Patent Grant
7501755
The present invention relates to an organic electroluminescence device, and more particularly, to an electron injection layer of an organic electroluminescence device.
In an organic electroluminescence device, in order to reduce the operating voltage of the device, the injection of electrons and holes should be balanced. It is needed to improve electron injection ability.
The use of a low work function metal as a cathode can effectively improve electron injection ability. However, the low work function metal is too active and apt to react with water and oxygen.
Another method for improving electron injection ability is to add an electron injection layer formed of an inorganic compound layer between said cathode and an organic layer. It has been proved in practice that LiF/Al is a cathode structure having excellent electron injection ability, which is widely used in OLED products. However, the present of halogen elements may cause quench of light emission.
One object of the present invention is to provide an electron injection layer having excellent electron injection ability.
According to an aspect of the present invention, an organic electroluminescence device includes an electron injection layer between a cathode and an organic layer, characterized in that the electron injection layer contains a material represented by formula AxByOz, wherein A is one of an alkali metal and an alkali earth metal, B is one of group VIII metals and 0<x≦2, 0<y≦3, 0<z≦6.
Preferably, the electron injection layer has a thickness of 0.5-20 nm.
The alkali metal or alkali earth metal can be selected from one of Li, Na, K, Rb, Cs, Be, Mg, Ca, Sr and Ba.
The group VIII metal can be selected from one of Fe, Co, Ni, Ru, Rh, Pd, Os, Ir and Pt.
The material of the electron injection layer can be LiNiO2.
The material of the electron injection layer can be LiCoO2.
The material of the electron injection layer can be formed of Al and a material represented by formula AxByOz.
The advantageous effects of the organic electroluminescence device according to the present invention include: high efficiency of injecting electrons from a cathode to an organic layer, low operating voltage, high device luminance and efficiency and long device life.
An electron injection layer of the present invention is a layer between a cathode and an organic layer (such as a light-emitting layer or an electron transport layer).
As shown in
A substrate 101 is used to support other layers of OLED device.
Holes flow from an anode 102 when voltage is applied to the device.
Hole injection layer 103 has a function to improve efficiency of injecting holes from an anode to an organic layer.
Hole transport layer 104 has a function to transport holes to a light-emitting layer 105.
The light-emitting layer 105 provides a place for recombination of electrons and holes, and emits light after recombination.
Electron transport layer 106 has a function to transport electrons to the organic layer.
Electrons flow from a cathode 108 when voltage is applied to the device.
The functions and materials of the layers of OLED device and the preparation process of the same are well known by those skilled in the art, which will not be described in detail herein.
Materials in examples has been described in detail in table 1.
The electron injection layer of the present invention is formed of a material represented by formula AxByOz, 0<x≦2, 0<y≦3, 0<z≦6. The electron injection layer formed of the material can be evaporated on the light-emitting layer 105 or the electron transport layer 106. Preferably, it has a thickness of 0.5-20 nm. If the thickness is less than 0.5 nm, it is not easy to form the electron injection layer film. If the thickness is more than 20 nm, the effect of injecting electrons may be reduced. It should be understood that it is useable with other thicknesses. A group VIII element is a very important transition metal element, the total electron number of outermost shell s and inner shell d of which is more than or equal to 8. Due to this special electron arrangement, the group VIII element has a feature of valence alternation. Therefore, the mixed oxide of the group VIII element and an alkali metal or an alkali earth metal has higher electron injection and conducting ability.
It should be understood for those skilled in the art that it is preferred to use the implementation of the layer structure of OLED shown in
(1) Cleaning of a Glass Substrate Pre-provided with a ITO:
A transparent conductive substrate ITO glass is cleaned by thermal detergent ultrasonic and deionized water ultrasonic methods, and then dried under an infrared lamp. Then, the dried ITO glass is preprocessed by ultraviolet ozone cleaning and low energy oxygen ion beam bombardment, wherein the ITO film on the conductive substrate is used as an anode layer. The square resistance of the ITO film is 50Ω, and the thickness of the ITO film is 150 nm.
(2) Preparation of an Organic Layer:
The cleaned, dried and preprocessed ITO film is placed in a vacuum cavity which is pumped to 1×10−3 Pa. A CuPc film of 15 nm is evaporated in a evaporation rate of 0.05 nm/s. Then, a layer of hole transport material NPB of 60 nm is evaporated on the CuPc film in a evaporation rate of 0.3 nm/s. On the hole transport layer, a TADN of 40 nm is evaporated for a light-emitting layer, and a Alq3 of 10 nm is evaporated for an electron transport layer.
(3) Preparation of an Electron Injection Layer:
After evaporating the electron transport layer, LiCoO2 of 0.7 nm is evaporated in a evaporation rate of 0.04 nm/s for an electron injection layer.
(4) Preparation of an Cathode:
In the light-emitting device, the cathode is formed of Al film of 150 nm. The evaporation rate of Al layer is 0.2 nm/s.
(5) Packaging with Glass Package Sheets.
ITO/CuPc(15 nm)/NPB(60 nm)/TADN(40 nm)/Alq3(10 nm)/LiF(0.7 nm)/Al(150 nm)
The preparation steps are the same with Example 1, but after the electron transport layer, LiF of 0.7 nm is evaporated.
The preparation procedure is referred to Example 1.
The preparation procedure is referred to Example 1.
ITO/CuPc(15 nm)/NPB(60 nm)/Alq3(40 nm)/Al(20 nm):LiCoO2[10%]/Al(120 nm) Al(20 nm):LiCoO2[10%]
A mixed electron injection layer of Al and LiCoO2 of 20 nm is prepared by a double source co-evaporation method. The evaporation rate of the layer is 0.1 nm/s, and the dopant concentration of LiCoO2 is controlled to 10%.
Other preparation steps are referred to Example 1.
It can be seen from
It can be seen from
It can be seen from
It can be seen from
It can be seen from the table that efficiency and life of LiCoO2:Al device of Example 3 are better than that of LiNiO2 device of Example 2, and efficiency and life of LiNiO2 device of Example 2 are better than that of LiF device of Comparative Example 1.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2005 1 0000284 | Jan 2005 | CN | national |
| Number | Name | Date | Kind |
|---|---|---|---|
| 5776622 | Hung et al. | Jul 1998 | A |
| 6806641 | Ueda et al. | Oct 2004 | B2 |
| 20060108578 | Liu | May 2006 | A1 |
| Number | Date | Country | |
|---|---|---|---|
| 20060152145 A1 | Jul 2006 | US |
