1. Field of the Invention
The present invention relates to an electron tube having a helix which will be used as a high-frequency circuit for bringing about interaction between an electron beam and a high-frequency signal.
2. Description of the Related Art
There are known electron tubes such as a traveling-wave tube or a klystron, for amplifying and oscillating a high-frequency signal by interaction between an electron beam emitted from an electron gun and a high-frequency circuit. One of these electron tubes, as shown in
Electron gun 10 is provided with cathode 11 for emitting thermoelectrons, heater 12 for giving cathode 11 thermal energy for the emission of thermoelectrons, and Wehnelt electrode 13 for concentrating thermoelectrons to form electron beam 50.
Predetermined power supply voltages are respectively supplied to collector electrode 30 and electron gun 10 in the electron tube shown in
A common negative high voltage (cathode voltage) is supplied to cathode 11 and Wehnelt electrode 13 of electron gun 10 from power supply 60; a predetermined voltage is supplied to heater 12 based on the cathode voltage. Also, a positive high voltage is supplied to collector electrode 30 based on the cathode voltage. Alternatively, an electron tube is known in which anode 40 and helix 20 are separated and various power supply voltages are supplied to anode 40 and helix 20.
Electron beam 50 emitted from electron gun 10 is accelerated by anode electrode 40 and introduced into the spiral structure of helix 20, and travels inside the structure of helix 20 while interacting with the high-frequency signal supplied from the input end of helix 20. Electron beam 50 output from the spiral structure of helix 20 is captured by collector electrode 30 while the high-frequency signal amplified by interaction with electron beam 50 is output from the output end of helix 20.
Helix 20, as shown in
As shown in
To deal with these disadvantages, for example, Patent Document 1 (Japanese Patent Laid-Open publication No. 242817/1993) discloses that steps are arranged on one or both sides of the supports (dielectric) for supporting the helix and that metal plating is applied to the steps, so that the support functions as vein and veins are unnecessary.
However, in the conventional structure disclosed in Patent Document 1, because a technique for accurately applying metal plating to the steps arranged on the support made of dielectrics has not been established, there is a problem that the defective rate in the process of forming supports is high.
Therefore, the problems that occur are that cost of manufacturing electron tubes increases and electron tubes cannot be used over a wide range of frequencies.
It is therefore an object of the present invention to provide an electron tube which has low manufacturing costs (in which manufacturing costs are suppressed) and which can be used over a wide range of frequencies.
To achieve the object, according to the present invention, an electron tube is provided with a plurality of supports, a portion of which is covered with conductive material, these supports covered with conductive material abut an inner wall of the shell, and another portion of the supports covered with a dielectric abuts the helix, and a helix to be used as a high-frequency circuit for bringing about interaction between the electron beam and a high-frequency signal is supported and fixed within the shell by plurality of supports.
In the electron tube according to this arrangement, the conductive material that included the support, rather than the veins, contributes to the electron tube being able to operate over a wide range of frequencies, and therefore it is not necessary to arrange veins on the inside of the shell. In particular, since the dielectric is formed on the surface of the conductive material, the supports can be formed by an established technique such as the CVD (Chemical Vapor Deposition) method and the defective rate in the process of forming the supports is improved. Therefore, it is possible to obtain an electron tube in which an increase of manufacturing costs is suppressed and which can be used over a wide range of frequencies.
The above and other objects, features, and advantages of the present invention will become apparent from the following description with reference to the accompanying drawings which illustrate examples of the present invention.
As shown in
Support 2 in the electron tube of the first embodiment is formed by covering dielectric 4 onto the surface of conductive material 3 in such a manner that dielectric 4 is exposed at the region abutting on the inner wall of shell 21. Hence, conductive material 3 comes in contact with the inner wall of shell 21 in the radial direction. Additionally,
Non-magnetic material such as copper and graphite is used for conductive material 3. Boron nitride or aluminum nitride is used for dielectric 4 that covers conductive material 3. On the surface of conductive material 3, for example, dielectric 4 is deposited by CVD (Chemical Vapor Deposition) method.
In the electron tube of the first embodiment, conductive material 3 in support 2 reduces changes with reference to the frequency in the phase speed of high-frequency signal (microwave) supplied to helix 20, and reduces changes in the interaction impedance of electron beam and high-frequency signal so as to contribute to the electron tube being used over a wide rage of frequencies. Hence, veins 23 are unnecessary, the process of attaching veins 23 is not required, and therefore, the cost of electron tube is reduced.
Also, in the first embodiment, compact electron tubes being able to operate over a wide range of frequencies can be obtained by the same manufacturing method as the conventional method because veins 23 is not needed.
Further, in the first embodiment, it is possible to produce support 2 by forming dielectric 4 on the surface of conductive material 3 with established techniques such as the CVD method rather than by applying metal plating to support 2 which is made of dielectric as described in Patent Document 1. The defective rate is improved during the process of forming support 2. Hence, an increase in the cost of electron tubes can be suppressed while the electron tube can be used over a wide range of frequencies.
As shown in
Non-magnetic material such as copper and graphite is used for conductive material 6, as in the first embodiment. Boron nitride or aluminum nitride is used for dielectric film 7. On the region abutting helix 20, dielectric film 7 is formed by the CVD method.
In the electron tube of the second embodiment, as with the first embodiment, conductive material 6 which is used in support 5, rather than vein 23 shown in
Also, in the second embodiment, compact electron tubes operating over wide range frequencies can be obtained by the same manufacturing method as the conventional method because veins 23 are not needed in the construction of the electron tube.
Further, in the second embodiment, it is possible to produce support 5 by forming dielectric film 7 on the surface of conductive material 6 with established techniques such as the CVD method. The defective rate is improved in the process of forming support 5. Hence, an increase in the cost of electron tube can be suppressed while the electron tube can be used over a wide range of frequencies.
While preferred embodiments of the present invention have been described using specific terms, such description is for illustrative purposes only, and it is to be understood that changes and variations may be made without departing from the spirit or scope of the following claims.
Number | Date | Country | Kind |
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2004-323836 | Nov 2004 | JP | national |