The present disclosure relates to an electronic device.
As a type of semiconductor laser, a surface-emitting laser such as a vertical-cavity surface-emitting laser (VCSEL) is known (e.g., see Patent Documents 1 and 2.). In general, in a light-emitting device using a surface-emitting laser, a plurality of light-emitting elements is provided in a two-dimensional array on the front surface or back surface of a substrate, and a lens is disposed thereon. The light emitted from the plurality of light-emitting elements is emitted to the outside of the light-emitting device through the lens.
Fig. 7A of Patent Document 2 discloses a configuration in which a chip having a circuit as a light-emitting unit formed therein is flip chip-mounted on a chip in which a circuit as a drive unit is formed. In the device having this configuration, there is a possibility that a part of the light emitted from the light-emitting unit is reflected by the surface of the lens and incident on the drive unit. The drive unit has elements (e.g., bipolar transistors) each including a p-n junction surface. When light strikes these elements, a photovoltaic effect occurs, the characteristics of the elements change, and there is a possibility that the drive unit malfunctions.
The present disclosure has been made in view of such circumstances, and an object of the present disclosure is to provide an electronic device capable of reducing the possibility of malfunction.
An electronic device according to one aspect of the present disclosure is provided with: a first substrate including a drive circuit; a second substrate including a light-emitting unit driven by the drive circuit and mounted on one surface side of the first substrate; and a light-shielding unit provided on the first substrate and configured to shield at least a part of the drive circuit from light emitted by the light-emitting unit.
Accordingly, even in a case where a part of the light (e.g., infrared light) emitted from the light-emitting unit is reflected by the surface of the lens and directed to a part of the drive circuit (e.g., a bias circuit), this infrared ray is shielded by the light-shielding unit. The light-shielding unit can reduce the occurrence of a photovoltaic effect on a p-n junction surface of an element (e.g., bipolar transistor, etc.) included in the bias circuit and can reduce a change in characteristics of the element due to the photovoltaic effect. Thus, the light-shielding unit can reduce the possibility that the drive circuit malfunctions.
An electronic device according to another aspect of the present disclosure is provided with: a first substrate including a drive circuit; a second substrate including a light-emitting unit driven by the drive circuit and mounted on one surface side of the first substrate; and a peripheral light-shielding unit having a light-shielding property against light emitted by the light-emitting unit. The first substrate includes a wire bonding pad electrode provided on one surface side of the first substrate, and a protective film provided on one surface side of the first substrate and provided with an opening that exposes the surface of the wire bonding pad electrode. The peripheral light-shielding unit is disposed around the wire bonding pad electrode.
Accordingly, even in a case where a part of light (e.g., infrared light) emitted from the light-emitting unit is reflected by the surface of the lens and directed to the periphery of the wire bonding electrode, this infrared ray is shielded by the peripheral light-shielding unit. As a result, the peripheral light-shielding unit can reduce the entry of light into the first substrate from the periphery of the wire bonding electrode. Thus, the peripheral light-shielding unit can reduce the possibility that the drive circuit malfunctions.
Hereinafter, a first embodiment of the present disclosure will be described with reference to the drawings. In the description of the drawings referred to in the following description, the same or similar parts are denoted by the same or similar reference numerals. However, it should be noted that the drawings are schematic, and the relationship between the thickness and the plane dimension, the ratio of the thickness of each layer, and the like are different from actual ones. Therefore, specific thicknesses and dimensions should be determined in consideration of the following description. In addition, it is needless to say that portions having different dimensional relationships and ratios are included between the drawings.
The definition of directions, such as upper and lower, in the following description is merely a definition for convenience of description and does not limit the technical idea of the present disclosure. For example, it is a matter of course that when an object is rotated by 90° and observed, the upper and lower sides are converted to the left and right and read, and when the object is rotated by 180° and observed, the upper and lower parts are inverted and read.
In the following description, there are cases where the direction is described using words in the X-axis direction, the Y-axis direction, and the Z-axis direction. For example, the X-axis direction and the Y-axis direction are directions parallel to an upper surface 42a of a laser diode driver (LDD) substrate 42. The X-axis direction and the Y-axis direction are also referred to as horizontal directions. The Z-axis direction is a direction vertical to the upper surface 42a. The X-axis direction, the Y-axis direction, and the Z-axis direction are orthogonal to each other.
