to claim 14, wherein at least one of positive electrodes and negative electrodes of the plate electrodes are oxidized.
- 18. The electric dust collector system according to claim 14, further comprising a plurality of mesh-shaped electrodes for applying electric field, the mesh-shaped electrodes being positioned around the electrostatic filter and the plate electrodes, the mesh-shaped electrodes including the metallic oxide semiconductive layer being formed inwardly from the surface of the mesh-shaped electrodes by an oxidation treatment.
- 19. An electric dust collector system as claimed in claim 1, wherein said collecting means comprises filter means having an electrostatic filter for collecting the dust particles; and
- wherein said electric dust collector further comprises a plurality of mesh-shaped electrodes for applying an electric field, between which the electrostatic filters are positioned, the mesh-shaped electrodes including a metallic oxide semiconductive layer being formed inwardly from the surface of the mesh-shaped electrodes by an oxidation treatment.
- 20. The electric dust collector system according to claim 19, wherein the electrostatic filter is positioned between the mesh-shaped electrodes positioned parallel to the electrostatic filter.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2-330333 |
Nov 1990 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 07/800,075, filed Nov. 29, 1991, now abandoned.
US Referenced Citations (9)
Foreign Referenced Citations (5)
Number |
Date |
Country |
163097 |
May 1955 |
AUX |
562774 |
Sep 1958 |
CAX |
614410 |
Feb 1961 |
CAX |
2317354 |
Oct 1974 |
DEX |
48-88554 |
Nov 1973 |
JPX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
800075 |
Nov 1991 |
|