Claims
- 1. A method for providing an opening through a positive ionic conductor material having minimal electron conduction which comprises (a) placing said material in a vacuum, and (b) exposing a region of said material to a focused electron beam having a current level sufficient to cause the material within said region to become positively charged, and causing the positively charged ions within said region to be repelled from said region.
- 2. In a method for atomic lithography which comprises providing a lithography mask having a pattern cut thereinto, the improvement comprising cutting said pattern in said mask in accordance with the method of claim 1.
- 3. The method according to claim 1 in which the material is .beta.-alumina.
Government Interests
This invention was made in the course of research funded by the Department of Energy, Division of Materials Science through the University of Illinois Material Research Laboratory, under Contract No. DE-AC02-76ER01198, and carried out in the Center For the Microanalysis of Materials at the University of Illinois.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
2793281 |
Steigerwald |
May 1957 |
|
Foreign Referenced Citations (1)
Number |
Date |
Country |
2740764 |
Mar 1979 |
DEX |
Non-Patent Literature Citations (1)
Entry |
Schollhammer, "Electron Beam Cutting Techniques for Electronic Applications", The 6th National IRE Conference, Nov., 1962, pp. 1-12. |