The light-emitting device 1 includes a light-emitting unit 11, a drive circuit 12, a power supply circuit 13, and a light-emitting-side optical system 14. The imaging device 2 includes an image sensor 21, an image processing unit 22, and an imaging-side optical system 23. The control device 3 includes a distance measuring unit 31.
The light-emitting unit 11 emits laser light for irradiating the subject. The light-emitting unit 11 includes a VCSEL. For example, the light-emitting unit 11 includes a plurality of light-emitting elements arranged in a two-dimensional array, and each light-emitting element has a VCSEL structure. The subject is irradiated with light emitted from these light-emitting elements. The light emitted from the light-emitting element is, for example, infrared light. The light-emitting unit 11 is provided in a chip called a laser diode (LD) chip 41.
The drive circuit 12 is an electric circuit that drives the light-emitting unit 11. The power supply circuit 13 is an electric circuit that generates the power supply voltage of the drive circuit 12. For example, the distance measuring device 100 generates a power supply voltage from an input voltage supplied from a battery (not illustrated) by the power supply circuit 13, supplies the generated power supply voltage to the drive circuit 12, and drives the light-emitting unit 11 by the drive circuit 12. The battery may be provided inside the distance measuring device 100 or may be provided outside the distance measuring device 100. Further, the drive circuit 12 is provided in a substrate called a laser diode driver (LDD) substrate 42.
The light-emitting-side optical system 14 includes various optical elements and irradiates the subject with light from the light-emitting unit 11 via these optical elements. Similarly, the imaging-side optical system 23 includes various optical elements and receives light from the subject via these optical elements.
The image sensor 21 receives light from the subject via the imaging-side optical system 23 and converts the light into an electric signal by photoelectric conversion. The image sensor 21 is, for example, a charge-coupled device (CCD) sensor or a complementary metal-oxide-semiconductor (CMOS) sensor. The image sensor 21 converts the electronic signal described above from an analog signal to a digital signal by analog-to-digital (A/D) conversion and outputs an image signal as a digital signal to the image processing unit 22. Further, the image sensor 21 outputs a frame synchronization signal to the drive circuit 12, and on the basis of the frame synchronization signal, the drive circuit 12 causes the light-emitting unit 11 to emit light at a timing corresponding to a frame period in the image sensor 21.
The image processing unit 22 performs various types of image processing on the image signal output from the image sensor 21. The image processing unit 22 includes, for example, an image processing processor such as a digital signal processor (DSP).
The control device 3 controls various operations of the distance measuring device 100 and controls, for example, a light-emitting operation of the light-emitting device 1 and an imaging operation of the imaging device 2. The control device 3 includes, for example, a central processing unit (CPU), a read-only memory (ROM), a random-access memory (RAM), and the like.
The distance measuring unit 31 measures the distance to the subject on the basis of the image signal output from the image sensor 21 and subjected to the image processing by the image processing unit 22. The distance measuring unit 31 adopts, for example, a structured light (STL) system or a time of flight (ToF) system as a distance measuring system. Moreover, the distance measuring unit 31 may further measure the distance between the distance measuring device 100 and the subject for each portion of the subject on the basis of the image signal described above to specify the three-dimensional shape of the subject.
As illustrated in
The correction lens holder 45 is disposed on the heat dissipation substrate 44 so as to surround the LD chip 41, and holds one or more correction lenses 46 above the LD chip 41. These correction lenses 46 are included in the light-emitting-side optical system 14 described above (cf.
The plurality of bump electrodes 48 is provided on at least one of the upper surface of the LDD substrate 42 or the lower surface of the LD chip 41 and electrically connects the LDD substrate 42 and the LD chip 41. The bump electrode 48 is made of an arbitrary metal material such as gold (Au), nickel (Ni), or aluminum (Al).
Furthermore, the LDD substrate 42 is provided with a light-shielding film 50 (an example of a “light-shielding unit” of the present disclosure) that shields at least a part of the drive circuit 12 from light emitted by the light-emitting unit 11 provided in the LD chip 41. The light-shielding film 50 may be provided on the upper surface 42a of the LDD substrate 42 or may be provided inside the LDD substrate 42.
