Claims
- 1. An electron-beam forming system for multibeam cathode-ray tubes and particularly for color-picture tubes comprising:
- a plurality of cathodes for generating a plurality of electron beams; and
- at least four electrodes for acting on the electron beams, each of said four electrodes being supported from spaced glass beads to dispose each of said four electrodes in different planes lying one behind the other each differently spaced from said plurality of cathodes, each of said four electrodes including a plurality of apertures each aligned with a different one of said plurality of cathodes for passing the electron beam radiating therefrom, at least three of said four electrodes closest to said plurality of cathodes each being formed of different materials each selected to have different coefficients of thermal expansion so that the ratio of the difference in linear thermal expansion between every two adjacent ones of said three electrodes to the distance between the planes of said adjacent ones of said three electrodes is approximately constant whereby mechanical stresses and convergence errors are avoided during operation as said four electrodes are heated to different temperatures depending on their proximity to the cathodes.
- 2. An electron-beam forming system according to claim 1,
- wherein two of said four electrodes furthest from said plurality of cathodes are made of the same material.
- 3. An electron-beam forming system according to claim 2,
- wherein a first of said four electrodes closest to said plurality of cathodes is formed from FeNi36, a second of said four electrodes next closest to said plurality of cathodes is formed from NiFe48Cr and a third and fourth of said four electrodes furthest from said plurality of cathodes are formed from x4CrNi1813.
- 4. An electron-beam forming system according to claim 1,
- wherein a first of said three electrodes closest to said plurality of cathodes is formed from FeNi36, a second of said three electrodes next closest to said plurality of cathodes is formed from NiFe48Cr and a third of said three electrodes furthest from said plurality of cathodes is formed from x4CrNi1813.
- 5. An electron-beam forming system according to claim 4,
- wherein a fourth of said four electrodes spaced from said third of said three electrodes remote from said plurality of cathodes is formed from x4CrNi1813.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2920151 |
May 1979 |
DEX |
|
CROSS REFERENCE TO RELATED APPLICATION
This application is a continuation of application of Ser. No. 429,572, filed Sept. 30, 1982, now abandoned, which is a continuation application of Ser. No. 149,102 filed May 12, 1980, now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3974416 |
Van der Goot et al. |
Aug 1976 |
|
4119884 |
Blumenberg et al. |
Oct 1978 |
|
4138624 |
Srowig |
Feb 1979 |
|
Continuations (2)
|
Number |
Date |
Country |
Parent |
429572 |
Sep 1982 |
|
Parent |
149102 |
May 1980 |
|