Claims
- 1. In an electrode for electrode processes and comprising a valve metal as a base member the improvement which comprises:
- a. a base layer coated on said base member and comprising an electrically conductive chemical element having no substantial valve effect; and
- b. a gas-tight and liquid-tight cover layer on said base layer and comprising:
- 1. a valve metal oxide selected from the group consisting of titanium dioxide and tantalum oxide;
- 2. a doping material to increase the electrical conductivity of said valve metal oxide and comprising, when titanium oxide is said valve metal oxide, an oxide selected from the oxides of niobium, tungsten, molybdenum, antimony, and tin and comprising, when tantalum oxide is said valve metal oxide, an oxide selected from the oxides of tungsten, molybdenum, antimony, and tin;
- 3. at least one of the oxides stable in an electrolysis medium selected from the oxides of barium, gallium, germanium, lead, bismuth, selenium, tellurium, copper, cadmium, the rare earth elements, manganese, iron, cobalt, and nickel;
- wherein the proportion of said doping material in said valve metal oxides is less than about 28 mol percent of the mixture and the proportion of said stable oxides in said cover layer is greater than about 50 mol percent.
- 2. The electrode as defined in claim 1 wherein said valve metal forming said base member is selected from the group consisting of titanium, tantalum, niobium, zirconium, and alloys thereof.
- 3. The electrode as defined in claim 1 wherein said electrically conductive chemical element is selected from the group consisting of cadmium, silver, gold, platinum, ruthenium, palladium, and carbon.
- 4. The electrode as defined in claim 1 wherein said valve metal oxide is titanium dioxide.
- 5. The electrode as defined in claim 1 wherein said valve metal is tantalum oxide.
- 6. The electrode as defined in claim 3 wherein said electrically conductive chemical element is carbon.
- 7. The electrode as defined in claim 1 wherein said valve metal forming said base member is selected from the group consisting of titanium, tantalum, niobium, zirconium, and alloys thereof; said valve metal oxide is titanium dioxide; and said electrically conductive chemical element is selected from the group consisting of cadmium, silver, gold, platinum, ruthenium, palladium, and carbon.
- 8. The electrode as defined in claim 1 wherein said valve metal is titanium, said valve metal oxide is titanium dioxide, and said electrically conducting chemical element is carbon.
- 9. The electrode as defined in claim 1 wherein said valve metal is titanium, said valve metal oxide is tantalum oxide, and said electrically conducting chemical element is carbon.
- 10. The electrode as defined in claim 1 comprising interruptions in said base layer in a manner to divide said base layer into a number of fields to in part expose said base member to and to in part separate said base member from said cover layer.
- 11. The electrode as defined in claim 4 comprising interruptions in said base layer in a manner to divide said base layer into a number of fields to in part expose said base member to and to in part separate said base member from said cover layer.
- 12. The electrode as defined in claim 7 comprising interruptions in said base layer in a manner to divide said base layer into a number of fields to in part expose said base member to and to in part separate said base member from said cover layer.
- 13. The electrode as defined in claim 1 wherein said stable oxides comprise a spinel.
- 14. The electrode as defined in claim 4 wherein said stable oxides comprise a spinel.
- 15. The electrode as defined in claim 7 wherein said stable oxides comprise a spinel.
Parent Case Info
The present application is a continuation-in-part application of co-pending application Ser. No. 438,388 filed Jan. 31, 1974 now abandoned. The latter application was a continuation-in-part of abandoned application Ser. No. 234,846, filed Mar. 15, 1972 now abandoned.
US Referenced Citations (6)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
438388 |
Jan 1974 |
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