In the first embodiment of the present disclosure, a structural body in which the LD chip 41 including the VCSEL is flip chip-mounted on the LDD substrate 42 is referred to as a VCSEL mounted body 40.
The driver circuit 60 controls the light emission timing of the light-emitting unit 11 on the basis of the supplied clock signal. In addition, the driver circuit 60 corrects a current value to be applied to the light-emitting unit 11 on the basis of the signal supplied from the temperature information generation unit 63. As a result, the driver circuit 60 can reduce the fluctuation of the intensity of the light emitted from the light-emitting unit 11 due to the temperature.
Next, the structure of the VCSEL mounted body 40 in which the LD chip 41 is flip chip-mounted on the LDD substrate 42 will be described more specifically.
The LDD substrate 42 has a substrate body 421 made of Si, for example. The upper surface 42a of the LDD substrate 42 is an upper surface of the substrate body 421, and a lower surface 42b of the LDD substrate 42 is a lower surface of the substrate body 421. The substrate body 421 includes the driver circuit 60, the bias circuit 61, the CLK circuit 62 (cf.
The bias circuit 61 includes a well layer 611, an npn bipolar transistor 612 provided in the well layer 611, and a pnp bipolar transistor 613 provided in the well layer 611.
Further, the substrate body 421 is provided with the light-shielding film 50, a pad electrode 70, and a plurality of wiring layers 71 to 73. For example, the light-shielding film 50 and the pad electrode 70 are provided on the upper surface 42a of the substrate body 421. The wiring layers 71 to 73 are provided inside the substrate body 421. The pad electrode 70 is located above the driver circuit 60, and the plurality of wiring layers 71 to 73 is provided between the driver circuit 60 and the pad electrode 70. The driver circuit 60 and the pad electrode 70 are electrically connected to each other via the plurality of wiring layers 71 to 73 and a through electrode (not illustrated) that connects the wiring layers 71 to 73 in the vertical direction (Z-axis direction).
The light-shielding film 50 is made of a metal having a light-shielding property against infrared light, such as aluminum (Al) or copper (Cu). The light-shielding film 50 covers the entire region of the bias circuit 61 from the upper surface 42a side of the substrate body 421. The light-shielding film 50 may be provided on the same layer as the pad electrode 70 as illustrated in
The bump electrode 48 is provided on the pad electrode 70. The driver circuit 60 is electrically connected to the LD chip 41 via the plurality of wiring layers 71 to 73, the pad electrode 70, and the bump electrode 48. The correction lens 46 (cf.
As described above, the distance measuring device 100 according to the first embodiment of the present disclosure includes the LDD substrate 42 having the drive circuit 12, the LD chip 41 having the light-emitting unit 11 driven by the drive circuit 12, and the light-shielding film 50. The LD chip 41 is flip chip-mounted on the upper surface 42a side of the LDD substrate 42. The light-shielding film 50 is provided on the LDD substrate 42 and shields at least a part of the drive circuit 12 (e.g., bias circuit 61) from light (e.g., infrared light) emitted by the light-emitting unit 10.
Accordingly, even in a case where a part of the infrared light emitted from the light-emitting unit 10 is reflected by the surface of the correction lens 46 and directed to the bias circuit 61, this infrared light is shielded by the light-shielding film 50. Even in a state where the LD chip 41 is flip chip-mounted on the upper surface 42a of the LDD substrate 42 and the upper portion of the bias circuit 61 is not sealed with a molding resin or the like (i.e., a bare state), the light-shielding film 50 prevents the incidence of infrared light on the bias circuit 61. The light-shielding film 50 can reduce the occurrence of a photovoltaic effect on the p-n junction surface of the element, such as the bipolar transistors 612, 613, included in the bias circuit 61 and can reduce a change in characteristics of the element due to the photovoltaic effect. Thus, the light-shielding film 50 can reduce the possibility that the drive circuit 12 malfunctions.
