Claims
- 1. A conducting water-soluble, self-doped polymer having along its backbone a II-electrone conjugated system which comprises about 100 to 500 monomer units, wherein about 0.01 and 100 mole % of the units have the following chemical formula ##STR15## wherein Y.sub.2 and Y.sub.3 are hydrogen, and Y.sub.4 is selected from the group consisting of hydrogen and --R.sub.n --X--M, wherein R is a direct bond when n is 0,
- X is SO.sub.3 ;
- M is selected from H, Na, K, or Li; and
- n is 0, wherein said polymer is conductive without added external dopant when the moiety M is removed.
- 2. The polymer of claim 1, wherein M is selected from the group consisting of H, Na, Li or K, and Y.sub.4 is hydrogen.
- 3. The polymer of claim 2 wherein M is Na.
- 4. The polymer of claim 1, wherein M is H.
- 5. The polymer of claim 1, wherein M is Na.
- 6. The polymer of claim 1 wherein M is Li.
- 7. The polymer of claim 1, wherein M is K.
- 8. An aqueous solution useful for casting conducting polymeric films, which solution comprises:
- (a) a water-soluble self-doped polymer comprising about 100 to 500 monomer units, wherein about 0.01 to 100 mole % of the monomer units have the chemical formula ##STR16## wherein Y.sub.2 and Y.sub.3 are hydrogen and Y.sub.4 is selected from the group consisting of hydrogen and --R.sub.n --X--M wherein R is a direct bond when n is 0, X is SO.sub.3, M is H, Na, K, or Li, and n is 0, wherein said polymer is conductive without added external dopant when the moiety M is removed; and
- (b) an amount of water at least sufficient to dissolve the polymer of part (a).
- 9. The aqueous solution of claim 8, wherein M is selected from the group consisting of H, Na, Li or K, and Y.sub.4, is hydrogen.
- 10. The aqueous solution of claim 9, wherein M is Na.
- 11. The aqueous solution of claim 8, wherein M is Na.
- 12. The aqueous solution of claim 8, wherein M is K.
- 13. The aqueous solution of claim 8, wherein M is H.
- 14. The aqueous solution of claim 8, wherein M is Li.
Priority Claims (1)
| Number |
Date |
Country |
Kind |
| 61-64272 |
Mar 1986 |
JPX |
|
Parent Case Info
This is a continuation of U.S. Ser. No. 08/015,334, filed Feb. 8, 1993, now abandoned, which is a continuation of U.S. Ser. No. 07/616,743, filed on Nov. 16, 1990, now U.S. Pat. No. 5,310,781, which is a continuation of U.S. Ser. No. 07/243,530, filed on Sep. 12, 1988, now abandoned, which is a continuation-in-part of U.S. Ser. No. 07/156,928 filed Dec. 14, 1987, now abandoned, which claims priority of International Application PCT/US86/02042, filed on Sep. 29, 1986, which claims priority on Japanese Patent Application 64373/86 filed Mar. 24, 1986.
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Continuations (3)
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Number |
Date |
Country |
| Parent |
15334 |
Feb 1993 |
|
| Parent |
616743 |
Nov 1990 |
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| Parent |
243530 |
Sep 1988 |
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Continuation in Parts (1)
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Number |
Date |
Country |
| Parent |
156928 |
Dec 1987 |
|