Electrostatic chuck with improved spacing and charge migration reduction mask

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Information

Patent Grant
D407073

References
Source

Patent Number
D407,073
Date Filed
Wednesday, December 24, 1997
27 years ago
Date Issued
Tuesday, March 23, 1999
26 years ago

Inventors
Original Assignees
- Applied Materials, Inc.
Examiners
- Vinson; Brian N.
Agents
- Thomason & Moser

US Classifications
- D13 - Equipment for production, distribution, or transformation of energy
Field of Search
- US
- D13 199
- 361 230
- 361 233
- 361 234
- 279 128
- 269 8
- 269 903
International Classifications
- 1399
- Term of Grant
  14Years

Information

Abstract

Description

Claims

The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown herein.

US Referenced Citations (6)

Number	Name	Date	Kind
4502094	Lewis et al.	Feb 1985
4554611	Lewis	Nov 1985
4665463	Ward et al.	May 1987
5001594	Bobbio	Mar 1991
5179498	Honough et al.	Jan 1993
5459632	Birang et al.	Oct 1995

Continuation in Parts (1)

	Number	Date	Country
Parent	639841	May 1996