Among the circuits in the drive circuit 12, the bias circuit 61 has the highest sensitivity to light and the largest area. Therefore, in the first embodiment of the present disclosure, it is particularly preferable to shield the bias circuit 61 from light. As described above, the bias circuit 61 generates a reference current, but when the bias circuit 61 is irradiated with infrared light, the characteristics of the elements, such as the bipolar transistors 612, 613, change due to the photovoltaic effect, and the reference current fluctuates. When the fluctuation of the reference current is large, the drive circuit 12 is likely to malfunction. By shielding the bias circuit 61 from light, it is possible to reduce the fluctuation of the reference current and to reduce the possibility that the drive circuit 12 malfunctions.
In the first embodiment described above, an aspect has been described in which the light-shielding film 50 is disposed in the region overlapping with the bias circuit 61 in the thickness direction (e.g., in the Z-axis direction) of the LDD substrate 42, and the bias circuit 61 is not disposed in the other regions. However, the first embodiment of the present disclosure is not limited thereto. In the first embodiment of the present disclosure, in the Z-axis direction, the light-shielding film 50 may be disposed in a region overlapping with the driver circuit 60 (cf.
Any of the driver circuit 60, the CLK circuit 62, and the temperature information generation unit 63 includes an element including a p-n junction surface, such as a bipolar transistor or a MOS transistor, but the light-shielding film 50 can reduce the generation of the photovoltaic effect on the p-n junction surface by preventing the incidence of infrared light. As a result, the light-shielding film 50 can reduce a change in the characteristics of the element due to the photovoltaic effect in any of the driver circuit 60, the CLK circuit 62, and the temperature information generation unit 63 and can reduce the possibility that the drive circuit 12 malfunctions.
On the upper surface 42a of the LDD substrate 42, the coverage by the light-shielding film 50 is preferably high. For example, on the upper surface 42a of the LDD substrate 42, the coverage per unit area by the light-shielding film 50 is preferably 50% or more, more preferably 65% or more, and still more preferably 80% or more, except for a region where the LD chip 41 is mounted. The light-shielding film 50 may be provided to cover the entire upper surface 42a of the LDD substrate 42 except for the region where the LD chip 41 is mounted (i.e., so as to make the coverage 100%.). An example in which the coverage per unit area is 100% except for the region where the LD chip 41 is mounted is illustrated in
In the first embodiment of the present disclosure, in addition to the light-shielding film 50, some of the wiring layers 71 to 73 may function as a light-shielding unit. The wiring layer functioning as the light-shielding unit is made of a metal having a light-shielding property against infrared light, such as aluminum (Al) or copper (Cu).
In the VCSEL mounted body 40B according to Modification 2, the positions of the light-shielding film 50 and the wiring layer 71 in the horizontal direction are shifted from each other. The light-shielding film 50 and the wiring layer 71 in such a positional relationship prevent the incidence of infrared light on the bias circuit 61. Therefore, similarly to the first embodiment described above, it is possible to reduce a change in characteristics of the element due to the photovoltaic effect, and it is possible to reduce the possibility that the drive circuit 12 malfunctions.
In the first embodiment of the present disclosure, the bias circuit 61 is preferably disposed at a position away from a side surface 42c of the outer periphery of the LDD substrate 42.
There is a possibility that a part of the light reflected by the surface of the correction lens 46 is re-reflected by the inner side surface of the correction lens holder 45 (cf.
In the first embodiment of the present disclosure, a through layer made of a light-shielding material may be provided between the side surface 42c of the outer periphery of the LDD substrate 42 and the drive circuit 12 (cf.
As described above, there is a possibility that a part of the light reflected by the surface of the correction lens 46 is re-reflected by the inner side surface of the correction lens holder 45 (cf.
In the first embodiment described above, it has been described that the light-shielding film 50 is made of a metal such as aluminum (Al) or copper (Cu). However, the first embodiment of the present disclosure is not limited thereto. The light-shielding film 50 may be made of, for example, resin.
Furthermore, in the first embodiment of the present disclosure, as illustrated in
In the VCSEL mounted body 40F according to Modification 5A, the resin 53 and the light-shielding film 52 described above may have the same composition. In addition, the resin 53 and the light-shielding film 52 described above may be formed simultaneously in the same step. Accordingly, there is a possibility that the number of steps can be reduced at the time of manufacturing the VCSEL mounted body 40F, and there is a possibility that the manufacturing cost can be reduced.
