Electrode plate for a plasma processing apparatus

Information

  • Patent Grant
  • D868993
  • Patent Number
    D868,993
  • Date Filed
    Tuesday, January 30, 2018
    6 years ago
  • Date Issued
    Tuesday, December 3, 2019
    4 years ago
  • US Classifications
    Field of Search
    • US
    • D24 107
    • D24 1106
    • D24 113
    • D24 129
    • D24 144
    • D24 206
    • D24 224
    • D24 193
    • D24 197
    • D24 168
    • D24 170
    • D24 187
    • D24 200
    • D23 200
    • D23 213-215
    • D23 222
    • D23 223
    • D23 229
    • D23 283
    • D15 140
    • D13 182
    • CPC
    • H01J37/32082
    • H01J37/32541
  • International Classifications
    • 2402
    • Term of Grant
      15Years
Abstract
Description

This application contains subject matter related to the following co-pending U.S. design patent applications:


Application Ser. No. 29/635,289, filed herewith and entitled “Gas Ring for a Plasma Processing Apparatus”;


Application Ser. No. 29/635,292, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”; and


Application Ser. No. 29/635,296, filed herewith and entitled “Electrode Plate Peripheral Ring for a Plasma Processing Apparatus”.



FIG. 1 is a front, bottom and right side perspective view of an electrode plate for a plasma processing apparatus according to the design;



FIG. 2 is a front elevational view thereof;



FIG. 3 is a left side elevational view thereof;



FIG. 4 is a right side elevational view thereof;



FIG. 5 is a top plan view thereof;



FIG. 6 is a bottom plan view thereof;



FIG. 7 is a rear elevational view thereof;



FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;



FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8; and,



FIG. 10 is an enlarged view of the portion shown in box 10 in FIG. 2.


The broken lines show the boundaries of the enlarged portions illustrated in FIG. 9 and FIG. 10 and form no part of the claimed design.


Claims
  • The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.
Priority Claims (1)
Number Date Country Kind
2017-018889 Aug 2017 JP national
US Referenced Citations (17)
Number Name Date Kind
D411516 Imafuku Jun 1999 S
D548705 Hayashi Aug 2007 S
D553104 Oohashi Oct 2007 S
D587339 Schoenherr Feb 2009 S
D638550 Bedingham May 2011 S
8206506 Kadkhodayan Jun 2012 B2
D667561 Bedingham Sep 2012 S
D672050 Lee Dec 2012 S
D787458 Kim May 2017 S
D789888 Jang Jun 2017 S
D790039 Hawrylchak Jun 2017 S
D790489 Toyomura Jun 2017 S
D793526 Behdjat Aug 2017 S
D793572 Kozuka Aug 2017 S
D794753 Miller Aug 2017 S
20040179323 Litman Sep 2004 A1
20040218339 Nakamura Nov 2004 A1
Foreign Referenced Citations (4)
Number Date Country
D1117165 Aug 2001 JP
D1142402 Jun 2002 JP
D1438663 Apr 2012 JP
D1545406 Mar 2016 JP
Non-Patent Literature Citations (5)
Entry
Silicon Part. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: http://www.daewonspic.com/english/si_en.jsp.
Bialetti Moka Express Espresso Gasket & Filter Replacements. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: https://www.surlatable.com/product/PRO-449611/Bialetti+Moka+Express+Espresso+Gasket+and+Filter+Replacements.
Okuda et al., Design U.S. Appl. No. 29/635,289, filed Jan. 30, 2018.
Isozaki et al., Design U.S. Appl. No. 29/635,292, filed Jan. 30, 2018.
Isozaki et al., Design U.S. Appl. No. 29/635,296, filed Jan. 30, 2018.