Claims
- 1. A self-isolating decoupling capacitor for use in an integrated circuit comprising:a semiconductor substrate; an n-well in a surface of the substrate, said n-well having a plurality of edges extending to the surface of the substrate and said n-well having a depth substantially greater than diffused regions of active devices formed in said substrate; a capacitor having a first electrode comprising a conductive layer dielectrically spaced from the surface of said n-well, said n-well comprising the second electrode of said capacitor; a control device for connecting the n-well to a reference potential; said control device extending along at least one edge of said n-well; a first conductor coupled between said first electrode and a voltage node to be provided decoupling capacitance protection; and a second conductor coupled between the control device and a control signal.
- 2. The self-isolating decoupling capacitor of claim 1 wherein said control device comprises an n-channel device.
- 3. The self-isolating decoupling capacitor of claim 2 wherein said capacitor comprises a planar thin oxide capacitor.
Parent Case Info
This application is a divisional application Ser. No. 08/418,971 filed on Apr. 7, 1995, now U.S. Pat. No. 5,506,457.
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