In an embodiment of the present disclosure, the LDD substrate 42 may have a wire bonding pad electrode (WB pad electrode) to which a wire such as a gold wire is connected. An opening that exposes the surface of the WB pad electrode is provided on the WB pad electrode, and a wire is connected to the surface of the WB pad electrode through the opening. In an embodiment of the present disclosure, the light-shielding film 50 may cover not only the upper portion of the drive circuit 12 but also the periphery of the wire bonding pad electrode.
As illustrated in
As illustrated in
As illustrated in
The WB pad electrode 110 is made of, for example, aluminum (Al) or an Al alloy containing Al. The protective film 120 includes, for example, a silicon oxide film (SiO2 film) 121 and a silicon nitride film (SiN) 122 provided on the SiO2 film 121. The light-shielding film 50 includes, for example, titanium (Ti) and gold (Au) provided on Ti.
As illustrated in
In the VCSEL mounted body 140 according to the second embodiment, not only the upper portion the drive circuit 12 but also the periphery of the WB pad electrode 110 is covered with the light-shielding film 50. Even in a case where a part of the light (e.g., infrared light) emitted from the light-emitting unit is reflected by the surface of the lens and directed to the periphery of the WB pad electrode 110, this light (ambient light) is shielded by the light-shielding film 50. Therefore, the light-shielding film 50 can reduce the entry of light into the LDD substrate 42 from the periphery of the WB pad electrode 110 and can further reduce the possibility that the drive circuit 12 malfunctions.
In the second embodiment, a portion of the light-shielding film 50 disposed around the WB pad electrode 110 is an example of a “peripheral light-shielding unit” of the present disclosure.
As described in the second embodiment, the opening H120 for exposing the surface of the WB pad electrode 110 is provided on the WB pad electrode 110, and a wire is connected to the surface of the WB pad electrode 110 through the opening H120. With the side surface of the opening H120 being exposed from the light-shielding film 50, there is a possibility that the side surface becomes an entrance of light into the LDD substrate 42. In order to reduce this possibility, in the embodiment of the present disclosure, the side surface of the opening H120 may be covered with a peripheral light-shielding unit. As such an aspect, Configuration Examples 1 to 3 of the third embodiment will be described.
The light-shielding resin 210 is an insulating resin. In addition, the light-shielding resin 210 has a light-shielding property against light emitted from the light-emitting unit 11. For example, the light-shielding resin 210 is a dark or black insulating resin and has a shielding property against infrared light emitted from the light-emitting unit 11. The light-shielding resin 210 may be a resin called a black matrix.
As illustrated in
An interface end between the WB pad electrode 110 and the protective film 120 and the side surface s1 of the opening H120 can be cited as an entrance of light (ambient light) from the opening H120 to the LDD substrate 42. In addition, an interface end between the protective film 120 and the light-shielding film 50 can be cited as an entrance of the ambient light from the opening H50 into the LDD substrate 42. The light-shielding resin 210 covers and closes these entrances.
In the VCSEL mounted body 140A according to Configuration Example 1 of the third embodiment, the light-shielding resin 210 covers the side surfaces s1, s2 of the openings H120, H50. Thus, the light-shielding resin 210 can prevent ambient light from entering the LDD substrate 42 through the openings H120, H50 and can shield at least some (e.g., the bias circuit 61) of the drive circuit 12 from the ambient light. Therefore, the light-shielding resin 210 can further reduce the possibility that the drive circuit 12 malfunctions.
The light-shielding resin 210 preferably covers the entire side surface s1 of the opening H120. Hence the light-shielding resin 210 easily shields the entrance of the ambient light present on the side surface s1 of the opening H120 and the like.
Note that Configuration Example 1 of the third embodiment is not limited to the above. The light-shielding resin 210 may be disposed to cover not the entire side surface s1 of the opening H120 but a part of the side surface s1. For example, the light-shielding resin 210 may be applied so as to cover the side surface on the side closer to the drive circuit 12 and so as not to cover the side surface on the side farther from the drive circuit 12 among the side surfaces s1 of the opening H120. In this case, there is a possibility that the entry of the ambient light into the drive circuit 12 can be reduced as compared with a case where the side surface on the side close to the drive circuit 12 is not covered with the light-shielding resin 210.
As a result, the thick film portion 111 of the WB pad electrode 110 can prevent ambient light from entering the LDD substrate 42 through the opening H120 and can shield at least a part (e.g., the bias circuit 61) of the drive circuit 12 from the ambient light. Therefore, the thick film portion 111 can further reduce the possibility that the drive circuit 12 malfunctions.
The thick film portion 111 preferably covers the entire side surface s1 of the opening H120. Hence the thick film portion 111 easily shields the entrance of the ambient light existing on the side surface s1 of the opening H120 and the like.
Note that Configuration Example 2 of the third embodiment is not limited to the above. The thick film portion 111 may be disposed to cover not the entire side surface s1 of the opening H120 but a part of the side surface s1. For example, the thick film portion 111 may be formed so as to cover the side surface on the side closer to the drive circuit 12 and so as not to cover the side surface on the side farther from the drive circuit 12 among the side surfaces s1 of the opening H120. In this case, there is a possibility that the entry of the ambient light into the drive circuit 12 can be reduced as compared with a case where the side surface on the side close to the drive circuit 12 is not covered with the thick film portion 111.
The sidewalls 211, 212 are made of an insulating resin. In addition, the sidewalls 211, 212 have a light-shielding property against light emitted from the light-emitting unit 11. For example, the sidewalls 211, 212 are made of a dark or black resin and have a shielding property against infrared light emitted from the light-emitting unit 11. The resin constituting the sidewalls 211, 212 may be made of a resin called a black matrix.
The sidewalls 211, 212 are formed, for example, by applying an insulating dark or black resin to the upper surface 42a of the LDD substrate 42 in which the openings H120, H50 are formed, and etching back the applied resin.
In the VCSEL mounted body 140C, the sidewall 211 covers and closes the side surface s1 of the opening H120 serving as an entrance for the ambient light, and the interface end between the WB pad electrode 110 and the protective film 120. Similarly, in the VCSEL mounted body 140C, the sidewall 212 covers and closes the interface end between the protective film 120 and the light-shielding film 50 serving as the entrance of the ambient light. As a result, the sidewalls 211, 212 can prevent the entry of ambient light from the openings H120, H50 into the LDD substrate 42 and can shield at least a part (e.g., the bias circuit 61) of the drive circuit 12 from the ambient light. Therefore, the sidewalls 211, 212 can further reduce the possibility that the drive circuit 12 malfunctions.
The sidewall 211 preferably covers the entire side surface s1 of the opening H120. Hence the sidewall 211 easily shields the entrance of the ambient light existing on the side surface s1 of the opening H120 and the like. Similarly, the sidewall 212 preferably covers the entire side surface s2 of the opening H50. Hence the sidewall 211 easily shields the entrance of the ambient light existing in the vicinity of the side surface s2 of the opening H50.
Note that Configuration Example 3 of the third embodiment is not limited to the above. For example, only one of the sidewalls 211, 212 may be provided.
Further, the sidewall 211 may be disposed to cover not the entire side surface s1 of the opening H120 but a part of the side surface s1. For example, the sidewall 211 may be formed so as to cover the side surface on the side closer to the drive circuit 12 and so as not to cover the side surface on the side farther from the drive circuit 12 among the side surfaces s1 of the opening H120. In this case, there is a possibility that the entry of the ambient light into the drive circuit 12 can be reduced as compared with a case where the side surface on the side close to the drive circuit 12 is not covered with the sidewall 211.
Similarly, the sidewall 212 may be disposed to cover not the entire side surface s2 of the opening H50 but a part of the side surface s2. In this case, the sidewall 212 may be formed so as to cover the side surface on the side closer to the drive circuit 12 and so as not to cover the side surface on the side farther from the drive circuit 12 among the side surfaces s2 of the opening H50. In this case, there is a possibility that the entry of the ambient light into the drive circuit 12 can be reduced as compared with a case where the side surface on the side close to the drive circuit 12 is not covered with the sidewall 212.
In the embodiment of the present disclosure, the peripheral light-shielding unit may be disposed to shield the propagation path of the ambient light having entered from the opening H120 or the like. As such an aspect, Configuration Examples 1 to 4 of the fourth embodiment will be described.
As illustrated in
The opaque member 221 is made of, for example, titanium nitride (TiN). TiN is formed by forming a film by a semiconductor manufacturing process, such as chemical vapor deposition (CVD) or sputtering, and using a photolithography technique to perform patterning.
The opaque member 221 is preferably in contact with the SiN film 122. As a result, the opaque member 221 can divide the SiO2 film 121 on the WB pad electrode 110 and can absorb and attenuate ambient light propagating in the SiO2 film 121. For example, after the opaque member 221 is formed on the WB pad electrode 110, the SiO2 film 121 is formed on the LDD substrate 42, the surface of the SiO2 film 121 is subjected to chemical mechanical polishing (CMP) treatment to expose the surface of the opaque member 221, and then the SiN film 122 is formed, whereby the opaque member 221 can be brought into contact with the SiN film 122.
In the VCSEL mounted body 140D according to the fourth embodiment, the opaque member 221 shields the propagation path of the ambient light, so that at least a part (e.g., the bias circuit 61) of the drive circuit 12 can be shielded from the ambient light. Therefore, the opaque member 221 can further reduce the possibility that the drive circuit 12 malfunctions.
Further, as illustrated in
Note that Configuration Example 1 of the fourth embodiment is not limited to the above. The opaque member 221 may be intermittently provided to surround the opening H120 from the outside in cross-sectional view from the axial direction. In addition, the opaque member 221 may not necessarily surround the opening H120.
Note that Configuration Example 1 of the fourth embodiment is not limited to the above. The opaque member 221 may be disposed only on one of the inside or the outside of the rectangular frame formed by the plurality of WB pad electrodes 110 arranged in the plan view from the Z-axis direction. For example, the opaque member 221 may be disposed only inside the rectangular frame, which is the side closer to the drive circuit 12. In this case, there is a possibility that the propagation of the ambient light to the drive circuit 12 can be reduced as compared with a case where the opaque member 221 is disposed only outside the rectangular frame.
The antireflection film 222 is made of, for example, a photoresist. The antireflection film 222 is formed by forming a film by a semiconductor manufacturing process, such as CVD or sputtering, and using a photolithography technique to perform patterning.
In the VCSEL mounted body 140E according to Configuration Example 2 of the fourth embodiment, the antireflection film 222 shields the propagation path of the ambient light, so that at least a part (e.g., the bias circuit 61) of the drive circuit 12 can be shielded from the ambient light. Therefore, the antireflection film 222 can further reduce the possibility that the drive circuit 12 malfunctions.
Further, the antireflection film 222 is preferably provided continuously to surround the opening H120 from the outside in a plan view from the Z-axis direction as in the opaque member 221 illustrated in
Note that Configuration Example 1 of the fourth embodiment is not limited to the above. The antireflection film 222 may be intermittently provided to surround the opening H120 from the outside in cross-sectional view from the axial direction. In addition, the antireflection film 222 may not necessarily surround the opening H120.
Furthermore, the modification illustrated in
As illustrated in
In a case where the ambient light propagates through the interface between the WB pad electrode 110 and the protective film 120 or through the SiO2 film 121 constituting the protective film 120, there is a possibility that at least a part of the ambient light further propagates into the LDD substrate 42 through the periphery of the WB pad electrode 110. In consideration of this possibility, in the VCSEL mounted body 140F, the light-shielding dummy wiring layer DML is disposed on the outer periphery of the WB pad electrode 110 and a region immediately below the WB pad electrode. For example, the dummy wiring layer DML is disposed between the WB pad electrode / the region immediately below the WB pad electrode 110 and the guard ring GR. The dummy wiring layer DML may be disposed on the entire outer periphery of the WB pad electrode 110 and the region immediately below the WB pad electrode or may be disposed on a part of the outer periphery of the WB pad electrode 110.
Further, in the light-shielding dummy wiring layer DML, a plurality of dummy wires is arranged to overlap with each other in order to shield ambient light. For example, in the left diagram of
In the Z-axis direction, the dummy wire DM7 (an example of a “(n + m)th layer dummy wire” of the present disclosure) and the dummy wire DM6 (an example of an “nth layer dummy wire” of the present disclosure) overlap with each other such that the dummy wire DM6 overlaps with an inter-wire space sp7 of the dummy wire DM7. Thus, even in a case where the ambient light is transmitted through the inter-wire space sp7 of the dummy wire DM7, the light transmitted through the inter-wire space sp7 is reflected by the dummy wire DM6 located ahead of the inter-wire space sp7 and is attenuated.
Similarly, the dummy wire DM5 (an example of the “(n + m)th layer dummy wire” of the present disclosure) and the dummy wire DM4 (an example of the “nth layer dummy wire” of the present disclosure) overlap with each other such that the dummy wire DM4 overlaps with an inter-wire space sp5 of the dummy wire DM5. Thus, even in a case where the ambient light is transmitted through the inter-wire space sp5 of the dummy wire DM5, the light transmitted through the inter-wire space sp5 is reflected by the dummy wire DM4 located ahead of the inter-wire space sp5 and is attenuated.
As a result, the dummy wiring layer DML can shield the propagation path of the ambient light. The dummy wiring layer DML can reduce the propagation of the ambient light and can shield at least a part (e.g., the bias circuit 61) of the drive circuit 12 from the ambient light. Therefore, the dummy wiring layer DML can further reduce the possibility that the drive circuit 12 malfunctions.
Note that as described above, the dummy wires to be overlapped are preferably adjacent wires in the thickness direction of the LDD substrate 42, such as the dummy wire DM7 and the dummy wire DM6 or the dummy wire DM5 and the dummy wire DM4. That is, m in the n + m layer described above is preferably 1. Hence it is possible to reduce the diffraction of the ambient light transmitted through the inter-wire space to a small degree, and it is possible to more effectively reduce the propagation of the ambient light.
Furthermore, the modification illustrated in
The trench isolation 230 includes a trench 231 provided in the interlayer insulating film 130 and an embedded material 232 provided in the trench 231. The embedded material 232 is made of a material capable of absorbing or reflecting ambient light, such as polysilicon, metal, or a low-dielectric constant material (low-K material).
Therefore, the trench isolation 230 can shield the propagation path of the ambient light and reduce the propagation of the ambient light. The trench isolation 230 can shield at least a part (e.g., the bias circuit 61) of the drive circuit 12 from ambient light, so that it is possible to further reduce the possibility that the drive circuit 12 malfunctions.
As described above, the present disclosure has been described with reference to the embodiments and the modifications, but it should not be understood that the description and the drawings constituting a part of this disclosure limit the present disclosure. Various alternative embodiments, examples, and operation techniques will be apparent to those skilled in the art from this disclosure. For example, the light emitted by the light-emitting unit 11 is not limited to infrared light. The light emitted from the light-emitting unit 11 may be visible light or ultraviolet light. Further, the light-shielding unit of the present disclosure may include both the light-shielding film 50 and the through layer 51. As described above, it is a matter of course that the present technology includes various embodiments and the like not described herein. At least one of various omissions, substitutions, or changes of the components can be made without departing from the gist of the embodiments and modifications described above. Furthermore, the effects described in the present specification are merely examples, are not limited, and may have other effects.
Note that the present disclosure can also be configured as follows:
1
2
3
11
12
13
14
21
22
23
31
40, 40A, 40B, 40C, 40D, 40E, 40F, 40G, 140A, 140B, 140C, 140D, 140E, 140F, 140G
41
42
42
a
42
b
43
44
45
46
48
50, 52
51
53
60
61
62
63
70
71, 72, 73
100
110
111
112
120
121
122
130
210
211, 212
221
222
230
231
232
421
611
612, 613
s
1, s2
sp
5, sp7
Number | Date | Country | Kind |
---|---|---|---|
2020-088857 | May 2020 | JP | national |
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/JP2021/015492 | 4/14/2021 | WO |